Semiconductor layer structure with superlattice
    21.
    发明授权
    Semiconductor layer structure with superlattice 有权
    半导体层结构超晶格

    公开(公告)号:US07893424B2

    公开(公告)日:2011-02-22

    申请号:US11780514

    申请日:2007-07-20

    IPC分类号: H01L21/00

    摘要: The semiconductor layer structure includes a superlattice composed of stacked layers of III-V compound semiconductors of a first and at least one second type. Adjacent layers of different types in the superlattice differ in composition with respect to at least one element, at least two layers of the same type have a different content of the at least one element, the content of the at least one element is graded within a layer of the superlattice, and the layers of the superlattice contain dopants in predefined concentrations, with the superlattice comprising layers that are doped with different dopants. In this way, the electrical, optical and epitaxial properties of the superlattice can be adapted in the best possible manner to given requirements, particularly epitaxial constraints.

    摘要翻译: 半导体层结构包括由第一和至少一种第二类型的III-V族化合物半导体的堆叠层组成的超晶格。 超晶格中不同类型的相邻层相对于至少一个元素的组成不同,至少两个相同类型的层具有至少一个元素的不同含量,至少一个元素的含量被分级在 超晶格的层,并且超晶格的层含有预定浓度的掺杂剂,超晶格包含掺杂有不同掺杂剂的层。 以这种方式,超晶格的电,光学和外延特性可以以给定的要求,特别是外延约束的最佳可能方式进行调整。

    Method for Laterally Cutting Through a Semiconductor Wafer and Optoelectronic Component
    22.
    发明申请
    Method for Laterally Cutting Through a Semiconductor Wafer and Optoelectronic Component 有权
    用于横向切割半导体晶片和光电元件的方法

    公开(公告)号:US20090290610A1

    公开(公告)日:2009-11-26

    申请号:US11991488

    申请日:2006-08-07

    IPC分类号: H01S5/00 H01L21/30 H01L33/00

    摘要: A method for laterally dividing a semiconductor wafer (1) comprises the method steps of: providing a growth substrate (2); epitaxially growing a semiconductor layer sequence (3), which comprises a functional semiconductor layer (5), onto the growth substrate (2); applying a mask layer (10) to partial regions of the semiconductor layer sequence (3) in order to produce masked regions (11) and unmasked regions (12); implanting ions through the unmasked regions (12) in order to produce implantation regions (13) in the semiconductor wafer (1); and dividing the semiconductor wafer (1) along the implantation regions (13), wherein the growth substrate (2) or at least one part of the growth substrate (2) is separated from the semiconductor wafer.

    摘要翻译: 一种用于横向分割半导体晶片(1)的方法包括以下方法步骤:提供生长衬底(2); 在生长衬底(2)上外延生长包括功能半导体层(5)的半导体层序列(3); 将掩模层(10)施加到所述半导体层序列(3)的部分区域以产生掩蔽区域(11)和未屏蔽区域(12); 通过未掩模区域(12)注入离子,以便在半导体晶片(1)中产生注入区域(13); 以及沿着所述注入区域(13)划分所述半导体晶片(1),其中所述生长衬底(2)或所述生长衬底(2)的至少一部分与所述半导体晶片分离。

    SEMICONDUCTOR LAYER STRUCTURE WITH SUPERLATTICE
    23.
    发明申请
    SEMICONDUCTOR LAYER STRUCTURE WITH SUPERLATTICE 有权
    半导体层结构与超导

    公开(公告)号:US20080054247A1

    公开(公告)日:2008-03-06

    申请号:US11780514

    申请日:2007-07-20

    IPC分类号: H01L33/00 H01L29/15

    摘要: The semiconductor layer structure includes a superlattice (9) composed of stacked layers (9a, 9b) of III-V compound semiconductors of a first (a) and at least one second type (b). Adjacent layers of different types in the superlattice (9) differ in composition with respect to at least one element, at least two layers of the same type have a different content (cAl, cIn) of the at least one element, the content (cAl, cIn) of the at least one element is graded within a layer (9a, 9b) of the superlattice (9), and the layers (9a, 9b) of the superlattice contain dopants in predefined concentrations, with the superlattice (9) comprising layers (9a, 9b) that are doped with different dopants. In this way, the electrical, optical and epitaxial properties of the superlattice (9) can be adapted in the best possible manner to given requirements, particularly epitaxial constraints.

    摘要翻译: 半导体层结构包括由第一(a)和至少一种第二类型(b)的III-V族化合物半导体的堆叠层(9a,9b)组成的超晶格(9)。 超晶格(9)中不同类型的相邻层在组成上相对于至少一个元素不同,至少两层相同类型具有不同的含量(c 至少一个元件的内容物,(a)至少一个元素的内容(c,S,N,C)在一个层(9a, (9)的超导体(9b),并且超晶格的层(9a,9b)含有预定浓度的掺杂剂,超晶格(9)包含掺杂不同掺杂剂的层(9a,9b) 。 以这种方式,超晶格(9)的电,光学和外延特性可以以最佳可能的方式适应给定的要求,特别是外延约束。

    Laser light source and method for producing a laser light source
    25.
    发明授权
    Laser light source and method for producing a laser light source 有权
    激光光源及激光光源的制造方法

