公开(公告)号：US07470499B2

公开(公告)日：2008-12-30

申请号：US10548067

申请日：2004-03-04

申请人： Katsumi Maeda ,  Kaichiro Nakano

发明人： Katsumi Maeda ,  Kaichiro Nakano

IPC分类号： G03F7/039 ,  G08F32/08 ,  C07C35/52 ,  C07C69/65 ,  C07C43/178

CPC分类号： C07C35/52 ,  C07C2603/66 ,  G03F7/0046 ,  G03F7/0395 ,  Y10S430/108

摘要： A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.

摘要翻译： 由通式（1）表示的高级脂环族不饱和化合物：其中R 1和R 2中的至少一个为氟原子或氟代烷基; 通过包含脂环族化合物的聚合物前体的聚合形成的聚合物。 聚合物在使用波长为190nm以下的光的光刻中作为化学放大型抗蚀剂是有用的，该抗蚀剂相对于曝光用光具有优异的透明性，并且对基材的粘附性也优异， 耐干蚀刻。

公开(公告)号：US20080056984A1

公开(公告)日：2008-03-06

申请号：US11576408

申请日：2005-09-21

申请人： Kenji Yoshioka ,  Hiroshi Yoneyama ,  Katsumi Maeda ,  Ikuo Niikura ,  Mitsuru Sato ,  Masumi Ito ,  Fumio Orito

发明人： Kenji Yoshioka ,  Hiroshi Yoneyama ,  Katsumi Maeda ,  Ikuo Niikura ,  Mitsuru Sato ,  Masumi Ito ,  Fumio Orito

IPC分类号： C30B29/16 ,  C30B7/10

CPC分类号： C30B29/16 ,  C30B7/10

摘要： Provided is a single crystal with a hexagonal wurtzite structure which is useful as a substrate for various devices and has high purity and is uniform. The single crystal with a hexagonal wurtzite structures which is obtained by a crystal growth on at least an m-plane of a columnar seed crystal and represented by AX (A representing an electropositive element and X representing an electronegative element) is characterized in that a variation in the concentration of a metal other than the electropositive element A and having a concentration of 0.1 to 50 ppm is within 100%.

摘要翻译： 提供具有六方纤锌矿结构的单晶，其可用作各种装置的基板，并且具有高纯度并且均匀。 通过在柱状晶种的至少m面上由AX（表示正电荷的元素和表示电负性元素的X）表示的晶体生长获得的具有六方纤锌矿结构的单晶的特征在​​于， 在正电性元素A以外的金属浓度为0.1〜50ppm的浓度为100％以下。

公开(公告)号：US07192682B2

公开(公告)日：2007-03-20

申请号：US10497302

申请日：2003-06-27

申请人： Katsumi Maeda ,  Kaichiro Nakano

发明人： Katsumi Maeda ,  Kaichiro Nakano

IPC分类号： G03F7/039 ,  G03F7/30 ,  G03F7/38 ,  C08F10/00 ,  C08F136/00

CPC分类号： G03F7/0395 ,  C07D307/92 ,  C07D307/93 ,  C08G61/125 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic γ-lactone structure defined in the general formula (V).

摘要翻译： 提供了具有波长为220纳米或更小的光的高透明度的化学放大抗蚀剂组合物，优异的抗蚀刻性和对基底的优异粘附性。 通过使用具有通式（III）中定义的桥连脂环族γ-内酯结构的重复结构单元，具有定义的桥连脂环族γ-内酯结构的重复结构单元中的至少一种来制备化学放大抗蚀剂组合物 和通式（Ⅴ）中定义的具有桥连的脂环族γ-内酯结构的重复结构单元。

公开(公告)号：US06924079B2

公开(公告)日：2005-08-02

申请号：US10240404

申请日：2001-07-02

申请人： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

发明人： Katsumi Maeda ,  Shigeyuki Iwasa ,  Kaichiro Nakano ,  Etsuo Hasegawa

IPC分类号： C08F34/02 ,  C08F220/10 ,  C08F222/06 ,  C08G61/06 ,  C08G61/08 ,  C08G61/12 ,  G03F7/039 ,  H01L21/027 ,  H01L21/312

