公开(公告)号：US20120107743A1

公开(公告)日：2012-05-03

申请号：US13123816

申请日：2010-11-03

申请人： Seth Miller

发明人： Seth Miller

IPC分类号： G03F7/20 ,  G03F7/029 ,  G03B27/00 ,  G03F7/004 ,  B82Y40/00

CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/2053

摘要： Technologies are generally described for a photoresist and methods and systems effective to form a pattern in a photoresist on a substrate. In some examples, the photoresist includes a resin, a photoinitiator and a photoinhibitor. The photoinitiator may be effective to generate a first reactant upon the absorption of at least one photon of a particular wavelength of light. The first reactant may be effective to render the resin soluble or insoluble in a photoresist developer. The photoinhibitor may be effective to generate a second reactant upon the absorption of at least one photon of the particular wavelength of light. The second reactant may be effective to inhibit the first reactant.

摘要翻译： 通常描述了用于光致抗蚀剂的技术，并且有效地在基板上的光致抗蚀剂中形成图案的方法和系统。 在一些实例中，光致抗蚀剂包括树脂，光引发剂和光抑制剂。 在吸收特定波长的光的至少一个光子时，光引发剂可以有效地产生第一反应物。 第一反应物可能有效地使树脂溶解或不溶于光致抗蚀剂显影剂。 光吸收剂可以有效地在吸收特定波长的光的至少一个光子时产生第二反应物。 第二反应物可能有效抑制第一反应物。

公开(公告)号：US20120045723A1

公开(公告)日：2012-02-23

申请号：US13207519

申请日：2011-08-11

申请人： Ryo NAWATA ,  Katsumi ASADA

发明人： Ryo NAWATA ,  Katsumi ASADA

IPC分类号： G03B27/00 ,  F16M13/00 ,  G03F7/20 ,  F16F7/00

CPC分类号： F16F15/002 ,  G03F7/70833 ,  G03F7/709

摘要： The vibration isolation device of the present invention includes a first position feedback control system including a reference body system that is fixed to an object to be isolated from vibration and includes a reference body; a first driving unit that drives the object with respect to a base; and a first compensator that calculates a command value to the first driving unit based on position information obtained from the reference body system. Also, the reference body system includes a second position feedback control system including a second driving unit that drives the reference body with respect to the object; a first measuring unit that measures the position of the reference body relative to the object; and a second compensator that calculates a command value to the second driving unit based on position information obtained from the first measuring unit. Here, the second compensator is a PD compensator.

摘要翻译： 本发明的隔振装置包括第一位置反馈控制系统，该第一位置反馈控制系统包括固定在与振动隔离的物体上并包括基准体的基准体系统; 相对于基座驱动物体的第一驱动单元; 以及第一补偿器，其基于从参考主体系统获得的位置信息来计算到第一驱动单元的命令值。 此外，参考体系包括第二位置反馈控制系统，其包括相对于物体驱动参考体的第二驱动单元; 第一测量单元，其测量参考体相对于物体的位置; 以及第二补偿器，其基于从所述第一测量单元获得的位置信息来计算到所述第二驱动单元的指令值。 这里，第二补偿器是PD补偿器。

公开(公告)号：US20110247511A1

公开(公告)日：2011-10-13

申请号：US13130610

申请日：2009-12-09

申请人： Daniel H. Carlson ,  Daniel J. Theis ,  Brian K. Nelson

发明人： Daniel H. Carlson ,  Daniel J. Theis ,  Brian K. Nelson

IPC分类号： B41J2/01 ,  B26D3/00 ,  G03B27/00 ,  B26D3/08

CPC分类号： H05K1/0269 ,  B41J3/543 ,  B41J11/46 ,  H05K3/0082 ,  H05K2201/09918 ,  H05K2203/013 ,  H05K2203/107 ,  H05K2203/1545 ,  Y10T83/02 ,  Y10T83/0333

摘要： Fiducials having substantially continuous portions made on a substrate allow the position of the substrate to be determined. An approach for making fiducials involves moving first and second fiducial devices together back and forth across the substrate along a trajectory having a component along the lateral axis of the substrate while the substrate and the first and second fiducial devices are in relative motion along the longitudinal axis of the substrate. The first fiducial device operates to make one fiducial on the substrate during the movement along the trajectory and the relative motion. The second fiducial device operates to make another fiducial on the substrate during the movement along the trajectory and the relative motion. The fiducials may be formed so that they have a constant spatial frequency with the first fiducial being out of phase with respect to the second fiducial.

