Semiconductor device and control method thereof

    公开(公告)号:US6153896A

    公开(公告)日:2000-11-28

    申请号:US41792

    申请日:1998-03-13

    CPC分类号: H01L29/7395 H03K17/08128

    摘要: Disclosed is a semiconductor device capable of stabilizing a gate voltage at high voltage and high current, protecting the device from breakdown by preventing current nonuniformity and oscillations and the like, thereby improving reliability, and a method for controlling the semiconductor device. The semiconductor device comprises an n-type base layer, a p-type emitter layer, which is formed on a surface of the n-type base layer, a collector electrode, formed on a surface of the p-type emitter layer, a p-type base layer, formed on a surface on the n-type base layer which is opposite to the p-type emitter layer, an n-type source layer, formed in a surface of the p-type base layer, an emitter electrode, formed on the n-type source layer and the p-type base layer, and a gate electrode, contacting the n-type source layer, the p-type base layer and the n-type base layer, with a gate insulating film interposed therebetween, wherein when a voltage is applied between the collector electrode and the emitter electrode, the capacitance of the gate electrode is always a positive value or zero.

    Electroconductive composite ceramics
    24.
    发明授权
    Electroconductive composite ceramics 失效
    导电复合陶瓷

    公开(公告)号:US4110260A

    公开(公告)日:1978-08-29

    申请号:US725457

    申请日:1976-09-22

    CPC分类号: C04B35/71 C04B35/01 H01B1/00

    摘要: The electroconductive composite ceramics composed of an independent phase conglomerates having a particle diameter of at least 20.mu. and a continuous phase connecting mutually the independent phase of conglomerates. Particularly, electroconductive composite ceramics composed of (A) 50-98% by weight of an independent phase of conglomerates having a particle diameter of at least 20 which consists essentially of a phase of insulating or semiconductive ceramics having a high melting point or a mixture thereof and (B) 50-2% by weight of a continuous phase of an electroconductive substance connecting mutually the independent phase of conglomerates. The electroconductive composite ceramics exhibit stable electroconductivity-temperature characteristics at a temperature of 1000.degree. C. or higher and have excellent thermal shock resistance, mechanical strength and chemical resistance.

    摘要翻译: 导电复合陶瓷由具有至少20微米的粒径的砾石的独立相组成,连续相连接相互独立的砾岩相。 特别地,导电复合陶瓷由(A)50-98重量%的粒径为至少为20的砾石的独立相组成,其主要由具有高熔点的绝缘或半导体陶瓷相或其混合物组成 和(B)50-2重量%的连续相的连续相连接相互独立相的砾岩。 导电性复合陶瓷在1000℃以上的温度下表现出稳定的导电性特性,具有优异的耐热冲击性,机械强度和耐化学性。

    Semiconductor device
    25.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US08319314B2

    公开(公告)日:2012-11-27

    申请号:US13005589

    申请日:2011-01-13

    摘要: A semiconductor device comprises a first base layer of a first conductivity type; a plurality of second base layers of a second conductivity type, provided on a part of a first surface of the first base layer; trenches formed on each side of the second base layers, and formed to be deeper than the second base layers; an emitter layer formed along the trench on a surface of the second base layers; a collector layer of the second conductivity type, provided on a second surface of the first base layer opposite to the first surface; an insulating film formed on an inner wall of the trench, the insulating film being thicker on a bottom of the trench than on a side surface of the trench; a gate electrode formed within the trench, and isolated from the second base layers and the emitter layer by the insulating film; and a space section provided between the second base layers adjacent to each other, the space section being deeper than the second base layers and being electrically isolated from the emitter layer and the second base layers.

    摘要翻译: 半导体器件包括第一导电类型的第一基极层; 多个第二导电类型的第二基层,设置在所述第一基底层的第一表面的一部分上; 沟槽形成在第二基底层的每一侧上,并且形成为比第二基底层更深; 在所述第二基底层的表面上沿着所述沟槽形成的发射极层; 设置在与第一表面相对的第一基底层的第二表面上的第二导电类型的集电极层; 形成在所述沟槽的内壁上的绝缘膜,所述绝缘膜在所述沟槽的底部比在所述沟槽的侧表面上更厚; 形成在所述沟槽内并与所述第二基极层和所述发射极层通过所述绝缘膜隔离的栅电极; 以及设置在彼此相邻的第二基底层之间的空间部分,空间部分比第二基底层更深,并且与发射极层和第二基底层电隔离。

    Semiconductor device
    26.
    发明授权
    Semiconductor device 有权
    半导体器件

    公开(公告)号:US07456487B2

    公开(公告)日:2008-11-25

    申请号:US10974810

    申请日:2004-10-28

    IPC分类号: H01L29/739

    摘要: This disclosure concerns a semiconductor device that includes a first base layer; second base layers provided on a part of a first surface of the first base layer; trenches formed on each side of the second base layers; an emitter layer formed on a surface of the second base layers; a collector layer provided below a second surface of the first base layer, an insulating film formed on an inner wall of the trench, the insulating film being thicker on a bottom of the trench than on a side surface of the trench; a gate electrode formed within the trench, and isolated by the insulating film; and a space section provided between the second base layers adjacent to each other, the space section being electrically isolated from the emitter layer and the second base layers, wherein the space section includes a semiconductor layer being deeper than the second base layers.

