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公开(公告)号：US07969636B2
公开(公告)日：2011-06-28
申请号：US12191684
申请日：2008-08-14
IPC分类号： G02B26/08
CPC分类号： G03F7/2006 , G03F7/70383
摘要： A laser direct imaging apparatus which can expose photosensitive materials having various sensitivities and which can correct an imaging position in accordance with deformation of a workpiece. In the laser direct imaging apparatus, the workpiece is moved in a sub-scanning direction while a cylindrical lens is used to converge a laser beam, which has been modulated based on raster data, in the sub-scanning direction and deflect the laser beam toward a main scanning direction so as to image a desired pattern on the workpiece. The cylindrical axis of the cylindrical lens is designed to be able to rotate horizontally and to be able to change an angle with respect to the main scanning direction.
摘要翻译： 一种激光直接成像装置，其可以暴露具有各种灵敏度并且可以根据工件的变形校正成像位置的感光材料。 在激光直接成像装置中，工件在副扫描方向上移动，同时使用柱面透镜在副扫描方向上将基于光栅数据调制的激光束会聚在一起，并将激光束朝向 主扫描方向，以便对工件上的期望图案进行成像。 柱面透镜的圆柱轴被设计成能够水平旋转并且能够相对于主扫描方向改变角度。
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公开(公告)号：US20060215139A1
公开(公告)日：2006-09-28
申请号：US11353017
申请日：2006-02-14
申请人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
发明人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
IPC分类号： G03B27/52
CPC分类号： G02B26/12 , G02B26/123 , G03F7/70383 , G03F7/70466 , G03F7/70575 , G03F7/70791
摘要： A maskless exposure method and a maskless exposure apparatus in which maskless exposure can be performed efficiently with high-directivity illumination light, while the exposure efficiency of solder resist can be improved. Blue-violet semiconductor lasers 12A emitting laser beams 1a with a wavelength of 405 nm and ultraviolet semiconductor lasers 12B emitting laser beams 1b with a wavelength of 375 nm are provided to irradiate a substrate 8 with the laser beams 1a and 1b whose optical axes are made coaxial. In this event, one and the same place on the substrate 8 is irradiated with the laser beams 1a and 1b a plurality of times. Thus, the variation in intensity of the laser beams 1a and 1b is averaged.
摘要翻译： 可以通过高方向性照明光有效地进行无掩模曝光的无掩模曝光方法和无掩模曝光装置，同时可以提高阻焊剂的曝光效率。 提供波长为405nm的蓝紫色半导体激光器12A和发射波长为375nm的激光束1b的紫外半导体激光器12B以激光束1a和1照射基板8 b的光轴是同轴的。 在这种情况下，多次地用激光束1a和1b照射基板8上的同一个位置。 因此，激光束1a和1b的强度变化是平均的。
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公开(公告)号：US20080213705A1
公开(公告)日：2008-09-04
申请号：US12098089
申请日：2008-04-04
CPC分类号： G03F7/70791 , G02B26/123 , G03F7/70383 , G03F7/70391 , G03F7/70466
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.
摘要翻译： 图案曝光方法和图案曝光装置，其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向，而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下，使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下，每个激光器的波长可以不超过410nm。
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4.发明申请Device for Changing Pitch Between Light Beam Axes, and Substrate Exposure Apparatus 有权用于改变光束轴之间的间距的装置和基板曝光装置公开(公告)号：US20070279609A1
公开(公告)日：2007-12-06
申请号：US11755361
申请日：2007-05-30
申请人： Yoshitada OSHIDA , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
发明人： Yoshitada OSHIDA , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G02B5/045 , G02B17/04 , G02B26/12 , G03F7/7005 , G03F7/70391 , G03F7/704
摘要： A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.