摘要翻译： 在基板上具有基本上连续的部分的基准允许确定基板的位置。 用于制造基准的方法涉及使第一和第二基准装置沿着具有沿着基板的横向轴线的分量的轨迹穿过基板一起来回移动，同时基板和第一和第二基准装置沿着纵向轴线相对运动 的基底。 第一个基准装置用于在轨迹和相对运动的运动过程中在基板上形成一个基准点。 第二基准装置在沿着轨迹和相对运动的运动期间操作以在基底上形成另一基准。 基准可以被形成为使得它们具有恒定的空间频率，其中第一基准相对于第二基准是异相的。

公开(公告)号：US07970485B2

公开(公告)日：2011-06-28

申请号：US12469138

申请日：2009-05-20

申请人： Li-Ming Wang

发明人： Li-Ming Wang

IPC分类号： G06F19/00 ,  G03F1/00 ,  G03C5/00 ,  G03B27/00 ,  G03B27/42

CPC分类号： G03F7/70625 ,  G03F1/84

摘要： Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.

摘要翻译： 用于确定产品蒙版布局的宽度/空间限制的系统。 掩模写入器在与测试掩码布局相对应的测试掩码上生成第一模式。 光刻工具通过使用预设曝光剂量的光刻工艺在与测试掩模上的第一图案相对应的晶片上产生第二图案。 计量工具测量第一和第二模式的宽度。 控制器根据第一和第二图案之间的宽度差确定产品掩模布局的宽度/空间极限。

公开(公告)号：US07808610B2

公开(公告)日：2010-10-05

申请号：US10853659

申请日：2004-05-26

申请人： Kia Silverbrook

发明人： Kia Silverbrook

IPC分类号： G03B27/00 ,  G03B19/00

CPC分类号： B41J2/175 ,  B41J2/14 ,  B41J2/14427 ,  B41J2/1623 ,  B41J2/1626 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1635 ,  B41J2/1637 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1645 ,  B41J2/1646 ,  B41J2/1648 ,  B41J2/16585 ,  B41J2/17503 ,  B41J2/17513 ,  B41J2/17546 ,  B41J2/17553 ,  B41J2/17596 ,  B41J3/44 ,  B41J3/445 ,  B41J11/0005 ,  B41J13/103 ,  B41J15/044 ,  B41J2002/041 ,  B41J2002/17516 ,  B41J2202/21 ,  B42D2035/34 ,  B82Y30/00 ,  G03B17/00 ,  G03B27/00 ,  G06F21/79 ,  G06F21/86 ,  G06F2221/2129 ,  G06K1/121 ,  G06K7/14 ,  G06K7/1417 ,  G06K15/00 ,  G06K19/06037 ,  G06K2215/0002 ,  G07F7/08 ,  G07F7/086 ,  G07F7/12 ,  G11C11/56 ,  H04N1/00127 ,  H04N1/00326 ,  H04N1/0044 ,  H04N1/00477 ,  H04N1/00965 ,  H04N1/2112 ,  H04N1/2154 ,  H04N1/32133 ,  H04N1/32561 ,  H04N5/225 ,  H04N5/228 ,  H04N5/2628 ,  H04N5/335 ,  H04N2101/00 ,  H04N2201/0008 ,  H04N2201/3222 ,  H04N2201/3261 ,  H04N2201/3264 ,  H04N2201/3269 ,  H04N2201/3276 ,  H04N2201/328

