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    Method for the operation of an electron beam
    21.
    发明申请
    Method for the operation of an electron beam 有权

    公开(公告)号：US20010016237A1

    公开(公告)日：2001-08-23

    申请号：US09750663

    申请日：2001-01-02

    Inventor： Martin Bahr ,  Erik Laux

    IPC: C23C008/00

    CPC classification number: H01J37/302 ,  H01J37/3053 ,  H01J2237/30483 ,  H01J2237/3132

    Abstract: A method is disclosed for the operation of a high-power electron beam for the vaporization of materials in a target. With this method, static and dynamic deflection errors are corrected. First, the static and dynamic deflection errors are ascertained by means of a teach-in process for concrete spatial coordinates and concrete frequencies of the deflection currents and stored in a memory. For the later operation, this stored data is used in such a way that input geometric data for the incidence points of the electron beam is automatically recalculated into corrected current values which bring about the exact incidence onto the input points. A corresponding procedure takes place with the input of frequencies for the deflection current. The input frequencies are automatically corrected in terms of frequency and amplitude in order to eliminate the frequency-dependent attenuation effects. Both in the correction of the static and in the correction of the dynamic deflection errors it is guaranteed by suitable interpolation methods that even the spatial coordinates and frequencies not considered in the teach-in process are taken into account. Finally, a method is specified with which it is possible by mere specification of a power distribution on a crucible surface to control the electron beam such that the specified data is satisfied.

    APPARATUS AND METHOD FOR ELECTION BEAM EVAPORATION
    22.
    发明申请
    APPARATUS AND METHOD FOR ELECTION BEAM EVAPORATION 失效
    选择波束蒸发的装置和方法

    公开(公告)号：US20010006708A1

    公开(公告)日：2001-07-05

    申请号：US08876887

    申请日：1997-06-16

    Inventor： STEFAN LOCHER ,  ECKHARD WIRTH

    IPC: C23C016/50

    CPC classification number: H01J37/3053 ,  H01J2237/3132

    Abstract: An electron beam evaporator, which is formed of the component assemblies: beam generator, deflection system and water-cooled crucible/rotary crucible, is fastened on the cover plate of a flat hollow body. The hollow body is placed gas-tight on a bore in the tank and can be turned about the main axis of the bore. The interior of the hollow body is connected with atmosphere through the bore. All connecting lines for water, low-voltage current, high voltage and rotary drive are carried in the hollow body to the component assemblies which are mounted gas-tight.

    Abstract translation: 电子束蒸发器由组件组件形成：光束发生器，偏转系统和水冷坩埚/旋转坩埚，紧固在平坦的中空体的盖板上。 中空体气密地放置在罐中的孔中，并且可以围绕孔的主轴线转动。 中空体的内部通过孔连接大气。 所有用于水，低压电流，高压和旋转驱动的连接线都在空心体中承载到气密安装的部件组件上。

    Evaporator crucible and improved method for performing electron-beam evaporation
    23.
    发明授权
    Evaporator crucible and improved method for performing electron-beam evaporation 失效
    蒸发器坩埚和改进的电子束蒸发方法

    公开(公告)号：US5878074A

    公开(公告)日：1999-03-02

    申请号：US904098

    申请日：1997-07-31

    Applicant: Barry S. Buchanan ,  Frances Deemer ,  Lloyd G. Walton

    Inventor： Barry S. Buchanan ,  Frances Deemer ,  Lloyd G. Walton

    IPC: C23C14/24 ,  H01J37/305

    CPC classification number: H01J37/3053 ,  C23C14/243 ,  H01J2237/3132

    Abstract: A crucible is disclosed for use in coating a substrate with deposition materials by electron-beam evaporation. The crucible is configured to be inserted into an evaporator pot; it has a bottom and at least one sidewall extending upwardly from the bottom and terminating in a rim, such that the bottom and sidewall define a reservoir for containing the deposition material, and the rim defines a mouth out of which the deposition material may evaporate. A lip extends upwardly from a predetermined section of the rim which shields the spattering of deposition of material onto the evaporator pot during the evaporation process. A improved method is also disclosed for performing electron-beam evaporation with the present invention crucible.