摘要翻译： 在xy方向上具有平行四边形横截面的棱镜的平行玻璃和在xy方向上具有平行四边形横截面的棱镜的平行玻璃，每个平行玻璃包括在垂直于xy方向的az方向的一个表面中形成的凹槽 xy方向彼此直接接触地堆叠，使得凹槽位于内侧，并且试图进入凹槽的光被全反射，从而将具有13mm间距的入射平行光束改变为具有 间距为1毫米。
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公开(公告)号：US20050219496A1
公开(公告)日：2005-10-06
申请号：US11075245
申请日：2005-03-09
CPC分类号： G03F7/70791 , G02B26/123 , G03F7/70383 , G03F7/70391 , G03F7/70466
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.
摘要翻译： 图案曝光方法和图案曝光装置，其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向，而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下，使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下，每个激光器的波长可以不超过410nm。
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6.发明授权Device for changing pitch between light beam axes, and substrate exposure apparatus 有权用于改变光束轴之间的间距的装置和基板曝光装置公开(公告)号：US08089614B2
公开(公告)日：2012-01-03
申请号：US11755361
申请日：2007-05-30
申请人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
发明人： Yoshitada Oshida , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
IPC分类号： G03B27/53
CPC分类号： G03F7/70791 , G02B5/045 , G02B17/04 , G02B26/12 , G03F7/7005 , G03F7/70391 , G03F7/704
摘要： A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.
摘要翻译： 在xy方向上具有平行四边形横截面的棱镜的平行玻璃和在xy方向上具有平行四边形横截面的棱镜的平行玻璃，每个平行玻璃包括在垂直于xy方向的az方向的一个表面中形成的凹槽 xy方向彼此直接接触地堆叠，使得凹槽位于内侧，并且试图进入凹槽的光被全反射，从而将具有13mm间距的入射平行光束改变为具有 间距为1毫米。
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公开(公告)号：US07372478B2
公开(公告)日：2008-05-13
申请号：US11075245
申请日：2005-03-09
CPC分类号： G03F7/70791 , G02B26/123 , G03F7/70383 , G03F7/70391 , G03F7/70466
摘要： A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.
摘要翻译： 图案曝光方法和图案曝光装置，其中通过廉价的装置提高生产量并且没有低的运行成本。 从多个半导体激光器分别发射的多个激光束的输出面分别布置在两个方向上。 方向之一是与多面镜的扫描方向相同的方向，而另一方向是与多面镜的扫描方向交叉的方向。 在这种情况下，使排列在与多面镜的扫描方向交叉的方向上的输出面的阵列间距等于曝光图案的分辨率。 在这种情况下，每个激光器的波长可以不超过410nm。
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公开(公告)号：US20090086009A1
公开(公告)日：2009-04-02
申请号：US12191901
申请日：2008-08-14
IPC分类号： B41J2/47
CPC分类号： H05K3/0082 , G03F7/2053 , G03F9/00 , H05K1/0269 , H05K3/0008 , H05K2201/091 , H05K2201/09918 , H05K2203/082 , H05K2203/107 , H05K2203/1563 , H05K2203/1572 , H05K2203/167
摘要： A laser beam direct imaging apparatus and an imaging method which can precisely determine a back-surface-side position with respect to a front-surface-side position even if any kind of photosensitive material is used. In the laser direct imaging apparatus, a laser beam is deflected toward a main scanning direction (X-axis direction) while a workpiece mounted on a table is moved in a sub-scanning direction (Y-axis direction) so that a pattern is imaged on the surface of the workpiece. Hollow pins are disposed on the table so that the tips of the hollow pins 20 project over the surface of the table by a predetermined distance. The workpiece is sucked onto the table so that indentations (indentations by the tips of the hollow pins) are formed on the back surface of the workpiece. When a pattern is imaged on the back surface, imaging is performed with reference to the indentations.
