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    Magnetic levitation system
    21.
    发明授权
    Magnetic levitation system 有权
    磁悬浮系统

    公开(公告)号：US08115349B2

    公开(公告)日：2012-02-14

    申请号：US12686389

    申请日：2010-01-13

    申请人： Takashi Mamba ,  Hiroshi Nakamura ,  Wennong Zhang

    发明人： Takashi Mamba ,  Hiroshi Nakamura ,  Wennong Zhang

    IPC分类号： H02K41/00

    CPC分类号： H02K41/033 ,  H02K1/148 ,  H02K7/09 ,  H02K16/04 ,  H02N15/00

    摘要： A magnetic levitation system includes a levitation-actuator movable element which generates a levitation force applied to a control object; and a levitation-actuator stator which receives a reactive force while the control object is being operated, the levitation-actuator stator being attached to a fixed or movable structure. The levitation-actuator stator includes levitation-actuator stator units connectable to each other in a travelling direction. Each levitation-actuator stator unit includes a coil and an iron core for generating a levitation force between the levitation-actuator stator unit and the levitation-actuator movable element. A length of an end portion of each iron core is equal to or larger than a length of each coil between the ends of the coil so that the cores are continuously arranged without gaps therebetween when the levitation-actuator stator units are connected to each other in the travelling direction.

    摘要翻译： 磁悬浮系统包括产生施加到控制对象的悬浮力的悬浮致动器可移动元件; 以及悬浮致动器定子，其在控制对象被操作的同时接收反作用力，所述悬浮致动器定子附接到固定或可移动结构。 悬浮致动器定子包括沿行进方向彼此连接的悬浮致动器定子单元。 每个悬浮致动器定子单元包括用于在悬浮致动器定子单元和悬浮致动器可移动元件之间产生悬浮力的线圈和铁芯。 每个铁芯的端部的长度等于或大于线圈端部之间的每个线圈的长度，使得当悬浮致动器定子单元彼此连接时，芯彼此连续布置而没有间隙 行进方向。

    Substrate treatment method
    22.
    发明授权
    Substrate treatment method 有权
    底物处理方法

    公开(公告)号：US08110325B2

    公开(公告)日：2012-02-07

    申请号：US13022811

    申请日：2011-02-08

    申请人： Takafumi Niwa ,  Hiroshi Nakamura ,  Hideharu Kyouda

    发明人： Takafumi Niwa ,  Hiroshi Nakamura ,  Hideharu Kyouda

    IPC分类号： G03F9/00 ,  G03C5/00

    CPC分类号： H01L21/0273 ,  G03F7/0035 ,  H01L21/67178 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A substrate treatment method including a first treatment process (S13 to S16) for exposing, heating, and developing a substrate on which a first resist is formed, thereby forming a first resist pattern, and a second treatment process (S17 to S20) for forming a second resist film on the substrate on which the first resist pattern is formed, exposing, heating, and developing the substrate on which the second resist film is formed, thereby forming a second resist pattern. Also, the substrate treatment method compensates a first treatment condition in a first treatment process (S22 to S25) based on a measured value of a line width of the second resist pattern and a second treatment condition in a second treatment process (S26 to S29) based on a measured value of a line width of the first resist pattern.

    摘要翻译： 一种基板处理方法，包括：第一处理工艺（S13至S16），用于对形成第一抗蚀剂的基板进行曝光，加热和显影，从而形成第一抗蚀剂图案;以及第二处理工艺（S17至S20），用于形成 在其上形成第一抗蚀剂图案的基板上的第二抗蚀剂膜，暴露，加热和显影其上形成有第二抗蚀剂膜的基板，从而形成第二抗蚀剂图案。 此外，基板处理方法在第二处理工序中基于第二抗蚀剂图案的线宽度的测量值和第二处理条件在第一处理工艺（S22至S25）中补偿第一处理条件（S26至S29） 基于第一抗蚀剂图案的线宽的测量值。

