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126 条记录 (耗时 0.034 秒)

    Automated elevator fixture addressing
    22.
    发明授权
    Automated elevator fixture addressing 有权
    自动电梯夹具寻址

    公开(公告)号：US08573364B2

    公开(公告)日：2013-11-05

    申请号：US13055498

    申请日：2008-08-29

    申请人： Ming Fang ,  QingQi Wu

    发明人： Ming Fang ,  QingQi Wu

    IPC分类号： B66B1/28

    CPC分类号： B66B1/34

    摘要： An exemplary method of automatically addressing a plurality of fixtures in an elevator system includes establishing a shared communication link between a central controller and the plurality of fixtures. The method includes determining whether a selected elevator device operation is performed at a location of a fixture and enabling the corresponding fixture to receive initializing information, such as addressing information. The central controller broadcasts the initializing information over the communication link for automatically providing the initializing information to the enabled, corresponding fixture. By enabling only one fixture at a time, based on the selected elevator device operation, the central controller is able to accurately address each of the fixtures individually even though the initializing information is broadcast over the shared link.

    摘要翻译： 在电梯系统中自动寻址多个固定装置的示例性方法包括在中央控制器和多个固定装置之间建立共享通信链路。 该方法包括确定在固定装置的位置是否执行所选择的电梯装置操作，并且使得对应的装置能够接收诸如寻址信息的初始化信息。 中央控制器通过通信链路广播初始化信息，用于将初始化信息自动提供给启用的相应的固定装置。 通过基于所选择的电梯设备操作，一次只能启用一个固定装置，即使通过共享链路广播初始化信息，中央控制器也能够分别准确地对每个固定装置进行寻址。

    HEATING SYSTEM AND METHOD FOR MICROFLUIDIC AND MICROMECHANICAL APPLICATIONS
    23.
    发明申请
    HEATING SYSTEM AND METHOD FOR MICROFLUIDIC AND MICROMECHANICAL APPLICATIONS 有权
    微流体和微生物应用的加热系统和方法

    公开(公告)号：US20110081138A1

    公开(公告)日：2011-04-07

    申请号：US12968150

    申请日：2010-12-14

    申请人： Ming Fang ,  Fuchao Wang

    发明人： Ming Fang ,  Fuchao Wang

    IPC分类号： H05B3/82 ,  B23P19/04

    CPC分类号： B81C1/00119 ,  B41J2/14056 ,  B41J2/14072 ,  B41J2/14137 ,  B41J2/16 ,  B41J2/1601 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1639 ,  B81B1/006 ,  B81B2201/052 ,  B81B2201/058 ,  B81C2201/013 ,  B81C2203/075 ,  H01L28/20 ,  Y10T29/41 ,  Y10T29/49401 ,  Y10T29/49826

    摘要： An integrated semiconductor heating assembly includes a semiconductor substrate, a chamber formed therein, and an exit port in fluid communication with the chamber, allowing fluid to exit the chamber in response to heating the chamber. The integrated heating assembly includes a first heating element adjacent the chamber, which can generate heat above a selected threshold and bias fluid in the chamber toward the exit port. A second heating element is positioned adjacent the exit port to generate heat above a selected threshold, facilitating movement of the fluid through the exit port away from the chamber. Addition of the second heating element reduces the amount of heat emitted per heating element and minimizes thickness of a heat absorption material toward an open end of the exit port. Since such material is expensive, this reduces the manufacturing cost and retail price of the assembly while improving efficiency and longevity thereof.

    摘要翻译： 集成半导体加热组件包括半导体衬底，形成在其中的腔室以及与腔室流体连通的出口，允许流体响应于加热室而离开腔室。 集成加热组件包括邻近腔室的第一加热元件，该第一加热元件可以产生高于选定阈值的热量，并将腔室中的流体朝向出口偏压。 第二加热元件邻近出口定位以产生高于所选阈值的热量，便于流体通过出口远离腔室的运动。 添加第二加热元件减少了每个加热元件发出的热量，并使吸热材料的厚度最小化到出口的开口端。 由于这样的材料是昂贵的，所以这降低了组件的制造成本和零售价格，同时提高了其效率和使用寿命。

    METHOD TO FORM A RECESS FOR A MICROFLUIDIC DEVICE
    24.
    发明申请
    METHOD TO FORM A RECESS FOR A MICROFLUIDIC DEVICE 有权
    形成微流体装置的记录方法

    公开(公告)号：US20100163517A1

    公开(公告)日：2010-07-01

    申请号：US12422732

    申请日：2009-04-13

    申请人： Fuchao Wang ,  Ming Fang

    发明人： Fuchao Wang ,  Ming Fang

    IPC分类号： B44C1/22

    CPC分类号： B41J2/1601 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1639 ,  B41J2202/13 ,  B41J2202/16

