公开(公告)号：US20050128451A1

公开(公告)日：2005-06-16

申请号：US11012257

申请日：2004-12-16

申请人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

发明人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/42

CPC分类号： H01L21/681

摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.

摘要翻译： 基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具 在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器 根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及 旋转机制。

公开(公告)号：US20050052634A1

公开(公告)日：2005-03-10

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G01B11/02 ,  G02B7/28 ,  G02B21/26 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

公开(公告)号：US20050002020A1

公开(公告)日：2005-01-06

申请号：US10852434

申请日：2004-05-25

申请人： Hiromu Inoue ,  Toru Tojo ,  Takehiko Nomura ,  Shinichi Imai

发明人： Hiromu Inoue ,  Toru Tojo ,  Takehiko Nomura ,  Shinichi Imai

IPC分类号： G01N21/956 ,  G03F1/84 ,  H01L21/66 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01N2021/95676

摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.

摘要翻译： 光刻掩模检查装置具有至少两个传感器。 一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。 第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。 第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。 还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

公开(公告)号：US4811062A

公开(公告)日：1989-03-07

申请号：US214821

申请日：1988-07-01

申请人： Mitsuo Tabata ,  Toru Tojo ,  Hiroaki Shimozono

发明人： Mitsuo Tabata ,  Toru Tojo ,  Hiroaki Shimozono

IPC分类号： H01L21/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G01B11/26

CPC分类号： G03F9/7049

摘要： In a method for aligning first and second objects relative to each other, according to this invention, the first and second objects are arranged opposite to each other, and are aligned in a direction perpendicular to their opposing direction. A grating pattern is formed, as an alignment mark, on the first object, and a checkerboard-like grating pattern is formed, also as an alignment mark, on the second object. A light beam emitted from an alignment light source is radiated onto the checkerboard-like grating pattern of the second object. The light beam diffracted by the checkerboard-like grating pattern is guided onto the grating pattern of the first object. The light beam diffracted by the grating pattern of the first object is detected by a detector. Since the light beam emitted from the light source is diffracted by the checkerboard-like grating pattern, a relative position of the first and second objects can be detected, irrespective of the distance therebetween. The first and second objects are accurately aligned, based on the detection result. This invention can be applied to a method for aligning a mask and a wafer when a circuit pattern pre-formed on the mask is to be transferred onto the wafer.

摘要翻译： 在第一和第二物体相对于彼此对准的方法中，根据本发明，第一和第二物体彼此相对布置，并且在垂直于它们的相反方向的方向上对齐。 在第一物体上形成作为对准标记的光栅图案，并且在第二物体上形成棋盘状光栅图案，也作为对准标记。 从对准光源发射的光束被辐射到第二物体的棋盘状光栅图案上。 由棋盘状光栅图案衍射的光束被引导到第一物体的光栅图案上。 由第一物体的光栅图案衍射的光束由检测器检测。 由于从光源发射的光束被棋盘状光栅图案衍射，所以可以检测第一和第二物体的相对位置，而与它们之间的距离无关。 基于检测结果，第一和第二物体被精确对准。 当将掩模上预先形成的电路图案转印到晶片上时，本发明可以应用于将掩模和晶片对准的方法。

公开(公告)号：US4480284A

公开(公告)日：1984-10-30

申请号：US428341

申请日：1982-09-29

申请人： Toru Tojo ,  Ichiro Mori ,  Shunichi Sano

发明人： Toru Tojo ,  Ichiro Mori ,  Shunichi Sano

IPC分类号： B23Q3/15 ,  H01L21/683 ,  H02N13/00

CPC分类号： H01L21/6831 ,  H01L21/6833

摘要： An electrostatic chuck plate comprises an electrode plate made of electrically conductive material and a dielectric layer formed on one surface of the electrode plate by flame-spraying dielectric material. The surface region of the dielectric layer is impregnated with plastic material, and the surface of the dielectric layer is smooth and flat. A sample is electrostatically attracted toward the electrode plate and is thus held on the smooth and flat surface of the dielectric layer.