    公开(公告)号:US08964808B2

    公开(公告)日:2015-02-24

    申请号:US13730363

    申请日:2008-12-17

    IPC分类号: H01S5/00 H01S5/028 H01S5/10

    摘要: A laser light source comprises, in particular, a semiconductor layer sequence (10) having an active region (45) and a radiation coupling-out area (12) having a first partial region (121) and a second partial region (122) different than the latter, and a filter structure (5), wherein the active region (45) generates, during operation, coherent first electromagnetic radiation (51) having a first wavelength range and incoherent second electromagnetic radiation (52) having a second wavelength range, the coherent first electromagnetic radiation (51) is emitted by the first partial region (121) along an emission direction (90), the incoherent second electromagnetic radiation (52) is emitted by the first partial region (121) and by the second partial region (122), the second wavelength range comprises the first wavelength range, and the filter structure (5) at least partly attenuates the incoherent second electromagnetic radiation (52) emitted by the active region along the emission direction (90).

    摘要翻译: 激光光源特别包括具有有源区(45)和辐射耦合输出区(12)的半导体层序列(10),辐射耦合输出区域(12)具有不同的第一部分区域(121)和第二部分区域(122) 以及滤波器结构(5),其中所述有源区(45)在操作期间产生具有第一波长范围和具有第二波长范围的非相干第二电磁辐射(52)的相干第一电磁辐射(51) 相干第一电磁辐射(51)沿着发射方向(90)由第一部分区域(121)发射,非相干的第二电磁辐射(52)由第一部分区域(121)和第二部分区域 (122),所述第二波长范围包括所述第一波长范围,并且所述滤波器结构(5)至少部分地衰减由所述有源区沿着所述发射方向发射的非相干的第二电磁辐射(52) (90)。

    Laser Light Source and Method for Producing a Laser Light Source
    27.
    发明申请
    Laser Light Source and Method for Producing a Laser Light Source 有权
    激光光源及其制造方法

    公开(公告)号:US20110188530A1

    公开(公告)日:2011-08-04

    申请号:US12809748

    申请日:2008-12-17

    IPC分类号: H01S5/20 H01S5/00

    摘要: A laser light source comprises, in particular, a semiconductor layer sequence (10) having an active region (45) and a radiation coupling-out area (12) having a first partial region (121) and a second partial region (122) different than the latter, and a filter structure (5), wherein the active region (45) generates, during operation, coherent first electromagnetic radiation (51) having a first wavelength range and incoherent second electromagnetic radiation (52) having a second wavelength range, the coherent first electromagnetic radiation (51) is emitted by the first partial region (121) along an emission direction (90), the incoherent second electromagnetic radiation (52) is emitted by the first partial region (121) and by the second partial region (122), the second wavelength range comprises the first wavelength range, and the filter structure (5) at least partly attenuates the incoherent second electromagnetic radiation (52) emitted by the active region along the emission direction (90).

    摘要翻译: 激光光源特别包括具有有源区(45)和辐射耦合输出区(12)的半导体层序列(10),辐射耦合输出区域(12)具有不同的第一部分区域(121)和第二部分区域(122) 以及滤波器结构(5),其中所述有源区(45)在操作期间产生具有第一波长范围和具有第二波长范围的非相干第二电磁辐射(52)的相干第一电磁辐射(51) 相干第一电磁辐射(51)沿着发射方向(90)由第一部分区域(121)发射,非相干的第二电磁辐射(52)由第一部分区域(121)和第二部分区域 (122),所述第二波长范围包括所述第一波长范围,并且所述滤波器结构(5)至少部分地衰减由所述有源区沿着所述发射方向发射的非相干的第二电磁辐射(52) (90)。

    Semiconductor layer structure with superlattice
    29.
    发明授权
    Semiconductor layer structure with superlattice 有权
    半导体层结构超晶格

    公开(公告)号:US07822089B2

    公开(公告)日:2010-10-26

    申请号:US11780512

    申请日:2007-07-20

    IPC分类号: H01S5/00 H01L33/00

    摘要: The semiconductor layer structure comprises a superlattice (9) composed of alternately stacked layers (9a, 9b) of III-V semiconductor compounds of a first composition (a) and at least one second composition (b). The layers (9a, 9b) of the superlattice (9) contain dopants in predetermined concentrations, with regard to which the concentrations of the dopants are different at least two layers of a same composition in the superlattice (9), the concentration of the dopants is graded within at least one layer (9a, 9b) of the superlattice (9), and the superlattice (9) comprises layers that are doped with different dopants or comprise at least one layer (9a, 9b) that is undoped. The electrical and optical properties of the superlattice (9) can be adapted to given requirements in the best possible manner in this way.

    摘要翻译: 半导体层结构包括由第一组合物和至少一种第二组合物的III-V半导体化合物的交替堆叠层组成的超晶格。 超晶格的层含有预定浓度的掺杂剂,关于掺杂剂的浓度在超晶格中不同于至少两层相同的组成,掺杂剂的浓度在至少一层超晶格内分级, 并且超晶格包括掺杂有不同掺杂剂或包含至少一层未掺杂的层的层。