公开(公告)号：US20230171869A1

公开(公告)日：2023-06-01

申请号：US17922056

申请日：2021-04-26

Applicant: ASML Netherlands B.V.

Inventor： Benjamin Andrew Sams ,  Dietmar Uwe Herbert Trees ,  Theodorus Wilhelmus Driessen ,  Herman Harry Borggreve ,  Brandon Michael Johnson ,  Vikas Giridhar Telkar

IPC: H05G2/00 ,  B05B1/02 ,  G03F7/20

CPC classification number: H05G2/006 ,  B05B1/02 ,  G03F7/70033 ,  H05G2/008

Abstract: A droplet generator nozzle (800, 820/830) includes a metal body (802, 822), a metal fitting (812, 823/833) arranged adjacent to the metal body, and a capillary (804, 824/834) comprising a first end and a second end. The first end of the capillary is disposed within the metal fitting, and the capillary is configured to eject initial droplets of a material from the second end of the capillary. The droplet generator nozzle further includes an electromechanical element (808 828/838) disposed within the metal body and coupled to the first end of the capillary and a fastener element (810) configured to clamp around a portion of the metal body and around the metal fitting. The electromechanical element is configured to apply a change that affects droplet generation from the capillary. The second end of the capillary protrudes out from an opening in the fastener element of the droplet generator nozzle. Droplet generator nozzle 830 of FIG. 8C represents the embodiment shown in FIG. 8B, in a cross section orthogonal to the cross section shown in FIG. 8B.

公开(公告)号：US11662669B2

公开(公告)日：2023-05-30

申请号：US17625466

申请日：2020-06-15

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich Rogachevskiy ,  Martin Jules Marie-Emile De Nivelle ,  Arjan Gijsbertsen ,  Willem Richard Pongers ,  Viktor Trogrlic

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F9/7092 ,  G03F7/7085 ,  G03F9/7026 ,  G03F9/7034

Abstract: An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.

公开(公告)号：US11662666B2

公开(公告)日：2023-05-30

申请号：US17441353

申请日：2020-03-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Rowin Meijerink ,  Putra Saputra ,  Pieter Gerardus Jacobus Smorenberg ,  Theo Wilhelmus Maria Thijssen ,  Khalid Elbattay ,  Ma Su Su Hlaing ,  Paul Derwin ,  Bo Zhong ,  Masaya Komatsu

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70258 ,  G03F7/70725

Abstract: A method for controlling a lithographic apparatus configured to pattern an exposure field on a substrate including at least a sub-field, the method including: obtaining an initial spatial profile associated with a spatial variation of a performance parameter associated with a layer on the substrate across at least the sub-field of the exposure field; and decomposing the initial spatial profile into at least a first component spatial profile for controlling a lithographic apparatus at a first spatial scale and a second component spatial profile for controlling the lithographic apparatus at a second spatial scale associated with a size of the sub-field, wherein the decomposing includes co-optimizing the first and second component spatial profiles based on correcting the spatial variation of the performance parameter across the sub-field.

公开(公告)号：US20230164900A1

公开(公告)日：2023-05-25

申请号：US18011593

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Alexander Igorevich Ershov ,  Chirag Rajyaguru ,  Dietmar Uwe Herbert Trees ,  Joshua Mark Lukens ,  Theodorus Wilhelmus Driessen ,  Robert Jay Rafac ,  Georgiy Olegovich Vaschenko

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008 ,  G03F7/70033

Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.

公开(公告)号：US20230162944A1

公开(公告)日：2023-05-25

申请号：US17916785

申请日：2021-03-31

Applicant: ASML Netherlands B.V.

Inventor： Xiang WANG ,  Steffen MEYER ,  Mark O'MAHONY

IPC: H01J37/22 ,  H01J37/28

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J2237/2817 ,  H01J2237/2809 ,  H01J2237/0044 ,  H01J2237/282

Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a plurality of test images of a sample that are obtained at different landing energies, determining distortion levels for the plurality of test images, determining a landing energy level that enables the sample to be in a neutral charge condition during inspection based on the distortion levels, and acquiring an inspection image based on the determined landing energy level.