    摘要： A method includes forming a recess in a first surface of a substrate, the recess having a width, depth, and height selected to correspond to a width, depth, and height of a fluid chamber, forming a sacrificial material in the recess, forming a first heater element, forming a metal layer overlying the first heater element, and forming a nozzle opening in the metal layer to expose the sacrificial material. The method also includes forming a path from a second surface of the substrate to expose the sacrificial material and removing the sacrificial material from the recess to expose the chamber with the selected width, depth, and height, the chamber in fluid communication with the path, the nozzle opening, and a surrounding environment.

    摘要翻译： 一种方法包括在基板的第一表面中形成凹槽，所述凹槽具有选定为对应于流体室的宽度，深度和高度的宽度，深度和高度，在凹槽中形成牺牲材料，形成凹陷 第一加热器元件，形成覆盖在第一加热器元件上的金属层，以及在金属层中形成喷嘴开口以露出牺牲材料。 该方法还包括从衬底的第二表面形成路径以暴露牺牲材料并从凹部移除牺牲材料，以使选定的宽度，深度和高度暴露腔室，该腔室与路径流体连通， 喷嘴开口和周围环境。

    MICROFLUIDIC NOZZLE FORMATION AND PROCESS FLOW
    25.
    发明申请
    MICROFLUIDIC NOZZLE FORMATION AND PROCESS FLOW 有权
    微流化喷嘴形成和工艺流程

    公开(公告)号：US20100163116A1

    公开(公告)日：2010-07-01

    申请号：US12422690

    申请日：2009-04-13

    申请人： Ming Fang ,  Fuchao Wang

    发明人： Ming Fang ,  Fuchao Wang

    IPC分类号： F16L53/00 ,  B44C1/22

    CPC分类号： B41J2/1601 ,  B41J2/14056 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1646 ,  B41J2002/1437 ,  B41J2202/16 ,  Y10T137/6416

    摘要： A method that includes forming a chamber in a substrate, forming a silicon layer overlying the chamber, etching the silicon layer to remove selected regions and retain a selected portion overlying the chamber, the selected portion being at a location and having dimensions that correspond to a location and to dimensions of a nozzle, and forming a first metal layer adjacent to the selected portion. The method also includes forming a path in the substrate to expose the chamber concurrently with removing the selected portion of the silicon layer to expose the nozzle, the nozzle being in fluid communication with the path, the chamber, and a surrounding environment.

    摘要翻译： 一种方法，其包括在衬底中形成腔室，形成覆盖在所述腔室上的硅层，蚀刻所述硅层以去除所选择的区域并且保持覆盖所述腔室的选定部分，所述选定部分位于并且具有对应于 位置和尺寸，以及形成与选定部分相邻的第一金属层。 该方法还包括在衬底中形成路径以同时去除硅层的选定部分以暴露喷嘴，喷嘴与路径，腔室和周围环境流体连通。

    Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system
    27.
    发明授权
    Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system 有权
    防止EUV光刻系统中反射镜和电极的锡污染的技术

    公开(公告)号：US07567379B2

    公开(公告)日：2009-07-28

    申请号：US10835867

    申请日：2004-04-29

    申请人： Robert Bristol ,  Bryan J. Rice ,  Ming Fang ,  John P. Barnak ,  Melissa Shell

    发明人： Robert Bristol ,  Bryan J. Rice ,  Ming Fang ,  John P. Barnak ,  Melissa Shell

    IPC分类号： F21V9/04

    CPC分类号： G03F7/70958 ,  C23C14/083 ,  C23C14/165 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/067

    摘要： Passivation coatings and gettering agents may be used in an Extreme Ultraviolet (EUV) source which uses tin (Sn) vapor as a plasma “fuel” to prevent contamination and corresponding loss of reflectivity due to tin contamination. The passivation coating may be a material to which tin does not adhere, and may be placed on reflective surfaces in the source chamber. The gettering agent may be a material that reacts strongly with tin, and may be placed outside of the collector mirrors and/or on non-reflective surfaces. A passivation coating may also be provided on the insulator between the anode and cathode of the source electrodes to prevent shorting due to tin coating the insulator surface.

