公开(公告)号：US4473750A

公开(公告)日：1984-09-25

申请号：US236512

申请日：1981-07-24

申请人： Yoshitada Oshida ,  Yoichi Kawata ,  Shinobu Watanabe ,  Noboru Umehara ,  Kenichi Isoda

发明人： Yoshitada Oshida ,  Yoichi Kawata ,  Shinobu Watanabe ,  Noboru Umehara ,  Kenichi Isoda

IPC分类号： G01B11/24 ,  G01N21/86

CPC分类号： G01B11/24

摘要： A three-dimensional shape measuring device comprises a light beam condensing and irradiating system for irradiating a light beam to an object at a fixed angle .theta. and converging the light beam to a desired minimum diameter at a point A on an optical axis of the light beam, an imaging optical system having an optical axis having an angle .phi. different from the angle .theta. and including the point A on the optical axis thereof, for focusing the point A on an effectively constant aperture of a detecting light screen or on a small area, aperture-transmitted light detecting means or photo-electric converter means for detecting light transmitted through the aperture or the small area, detecting position changing means for changing a relative position between the object and the point A, maximum value detecting means for detecting a maximum value of the signal detected by the aperture-transmitted light detecting means or the photo-electric converter means and detection means for detecting a change in the detecting position caused by the detecting position changing means at a time when the maximum value detecting means detects the maximum value. The change in the detecting position is sequentially detected by the detecting means for each of a plurality of points on the surface of the object to measure the three-dimensional shape of the object.

摘要翻译： 三维形状测量装置包括光束聚光和照射系统，用于以固定角度θ将光束照射到物体，并将光束会聚在光束的光轴上的点A处的期望的最小直径 成像光学系统，其光轴具有与角度θ不同的角度，并且包括其光轴上的点A，用于将点A聚焦在检测光屏的有效恒定的孔上或小区域上， 孔径透过光检测装置或光电转换装置，用于检测透过孔径或小区域的光;检测位置改变装置，用于改变物体与点A之间的相对位置;最大值检测装置，用于检测最大值 由光圈透射光检测装置或光电转换装置检测的信号和检测ac的检测装置 在最大值检测装置检测到最大值时，由检测位置改变装置引起的检测位置的变化。 通过检测装置对物体表面上的多个点中的每个点依次检测检测位置的变化，以测量物体的三维形状。

公开(公告)号：US07969636B2

公开(公告)日：2011-06-28

申请号：US12191684

申请日：2008-08-14

申请人： Yoshitatsu Naito ,  Yoshitada Oshida ,  Mitsuhiro Suzuki

发明人： Yoshitatsu Naito ,  Yoshitada Oshida ,  Mitsuhiro Suzuki

IPC分类号： G02B26/08

CPC分类号： G03F7/2006 ,  G03F7/70383

摘要： A laser direct imaging apparatus which can expose photosensitive materials having various sensitivities and which can correct an imaging position in accordance with deformation of a workpiece. In the laser direct imaging apparatus, the workpiece is moved in a sub-scanning direction while a cylindrical lens is used to converge a laser beam, which has been modulated based on raster data, in the sub-scanning direction and deflect the laser beam toward a main scanning direction so as to image a desired pattern on the workpiece. The cylindrical axis of the cylindrical lens is designed to be able to rotate horizontally and to be able to change an angle with respect to the main scanning direction.

摘要翻译： 一种激光直接成像装置，其可以暴露具有各种灵敏度并且可以根据工件的变形校正成像位置的感光材料。 在激光直接成像装置中，工件在副扫描方向上移动，同时使用柱面透镜在副扫描方向上将基于光栅数据调制的激光束会聚在一起，并将激光束朝向 主扫描方向，以便对工件上的期望图案进行成像。 柱面透镜的圆柱轴被设计成能够水平旋转并且能够相对于主扫描方向改变角度。

公开(公告)号：US07372478B2

公开(公告)日：2008-05-13

申请号：US11075245

申请日：2005-03-09

申请人： Yoshitada Oshida ,  Yoshitatsu Naito ,  Mituhiro Suzuki ,  Bunji Uchiyama ,  Tsuyoshi Yamaguchi

发明人： Yoshitada Oshida ,  Yoshitatsu Naito ,  Mituhiro Suzuki ,  Bunji Uchiyama ,  Tsuyoshi Yamaguchi

IPC分类号： B41J2/47 ,  G03B27/54

CPC分类号： G03F7/70791 ,  G02B26/123 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/70466

摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

摘要翻译： 图案曝光方法和图案曝光装置，其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向，而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下，使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下，每个激光器的波长可以不超过410nm。