公开(公告)号：US20230161265A1

公开(公告)日：2023-05-25

申请号：US18157776

申请日：2023-01-20

Applicant: ASML Netherlands B.V.

Inventor： Pioter NIKOLSKI ,  Thomas THEEUWES ,  Antonio CORRADI ,  Duan-Fu Stephen HSU ,  Sun Wook JUNG

IPC: G03F7/20

CPC classification number: G03F7/70525 ,  G03F7/70616 ,  G03F7/70441

Abstract: Disclosed is a method of determining a process window within a process space comprising obtaining contour data relating to features to be provided to a substrate across a plurality of layers, for each of a plurality of process conditions associated with providing the features across said plurality of layers and failure mode data describing constraints on the contour data across the plurality of layers. The failure mode data is applied to the contour data to determine a failure count for each process condition; and the process window is determined by associating each process condition to its corresponding failure count. Also disclosed is a method of determining an actuation constrained subspace of the process window based on actuation constraints imposed by the plurality of actuators.

公开(公告)号：US20230161264A1

公开(公告)日：2023-05-25

申请号：US18089940

申请日：2022-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Duan-Fu Stephen HSU ,  Christoph Rene Konrad Cebulla Hennerkes ,  Rafael C. Howell ,  Zhan Shi ,  Xiaoyang Jason Li ,  Frank Staals

IPC: G03F7/20

CPC classification number: G03F7/70266 ,  G03F7/705 ,  G03F7/7055

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

公开(公告)号：US11656555B2

公开(公告)日：2023-05-23

申请号：US17605601

申请日：2020-04-14

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Janardan Nath ,  Kalyan Kumar Mankala ,  Todd R. Downey ,  Joseph Harry Lyons ,  Ozer Unluhisarcikli ,  Alexander Harris Ledbetter ,  Nicholas Stephen Apone ,  Tian Gang

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70083 ,  G03F7/70133

Abstract: An illumination adjustment apparatus, to adjust a cross slot illumination of a beam in a lithographic apparatus, includes a plurality of fingers to adjust the cross slot illumination to conform to a selected intensity profile. Each finger has a distal edge that includes at least two segments. The two segments form an indentation of the distal edge.

公开(公告)号：US20230154725A1

公开(公告)日：2023-05-18

申请号：US18155698

申请日：2023-01-17

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST

IPC: H01J37/305 ,  H01J37/22 ,  H01J37/317

CPC classification number: H01J37/3056 ,  H01J37/226 ,  H01J37/3175 ,  H01J2237/31774 ,  H01J2237/20285

Abstract: An emitter is configured to emit charged particles. The emitter comprises a body, a metal layer and a charged particle source layer. The body has a point. The metal layer is of a first metal on at least the point. The charged particle source layer is on the metal layer. The point comprises a second metal other than the first metal.

公开(公告)号：US11650576B2

公开(公告)日：2023-05-16

申请号：US16479199

申请日：2018-01-15

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Cho Huak Teh ,  Robeter Jian ,  Yi-Ying Wang ,  Shih-Tsung Chen ,  Jian-Min Liao ,  Chuan Li ,  Zhaohui Guo ,  Pang-Hsuan Huang ,  Shao-Wei Lai ,  Shih-Tsung Hsu

IPC: G06T7/00 ,  G06K9/62 ,  G06N5/02 ,  G05B19/418 ,  G06F18/24

CPC classification number: G05B19/41875 ,  G06F18/24 ,  G06N5/02 ,  G06T7/0004 ,  G06T2207/30148

Abstract: A server for knowledge recommendation for defect review. The server includes a processor electronically coupled to an electronic storage device storing a plurality of knowledge files related to wafer defects. The processor is configured to execute a set of instruction to cause the server to: receive a request for knowledge recommendation for inspecting an inspection image from a defect classification server; search for a knowledge file in the electronic storage device that matches the inspection image; and transmit the search result to the defect classification server.