CPC分类号： G03F7/0392 ,  C08G61/06 ,  C08G61/08 ,  C08G61/12 ,  C08G61/125 ,  G03F7/0395 ,  G03F7/0397 ,  H01L21/312 ,  Y10S430/106 ,  Y10S430/111

摘要： The present invention relates to a resist resin having an acid-decomposable group, which gives rise to decomposition of the acid-decomposable group to show an increased solubility to an aqueous alkali solution by the action of an acid, wherein the resist resin has, in the main chain, an alicyclic lactone structure represented by the following general formula (1). According to the present invention, a positive-type chemically amplified resist can be obtained which has high transparency to a far-ultraviolet light having a wavelength of about 220 nm or less, excellent etching resistance, and excellent adhesion to substrate; and a fine pattern required in production of semiconductor device can be formed. (wherein Z is an alicyclic hydrocarbon group having a lactone structure).

摘要翻译： 本发明涉及具有酸分解性基团的抗蚀剂树脂，该抗蚀剂树脂引起酸分解基团的分解，以通过酸的作用使碱溶液的溶解度增加，其中抗蚀剂树脂具有 主链，由以下通式（1）表示的脂环族内酯结构。 根据本发明，可以获得对具有约220nm或更小的波长的远紫外光具有高透明度，优异的耐蚀刻性和对基底的优异粘附性的正型化学放大抗蚀剂; 并且可以形成半导体器件的制造所需的精细图案。 （其中Z为具有内酯结构的脂环族烃基）。

公开(公告)号：US20050164119A1

公开(公告)日：2005-07-28

申请号：US10505799

申请日：2003-02-25

申请人： Katsumi Maeda ,  Kaichiro Nakano

发明人： Katsumi Maeda ,  Kaichiro Nakano

IPC分类号： C07C43/313 ,  C07C43/317 ,  C07C69/00 ,  C07C69/653 ,  C07C69/753 ,  G03C1/76 ,  G03F7/004 ,  G03F7/039

CPC分类号： C07C43/317 ,  C07C43/313 ,  C07C69/653 ,  C07C69/753 ,  C07C2602/42 ,  C07C2603/62 ,  C07C2603/74 ,  C07C2603/86 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/111

摘要： As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating unit resulting from polymerization of a monomer exhibiting a polymerization activity, wherein the monomer has a fluorine-containing acetal or ketal structure represented by general formula (1): wherein R represents an atomic group containing a carbon-carbon double bond exhibiting polymerization activity; at least one of R1 and R2 is fluorinated alkyl group or fluorinated aryl group having 1 to 20 carbon atoms; and R3 represents a radical selected from the group consisting of hydrogen atom, alkyl group, alkoxy-substituted alkyl group, fluorinated alkyl group, aryl group, fluorinated aryl group, aralkyl group and fluorinated aralkyl group having 1 to 20 carbon atoms.

摘要翻译： 作为适用于化学放大型抗蚀剂中使用的抗蚀剂树脂的聚合物，其可应用于使用180nm以下的曝光光的光刻法，作为聚合物，其具有提高的透明性，提供了包含由单体聚合得到的重复单元的聚合物 表现出聚合活性，其中所述单体具有由通式（1）表示的含氟缩醛或缩酮结构：其中R表示含有表现出聚合活性的碳 - 碳双键的原子团; R 1和R 2中的至少一个是具有1至20个碳原子的氟化烷基或氟化芳基; R 3表示选自氢原子，烷基，烷氧基取代的烷基，氟化烷基，芳基，氟化芳基，芳烷基和含氟芳烷基的基团 至20个碳原子。

公开(公告)号：US06685416B2

公开(公告)日：2004-02-03

申请号：US10117048

申请日：2002-04-08

申请人： Katsuyasa Itoh ,  Masahiko Sakai ,  Motohiro Susa ,  Katsumi Maeda ,  Toshiaki Tsukahara ,  Maki Takimura ,  Hajime Nishimura ,  Junji Chatani

