公开(公告)号：US10186424B2

公开(公告)日：2019-01-22

申请号：US15622220

申请日：2017-06-14

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Suzanne M. Coley ,  Paul J. LaBeaume ,  Shintaro Yamada ,  Cecilia W. Kiarie ,  Li Cui ,  Bhooshan Popere

IPC: H01L21/027 ,  C08G77/04 ,  C09D183/04 ,  C09D5/00 ,  G03F7/039 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/09 ,  G03F7/32 ,  C09D7/20 ,  C08G77/00

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from these compositions can be easily removed during processing without the need for a separate removal step.

公开(公告)号：US09540476B2

公开(公告)日：2017-01-10

申请号：US14569610

申请日：2014-12-12

Applicant: Rohm and Haas Electronic Materials LLC ,  Rohm and Haas Electronic Materials Korea Ltd.

Inventor： Li Cui ,  Sung Wook Cho ,  Mingqi Li ,  Shintaro Yamada ,  Peter Trefonas, III ,  Robert L. Auger

IPC: G03F7/09 ,  C08G8/08 ,  C09D161/06 ,  C08G8/04

CPC classification number: C08G8/04 ,  C08G8/08 ,  C09D161/06 ,  G03F7/091 ,  G03F7/094 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/26 ,  H01L21/31111 ,  H01L21/31144

Abstract: Polymeric reaction products of certain aromatic alcohols with certain aromatic aldehydes are useful as underlayers in semiconductor manufacturing processes.

Abstract translation: 某些芳族醇与某些芳族醛的聚合反应产物可用作半导体制造工艺中的底层。

公开(公告)号：US12099300B2

公开(公告)日：2024-09-24

申请号：US16598264

申请日：2019-10-10

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Sheng Liu ,  James F. Cameron ,  Shintaro Yamada ,  Iou-Sheng Ke ,  Keren Zhang ,  Daniel Greene ,  Paul J. LaBeaume ,  Li Cui ,  Suzanne M. Coley

IPC: G03F7/11 ,  G03F7/075 ,  G03F7/09 ,  G03F7/20

CPC classification number: G03F7/11 ,  G03F7/0752 ,  G03F7/091 ,  G03F7/2016

Abstract: Compounds having three or more alkynyl moieties substituted with an aromatic moiety having one or more of certain substituents are useful in forming underlayers useful in semiconductor manufacturing processes.

公开(公告)号：US20240241441A1

公开(公告)日：2024-07-18

申请号：US18090638

申请日：2022-12-29

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Tomas Marangoni ,  Huan He ,  Joshua Kaitz ,  Li Cui ,  Yinjie Cen ,  Emad Aqad ,  Mingqi Li

IPC: G03F7/039 ,  G03F7/028

CPC classification number: G03F7/039 ,  G03F7/028

Abstract: A polymer including a first repeating unit comprising an acid labile group; an anionic endgroup selected from a carboxylate group or a sulfamate group; and an organic cation.

公开(公告)号：US20240184201A1

公开(公告)日：2024-06-06

申请号：US17985439

申请日：2022-11-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Conner A. Hoelzel ,  Li Cui ,  Jong Keun Park ,  Emad Aqad ,  James F. Cameron

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/22 ,  C08F220/1807 ,  C08F220/1809 ,  G03F7/038

Abstract: A polymer including a first repeating unit derived from a first monomer represented by formula (1); and a second repeating unit comprising an acid labile group, a hydroxyaryl group, a sulfonamide group, a fluoroalcohol group, or a combination thereof,




wherein, in formula (1), P is a polymerizable group comprising an ethylenically unsaturated carbon-carbon double bond; L1 is a single bond or a linking group; Ar is a substituted or unsubstituted C6-30 aromatic group or a substituted or unsubstituted C4-30 heteroaromatic group; X is O or S; A is a group selected from —O—, —S—, —S(O)—, —S(O)2—, —C(O)—, —C(S)—, or —N(Ra)—; Ra is hydrogen or a non-hydrogen substituent; and R1 and R2 are each as defined herein, wherein the first repeating unit and the second repeating unit are structurally different.