摘要： An image sensing and printing device includes a housing. An area image sensor is positioned on the housing for sensing a viewed image to be printed on media and for generating pixel data representing the viewed image. A printing mechanism is arranged on the housing. The printing mechanism defines a media feed path and includes a printhead assembly that includes a pagewidth printhead having at least one printhead chip that spans the media feed path. A feed mechanism feeds media along the media feed path so that the printhead can carry out a printing operation on the media. A processor is positioned in the housing. The processor includes processing circuitry. An image sensor interface is connected to the processing circuitry for receiving pixel data from the image sensor, converting the pixel data into an internal format and writing the converted pixel data to the processing circuitry. The processing circuitry is configured to convert the pixel data to print image data. A printhead interface is connected to the processing circuitry for receiving the print image data from the processing circuitry and for providing signals representing the print image data to the printhead so that the printhead can carry out the printing operation to generate a printed representation of the viewed image.

摘要翻译： 图像感测和打印装置包括壳体。 区域图像传感器位于壳体上，用于感测要被打印在介质上的观看图像并用于生成表示所观看图像的像素数据。 在外壳上设有打印机构。 打印机构限定介质进给路径并且包括打印头组件，该打印头组件包括具有跨过介质进给路径的至少一个打印头芯片的页宽打印头。 馈送机构沿着介质馈送路径馈送介质，使得打印头可以在介质上执行打印操作。 处理器位于外壳中。 处理器包括处理电路。 图像传感器接口连接到处理电路，用于从图像传感器接收像素数据，将像素数据转换为内部格式，并将转换的像素数据写入处理电路。 处理电路被配置为将像素数据转换为打印图像数据。 打印头接口连接到处理电路，用于从处理电路接收打印图像数据，并将表示打印图像数据的信号提供给打印头，使得打印头可以执行打印操作以产生所查看图像的打印表示 。

公开(公告)号：US20100239822A1

公开(公告)日：2010-09-23

申请号：US12679601

申请日：2007-10-02

申请人： Maria-Gugliel Pelizzo ,  Piergiorgio Nicolosi ,  Michele Suman ,  David L. Windt

发明人： Maria-Gugliel Pelizzo ,  Piergiorgio Nicolosi ,  Michele Suman ,  David L. Windt

IPC分类号： B32B3/00 ,  G03B27/00 ,  G06F17/50 ,  G06F17/10

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G02B27/0012 ,  G03F1/24 ,  G03F7/70233 ,  G21K1/062 ,  G21K2201/061 ,  Y10T428/24612

摘要： An aperiodic multilayer structure (2, 2′) comprising a plurality of alternating layers of a first (4, 4′) and a second (6, 6′) material and a capping layer (10, 10′) covering these alternating layers, wherein the structure (2, 2′) is characterized in that the thickness of the alternating layers chaotically varies in at least a portion of said structure (2, 2′). The invention further comprises design method comprising the step of define a time interval and a first plurality of periodic multilayer structures (A), then calculate a first merit function (∫R(λ)10*I(λ)dλ) and define a first domain for each first structures. The method further includes the step of apply at least one random mutation to each first structures inside the associated first domain and calculate a second merit function (∫R(λ)10*I(λ)dλ for the at least one mutation. Then, the method proceeds with a comparison of each first merit functions with the second merit function of the associated at least one mutation and if said second merit function is enhanced with respect to the first merit function, the at least one mutation is substituted for the structure of the first plurality and a second domain is defined for the mutation, otherwise, the structure of the first plurality is maintained inside the corresponding first domain. The method further includes the step of calculate a mean value of the merit functions of the first plurality of structures or mutations present in each first or second domain and define a threshold value to said mean value; then, for each first plurality of structures or mutations present in each first or second domain whose merit function is enhanced of the threshold with respect to the mean value, substitute a third domain to the first or second domain until the corresponding merit function is enhanced of said predetermined threshold. Then, the preceding step are repeated until the time interval has lapsed and the merit functions of the first plurality of structures or mutations present in each first domain are compared and the structure or mutation whose merit function is the more enhanced is selected.

