公开(公告)号：US08907277B2

公开(公告)日：2014-12-09

申请号：US12919676

申请日：2009-02-13

Applicant: Rainer Knippelmeyer ,  Nicholas Economou ,  Mohan Ananth ,  Lewis A. Stern ,  Bill DiNatale ,  Lawrence Scipioni ,  John A. Notte, IV

Inventor： Rainer Knippelmeyer ,  Nicholas Economou ,  Mohan Ananth ,  Lewis A. Stern ,  Bill DiNatale ,  Lawrence Scipioni ,  John A. Notte, IV

IPC: H01J49/00 ,  G01N1/32

CPC classification number: G01N1/32 ,  H01J2237/0203 ,  H01J2237/0807 ,  H01J2237/31749

Abstract: Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.

Abstract translation: 本文公开的方法包括：（a）在样品中形成通道，所述通道沿着与样品表面成一定角度取向的方向延伸一微米或更多; （b）使通道上方的样品的一部分暴露于粒子束以使颗粒离开样品的表面; 和（c）基于离开表面的颗粒形成样品的图像。

公开(公告)号：US20110049364A1

公开(公告)日：2011-03-03

申请号：US12919676

申请日：2009-02-13

Applicant: Rainer Knippelmeyer ,  Nicholas Economou ,  Mohan Ananth ,  Lewis A. Stern ,  Bill DiNatale ,  Lawrence Scipioni ,  John A. Notte, IV

Inventor： Rainer Knippelmeyer ,  Nicholas Economou ,  Mohan Ananth ,  Lewis A. Stern ,  Bill DiNatale ,  Lawrence Scipioni ,  John A. Notte, IV

IPC: G01N23/225

CPC classification number: G01N1/32 ,  H01J2237/0203 ,  H01J2237/0807 ,  H01J2237/31749

Abstract: Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface.

Abstract translation: 本文公开的方法包括：（a）在样品中形成通道，所述通道沿着与样品表面成一定角度取向的方向延伸一微米或更多; （b）使通道上方的样品的一部分暴露于粒子束以使颗粒离开样品的表面; 和（c）基于离开表面的颗粒形成样品的图像。

公开(公告)号：US20090256075A1

公开(公告)日：2009-10-15

申请号：US11991547

申请日：2006-09-06

Applicant: Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

Inventor： Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

IPC: G01N23/00 ,  G01K1/08

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

Abstract translation: 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数目的带电粒子子束对物体进行检查的带电粒子检查方法。

公开(公告)号：US07554094B2

公开(公告)日：2009-06-30

申请号：US11808845

申请日：2007-06-13

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC: H01J1/50 ,  H01J37/28 ,  H01J37/244 ,  G21K5/10 ,  G21K7/00

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract translation: 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US20090114818A1

公开(公告)日：2009-05-07

申请号：US11991546

申请日：2006-09-06

Applicant: Antonio Casares ,  Rainer Knippelmeyer ,  Thomas Kemen ,  Thomas Bayer ,  Georg Fritz ,  Johann Greschner ,  Samuel Kalt

Inventor： Antonio Casares ,  Rainer Knippelmeyer ,  Thomas Kemen ,  Thomas Bayer ,  Georg Fritz ,  Johann Greschner ,  Samuel Kalt

IPC: G01N23/00

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.

Abstract translation: 本发明涉及一种包括第一多孔板和在其间形成间隙的第二多孔板的颗粒光学部件; 其中所述第一多孔板的多个孔被布置成使得所述第一多孔板的所述多个孔中的每个孔与所述第二多孔板的多个孔的对应孔对齐; 并且其中所述间隙在第一位置处具有第一宽度，在第二位置处具有第二宽度，并且其中所述第二宽度比所述第一宽度大至少5％。 此外，本发明涉及包含这些部件的带电粒子系统和布置以及制造具有弯曲表面的多孔板的方法。

公开(公告)号：US20080054184A1

公开(公告)日：2008-03-06

申请号：US11808845

申请日：2007-06-13

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC: H01J1/50

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract translation: 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US07135677B2

公开(公告)日：2006-11-14

申请号：US10638328

申请日：2003-08-12

Applicant: Oliver Kienzle ,  Rainer Knippelmeyer ,  Stephan Uhlemann ,  Max Haider ,  Heiko Müller

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Stephan Uhlemann ,  Max Haider ,  Heiko Müller

IPC: H01J37/141 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/1472 ,  H01J37/28

Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.

Abstract translation: 电子显微镜系统包括物镜（19），该物镜成像在固定光束轴线（17）上在x方向上可移位的场。 物镜具有散光效果，其通过固定轴上的光束整形器（63）补偿。 此外，透镜配置可以选择性地作用于一次电子束或二次电子束。

公开(公告)号：US06946657B2

公开(公告)日：2005-09-20

申请号：US10631748

申请日：2003-08-01

Applicant: Oliver Kienzle ,  Rainer Knippelmeyer ,  Heiko Müller

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Heiko Müller

IPC: G01Q30/04 ,  H01J37/05 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/256

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/1472 ,  H01J2237/2817

Abstract: A particle-optical apparatus is disclosed which combines the functions of an energy selector 27 and a beam splitter 21. The particle-optical apparatus is used in an electron microscopy system and serves to separate and superimpose, respectively, beam paths of a primary electron beam 11 and a secondary electron beam 13.

Abstract translation: 公开了一种组合了能量选择器27和分束器21的功能的粒子光学装置。该粒子光学装置用于电子显微镜系统中，用于分别并分别叠加一次电子束的光束路径 11和二次电子束13。

公开(公告)号：US06914249B2

公开(公告)日：2005-07-05

申请号：US10639592

申请日：2003-08-13

Applicant: Oliver Kienzle ,  Rainer Knippelmeyer

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer

IPC: H01J37/04 ,  G01N23/00 ,  G01Q20/02 ,  G02B27/10 ,  G21G5/00 ,  H01J3/14 ,  H01J37/10 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J37/304 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J37/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/147 ,  H01J37/28 ,  H01J37/3175 ,  H01J2237/03 ,  H01J2237/1202 ,  H01J2237/121 ,  H01J2237/1215 ,  H01J2237/1504 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/303 ,  H01J2237/31774

Abstract: A particle-optical apparatus is provided for directing a beam of charged particles on an object plane or to image the object plane with the beam onto an image plane or intermediate image plane. The apparatus comprises a stack of lens assemblies which are disposed in beam direction at a fixed distances spaced apart from which other and are controllable for providing successively adjustable deflection fields for a beam traversing the stack. Each lens assembly provides at least one field source member for a magnetic or electric field. In particular, two rows of a plurality of field source members per lens assembly can be provided.

Abstract translation: 提供了一种粒子光学装置，用于将带电粒子束引导到物体平面上，或者将物体平面与光束成像到图像平面或中间像平面上。 该装置包括一组透镜组件，它们以光束方向设置成一定距离，间隔开并且可控制，以便为穿过堆叠的光束提供连续可调的偏转场。 每个透镜组件为磁场或电场提供至少一个场源元件。 特别地，可以提供每个透镜组件的两排多个场源元件。