公开(公告)号：US5281535A

公开(公告)日：1994-01-25

申请号：US906791

申请日：1992-06-30

申请人： Ronghua Wei ,  Paul J. Wilbur ,  Samuel C. Wu

发明人： Ronghua Wei ,  Paul J. Wilbur ,  Samuel C. Wu

IPC分类号： G01N17/00 ,  G01N33/20 ,  G01N3/56 ,  G01N19/06

CPC分类号： G01N33/20 ,  G01N17/00

摘要： Method and apparatus are provided for testing parts and materials in a controlled environment, especially an atomic oxygen environment. The apparatus includes a housing which has sample station located in its interior to receive a test sample. A contact element contacts a surface of the test sample, and a drive reciprocates the contact element so that the surface is subjected to wear along a wear path. At least one testing fluid is introduced and removed from the interior with the locations of introduction on removal preferably being such that the testing fluid flows across the test sample. The drive may be a carriage operated through the housing sidewall by a ferromagnetic coupling, and the sample station may be a turntable rotated by a ferromagnetic coupling. A second sample station may be included so that different wear path configurations are possible. The method includes the steps of placing a test sample on a sample support station, contacting the test sample with a contact element, isolating the interior of the housing from the ambient environment, introducing and removing at least one testing fluid at locations such that the testing fluid flows across the test sample, reciprocally moving the contact element on the test sample and measuring an amount of wear after a selected interval of time. Preferably, the test sample is rotated during reciprocation of the contact element. Temperature and pressure may be monitored and controlled.

摘要翻译： 提供了用于在受控环境，特别是原子氧环境中测试零件和材料的方法和装置。 该装置包括壳体，其具有位于其内部的采样台以接收测试样本。 接触元件接触测试样品的表面，并且驱动器使接触元件往复运动，使得表面沿磨损路径磨损。 至少一个测试流体从内部引入和移除，除去引入位置优选地使得测试流体流过测试样品。 驱动器可以是通过铁磁耦合操作通过壳体侧壁的滑架，并且样品台可以是通过铁磁耦合旋转的转盘。 可以包括第二采样站，使得不同的磨损路径配置是可能的。 该方法包括以下步骤：将测试样品放置在样品支持站上，使测试样品与接触元件接触，将壳体的内部与周围环境隔离，在至少一个测试流体的位置处引入和去除至少一个测试流体， 流体流过测试样品，将接触元件往复移动到测试样品上，并在选定的时间间隔后测量磨损量。 优选地，测试样品在接触元件的往复运动期间旋转。 可以监测和控制温度和压力。

公开(公告)号：US09103022B2

公开(公告)日：2015-08-11

申请号：US11865160

申请日：2007-10-01

申请人： Ronghua Wei ,  Marta Jakab ,  Craig Engel

发明人： Ronghua Wei ,  Marta Jakab ,  Craig Engel

IPC分类号： C23C14/35 ,  C23C14/34 ,  C22C45/08 ,  C23C14/14

CPC分类号： C23C14/3414 ,  C22C45/08 ,  C23C14/14 ,  C23C14/35 ,  Y10T428/12

摘要： The present disclosure relates to an amorphous aluminum alloy coating. The aluminum alloy coating may specifically include one of cerium, cobalt and/or molybdenum as alloying elements and be applied by a physical vapor deposition process to a desired thickness. The coating may supply improved corrosion resistance to a given environmental condition.

摘要翻译： 本公开涉及无定形铝合金涂层。 铝合金涂层可以具体包括铈，钴和/或钼中的一种作为合金元素，并通过物理气相沉积工艺施加到期望的厚度。 涂层可以为给定的环境条件提供改善的耐腐蚀性。

公开(公告)号：US08273222B2

公开(公告)日：2012-09-25

申请号：US11749739

申请日：2007-05-16

申请人： Ronghua Wei ,  Sabrina L. Lee

发明人： Ronghua Wei ,  Sabrina L. Lee

IPC分类号： C23C14/00 ,  C23C14/32 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00

CPC分类号： C23C14/35 ,  C23C14/046 ,  H01J37/32366 ,  H01J37/3405 ,  H01J37/3438

摘要： The present disclosure relates to an apparatus and method for depositing coatings on the surface of a workpiece with sputtering material in an ion plasma environment. The apparatus may include a magnetron including a core cooling system surrounded by a magnet assembly and target material having a surface capable of providing a source of sputtering material. An RF plasma generation assembly is also provided in the apparatus including an RF antenna capable of providing an RF plasma and drawing ions to one or both of the workpiece surface and target material surface.