    Abstract translation: 公开了一种用于通过电子束蒸发用沉积材料涂覆衬底的坩埚。 坩埚被配置成插入蒸发器罐中; 它具有从底部向上延伸并终止在边缘中的底部和至少一个侧壁，使得底部和侧壁限定用于容纳沉积材料的储存器，并且边缘限定出沉积材料可以蒸发的口。 唇缘从边缘的预定部分向上延伸，其在蒸发过程期间将材料的沉积物溅射到蒸发器罐上。 还公开了一种用本发明的坩埚进行电子束蒸发的改进方法。

    Process and apparatus for the production of a metal oxide layer
    24.
    发明授权
    Process and apparatus for the production of a metal oxide layer 失效
    用于生产金属氧化物层的方法和设备

    公开(公告)号：US5618575A

    公开(公告)日：1997-04-08

    申请号：US427658

    申请日：1995-04-21

    Applicant: Gunter Peter

    Inventor： Gunter Peter

    IPC: C23C14/30 ,  C23C14/00 ,  C23C14/54 ,  H01L21/316 ,  C23C14/08 ,  C23C16/00

    CPC classification number: C23C14/54 ,  C23C14/0021 ,  H01J2237/182 ,  H01J2237/2001 ,  H01J2237/3132

    Abstract: A process and apparatus for producing a metal oxide layer which is selectively permeable to ions of a given class, comprises evacuating a vacuum chamber, evaporating metal particles in the chamber and imparting to the particles kinetic energy which is at 10 eV maximum, introducing oxygen into the chamber with a quantity of oxygen being controlled to deposit a metal oxide on a substrate in the chamber, while the substrate is maintained below 900.degree. C.

    Abstract translation: 用于生产选择性地渗透给定类别的离子的金属氧化物层的方法和装置包括抽空真空室，蒸发室中的金属颗粒并赋予颗粒最大10eV的动能，将氧气引入 在将基底保持在900℃以下的状态下，控制具有一定量的氧气的腔室，以将金属氧化物沉积在腔室中的基底上。

    Electron jet vapor deposition system
    25.
    发明授权
    Electron jet vapor deposition system 失效
    电子射流气相沉积系统

    公开(公告)号：US5571332A

    公开(公告)日：1996-11-05

    申请号：US386705

    申请日：1995-02-10

    Applicant: Bret Halpern

    Inventor： Bret Halpern

    IPC: C23C14/22 ,  C23C14/32 ,  H01J37/305 ,  C23C16/00

    CPC classification number: C23C14/228 ,  C23C14/22 ,  C23C14/32 ,  H01J37/3053 ,  H01J2237/3132

    Abstract: A gas jet film deposition system includes a source of thermionically emitted electrons which are accelerated through carrier gas and generate He ions by impact ionization. The resultant electron avalanching and multiplication generates an extremely dense plasma, and produces large electron currents. The electron current is collected at a free, high electric field end of a crucible. The present system can generate vaporized evaporant which is entrained in the gas jet and thereby provide a high density source of ions. The ions may be presented to a substrate together with or without the evaporant.

    Abstract translation: 气体喷射膜沉积系统包括通过载气加速并通过冲击电离产生He离子的热离子发射电子源。 产生的电子雪崩和相乘产生非常致密的等离子体，并产生大的电子电流。 在坩埚的自由，高电场端收集电子电流。 本发明的系统可以产生汽化的蒸气，其被夹带在气体射流中，从而提供高密度的离子源。 离子可以与蒸发剂一起或不与蒸发器一起呈现给基底。

    Plasma Driven Particle Propagation Apparatus and Pumping Method
    27.
    发明申请
    Plasma Driven Particle Propagation Apparatus and Pumping Method 审中-公开

    公开(公告)号：US20180190471A1

    公开(公告)日：2018-07-05

    申请号：US15738634

    申请日：2016-06-21

    Applicant: Aurora Labs Limited

    Inventor： David Budge

    IPC: H01J37/301 ,  H01J37/305 ,  H05H1/24

    CPC classification number: H01J37/301 ,  H01J37/305 ,  H01J2237/3132 ,  H05H1/2406 ,  H05H1/54 ,  H05H2001/2412

    Abstract: A charged particle propagation apparatus has a generator including a vacuum chamber with a gun therein for discharging a charged particle beam through a beam exit. A higher pressure region adjoins the vacuum chamber at the beam exit and is maintainable at a pressure greater than a pressure of the vacuum chamber. A plasma interface located at the beam exit includes a plasma channel having at least three electrode plates disposed between its first end and its second end. A control system is adapted to apply a sequence of electrical currents to the electrode plates, which cause at least one plasma to move from the first end to the second end of the plasma channel, thereby pumping down the beam exit, and, in use, the charged particle beam is propagated from the vacuum chamber through the, or each, plasma into the higher pressure region.

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