公开(公告)号：US20210122154A1

公开(公告)日：2021-04-29

申请号：US17079029

申请日：2020-10-23

Applicant: SEMES CO., LTD.

Inventor： Kwangsup KIM ,  Dongok AHN ,  Junho OH ,  Ji Hoon YOO ,  Myeong Jun LIM

IPC: B41J2/045

Abstract: An inspection module is disclosed for inspecting a droplet from an ink jet head. The inspection module includes a sensor located under the ink jet head and measuring a distance between the droplet and the sensor in real time; a variable lens changing an operating distance based on the measured distance of the sensor; and a camera for capturing an image of the droplet. The inspection module further includes a droplet inspecting part inspecting the droplet image captured by the camera.

公开(公告)号：US20210118708A1

公开(公告)日：2021-04-22

申请号：US17072501

申请日：2020-10-16

Applicant: SEMES CO., LTD.

Inventor： Kyungsik SHIN ,  Junho KIM ,  Jinki SHIN

IPC: H01L21/67 ,  H01L21/027 ,  H01L21/3105 ,  H01L21/66 ,  F27B17/00 ,  H05B3/22 ,  F27D5/00 ,  G03F7/16

Abstract: An apparatus for treating a substrate includes a process chamber having a process space inside, a support unit that supports the substrate in the process space, a heating unit that is provided inside the support unit and that heats the substrate, an exhaust unit that evacuates the process space, and a gas supply unit that supplies a gas into the process space, and the gas supply unit supplies the gas at a temperature selected from a first temperature and a second temperature.

公开(公告)号：US20210114068A1

公开(公告)日：2021-04-22

申请号：US17073338

申请日：2020-10-17

Applicant: SEMES CO., LTD.

Inventor： Woo Sin JUNG ,  Sang Eun NOH ,  Dae Sung KIM

IPC: B08B3/14 ,  B08B13/00 ,  B08B3/12

Abstract: A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.

公开(公告)号：US10981184B2

公开(公告)日：2021-04-20

申请号：US15935111

申请日：2018-03-26

Applicant: SEMES CO., LTD.

Inventor： Soon Cheon Cho ,  Bongkyu Shin ,  Hyun Joong Kim

IPC: B05B5/025 ,  B05C5/02 ,  B05B17/04 ,  B05B5/08 ,  B05B7/22 ,  B05B5/00 ,  B05D1/04 ,  B05D3/00 ,  B05D3/14

Abstract: Disclosed are a coating apparatus and a coating method. The coating apparatus includes a chamber, a support located in an interior space of the chamber and configured to support a substrate which is to be coated, an ejection nozzle configured to eject a coating material toward the support, and an electric field forming unit configured to form an electric field in a movement path of the coating material to provide kinetic energy for the coating material.

公开(公告)号：US20210111042A1

公开(公告)日：2021-04-15

申请号：US17132008

申请日：2020-12-23

Applicant: SEMES CO., LTD.

Inventor： Boong KIM ,  Oh Jin KWON ,  Sungho JANG ,  Joo Jib PARK

IPC: H01L21/67 ,  F26B25/14 ,  H01L21/677 ,  H01L21/687

Abstract: Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.

公开(公告)号：US20210104417A1

公开(公告)日：2021-04-08

申请号：US17063820

申请日：2020-10-06

Applicant: SEMES CO., LTD.

Inventor： Eui Sang LIM ,  Young Hun LEE ,  Jinwoo JUNG ,  Miso PARK ,  Byongwook AHN ,  Young Hee LEE

IPC: H01L21/67 ,  H01J37/32

Abstract: The apparatus includes a support unit to support the substrate in a treatment space of a process chamber, a first fluid supply unit to supply a supercritical fluid having an organic solvent dissolved in the supercritical fluid, to the treatment space, a second fluid supply unit to supply the supercritical fluid having no organic solvent dissolved in the supercritical fluid, to the treatment space, an exhaust unit to exhaust the treatment space, a controller to control the first fluid supply unit, the second fluid supply unit, and the exhaust unit. The controller controls the first and second fluid supply units such that the supercritical fluid having no organic solvent dissolved in the supercritical fluid is supplied to the treatment space through the second fluid supply unit, after the supercritical fluid mixed with the organic solvent is supplied to the treatment space through the first fluid supply unit.

公开(公告)号：US10969700B2

公开(公告)日：2021-04-06

申请号：US16504092

申请日：2019-07-05

Applicant: SEMES CO., LTD.

Inventor： Hwangsoo Park ,  Jun Ho You

IPC: C23C16/02 ,  G03F7/20

Abstract: A method for treating a substrate includes a substrate treating step of treating the substrate by dispensing a treating liquid onto the substrate supported on a support plate in a processing space of a processing vessel and a vessel cleaning step of cleaning the processing vessel by dispensing a cleaning solution onto a jig supported on the rotating support plate. In the vessel cleaning step, the jig is located such that the center of the jig is offset from the center of the support plate.

公开(公告)号：US20210094055A1

公开(公告)日：2021-04-01

申请号：US17028211

申请日：2020-09-22

Applicant: SEMES CO., LTD.

Inventor： Kang Suk LEE ,  Joo Sung LEE ,  Soon Kab KWON

IPC: B05B12/10 ,  H01L21/02 ,  B08B3/08 ,  B05B12/12

Abstract: The inventive concept relates to an apparatus for treating a substrate. The apparatus includes a substrate support unit that supports the substrate, a nozzle unit that dispenses a treatment liquid onto the substrate supported on the substrate support unit, and a liquid supply unit that supplies the treatment liquid to the nozzle unit. The liquid supply unit includes a main supply line that is connected to the nozzle unit and that supplies the treatment liquid to the nozzle unit, wherein the treatment liquid is prepared by mixing a chemical with DIW at a first temperature and DIW at a second temperature higher than the first temperature, and temperature of the treatment liquid is adjusted by regulating a flow rate of the DIW at the first temperature and a flow rate of the DIW at the second temperature.

公开(公告)号：US10957517B2

公开(公告)日：2021-03-23

申请号：US16695386

申请日：2019-11-26

Applicant: SEMES CO., LTD.

Inventor： Yunsik Ju ,  Sangbo Seo ,  Byeong Hyeon Kong

IPC: H01J37/32

Abstract: Disclosed is a substrate treating apparatus including a chamber having a process space therein in which a substrate is treated, a substrate support assembly located in the chamber and including a support plate that supports the substrate, a gas supply unit that supplies gas into the chamber, a gas distribution plate that distributes the gas and supplies the gas into the process space, and a temperature control unit that controls temperature of the gas distribution plate. The temperature control unit includes a heating member that heats the gas distribution plate, a cooling member that cools the gas distribution plate, and a control member that controls the heating member and the cooling member, based on a correlation coefficient regarding an interaction of the heating member and the cooling member and a disturbance coefficient regarding an external influence.

公开(公告)号：US10955758B2

公开(公告)日：2021-03-23

申请号：US16658215

申请日：2019-10-21

Applicant: SEMES CO., LTD.

Inventor： Shi Hyun Park

IPC: G03F7/20

Abstract: Provided are a guide pin configured to support a corner of a photo mask using a double slide structure, a photo mask supporting unit including the same, and a photo mask cleaning apparatus including the same. The photo mask supporting unit includes a supporting plate, a supporting shaft which supports the supporting plate from under the supporting plate, a supporting plate driver configured to rotate the supporting plate, and a guide pin provided as a plurality of guide pins on the supporting plate to support a photo mask and including at least one column protruding upward from a flat surface and having a first sliding portion and a second sliding portion formed on a side surface of the column to be inclined downward to have different angles.