发明人： Katsuyasa Itoh ,  Masahiko Sakai ,  Motohiro Susa ,  Katsumi Maeda ,  Toshiaki Tsukahara ,  Maki Takimura ,  Hajime Nishimura ,  Junji Chatani

IPC分类号： B42C900

CPC分类号： B42C9/0037 ,  B65H37/04 ,  B65H2301/51614 ,  B65H2405/10 ,  B65H2511/13 ,  B65H2511/20 ,  B65H2701/13212 ,  B65H2701/1768 ,  B65H2220/01 ,  B65H2220/02

摘要： A bookbinding device is disclosed to adhesively bind a back surface of a stack of pages to a center portion of a cover page, which includes a page supply unit (1), a thickness sensor (2), an adhesive applicator (3), a page conveyor unit (4), a cover supply unit (5), a press unit (8) and a cover folding unit (9). The cover supply unit includes a trimmer (6) for trimming a side edge portion of the cover sheet depending upon thickness of the page stack detected by the thickness sensor, and a positioning unit (7) for positioning the cover sheet such that a center line of the cover sheet which has been trimmed by the trimmer is aligned with a center of thickness of the page stack, at which position the page stack is adhesively bound to the cover sheet.

摘要翻译： 公开了一种装订装置，用于将一叠页面的背面粘合到封页的中心部分，其中包括页面供应单元（1），厚度传感器（2），粘合剂涂布器（3）， 页面传送单元（4），盖供应单元（5），按压单元（8）和盖折叠单元（9）。 盖供给单元包括：修剪器（6），用于根据厚度传感器检测到的页面堆叠的厚度来修整盖板的侧边缘部分;以及定位单元（7），用于定位盖板，使得中心线 已经由修剪器修剪的覆盖片与页面堆叠的厚度的中心对准，在该位置，页面堆叠被粘合地结合到覆盖片。

公开(公告)号：US5994025A

公开(公告)日：1999-11-30

申请号：US763054

申请日：1996-12-10

申请人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

发明人： Shigeyuki Iwasa ,  Kaichiro Nakano ,  Katsumi Maeda ,  Takeshi Ohfuji ,  Etsuo Hasegawa

IPC分类号： C08F220/04 ,  C08F220/06 ,  C08F220/10 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C09D133/04 ,  C09D133/14 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/11 ,  Y10S430/111

摘要： There is provided a photoresist including (a) a resin composed of a polymer represented with the following general formula [1], and (b) a photo acid generator which produces acid when exposed to a light: ##STR1## wherein each of R.sup.1, R.sup.3 and R.sup.7 represents one of a hydrogen atom and a methyl group, R.sup.2 represents a hydrocarbon group including a bridged cyclic hydrocarbon group and having a carbon number in the range of 7 to 13 both inclusive, R.sup.4 represents one of a hydrogen atom and a hydrocarbon group having a carbon number of 1 or 2, R.sup.5 represents a hydrocarbon group having a carbon number of 1 or 2, R.sup.6 represents one of (a) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive, (b) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an alkoxy group having a carbon number in the range of 1 to 12 both inclusive, and (c) a hydrocarbon group having a carbon number in the range of 1 to 12 both inclusive and replaced with an acyl group having a carbon number in the range of 1 to 13 both inclusive, x+y+z=1, x is in the range of 0.1 to 0.9, y is in the range of 0.1 to 0.7, and z is in the range of 0 to 0.7. The resin has a weight percent in the range of 75 to 99.8 both inclusive, and the photo acid generator has a weight percent in the range of 0.2 to 25 both inclusive. The above mentioned photoresist produces no extra polymer by side reaction. Thus, the photoresist has high resolution to thereby make it possible to form a fine pattern without resist residue.

