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公开(公告)号:US20180104786A1
公开(公告)日:2018-04-19
申请号:US15516414
申请日:2015-10-02
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Kyung Hee PARK , Dong Yoon LEE , Seok Woo LEE , Tae-Gon KIM
CPC classification number: B23Q11/1076 , B23Q3/064 , B23Q11/1053 , B23Q11/1084 , B23Q11/14 , B23Q2220/008
Abstract: A device for simultaneously supplying fluids comprises: a fixing unit provided with a first flow path through which a first fluid flows, a second flow path through which a second fluid flows, and a through-hole; a rotation unit, which is rotatably provided on the through-hole, which is provided at the front end with a fixing hole into which a processing tool is inserted and fixed, and a communication part which communicates with the first flow path and the fixing hole; and a spray unit of which one side is connected to the second flow path and the other side is provided with a spray flow path having a nozzle for spraying the second fluid on an area to be processed by the processing tool, wherein the spray unit is provided on the fixing unit.
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公开(公告)号:US20180104785A1
公开(公告)日:2018-04-19
申请号:US15516416
申请日:2015-10-02
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Kyung Hee PARK , Dong Yoon LEE , Seok Woo LEE , Tae-Gon KIM
CPC classification number: B23Q11/1015 , B23Q11/103 , B23Q11/1046 , B23Q11/1053 , B23Q2220/008 , Y02P70/169
Abstract: A device for mixing and supplying fluids comprises: a fixing unit provided with a first flow path through which a first fluid flows, a second flow path through which a second fluid flows, and a through-hole; and a rotating unit, which is rotatably provided on the through-hole so as to penetrate the fixing unit, and which is provided at the front end with a fixing hole into which a processing tool is inserted and fixed, and a communication part which communicates with the first flow path and the fixing hole, so as to mix the first fluid and the second fluid and supply the mixture to the processing tool.
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公开(公告)号:US20180003956A1
公开(公告)日:2018-01-04
申请号:US15543052
申请日:2016-01-11
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Seung Taek KIM , Moon Soo PARK , Jong Seok KIM , Hyung Tae KIM
CPC classification number: G02B26/127 , B29C64/264 , B29C67/00 , B33Y30/00 , G01B5/0002 , G01B11/005 , G01B11/25 , G02B26/101 , G06K9/3233 , H04N1/113
Abstract: The present invention relates to a head device of a three-dimensional modelling equipment, and a modelling plane scanning method using the same, the head device of a three-dimensional modelling equipment comprising: a modelling light source array having a plurality of modelling light sources; a light guide part, installed at a given position above a modelling plane, having a function of reflecting modelling rays from the modelling light source array so as to be incident on the modelling plane; and a controller for controlling the operations of the modelling light source array and the light guide part in a conjoined manner, wherein a plurality of modelling rays generated from the plurality of modelling light sources are irradiated while forming one line scan having a first axial direction on the modelling plane, and the light guide part continuously or intermittently moves the one line scan on the modelling plane to irradiate the modelling light rays across the modelling plane. The present invention has the effects of enabling high-speed scanning to be performed, and modelling precision to be enhanced through precise scanning control.
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274.
公开(公告)号:US09840755B2
公开(公告)日:2017-12-12
申请号:US14777835
申请日:2013-06-12
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Byung Moon Moon , Gang June Kim , Jae Yoon Lee
IPC: C22B34/12 , C22B9/05 , C22B9/22 , C22B9/04 , C22B9/00 , F27D7/02 , F27D7/06 , F27D11/06 , F27B14/06 , H05B6/26 , F27D99/00
CPC classification number: C22B34/1268 , C22B9/003 , C22B9/04 , C22B9/05 , C22B9/226 , C22B34/1218 , C22B34/1295 , F27B14/061 , F27D7/02 , F27D7/06 , F27D11/06 , F27D99/0006 , F27D2007/063 , F27D2007/066 , H05B6/26 , Y02P10/23 , Y02P10/253
Abstract: Provided are a method and apparatus for refining titanium scraps and sponge titanium, which can remove oxygen from a melt by supplying a deoxidizing gas to the surface of the melt in order to refine titanium scraps and sponge titanium. The method for refining titanium scraps and sponge titanium comprises supplying hydrogen ions and electrons in plasma to a titanium melt to remove oxygen from the titanium melt surface having an oxide layer formed thereon. In addition, the apparatus comprises: a vacuum chamber; a crucible located in the vacuum chamber and configured to perform melting by the magnetic field of an induction coil in a state in which a melt and the inner wall of the crucible; a calcium gas supply means configured to supply calcium gas from the bottom of the crucible to the space between the inner wall of the crucible and the melt.
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公开(公告)号:US09802910B2
公开(公告)日:2017-10-31
申请号:US14915192
申请日:2014-08-28
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Jin Ku Cho , Sang Yong Kim , Bo Ra Kim , Seung Han Shin
IPC: C07D307/50 , C07D307/46
CPC classification number: C07D307/46
Abstract: Provided is a method for preparing 5-hydroxymethyl-2-furfural using an acid catalyst in the presence of an ethylene glycol-based solvent. The method for preparing the 5-hydroxymethyl-2-furfural involves using a linear or cyclic ethylene glycol-based compound as a solvent and producing the 5-hydroxymethyl-2-furfural from fructose, in the presence of the acid catalyst, thereby reducing the dependency on petroleum in response to greenhouse gas emission regulations. Also, a high yield of the 5-hydroxymethyl-2-furfural can be obtained from fructose, and the solvent and the catalyst can be efficiently separated, collected, and reused after a reaction has completed.