摘要翻译： 本公开涉及一种用于在离子等离子体环境中用溅射材料在工件的表面上沉积涂层的装置和方法。 该装置可以包括磁控管，其包括由磁体组件包围的芯冷却系统和具有能够提供溅射材料源的表面的靶材料。 在该设备中还提供了RF等离子体产生组件，其包括能够提供RF等离子体并且将离子牵引到工件表面和目标材料表面中的一个或两个的RF天线。

公开(公告)号：US08252388B2

公开(公告)日：2012-08-28

申请号：US12121410

申请日：2008-05-15

申请人： Ronghua Wei ,  Chris Rincon ,  Edward Langa

发明人： Ronghua Wei ,  Chris Rincon ,  Edward Langa

IPC分类号： B01J19/08

CPC分类号： C23C8/36 ,  C23C14/48 ,  C23C16/0272 ,  C23C16/26 ,  C23C16/515 ,  H01J37/32403 ,  H01J37/32412

摘要： A method of performing plasma immersion ion processing (PIIP), particularly suited for processing three-dimensional objects. One or more such objects are placed in a conductive cage having solid or mesh walls. The cage completely encloses the objects. A voltage is applied to the cage, and the plasma is generated, resulting in the plasma being contained within the cage.

摘要翻译： 一种执行等离子体浸没离子处理（PIIP）的方法，特别适用于处理三维物体。 一个或多个这样的物体被放置在具有固体或网状壁的导电笼中。 笼子完全包围着物体。 电压被施加到保持架上，并且产生等离子体，导致等离子体被包含在笼中。

公开(公告)号：US08029875B2

公开(公告)日：2011-10-04

申请号：US11752787

申请日：2007-05-23

申请人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

发明人： Ronghua Wei ,  Christopher Rincon ,  James H. Arps

IPC分类号： H05H1/24

CPC分类号： C23C16/0245 ,  C23C16/045 ,  C23C16/24 ,  C23C16/26 ,  C23C16/505

摘要： The present disclosure relates to a method for plasma ion deposition and coating formation. A vacuum chamber may be supplied, wherein the vacuum chamber is formed by a hollow substrate having a length, diameter and interior surface. A plasma may be formed within the chamber while applying a negative bias to the hollow substrate to draw ions from the plasma to the interior surface of the hollow substrate to deposit ions onto the interior surface and forming a coating. The coating may have a Vickers Hardness Number (Hv) of at least 500.

摘要翻译： 本公开涉及等离子体离子沉积和涂层形成的方法。 可以提供真空室，其中真空室由具有长度，直径和内表面的中空衬底形成。 可以在室内形成等离子体，同时向中空衬底施加负偏压以将离子从等离子体吸入中空衬底的内表面，以将离子沉积到内表面上并形成涂层。 该涂层可具有至少500的维氏硬度值（Hv）。

公开(公告)号：US20110003109A1

公开(公告)日：2011-01-06

申请号：US12496207

申请日：2009-07-01

申请人： Keith A. Slinker ,  Kent Coulter ,  Ronghua Wei

发明人： Keith A. Slinker ,  Kent Coulter ,  Ronghua Wei

IPC分类号： B32B5/02 ,  C23F1/00

CPC分类号： B82B3/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/174 ,  C01B32/176 ,  C01B2202/08 ,  H01J1/304 ,  H01J9/025 ,  H01J2201/30469 ,  Y10T428/23957

摘要： The invention relates to carbon nanotube arrays and methods for the preparation and modification of carbon nanotube arrays. The method includes synthesizing a plurality of carbon nanotubes on a substrate such that the carbon nanotubes are substantially vertically aligned and exposing the array to a plasma to change the topography of the array, change the structure or chemical nature of the individual nanotubes, remove at least a portion of the carbon nanotubes, and/or removing nanotubes to expose monodispserse groupings of nanotubes.