摘要翻译： 提供了包含（a）由以下通式[1]表示的聚合物构成的树脂的光致抗蚀剂，（b）暴露于光时产生酸的光酸产生剂：其中R1，R3和R7 表示氢原子和甲基中的一个，R 2表示包含桥连环烃基并且碳数为7〜13的碳原子的烃基，R4表示氢原子和具有 碳原子数1或2，R 5表示碳数为1或2的烃基，R 6表示（a）碳原子数为1〜12的烃基，（b）烃 碳数为1〜12的碳原子数为2〜12的碳原子数为2〜12的烷氧基，（c）碳数为1以上的烃基 到12，并用a替代 碳原子数为1〜13的碳原子，x + y + z = 1，x在0.1〜0.9的范围内，y在0.1〜0.7的范围内，z在范围 为0〜0.7。 树脂的重量百分比在75〜99.8之间，光酸产生剂的重量百分比在0.2〜25的范围内。 上述光致抗蚀剂通过副反应不产生额外的聚合物。 因此，光致抗蚀剂具有高分辨率，从而可以形成没有抗蚀剂残留物的精细图案。

公开(公告)号：US5665518A

公开(公告)日：1997-09-09

申请号：US588607

申请日：1996-01-19

申请人： Katsumi Maeda ,  Kaichiro Nakano ,  Takeshi Ohfuji ,  Etsuo Hasegawa

发明人： Katsumi Maeda ,  Kaichiro Nakano ,  Takeshi Ohfuji ,  Etsuo Hasegawa

IPC分类号： C07C61/35 ,  C07C69/00 ,  C07C69/753 ,  C07C69/757 ,  C07D307/20 ,  C07D309/10 ,  C07D309/12 ,  C08F20/26 ,  C08F20/28 ,  C08K5/00 ,  C08L33/04 ,  C08L33/14 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C07C69/54

CPC分类号： C07C69/00 ,  C07C69/753 ,  C07D307/20 ,  C07D309/10 ,  C08F20/28 ,  G03F7/0045 ,  G03F7/039 ,  C07C2103/00

摘要： The present invention provides a vinylmonomer represented with the following general formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group, R.sup.2 represents a dihydric, bridged cyclic hydrocarbon group having a carbon number in the range of 7 to 13 both inclusive, R.sup.3 represents a group to be decomposed by acid or a hydrogen atom, X represents an alkylene group or a coupling group composed of an oxygen-carbon bond, and Y represents an alkylene group or a coupling group composed of a carbon-carbon bond. A photoresist obtained by polymerizing a monomer in accordance with the invention has a high transparency to FUV having a wavelength of at greatest 220 nm, high sensitivity and resolution to FUV, and a high dry etching resistance, and hence is suitable for exposure light such as FUV having a wavelength of at greatest 220 nm and, in particular, ArF excimer laser. The photoresist makes it possible to carry out fine patterning required for the fabrication of a semiconductor element.

摘要翻译： 本发明提供由以下通式（I）表示的乙烯基单体：om或甲基，R 2表示碳原子数为7〜13的二羟基桥连环状烃基，其中R3表示 被酸或氢原子分解，X表示亚烷基或由氧 - 碳键组成的偶合基团，Y表示亚烷基或由碳 - 碳键组成的偶合基团。 通过使根据本发明的单体聚合而获得的光致抗蚀剂对波长为最大220nm，对FUV的高灵敏度和分辨率以及高耐干蚀刻性的FUV具有高透明度，因此适用于曝光光 具有波长最大为220nm的FUV，特别是ArF准分子激光。 光致抗蚀剂使得可以进行制造半导体元件所需的精细图案。