    摘要翻译: 本公开涉及包括第一基底层的半导体器件; 设置在所述第一基底层的第一表面的一部分上的第二基底层; 形成在第二基层的每侧的沟槽; 形成在所述第二基底层的表面上的发射极层; 设置在所述第一基底层的第二表面下方的集电极层,形成在所述沟槽的内壁上的绝缘膜,所述绝缘膜在所述沟槽的底部比在所述沟槽的侧表面上更厚; 形成在沟槽内并由绝缘膜隔离的栅电极; 以及设置在彼此相邻的第二基底层之间的空间部分,所述空间部分与发射极层和第二基底层电隔离,其中所述空间部分包括比所述第二基底层更深的半导体层。

    SEMICONDUCTOR DEVICE
    27.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20070278566A1

    公开(公告)日:2007-12-06

    申请号:US11833401

    申请日:2007-08-03

    IPC分类号: H01L29/78

    摘要: A semiconductor device includes a base layer of a first conductivity type, a barrier layer of a first conductivity type formed on the base layer, a trench formed from the surface of the barrier layer to such a depth as to reach a region in the vicinity of an interface between the barrier layer and the base layer, a gate electrode formed in the trench via a gate insulating film, a contact layer of a second conductivity type selectively formed in a surface portion of the barrier layer, a source layer of the first conductivity type selectively formed in the surface portion of the barrier layer so as to contact the contact layer and a side wall of the gate insulating film in the trench, and a first main electrode formed so as to contact the contact layer and the source layer.

    摘要翻译: 半导体器件包括第一导电类型的基底层,形成在基底层上的第一导电类型的阻挡层,从阻挡层的表面形成的沟槽到达达到 阻挡层和基底层之间的界面,通过栅极绝缘膜形成在沟槽中的栅极电极,选择性地形成在阻挡层的表面部分中的第二导电类型的接触层,第一导电性的源极层 形成在所述阻挡层的表面部分中以与所述沟槽中的所述接触层和所述栅极绝缘膜的侧壁接触的第一主电极以及与所述接触层和所述源极层接触的第一主电极。

    Power semiconductor device
    28.
    发明申请
    Power semiconductor device 审中-公开
    功率半导体器件

    公开(公告)号:US20060237786A1

    公开(公告)日:2006-10-26

    申请号:US11384260

    申请日:2006-03-21

    IPC分类号: H01L29/76

    摘要: A power semiconductor device according to the present invention comprises: a first conductive type base layer; a second conductive type base layer selectively formed on the first conductive type base layer; an insulation layer formed in the region on the first conductive type base layer on which the second conductive type base layer is not formed; a gate insulation film formed on the inner surface of a trench formed between the second conductive type base layer and the insulation layer so as to separate them from each other and to reach the first conductive type base layer from the surface of the second conductive type base layer; a first conductive type source layer selectively formed on the surface of the second conductive type base layer in contact with the gate insulation film; a gate electrode formed in the trench and insulated from the first conductive type base layer, the second conductive type base layer, and the first conductive type source layer by the gate insulation film; a main electrode electrically connected to the first conductive type base layer and the second conductive type base layer; and a first conductive type or second conductive type floating layer formed on the bottom of the insulation layer.

    摘要翻译: 根据本发明的功率半导体器件包括:第一导电型基极层; 选择性地形成在所述第一导电型基底层上的第二导电型基底层; 形成在不形成第二导电型基底层的第一导电型基底层上的区域中的绝缘层; 形成在形成在第二导电型基极层和绝缘层之间的沟槽的内表面上以便将它们彼此分离并从第二导电类型基底的表面到达第一导电型基极的栅极绝缘膜 层; 选择性地形成在与所述栅极绝缘膜接触的所述第二导电型基底层的表面上的第一导电型源极层; 形成在所述沟槽中的栅电极,通过所述栅极绝缘膜与所述第一导电型基极层,所述第二导电型基极层和所述第一导电型源极绝缘; 电连接到第一导电型基极层和第二导电型基极层的主电极; 以及形成在绝缘层的底部上的第一导电型或第二导电型浮动层。