公开(公告)号：US20100004869A1

公开(公告)日：2010-01-07

申请号：US12506350

申请日：2009-07-21

申请人： Takashi Shibayama ,  Takehiko Mayama ,  Takao Ukaji

发明人： Takashi Shibayama ,  Takehiko Mayama ,  Takao Ukaji

IPC分类号： G01V1/28 ,  G03B27/00

CPC分类号： F16F15/02 ,  G03F7/709

摘要： An arithmetic apparatus connected to a communication net connected to a vibration isolation device. The apparatus includes a reception unit that receives seismic information via the communication net from a seismic observation device, an estimation unit that estimates seismic vibration which will arrive at the vibration isolation device, on the basis of the seismic information received by the reception unit, and a transmission unit that transmits information on the seismic vibration estimated by the estimation unit to the vibration isolation device via the communication net.

摘要翻译： 连接到连接到隔振装置的通信网的运算装置。 该装置包括：接收单元，其经由通信网从地震观测装置接收地震信息;估计单元，其基于由接收单元接收的地震信息估计到达隔振装置的地震振动;以及 发送单元，其经由所述通信网向所述隔振装置发送由所述估计单元估计出的地震振动的信息。

公开(公告)号：US20090161082A1

公开(公告)日：2009-06-25

申请号：US12230506

申请日：2008-08-29

申请人： Hideaki Sakamoto

发明人： Hideaki Sakamoto

IPC分类号： G01B11/14 ,  G03B27/00

CPC分类号： G03F7/709 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70833

摘要： Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

摘要翻译： 公开了一种通过投影光学系统投影图案的曝光装置，包括：测量单元，具有测量投影光学系统与相对于投影光学系统定位的部件之间的位置关系的传感器;以及 第一支撑装置，其具有第一软结构，并且以与投影光学系统分开的悬挂方式支撑测量单元。

公开(公告)号：US07379153B2

公开(公告)日：2008-05-27

申请号：US10356727

申请日：2003-02-03

申请人： Johannes Gerardus Gijsbertsen ,  Pieter Willem Horman De Jager ,  Michiel David Nijkerk

发明人： Johannes Gerardus Gijsbertsen ,  Pieter Willem Horman De Jager ,  Michiel David Nijkerk

IPC分类号： G03B27/00 ,  G01J1/00

CPC分类号： G03F9/7053

摘要： A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and beam of radiation, and is an off-axis alignment sensor.

摘要翻译： 光刻投影装置包括一个对准传感器，该对准传感器具有一个电子束源，该电子束源被构造和布置成提供一个电子束，用于冲击基板上的一个对准标记;以及一个后向散射电子检测器，被构造和布置成检测从该对准反向散射的电子 标记。 对准传感器与投影系统和辐射束无关，是离轴对准传感器。

公开(公告)号：US20080076045A1

公开(公告)日：2008-03-27

申请号：US11535247

申请日：2006-09-26

申请人： James E. Willis ,  Manuel Perez ,  Asao Yamashita

发明人： James E. Willis ,  Manuel Perez ,  Asao Yamashita

IPC分类号： G03B27/00 ,  G03C5/00 ,  G03B27/42

CPC分类号： G03B27/42 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/95615 ,  G03F7/40

摘要： The present invention provides methods and system for improving the accuracy of measurements made using optical metrology. The present invention relates to methods and systems for changing the optical properties of tunable resists that can be used in the production of electronic devices such as integrated circuits. Further, the invention provides methods and systems for using a modifiable resist layer that provides a first set of optical properties before exposure and a second set of optical properties after exposure.

摘要翻译： 本发明提供了使用光学测量提高测量精度的方法和系统。 本发明涉及用于改变可用于生产诸如集成电路的电子器件的可调谐抗蚀剂的光学性质的方法和系统。 此外，本发明提供了用于使用在曝光之前提供第一组光学特性并且在曝光后提供第二组光学性质的可修改抗蚀剂层的方法和系统。