摘要翻译： 静电卡盘包括由导电材料制成的电极板和通过火焰喷涂介电材料形成在电极板的一个表面上的电介质层。 电介质层的表面区域用塑料材料浸渍，电介质层的表面光滑平坦。 样品被静电吸引到电极板上，因此被保持在电介质层的光滑平坦的表面上。

公开(公告)号：US4467210A

公开(公告)日：1984-08-21

申请号：US379712

申请日：1982-05-18

申请人： Kazuyoshi Sugihara ,  Toru Tojo ,  Ichiro Mori ,  Toshiaki Shinozaki

发明人： Kazuyoshi Sugihara ,  Toru Tojo ,  Ichiro Mori ,  Toshiaki Shinozaki

IPC分类号： H01L21/027 ,  B65G49/07 ,  H01J37/18 ,  H01L21/30 ,  H01L21/677 ,  H01L21/68 ,  B23Q3/157

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2037 ,  H01J37/18 ,  H01L21/30 ,  H01L21/67766 ,  H01L21/67796 ,  H01L21/682

摘要： An electron-beam image transfer device includes an evacuated vessel having a main chamber and spare chamber extended therefrom and a specimen holder and mask holder disposed in the main chamber. A subchamber is formed near the spare chamber to house a specimen. The specimen in the subchamber is transferred to the spare chamber by a movable support through an opening which is always kept in an airtight state, and then brought to the specimen holder by a transferring mechanism.

摘要翻译： 电子束图像转印装置包括具有从其延伸的主室和备用室的抽真空容器和设置在主室中的试样保持器和掩模保持架。 在备用室附近形成一个子室以容纳样品。 子室中的样品通过可移动的支撑件通过总是保持在气密状态的开口转移到备用室，然后通过传送机构带到样品保持器。

公开(公告)号：US4455501A

公开(公告)日：1984-06-19

申请号：US429230

申请日：1982-09-30

申请人： Toru Tojo ,  Kazuyoshi Sugihara

发明人： Toru Tojo ,  Kazuyoshi Sugihara

IPC分类号： G03F7/20 ,  H01J37/20 ,  H01L21/68 ,  H01L41/09 ,  H01L41/08

CPC分类号： H02N2/023 ,  G03F7/70691 ,  H01J37/20 ,  H01L21/68 ,  H02N2/0095 ,  H02N2/101

摘要： In a precision rotation mechanism, first and second sections of a rotatable disk member are alternately rotated. The first and second sections are coupled together with an elastic hinge which is provided in the center region of the disk. The first and second sections are also coupled with piezoelectric elements. After the first section is locked by a stopper, the piezoelectric element is elongated in a direction and the piezoelectric element is contracted in a direction, whereby the second section is rotated in a direction. Then, the second section is locked by the stopper and the first section is released from the stopper. In this state, one piezoelectric element is contracted and the other piezoelectric element is elongated so that the first section is rotated.

摘要翻译： 在精密旋转机构中，旋转盘构件的第一和第二部分交替旋转。 第一和第二部分与提供在盘的中心区域中的弹性铰链联接在一起。 第一和第二部分也与压电元件耦合。 在第一部分被止动器锁定之后，压电元件在一个方向上伸长，并且压电元件沿一个方向收缩，由此第二部分沿一个方向旋转。 然后，第二部分由止动器锁定，第一部分从止动件释放。 在这种状态下，一个压电元件收缩，另一个压电元件是细长的，从而使第一部分旋转。

公开(公告)号：US07551767B2

公开(公告)日：2009-06-23

申请号：US12040541

申请日：2008-02-29

申请人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

发明人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T2207/30148

摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动地取出模具数据的检查区域， 对比方法。

公开(公告)号：US07359546B2

公开(公告)日：2008-04-15

申请号：US11072317

申请日：2005-03-07

申请人： Shinji Sugihara ,  Ikunao Isomura ,  Junji Oaki ,  Toru Tojo

发明人： Shinji Sugihara ,  Ikunao Isomura ,  Junji Oaki ,  Toru Tojo

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01R31/311 ,  G03F1/84 ,  G06T2207/30148

摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.

摘要翻译： 缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据 将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据 具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为 第三像素数据具有较高的值。

公开(公告)号：US07123345B2

公开(公告)日：2006-10-17

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G03B27/42

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。