    LABEL AUTOMATIC APPLICATION DEVICE AND LABEL AUTOMATIC APPLICATION METHOD
    25.
    发明申请
    LABEL AUTOMATIC APPLICATION DEVICE AND LABEL AUTOMATIC APPLICATION METHOD 审中-公开
    标签自动应用设备和标签自动应用方法

    公开(公告)号：US20110284154A1

    公开(公告)日：2011-11-24

    申请号：US13147410

    申请日：2010-03-01

    申请人： Hiroshi Nakamura

    发明人： Hiroshi Nakamura

    IPC分类号： B32B38/10 ,  B32B41/00 ,  B32B37/02

    CPC分类号： B65C9/18 ,  B65C2009/1888

    摘要： The present invention is to provide a label automatic application device and a label automatic application method capable of easily removing a large number of single labels one by one from a label band body formed by coupling the single labels while displacing and overlapping the labels with each other in the longitudinal direction, so as to automatically apply a large amount of labels to application bodies per unit time.A label band body 8 formed by displacing a little and overlapping many single labels with each other is attached to a label transfer belt conveyor 32. The label transfer belt conveyor 32 to which the label band body 8 is attached and a product transfer belt conveyor 52 for moving application bodies 54 are arranged so that the forward directions thereof are the opposite directions to each other. The air is jetted by an air jet means 38 to a surface onto which a bonding means 5 is coated in a front end 1y of a lead label 1a of the label band body 8. The surface onto which the bonding means 5 is coated in the front end 1y of the lead label 1a is warped in the inversion direction and rolled up outward, so that the application body 54 easily comes into contact with the bonding means 5 of the front end 1y.

    摘要翻译： 本发明提供一种标签自动应用装置和标签自动应用方法，其能够从通过连接单个标签形成的标签带体逐个地移除大量单个标签，同时使标签彼此移位和重叠 在纵向方向上，以便每单位时间自动地向应用体施加大量的标签。 标签转印带式输送机32附着标签带主体8的标签转印带式输送机32和产品转印带式输送机52 用于移动的施加体54被布置成使得其向前方向彼此相反。 空气由空气喷射装置38喷射到在标签带体8的引线标签1a的前端1y中涂覆有粘合装置5的表面。粘合装置5的表面被涂覆在 引线标签1a的前端1y在反转方向上翘曲并向外卷起，使得施加体54容易与前端1y的接合装置5接触。

    Molecular assembly
    26.
    发明授权
    Molecular assembly 有权
    分子装配

    公开(公告)号：US08063207B2

    公开(公告)日：2011-11-22

    申请号：US12237795

    申请日：2008-09-25

    申请人： Kazuhiko Umemoto ,  Hisato Takeuchi ,  Hiroshi Nakamura ,  Arimitsu Usuki ,  Makoto Fujita

    发明人： Kazuhiko Umemoto ,  Hisato Takeuchi ,  Hiroshi Nakamura ,  Arimitsu Usuki ,  Makoto Fujita

    IPC分类号： C07F9/80 ,  C07F15/00

    CPC分类号： C07F15/0066

    摘要： A molecular assembly comprising a host metal complex with a space formed therein, and compounds having substituents enclosed in the metal complex within the space and molecular chains bonded to the substituents and extending to the exterior of the metal complex, wherein two or more substituents are enclosed in the same space of the metal complex.

    摘要翻译： 包含其中形成有空间的主体金属络合物的分子组合物，以及封闭在空间内的金属络合物中的取代基和与取代基键合并延伸至金属络合物外部的分子链的化合物，其中封闭了两个或多个取代基 在同一个空间的金属复合体。

    Nonvolatile semiconductor memory device
    27.
    发明授权
    Nonvolatile semiconductor memory device 有权
    非易失性半导体存储器件

    公开(公告)号：US08000147B2

    公开(公告)日：2011-08-16

    申请号：US12781396

    申请日：2010-05-17

    申请人： Tomoharu Tanaka ,  Hiroshi Nakamura ,  Ken Takeuchi ,  Riichiro Shirota ,  Fumitaka Arai ,  Susumu Fujimura