摘要翻译： 本发明涉及碳纳米管阵列及碳纳米管阵列的制备和改性方法。 该方法包括在基板上合成多个碳纳米管，使得碳纳米管基本上垂直取向并将阵列暴露于等离子体以改变阵列的形貌，改变单个纳米管的结构或化学性质，至少去除 碳纳米管的一部分，和/或去除纳米管以暴露纳米管的单分散组。

公开(公告)号：US07790003B2

公开(公告)日：2010-09-07

申请号：US11397878

申请日：2006-04-04

申请人： Kuang-Tsan Kenneth Chiang ,  Ronghua Wei ,  Edward Langa

发明人： Kuang-Tsan Kenneth Chiang ,  Ronghua Wei ,  Edward Langa

IPC分类号： C23C14/35

CPC分类号： C23C14/046 ,  C23C14/165 ,  C23C14/225 ,  C23C14/352 ,  C23C14/355 ,  H01J37/3405 ,  Y10T428/12903

摘要： A method for depositing a nanostructured coating comprising chromium or a copper-chromium mixture on a workpiece. The workpiece may comprise a hollowed structure such as a rocket or jet engine combustion chamber liner. The method comprises providing a magnetron and an external sputter target material comprising chromium or a copper-chromium composite and effecting a magnetron sputter deposition to deposit a substantially uniform nanostructured coating comprising said sputter target material on said workpiece. The method may include plasma enhancement wherein a filament is utilized to produce a plasma that effects an ion bombardment on the workpiece during the magnetron sputter deposition process. The invention also includes the nanostructured coatings deposited by these methods and workpieces coated thereby.

摘要翻译： 一种在工件上沉积包含铬或铜 - 铬混合物的纳米结构涂层的方法。 工件可以包括中空结构，例如火箭或喷气式发动机燃烧室衬套。 该方法包括提供磁控管和包含铬或铜 - 铬复合材料的外部溅射靶材料，并进行磁控溅射沉积，以将包含所述溅射靶材料的基本均匀的纳米结构涂层沉积在所述工件上。 该方法可以包括等离子体增强，其中使用丝来产生在磁控溅射沉积工艺期间对工件进行离子轰击的等离子体。 本发明还包括通过这些方法沉积的纳米结构涂层和由此涂覆的工件。

公开(公告)号：US20060076231A1

公开(公告)日：2006-04-13

申请号：US10962772

申请日：2004-10-12

申请人： Ronghua Wei

发明人： Ronghua Wei

IPC分类号： C23C14/00 ,  C23C14/32

CPC分类号： H01J37/3405 ,  C23C14/046 ,  C23C14/35

摘要： A method for depositing a coating on an interior surface of a hollowed workpiece. The method comprises providing the hollowed workpiece in a vacuum chamber, the hollowed workpiece comprising an interior surface substantially defining a bore having a longitudinal axis; positioning a magnetron within thed bore along substantially the length of said longitudinal axis and substantially radially equidistant from the interior surface, said magnetron comprising an external sputter target material; and, generating a circumferential magnetic field about the sputter target material for a time and under sputter deposition conditions effective to produce an interior surface comprising a substantially uniform coating comprising said sputter target material.

摘要翻译： 一种在中空工件的内表面上沉积涂层的方法。 所述方法包括在真空室中设置所述中空工件，所述中空工件包括基本上限定具有纵向轴线的孔的内表面; 将磁控管沿所述纵向轴线的大致长度定位在所述钻孔内，并且与所述内表面基本上径向等距离地定位，所述磁控管包括外部溅射靶材料; 以及在有效产生包括包括所述溅射靶材料的基本上均匀的涂层的内表面的时间和溅射沉积条件下，围绕溅射靶材料产生周向磁场。

公开(公告)号：US09511572B2

公开(公告)日：2016-12-06

申请号：US13463948

申请日：2012-05-04

申请人： Narayana Sastry Cheruvu ,  Ronghua Wei

发明人： Narayana Sastry Cheruvu ,  Ronghua Wei

IPC分类号： B32B15/04 ,  B32B33/00 ,  C23C28/02 ,  C23C30/00 ,  C23C28/00 ,  C22C19/03 ,  C22C19/00 ,  F01D5/28 ,  C22C19/05 ,  C22C19/07 ,  C23C14/16