摘要翻译： 即使使用任何种类的感光材料，也可以精确地确定相对于前表面侧位置的背面侧位置的激光束直接成像装置和成像方法。 在激光直接成像装置中，激光束朝向主扫描方向（X轴方向）偏转，同时安装在工作台上的工件沿副扫描方向（Y轴方向）移动，使得图案被成像 在工件表面。 空心销设置在桌子上，使得中空销20的尖端在桌子的表面上突出预定距离。 工件被吸入工作台上，使得在工件的后表面上形成有凹陷（由中空销的顶端压入）。 当在背面上成像图案时，参考凹痕进行成像。
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公开(公告)号：US06460755B1
公开(公告)日：2002-10-08
申请号：US08813577
申请日：1997-03-07
申请人： Kosuke Inoue , Takamichi Suzuki , Hitoshi Odashima , Katsuhiro Iwashita , Tatsuya Yoneda , Michiharu Honda , Katuhisa Tanaka , Tsuyoshi Yamaguchi , Tetsuo Murakami , Asahi Tsuchiya , Yoshitatsu Naito , Mitsuhiro Suzuki , Izumi Hata , Kouji Sajiki
发明人： Kosuke Inoue , Takamichi Suzuki , Hitoshi Odashima , Katsuhiro Iwashita , Tatsuya Yoneda , Michiharu Honda , Katuhisa Tanaka , Tsuyoshi Yamaguchi , Tetsuo Murakami , Asahi Tsuchiya , Yoshitatsu Naito , Mitsuhiro Suzuki , Izumi Hata , Kouji Sajiki
IPC分类号： B23K500
CPC分类号： H05K3/3478 , B23K3/0623 , B23K2101/40 , H01L21/4853 , H01L2224/05568 , H01L2224/05573 , H01L2224/056 , H01L2224/11334 , H01L2224/48091 , H01L2224/48227 , H01L2924/15311 , H01L2924/181 , H05K1/0269 , H05K3/3489 , H05K2203/0338 , H05K2203/041 , H05K2203/082 , H01L2924/00014 , H01L2924/00012
摘要： There are disclosed a solder bump forming method and an apparatus therefor, which achieve a high reliability, and an electronic part, produced by this method and this apparatus, is also disclosed. For each of the step of arraying solder balls, the step of supplying a flux, and the step of mounting the solder balls on a board, it is checked whether or not any solder ball is omitted, and the process is conducted while confirming the condition of the operation, thereby enhancing the reliability and also preventing defective products from being produced.
摘要翻译： 公开了一种实现高可靠性的焊料凸块形成方法及其装置，并且还公开了通过该方法和该装置制造的电子部件。 对于排列焊球的步骤，供给焊剂的步骤以及将焊球安装在板上的步骤，检查是否省略任何焊球，并且在确认条件的同时进行处理 的操作，从而提高可靠性并且还防止不良产品的生产。
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公开(公告)号：US08314825B2
公开(公告)日：2012-11-20
申请号：US12191901
申请日：2008-08-14
IPC分类号： B41J2/47
CPC分类号： H05K3/0082 , G03F7/2053 , G03F9/00 , H05K1/0269 , H05K3/0008 , H05K2201/091 , H05K2201/09918 , H05K2203/082 , H05K2203/107 , H05K2203/1563 , H05K2203/1572 , H05K2203/167
摘要： A laser beam direct imaging apparatus and an imaging method which can precisely determine a back-surface-side position with respect to a front-surface-side position even if any kind of photosensitive material is used. In the laser direct imaging apparatus, a laser beam is deflected toward a main scanning direction (X-axis direction) while a workpiece mounted on a table is moved in a sub-scanning direction (Y-axis direction) so that a pattern is imaged on the surface of the workpiece. Hollow pins are disposed on the table so that the tips of the hollow pins 20 project over the surface of the table by a predetermined distance. The workpiece is sucked onto the table so that indentations (indentations by the tips of the hollow pins) are formed on the back surface of the workpiece. When a pattern is imaged on the back surface, imaging is performed with reference to the indentations.
摘要翻译： 即使使用任何种类的感光材料，也可以精确地确定相对于前表面侧位置的背面侧位置的激光束直接成像装置和成像方法。 在激光直接成像装置中，激光束朝向主扫描方向（X轴方向）偏转，同时安装在工作台上的工件沿副扫描方向（Y轴方向）移动，使得图案被成像 在工件表面。 空心销设置在桌子上，使得中空销20的尖端在桌子的表面上突出预定距离。 工件被吸入工作台上，使得在工件的后表面上形成有凹陷（由中空销的顶端压入）。 当在背面上成像图案时，参考凹痕进行成像。
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