公开(公告)号：US4347919A

公开(公告)日：1982-09-07

申请号：US135325

申请日：1980-03-31

申请人： Katsumi Maeda

发明人： Katsumi Maeda

IPC分类号： B41J19/94 ,  F16H27/10 ,  F16D11/02 ,  F16H27/02 ,  F16H27/08

CPC分类号： F16H27/10 ,  B41J19/94 ,  Y10T74/1505 ,  Y10T74/1508 ,  Y10T74/19874

摘要： A one revolution clutch assembly is provided which transmits the rotation of a normally rotating drive shaft to a driven rotating body through gears and which interrupts the rotation of the driven body when it has rotated through one revolution. The one revolution clutch assembly includes a drive gear mounted on the drive shaft and which meshes with a driven gear on the driven body. The driven gear is formed with a hiatus along part of its periphery, and when the hiatus is located opposite to the drive gear, the rotation of the driven gear is interrupted. The driven gear is maintained in this position where it ceases to rotate, by a cam mounted on the driven assembly and formed with a notch which is engaged by a movable piece of an electromagnetic plunger. A crank lever has its one end rotatably mounted on the driven assembly, and imparts a rotating force to the driven gear to cause a meshing engagement of the driven gear with the drive gear when the driven gear is located at said position. When the plunger is actuated to release the driven gear, the crank lever causes a rotation of the driven gear. The timing when a meshing engagement between the driven gear and the drive gear is initiated is determined by a projection on a cam follower which is provided on the driven assembly and which engages a notch in a cam provided on the drive assembly.

摘要翻译： 提供一转子离合器组件，其通过齿轮将正转旋转驱动轴的旋转传递到从动旋转体，并且当其旋转一圈时中断驱动体的旋转。 一转离合器组件包括安装在驱动轴上并与被驱动体上的从动齿轮啮合的驱动齿轮。 从动齿轮沿着其周边的一部分形成有间隙，当间隙位于与驱动齿轮相对的位置时，从动齿轮的旋转被中断。 从动齿轮通过安装在从动组件上的凸轮保持在该位置，在该位置停止转动，并形成有由可动件的电磁柱塞接合的凹口。 曲柄杆的一端可旋转地安装在从动组件上，并且当从动齿轮位于所述位置时，向从动齿轮施加旋转力，从而使从动齿轮与驱动齿轮啮合。 当柱塞被致动以释放从动齿轮时，曲柄杆引起从动齿轮的旋转。 从动齿轮和驱动齿轮之间的啮合接合开始的时机由设置在从动组件上并与设置在驱动组件上的凸轮中的凹口接合的凸轮从动件上的凸起确定。

公开(公告)号：US20130319530A1

公开(公告)日：2013-12-05

申请号：US13985248

申请日：2012-02-13

申请人： Katsumi Maeda ,  Shin Nakamura ,  Kentaro Nakahara ,  Terumasa Shimoyama

发明人： Katsumi Maeda ,  Shin Nakamura ,  Kentaro Nakahara ,  Terumasa Shimoyama

IPC分类号： H01G9/20

CPC分类号： H01G9/2059 ,  C07D417/14 ,  C09B23/0008 ,  C09B23/005 ,  C09B23/0058 ,  C09B23/0066 ,  C09B23/14 ,  H01G9/2031 ,  H01L51/0061 ,  H01L51/0068 ,  H01L51/0069 ,  H01L51/0072 ,  Y02E10/542

摘要： The present invention provides a compound useful as a photoelectric conversion dye having excellent photoelectric conversion performance. The compound according to the present invention is a thiazole-based compound represented by the following general formula (1), a tautomer or stereoisomer thereof, or a salt thereof. In the general formula (1), R1 represents a hydrogen atom, a substituted or unsubstituted, linear or branched alkyl group, or a substituted or unsubstituted aryl group, R2 represents a hydrogen atom, a substituted or unsubstituted, linear or branched alkyl group, or a cyano group, D represents an organic group comprising an electron-donating substituent, Z represents a linking group having a heteroaromatic ring or at least one hydrocarbon group selected from the group consisting of an aromatic ring, a vinylene group (—CH═CH—), or an ethynylene group (—C≡C—), and M represents a hydrogen atom or a salt-forming cation.

摘要翻译： 本发明提供了可用作光电转换性能优异的光电转换染料的化合物。 根据本发明的化合物是由以下通式（1）表示的噻唑类化合物，其互变异构体或立体异构体或其盐。 在通式（1）中，R 1表示氢原子，取代或未取代的直链或支链烷基或取代或未取代的芳基，R 2表示氢原子，取代或未取代的直链或支链烷基， 或氰基，D表示包含给电子取代基的有机基团，Z表示具有杂芳环或至少一个选自芳香环，亚乙烯基（-CH = CH - ）或亚乙炔基（-C = C-），M表示氢原子或成盐阳离子。