CPC分类号： B32B33/00 ,  B32B15/04 ,  C22C19/00 ,  C22C19/03 ,  C22C19/05 ,  C22C19/07 ,  C23C14/165 ,  C23C28/00 ,  C23C28/022 ,  C23C28/3215 ,  C23C28/345 ,  C23C28/3455 ,  C23C30/00 ,  C23C30/005 ,  F01D5/28 ,  F01D5/288 ,  Y10T428/12931 ,  Y10T428/12937 ,  Y10T428/12944

摘要： A coated substrate including a substrate having a surface, a bond coat proximate to the substrate surface, a yttrium stabilized zirconia (YSZ) thermal barrier layer opposite the substrate surface, and at least one interlayer disposed between the bond coat and the thermal barrier layer, wherein the interlayer contains an alloy having a nanocrystalline grain structure. A method for coating a substrate to be exposed to high in service temperatures and/or temperature cycles including depositing a bond coating on substrate surface, depositing at least one nanocrystalline interlayer on the bond coat opposite the substrate surface, and depositing a yttrium stabilized zirconia (YSZ) thermal barrier coating on the nanocrystalline interlayer opposite the bond coat, wherein the service life of the YSZ thermal barrier coating is extended relative to a substrate coated with the bond coating and the thermal barrier without the interlayer disposed therebetween.

摘要翻译： 包括具有表面的基底，邻近基底表面的粘合涂层，与基底表面相对的钇稳定的氧化锆（YSZ）热阻隔层以及设置在粘合涂层和热障壁之间的至少一层的涂覆基底， 其中所述中间层包含具有纳米晶粒结构的合金。 一种用于涂覆待暴露于高使用温度和/或温度循环的基材的方法，包括在基材表面上沉积粘结涂层，在与基材表面相对的粘结涂层上沉积至少一个纳米晶体中间层，以及沉积钇稳定的氧化锆 YSZ）与粘合涂层相对的纳米晶体层上的热障涂层，其中YSZ热障涂层的使用寿命相对于涂覆有粘合涂层和热障壁的基底延伸，而中间层不设置在其间。

公开(公告)号：US09279187B2

公开(公告)日：2016-03-08

申请号：US12616599

申请日：2009-11-11

申请人： Ronghua Wei ,  Narayana S. Cheruvu

发明人： Ronghua Wei ,  Narayana S. Cheruvu

IPC分类号： C23C14/06 ,  C23C14/08 ,  C23C28/00 ,  C23C4/08 ,  C23C4/10 ,  C23C14/00 ,  C23C14/35 ,  C23C28/04 ,  F01D5/28 ,  H01J37/34 ,  C23C14/54

CPC分类号： C23C28/00 ,  C23C4/073 ,  C23C4/10 ,  C23C14/0036 ,  C23C14/0641 ,  C23C14/081 ,  C23C14/352 ,  C23C14/548 ,  C23C28/04 ,  F01D5/288 ,  H01J37/3408 ,  Y10T428/2495 ,  Y10T428/265 ,  Y10T428/31678

摘要： A coated substrate and a method of forming a diffusion barrier coating system between a substrate and a MCrAl coating, including a diffusion barrier coating deposited onto at least a portion of a substrate surface, wherein the diffusion barrier coating comprises a nitride, oxide or carbide of one or more transition metals and/or metalloids and a MCrAl coating, wherein M includes a transition metal or a metalloid, deposited on at least a portion of the diffusion barrier coating, wherein the diffusion barrier coating restricts the inward diffusion of aluminum of the MCrAl coating into the substrate.

摘要翻译： 一种涂覆的基材和在基材和MCrAl涂层之间形成扩散阻挡涂层体系的方法，包括沉积在基材表面的至少一部分上的扩散阻挡涂层，其中扩散阻挡涂层包括氮化物，氧化物或碳化物 一种或多种过渡金属和/或准金属和MCrAl涂层，其中M包括沉积在扩散阻挡涂层的至少一部分上的过渡金属或准金属，其中扩散阻挡涂层限制MCrAl的铝的向内扩散 涂覆到基材中。