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276.
公开(公告)号:US09789468B2
公开(公告)日:2017-10-17
申请号:US15119388
申请日:2014-09-26
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Hong Dae Kim , Eok Soo Kim , Ji Yoon Choi
IPC: B01J23/22 , B01J23/30 , B01J37/00 , B01D53/94 , B01J21/06 , B01J35/00 , B01J35/04 , B01J37/04 , B01J37/08 , B01J37/34
CPC classification number: B01J23/30 , B01D53/9418 , B01D2251/2062 , B01D2255/20707 , B01D2255/20723 , B01D2255/20776 , B01D2255/702 , B01J21/063 , B01J21/18 , B01J23/002 , B01J23/22 , B01J35/0006 , B01J35/002 , B01J35/04 , B01J37/0009 , B01J37/04 , B01J37/08 , B01J37/343 , B01J2523/00 , B01J2523/47 , B01J2523/55 , B01J2523/69
Abstract: Provided is a selective catalytic reduction (SCR) catalyst containing a carbon material loaded with vanadium and tungsten and a method of preparing the same, and relates to a method of loading vanadium and tungsten on a carbon material that exhibits excellent abrasion resistance and excellent strength and can be easily prepared.
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公开(公告)号:US09734994B2
公开(公告)日:2017-08-15
申请号:US14362491
申请日:2012-12-04
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Seung-Yong Shin , Kyoung-Il Moon , Ju-Hyun Sun , Chang-Hun Lee
IPC: H01J37/32 , C22C16/00 , C23C14/34 , B22F3/12 , C22C30/02 , C22C1/00 , C22C45/00 , B22F9/08 , B22F9/10 , C22C1/04
CPC classification number: H01J37/3255 , B22F3/12 , B22F3/14 , B22F9/082 , B22F9/10 , B22F2999/00 , C22C1/002 , C22C1/0458 , C22C16/00 , C22C30/02 , C22C45/00 , C22C2200/02 , C22C2200/04 , C23C14/3414 , B22F2202/06
Abstract: Provided are a crystalline alloy having significantly better thermal stability than an amorphous alloy as well as glass-forming ability, and a method of manufacturing the crystalline alloy. The present invention also provides an alloy sputtering target that is manufactured by using the crystalline alloy, and a method of manufacturing the alloy target. According to an aspect of the present invention, provided is a crystalline alloy having glass-forming ability which is formed of three or more elements having glass-forming ability, wherein the average grain size of the alloy is in a range of 0.1 μm to 5 μm and the alloy includes 5 at % to 20 at % of aluminum (Al), 15 at % to 40 at % of any one or more selected from copper (Cu) and nickel (Ni), and the remainder being zirconium (Zr).
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公开(公告)号:US09643866B2
公开(公告)日:2017-05-09
申请号:US14421953
申请日:2013-08-16
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Ju Dong Lee , Hyoung Jae Kim , Joung Ha Kim , Jae Il Lim
IPC: C02F1/68 , C02F103/08 , C02F101/10
CPC classification number: C02F1/68 , C02F1/265 , C02F1/683 , C02F2101/10 , C02F2103/007 , C02F2103/08 , C02F2209/02 , C02F2209/03 , C02F2303/18
Abstract: A method for treating water using a salt desorption process of gas hydrates according to the present invention includes: (a) introducing water containing impurities and a plurality of guest gases into a reactor; (b) forming gas hydrates by causing the water and the plurality of guest gases to react under a first condition; and (c) dissociating a gas hydrate of one guest gas from among the plurality of guest gases by changing the first condition to a second condition, wherein the first condition refers to temperature and pressure conditions under which all of the plurality of guest gases form gas hydrates and the second condition refers to temperature and pressure conditions under which the gas hydrate of the one guest gas from the mixed gas hydrates is dissociated.
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公开(公告)号:US09640776B2
公开(公告)日:2017-05-02
申请号:US14647121
申请日:2014-01-14
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Bum Ho Choi , Jong Ho Lee
CPC classification number: H01L51/5225 , C23C14/042 , C23C14/086 , C23C14/584 , C23C14/5853 , H01L51/0011 , H01L51/5206 , H01L51/56
Abstract: The present inventions relates to an organic light emitting device capable of decreasing a leakage current, and more particularly, to an organic light emitting device manufacturing method and an organic light emitting device using the same, which can decrease a leakage current, by flattening a lower electrode in order to decrease a leakage current of the lower electrode deposited through a shadow mask.
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公开(公告)号:US09605135B2
公开(公告)日:2017-03-28
申请号:US15035236
申请日:2013-12-16
Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
Inventor: Eui Sang Yoo , Ju Hea Kim , Won Young Jeong , Hyun Kyung Lee , Jae Kyoung Lee , Joon Taek Jun , Nam Hee Kwon , Mi Yeon Kwon , Dae Young Lim
IPC: C08K9/10 , A01N25/28 , B41M5/165 , A61K9/16 , B01J13/22 , B01J13/02 , B01J13/10 , B01J13/20 , B01J13/04
CPC classification number: C08K9/10 , A01N25/28 , A61K9/1694 , B01J13/02 , B01J13/04 , B01J13/10 , B01J13/20 , B01J13/22 , B41M5/165
Abstract: Disclosed are a shear thickening fluid (STF) and a polymer composite comprising a core filled with a shear thickening fluid containing silica particles dispersed in polyethylene glycol; an inner capsule layer formed of an emulsifier surrounding the shear thickening fluid; and an outer capsule layer formed of a thermosetting resin surrounding the inner capsule layer.
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