    摘要翻译： 钝化涂层和吸气剂可以用于使用锡（Sn）蒸气作为等离子体“燃料”的极紫外（EUV）源，以防止污染和相应的锡污染引起的反射率的损失。 钝化涂层可以是锡不粘附的材料，并且可以放置在源室中的反射表面上。 吸气剂可以是与锡强烈反应的材料，并且可以放置在集电镜和/或非反射表面之外。 也可以在源电极的阳极和阴极之间的绝缘体上提供钝化涂层，以防止由于涂覆绝缘体表面的锡而导致短路。

    UTILITY LIGHTER WITH A SAFTEY FEATURE
    28.
    发明申请
    UTILITY LIGHTER WITH A SAFTEY FEATURE 审中-公开
    实用型照明器具有一定的功能

    公开(公告)号：US20090061371A1

    公开(公告)日：2009-03-05

    申请号：US12052631

    申请日：2008-03-20

    申请人： Ming Fang

    发明人： Ming Fang

    IPC分类号： F23Q2/16 ,  F23D11/36 ,  F23Q2/00 ,  C10L11/00

    CPC分类号： F23Q2/164

    摘要： A utility lighter with a safety device having a trigger, a stop and a safety button. The trigger has a trigger engagement element and a lever. The trigger engagement element is capable of initiating the creation of a spark. The lever is capable of rotational movement about a point located on the trigger and has a lever stop. The safety button comprises a lever engagement portion. The lever has a first position where the lever stop is aligned with the stop and the lever stop will arrest the movement of the trigger preventing the creation of a spark and/or the release of fuel. Thus when a user applies force to the safety button, the lever engagement portion interacts with the lever. The lever engagement portion moves in a direction that is approximately transverse to the direction of movement of the trigger and urges the lever to a second position. When the lever is in the second position, the lever stop is out of alignment with the stop such that the movement of the trigger will not be arrested.

    摘要翻译： 具有安全装置的实用打火机具有触发器，止动器和安全按钮。 触发器具有触发器接合元件和杠杆。 触发器接合元件能够启动火花的产生。 杠杆能够围绕位于扳机上的点旋转运动并且具有杠杆止动件。 安全按钮包括杆接合部分。 杠杆具有第一位置，其中杆止动件与止动件对准，并且杆止动件将阻止扳机的运动，防止产生火花和/或释放燃料。 因此，当用户对安全按钮施加力时，杠杆接合部分与杠杆相互作用。 杠杆接合部分在大致横向于触发器的移动方向的方向上移动，并且将杆推动到第二位置。 当控制杆处于第二位置时，控制杆停止与停止件不对齐，使得触发器的移动不会被阻止。

    Cleaning liquid and cleaning method
    30.
    发明申请
    Cleaning liquid and cleaning method 审中-公开
    清洗液和清洗方法

    公开(公告)号：US20070099810A1

    公开(公告)日：2007-05-03

    申请号：US11259256

    申请日：2005-10-27

    申请人： Hiroshi Matsunaga ,  Masaru Ohto ,  Hiroshi Yoshida ,  Eiko Kuwabara ,  Ming Fang ,  Lourdes Dominguez

    发明人： Hiroshi Matsunaga ,  Masaru Ohto ,  Hiroshi Yoshida ,  Eiko Kuwabara ,  Ming Fang ,  Lourdes Dominguez

    IPC分类号： C11D3/395 ,  C11D17/00

    CPC分类号： C11D3/0073 ,  C11D3/044 ,  C11D3/43 ,  C11D7/06 ,  C11D7/5004

    摘要： A cleaning liquid which comprises at least one selected from potassium hydroxide or sodium hydroxide in an amount of 0.01 to 10% by weight, water-soluble organic solvent in an amount of 5 to 80% by weight, a corrosion inhibitor at least one selected from the group consisting of group IX metal of the Periodic Table, group IX metal alloy and group XI metal of the Periodic Table in an amount of 0.0001% by weight and water. The present provides a cleaning liquid and a cleaning method both capable of removing photoresists or its deposits and attached articles on the surface of treated substances such as organosiloxane-based anti-reflection film, configuration protective coat or so without corroding the treated substances, particularly low dielectric constant film, group IX metals of the Periodic Table and their alloy, and group XI metals of the Periodic Table.

    摘要翻译： 一种清洗液，其含有0.01〜10重量％的氢氧化钾或氢氧化钠中的至少1种，5〜80重量％的水溶性有机溶剂，至少1种选自 由元素周期表第IX族金属，第IX族金属合金和元素周期表第XI族金属组成的组为0.0001％（重量）和水。 本发明提供一种能够除去光致抗蚀剂或其沉积物和附着物品的清洗液和清洁方法，例如在有机硅氧烷类防反射膜，构型保护层等的表面处理，而不会腐蚀处理物质，特别是低 介电常数薄膜，元素周期表第IX族金属及其合金，以及元素周期表第XI族金属。