    发明人： Tomoharu Tanaka ,  Hiroshi Nakamura ,  Ken Takeuchi ,  Riichiro Shirota ,  Fumitaka Arai ,  Susumu Fujimura

    IPC分类号： G11C11/34 ,  G11C16/04 ,  G11C16/06

    CPC分类号： G11C16/0483 ,  G11C11/5621 ,  G11C11/5628 ,  G11C11/5635 ,  G11C16/3404 ,  G11C16/3409 ,  G11C16/344 ,  G11C16/3445 ,  G11C16/345 ,  G11C16/3454 ,  G11C16/3459 ,  G11C16/3463 ,  G11C2211/5621

    摘要： A NAND cell unit includes memory cells which are connected in series. An erase operation is effected on all memory cells. Then, a soft-program voltage, which is opposite in polarity to the erase voltage applied in an erase operation, is applied to all memory cells, thereby setting all memory cells out of an over-erased state. Thereafter, a program voltage of 20V is applied to the control gate of a selected memory cell, 0V is applied to the control gates of the two memory cells provided adjacent to the selected memory cell, and 11V is applied to the control gates of the remaining memory cells. Data is thereby programmed into the selected memory cell. The time for which the program voltage is applied to the selected memory cell is adjusted in accordance with the data to be programmed into the selected memory cell. Hence, data “0” can be correctly programmed into the selected memory cell, multi-value data can be read from any selected memory cell at high speed.

    摘要翻译： NAND单元单元包括串联连接的存储单元。 对所有存储单元进行擦除操作。 然后，将与擦除操作中施加的擦除电压极性相反的软编程电压施加到所有存储单元，从而将所有存储单元设置为过擦除状态。 此后，将20V的编程电压施加到所选择的存储单元的控制栅极，将0V施加到与所选存储单元相邻设置的两个存储单元的控制栅极，并且将11V施加到其余的控制栅极 记忆细胞 因此数据被编程到所选择的存储单元中。 根据要编程到所选择的存储单元中的数据来调整对所选存储单元施加编程电压的时间。 因此，可以将数据“0”正确地编程到所选择的存储单元中，可以从任何选择的存储单元高速读取多值数据。

    Character string recognition method and device
    28.
    发明授权
    Character string recognition method and device 有权
    字符串识别方法和装置

    公开(公告)号：US07949187B2

    公开(公告)日：2011-05-24

    申请号：US11693139

    申请日：2007-03-29

    申请人： Hiroshi Nakamura

    发明人： Hiroshi Nakamura

    IPC分类号： G06K9/34 ,  G06K9/38 ,  G06K9/18 ,  G06K9/00 ,  G06K15/02 ,  H04N1/40

    CPC分类号： G06K9/3283 ,  G06K2209/01

    摘要： A character string recognition method for recognizing a character string may include a first step in which a first projection data of image data are calculated in a direction of the character string and a second step in which a position of the character string is detected on the basis of the first projection data. In the first step, the image data are divided into a plurality of segments in the direction of the character string and projection in the segment is calculated. The method may further include a third step in which a second projection data in the segment are calculated on the basis of the position of the character string and a fourth step in which a position where the second projection data exceeds a threshold value is detected as a boundary position of a character, and the threshold value may be changed according to pixel number between both ends of the character string.

    摘要翻译： 用于识别字符串的字符串识别方法可以包括：第一步骤，其中在字符串的方向上计算图像数据的第一投影数据;以及第二步骤，其中基于字符串的位置检测字符串 的第一投影数据。 在第一步骤中，将图像数据沿字符串的方向划分成多个段，并计算段中的投影。 该方法还可以包括第三步骤，其中基于字符串的位置来计算段中的第二投影数据，并且第四步骤，其中第二投影数据超过阈值的位置被检测为 字符的边界位置和阈值可以根据字符串的两端之间的像素数进行改变。