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175 条记录 (耗时 0.044 秒)

    Filter for material supply apparatus of an extreme ultraviolet light source
    23.
    发明授权
    Filter for material supply apparatus of an extreme ultraviolet light source 有权
    过滤器用于极紫外光源的材料供应装置

    公开(公告)号：US09029813B2

    公开(公告)日：2015-05-12

    申请号：US13112784

    申请日：2011-05-20

    申请人： Igor V. Fomenkov ,  William N. Partlo ,  Georgiy O. Vaschenko ,  William Oldham

    发明人： Igor V. Fomenkov ,  William N. Partlo ,  Georgiy O. Vaschenko ,  William Oldham

    IPC分类号： G01J3/10 ,  B22F3/105 ,  B01D29/56

    CPC分类号： B01D29/56 ,  B22F3/105 ,  H05G2/006 ,  H05G2/008 ,  H05H1/46

    摘要： A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.

    摘要翻译： 在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。 第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。 通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。 片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。

    EUV collector debris management
    25.
    发明授权
    EUV collector debris management 失效
    EUV收集器碎片管理

    公开(公告)号：US08075732B2

    公开(公告)日：2011-12-13

    申请号：US10979945

    申请日：2004-11-01

    申请人： William N. Partlo ,  Richard L. Sandstrom ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William Oldham ,  William F. Marx ,  Oscar Hemberg

    发明人： William N. Partlo ,  Richard L. Sandstrom ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William Oldham ,  William F. Marx ,  Oscar Hemberg

    IPC分类号： C23F1/00

    CPC分类号： B08B7/00

    摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.

    摘要翻译： 可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。 蚀刻剂源材料可以包含卤素或卤素化合物。 蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。 该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。 还可以存在离子加速剂将离子朝向反射表面加速。 离子可以包括蚀刻剂源材料。 该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

    Laser system
    28.
    发明授权
    Laser system 有权
    激光系统

    公开(公告)号：US07630424B2

    公开(公告)日：2009-12-08

    申请号：US11981195

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov

    IPC分类号： H01S3/22

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/235 ,  H01S2301/02

    摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.

    摘要翻译： 方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量 激光系统输出光束的脉冲基本恒定。

    Drive laser for EUV light source
    29.
    发明授权
    Drive laser for EUV light source 有权
    驱动激光用于EUV光源

    公开(公告)号：US07518787B2

    公开(公告)日：2009-04-14

    申请号：US11452558

    申请日：2006-06-14

    申请人： Alexander N. Bykanov ,  Jerzy R. Hoffman ,  Igor V. Fomenkov ,  William N. Partlo

    发明人： Alexander N. Bykanov ,  Jerzy R. Hoffman ,  Igor V. Fomenkov ,  William N. Partlo

    IPC分类号： H01S4/00 ,  H01S3/22 ,  H01S3/223

    CPC分类号： H01S3/2316 ,  H01S3/0057 ,  H01S3/11 ,  H01S3/2232 ,  H01S3/225 ,  H05G1/54 ,  H05G2/008

    摘要： A laser light source is disclosed having a laser oscillator producing an output beam; a first amplifier amplifying the output beam to produce a first amplified beam, and a second amplifier amplifying the first amplified beam to produce a second amplified beam. For the source, the first amplifier may have a gain medium characterized by a saturation energy (Es, 1) and a small signal gain (go, 1); and the second amplifier may have a gain medium characterized by a saturation energy (Es, 2) and a small signal gain (go, 2), with (go, 1)>(go, 2) and (Es, 2)>(Es, 1). In another aspect, a laser oscillator of a laser light source may be a cavity dumped laser oscillator, e.g. a mode-locked laser oscillator, q-switched laser oscillator and may further comprising a temporal pulse stretcher.

    摘要翻译： 公开了具有产生输出光束的激光振荡器的激光源; 放大所述输出光束以产生第一放大光束的第一放大器，以及放大所述第一放大光束以产生第二放大光束的第二放大器。 对于源，第一放大器可以具有以饱和能量（Es，1）和小信号增益（go，1）为特征的增益介质; 并且第二放大器可以具有特征在于饱和能量（Es，2）和小信号增益（go，2）的增益介质，其中（go，1）>（go，2）和（Es，2）>（ Es，1）。 在另一方面，激光光源的激光振荡器可以是空腔倾覆的激光振荡器，例如。 模式锁定激光振荡器，q切换激光振荡器，并且还可以包括时间脉冲展开器。