公开(公告)号：US07064813B2

公开(公告)日：2006-06-20

申请号：US10253479

申请日：2002-09-25

申请人： Satoshi Takahashi ,  Kenji Yasuda ,  Yoshitada Oshida ,  Taisaku Seino

发明人： Satoshi Takahashi ,  Kenji Yasuda ,  Yoshitada Oshida ,  Taisaku Seino

IPC分类号： G01N21/00

CPC分类号： G01N1/312

摘要： Disclosed is an apparatus for measuring a micro area in a specimen in which a reagent necessary for observation and examination of a cell smear specimen or a tissue specimen is dropped to cause a reaction for a measurement and an analysis by way of an image. The apparatus includes: a micro reaction unit that is able to select a specific micro area in the specimen and to subject the specific micro area to a reaction-operation; a unit that measures; records and displays an image of the micro area; and a control unit that controls the measuring, recording, and displaying unit. Reactions can be effected quickly on such specimens as smear cell specimens and tissue slice specimens. The application of the reagent solution can be saved. A comparison between local presence of a gene or anti-body and a cell image can be made quickly and easily.

摘要翻译： 公开了一种用于测量样本中的微小区域的装置，其中用于观察和检查细胞涂片或组织样本的试剂下降以引起测量反应和通过图像进行分析。 该装置包括：微反应单元，其能够选择样品中的特定微区域并使特定微区域进行反应操作; 衡量单位 记录并显示微区图像; 以及控制单元，其控制测量，记录和显示单元。 反应可以在诸如涂片细胞标本和组织切片标本的样品上快速实现。 可以节省试剂溶液的应用。 基因或抗体的局部存在与细胞图像的比较可以快速且容易地进行。

公开(公告)号：US20050196705A1

公开(公告)日：2005-09-08

申请号：US11117493

申请日：2005-04-29

申请人： Minori Noguchi ,  Yukio Kenbo ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiro Yoshitaka ,  Makoto Murayama

发明人： Minori Noguchi ,  Yukio Kenbo ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiro Yoshitaka ,  Makoto Murayama

IPC分类号： G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03C5/00

CPC分类号： G03F7/705 ,  G03F7/2002 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70308 ,  G03F7/70591 ,  Y10S430/146

摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.

摘要翻译： 一种半导体器件的制造方法，包括以下步骤：通过在半导体器件的衬底上投射光图案来曝光涂覆在半导体器件的衬底上的抗蚀剂的步骤，使由光图案曝光的抗蚀剂显影以形成具有 并且蚀刻其上形成有抗蚀剂的晶片图案的基板。 在曝光的步骤中，通过用具有环形形状的准分子激光照射掩模形成光图案。

公开(公告)号：US20050191583A1

公开(公告)日：2005-09-01

申请号：US11117492

申请日：2005-04-29

申请人： Minori Noguchi ,  Yukio Kenbo ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiro Yoshitaka ,  Makoto Murayama

发明人： Minori Noguchi ,  Yukio Kenbo ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiro Yoshitaka ,  Makoto Murayama

IPC分类号： G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03F7/00

CPC分类号： G03F7/705 ,  G03F7/2002 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70308 ,  G03F7/70591 ,  Y10S430/146

摘要： A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device through an object lens, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing, the light pattern projected on the substrate is formed by excimer laser light which is emitted from an annular shaped light source and which is passed through a mask having a phase shifter.

摘要翻译： 一种半导体器件的制造方法，包括以下步骤：通过物镜将半导体器件的基板上的光图案投射到半导体器件的基板上，使其抗蚀剂曝光，使由光图形曝光的抗蚀剂显影形成 具有抗蚀剂的晶片图案，并且蚀刻其上形成有抗蚀剂的晶片图案的基板。 在曝光的步骤中，投射在基板上的光图案由从环形光源发射并通过具有移相器的掩模的准分子激光形成。

公开(公告)号：US06455944B1

公开(公告)日：2002-09-24

申请号：US08523994

申请日：1995-09-05

申请人： Takeshi Kato ,  Tatsuo Teraoka ,  Satoru Kikuchi ,  Masahiro Aoki ,  Yoshitada Oshida

发明人： Takeshi Kato ,  Tatsuo Teraoka ,  Satoru Kikuchi ,  Masahiro Aoki ,  Yoshitada Oshida

IPC分类号： H01L23544

CPC分类号： G02B6/4224

摘要： An optical assembly has a substrate and an optical device chip. On mutually opposed surfaces of the optical device chip and the substrate, indexes having slope faces are formed. Index passage alignment is performed by using the indexes as positioning reference and by using image measurement.