公开(公告)号：US20240019779A1

公开(公告)日：2024-01-18

申请号：US17749880

申请日：2022-05-20

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Li Cui ,  Emad Aqad ,  Yinjie Cen ,  Conner A. Hoelzel ,  James F. Cameron ,  Jong Keun Park ,  Suzanne M. Coley ,  Choong-Bong Lee

IPC: G03F7/004 ,  C07C317/22 ,  C07C69/78

CPC classification number: G03F7/0045 ,  C07C317/22 ,  C07C2601/16 ,  C07C2601/08 ,  C07C69/78

Abstract: A compound represented by Formula (1):




wherein X is a group having a valency of r; each R1 is independently an organic group comprising an acid-labile group; m is an integer greater than or equal to 1; k is an integer from 1 to 5; and r is an integer from 2 to 10, wherein the compound is non-polymeric, and wherein Ar1, L1, L2, R2, and R3 are as defined herein.

公开(公告)号：US11360387B2

公开(公告)日：2022-06-14

申请号：US16022874

申请日：2018-06-29

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Li Cui ,  Paul J. LaBeaume ,  James F. Cameron ,  Charlotte A. Cutler ,  Shintaro Yamada ,  Suzanne M. Coley ,  Iou-Sheng Ke

IPC: G03F7/075 ,  G03F7/11 ,  C09D143/04 ,  G03F7/42 ,  G03F7/20 ,  G03F7/09 ,  G03F7/16 ,  G03F7/40 ,  G03F7/32 ,  C08F220/18 ,  C08F230/08

Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising one or more condensed polymers having an organic polymer chain having pendently-bound moieties having an acidic proton and a pKa in water from −5 to 13 and having pendently-bound siloxane moieties are provided.

公开(公告)号：US20220066321A1

公开(公告)日：2022-03-03

申请号：US17007903

申请日：2020-08-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  James F. Cameron ,  Emad Aqad ,  Iou-Sheng Ke ,  Suzanne M. Coley

IPC: G03F7/11 ,  C08G8/04 ,  C09D161/06

Abstract: An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.

公开(公告)号：US20190115209A1

公开(公告)日：2019-04-18

申请号：US16218519

申请日：2018-12-13

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Suzanne M. Coley ,  Paul J. LaBeaume ,  Shintaro Yamada ,  Cecilia W. Kiarie ,  Li Cui ,  Bhooshan Popere

IPC: H01L21/027 ,  G03F7/16 ,  G03F7/32 ,  G03F7/09 ,  G03F7/20 ,  C09D7/20 ,  G03F7/038 ,  G03F7/039 ,  C09D5/00 ,  C09D183/04 ,  C08G77/04

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.

公开(公告)号：US20180164685A1

公开(公告)日：2018-06-14

申请号：US15826925

申请日：2017-11-30

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Li Cui ,  Paul J. LaBeaume ,  Charlotte A. Cutler ,  Shintaro Yamada ,  James F. Cameron ,  William Williams

IPC: G03F7/11 ,  C08F220/12 ,  G03F7/075

CPC classification number: G03F7/11 ,  C08F220/12 ,  C08F220/20 ,  C08F220/30 ,  C08F2220/1825 ,  C08F2230/085 ,  C08L101/00 ,  C08L101/02 ,  G03F7/0752 ,  G03F7/0757 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/30 ,  H01L21/0274 ,  C08F2220/283

Abstract: Methods of manufacturing electronic devices employing wet-strippable underlayer compositions comprising a condensate and/or hydrolyzate of a polymer comprising as polymerized units one or more first unsaturated monomers having a condensable silicon-containing moiety, wherein the condensable silicon-containing moiety is pendent to the polymer backbone, are provided.