摘要翻译： 光学组件具有基板和光学器件芯片。 在光学元件芯片和基板的彼此相对的表面上形成具有斜面的指标。 通过使用索引作为定位参考并通过使用图像测量来执行索引通道对准。

公开(公告)号：US5684565A

公开(公告)日：1997-11-04

申请号：US304586

申请日：1994-09-12

申请人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

发明人： Yoshitada Oshida ,  Hisafumi Iwata ,  Yasuhiro Yoshitake ,  Minoru Yoshida ,  Yukihiro Shibata

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F9/7065

摘要： A method and apparatus is disclosed for detecting a pattern image of each of a plurality of patterns on the surface of an object. Light emitted from either a light source including a wide wavelength or a light source including a plurality of monowavelengths is applied to the object. The object includes a layered structure having a plurality of layers, wherein at least a part of an uppermost layer of the object is optically transparent. Spectral illumination intensity characteristics of the light emitted from the light source is varied, depending on information about both the layered structure of the object, and a material of the object to obtain a desired spectral illumination intensity, and a pattern image of each of patterns is detected as either a one-dimensional or a two-dimensional image based on light reflected from the object.

摘要翻译： 公开了一种用于检测物体表面上的多个图案中的每一个的图案图像的方法和装置。 从包括宽波长的光源或包括多个单波长的光源发射的光被施加到物体。 该物体包括具有多个层的分层结构，其中物体的最上层的至少一部分是光学透明的。 根据关于物体的分层结构和物体的材料的信息，从光源发射的光的光谱照度强度特性是变化的，以获得期望的光谱照度，并且每个图案的图案图像是 基于从对象反射的光被检测为一维或二维图像。

公开(公告)号：US5329333A

公开(公告)日：1994-07-12

申请号：US846158

申请日：1992-03-05

申请人： Minori Noguchi ,  Yukio Kenbo ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiro Yoshitaka ,  Makoto Murayama

发明人： Minori Noguchi ,  Yukio Kenbo ,  Yoshitada Oshida ,  Masataka Shiba ,  Yasuhiro Yoshitaka ,  Makoto Murayama

IPC分类号： G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/705 ,  G03F7/2002 ,  G03F7/701 ,  G03F7/70125 ,  G03F7/70308 ,  G03F7/70591 ,  Y10S430/146

摘要： An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.

摘要翻译： 一种曝光装置和方法，其中用光和光照射掩模，将透射通过和从照射的掩模反射的透镜装置成像到基板上。 至少在成像期间，部分地抑制从被照射的掩模发射和反射的光的透射。 更具体地，利用空间滤波器来抑制O级衍射光的至少一部分。

公开(公告)号：US5302999A

公开(公告)日：1994-04-12

申请号：US9928

申请日：1993-01-27

申请人： Yoshitada Oshida ,  Tutomu Tawa ,  Yukihiro Shibata ,  Shigemi Ishii ,  Minori Noguchi ,  Tsuneo Terasawa ,  Makoto Murayama

发明人： Yoshitada Oshida ,  Tutomu Tawa ,  Yukihiro Shibata ,  Shigemi Ishii ,  Minori Noguchi ,  Tsuneo Terasawa ,  Makoto Murayama

IPC分类号： F21V8/00 ,  F21V13/12 ,  F21Y105/00 ,  G02B6/04 ,  G02B6/28 ,  G02B6/42 ,  G03B27/54 ,  G03F7/20 ,  G21K5/04 ,  G03B27/00

CPC分类号： G03F7/70058 ,  F21V13/12 ,  G02B6/0008 ,  G02B6/04 ,  G02B6/2808 ,  G02B6/4296 ,  G03F7/2057

摘要： A projection exposure apparatus comprises a light source for emitting a light beam for exposure; an illumination optical system comprising optical fiber bundle portion including a plurality of bundled optical fibers having an entrance plane to which a light beam exiting from the exposing light source is incident, and a little optical fiber bundle portion including a plurality of little optical fiber bundles respectively having an outgoing plane; and an projection exposure system for projecting a light beam passing through the illumination optical system and transmitting a mask or a reticle onto an object to be exposed as a pattern image of the mask or the reticle.

摘要翻译： 投影曝光装置包括用于发射用于曝光的光束的光源; 一种照明光学系统，包括光纤束部分，该光纤束部分包括具有入射面的多个束状光纤，从该曝光光源射出的光束入射到该入射面，以及分别包括多个小光纤束的小光纤束部分 有一个出局的飞机; 以及投影曝光系统，用于投影通过照明光学系统的光束，并将掩模或掩模版传送到待曝光的物体上作为掩模或掩模版的图案图像。