Arrangement for regulating the operating parameters of an electron beam generator
    21.
    发明授权
    Arrangement for regulating the operating parameters of an electron beam generator 失效
    用于调节电子束发生器的工作参数的布置

    公开(公告)号:US3909662A

    公开(公告)日:1975-09-30

    申请号:US47039474

    申请日:1974-05-16

    CPC classification number: G05F1/44 H01J37/241

    Abstract: An arrangement for regulating the operating parameters of an electron beam generator in which the main cathode is indirectly heated by a directly-heated auxiliary cathode. A regulating circuit connected to the auxiliary cathode has three individual regulators connected in tandem for regulating the auxiliary cathode. Three separate signals corresponding to the heating current of the auxiliary cathode, the emission current of the auxiliary cathode, and the emission current of the main cathode are applied respectively to the inputs of the three individual regulators in feedback arrangement.

    Abstract translation: 用于调节电子束发生器的操作参数的装置,其中主阴极由直接加热的辅助阴极间接加热。 连接到辅助阴极的调节电路具有串联连接用于调节辅助阴极的三个单独调节器。 对应于辅助阴极的加热电流,辅助阴极的发射电流和主阴极的发射电流的三个独立信号分别应用于反馈布置中的三个单独调节器的输入。

    Plasma processing apparatus and control method

    公开(公告)号:US11830704B2

    公开(公告)日:2023-11-28

    申请号:US18101468

    申请日:2023-01-25

    Abstract: A plasma processing apparatus includes: a processing container; an electrode that places a workpiece thereon; a plasma generation source that supplies plasma into the processing container; a bias power supply that supplies a bias power to the electrode; an edge ring disposed at a periphery of the workpiece; a DC power supply that supplies a DC voltage to the edge ring; a controller that executes a first control procedure in which the DC voltage periodically repeats a first state having a first voltage value and a second state having a second voltage value, the first voltage value is supplied in a partial time period within each period of a potential of the electrode, and the second voltage value is supplied such that the first and second states are continuous.

    Charged Particle Beam Device
    25.
    发明公开

    公开(公告)号:US20230290606A1

    公开(公告)日:2023-09-14

    申请号:US18013952

    申请日:2020-07-07

    CPC classification number: H01J37/147 H01J37/14 H01J37/241 H01J37/244

    Abstract: Provided is a charged particle beam device that can impart a function of an energy filter to even a small BSE detector. The charged particle beam device includes a fluorescent substance that converts charged particles generated by irradiation of a sample with a charged particle beam into light; a detector that detects the light emitted from the fluorescent substance; a light guide element for guiding the light from the fluorescent substance to the detector; a light amount adjuster that adjusts the amount of light that is received by the detector through the fluorescent substance and the light guide element; and a control unit that controls the light amount adjuster.

    PLASMA PROCESSING APPARATUS AND CONTROL METHOD

    公开(公告)号:US20230162946A1

    公开(公告)日:2023-05-25

    申请号:US18101468

    申请日:2023-01-25

    Abstract: A plasma processing apparatus includes: a processing container; an electrode that places a workpiece thereon; a plasma generation source that supplies plasma into the processing container; a bias power supply that supplies a bias power to the electrode; an edge ring disposed at a periphery of the workpiece; a DC power supply that supplies a DC voltage to the edge ring; a controller that executes a first control procedure in which the DC voltage periodically repeats a first state having a first voltage value and a second state having a second voltage value, the first voltage value is supplied in a partial time period within each period of a potential of the electrode, and the second voltage value is supplied such that the first and second states are continuous.

    Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus
    27.
    发明授权
    Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus 有权
    用于校正加速电压漂移的方法,用于校正带电粒子束漂移的方法和带电粒子束写入装置

    公开(公告)号:US09508528B2

    公开(公告)日:2016-11-29

    申请号:US14838848

    申请日:2015-08-28

    Abstract: A method for correcting a drift of an accelerating voltage includes measuring, after a position of a focus of a charged particle beam has been adjusted based on a first adjustment value and a predetermined time period has passed, a second adjustment value when the position of the focus of the charged particle beam is newly adjusted, calculating a deviation amount between the first adjustment value and the second adjustment value, calculating, using a correlation stored in a storage device, a correction value of an accelerating voltage to be applied to a beam source which emits the charged particle beam, where the correction value corresponds to the deviation amount, and correcting the accelerating voltage to be applied to the beam source, by using the correlation value.

    Abstract translation: 一种用于校正加速电压的漂移的方法包括:在基于第一调整值和预定时间段已经调整带电粒子束的焦点的位置之后,测量第二调整值,当位置 重新调整带电粒子束的焦点,计算第一调整值和第二调整值之间的偏差量,使用存储在存储装置中的相关性来计算要施加到光束源的加速电压的校正值 其发射带电粒子束,其中校正值对应于偏差量,并且通过使用相关值来校正要施加到束源的加速电压。

    ION IMPLANTER AND METHOD OF CONTROLLING THE SAME
    28.
    发明申请
    ION IMPLANTER AND METHOD OF CONTROLLING THE SAME 有权
    离子植入物及其控制方法

    公开(公告)号:US20160013014A1

    公开(公告)日:2016-01-14

    申请号:US14793265

    申请日:2015-07-07

    CPC classification number: H01J37/241 H01J37/3171

    Abstract: An ion implanter includes a high-voltage power supply, a control unit that generates a command signal controlling an output voltage of the high-voltage power supply, an electrode unit to which the output voltage is applied, and a measurement unit that measures an actual voltage applied to the electrode unit. The control unit includes a first generation section that generates a first command signal for allowing the high-voltage power supply to output a target voltage, a second generation section that generates a second command signal for complementing the first command signal so that the actual voltage measured by the measurement unit becomes or close to the target voltage, and a command section that brings to the high-voltage power supply a synthetics command signal which is produced by synthesizing the first command signal and the second command signal.

    Abstract translation: 离子注入机包括高压电源,产生控制高电压电源的输出电压的指令信号的控制单元,施加输出电压的电极单元和测量实际的测量单元 施加到电极单元的电压。 控制单元包括:第一生成部,其生成用于使高压电源输出目标电压的第一指令信号;第二生成部,生成用于补充第一指令信号的第二指令信号,使得测量的实际电压 通过测量单元变得或接近目标电压,以及命令部分,其通过合成第一命令信号和第二命令信号而产生合成命令信号给高压电源。

    SYSTEM AND METHOD OF GENERATING HIGH VOLTAGE VARIABLE FREQUENCY ELECTROMAGNETIC RADIATION
    29.
    发明申请
    SYSTEM AND METHOD OF GENERATING HIGH VOLTAGE VARIABLE FREQUENCY ELECTROMAGNETIC RADIATION 审中-公开
    生成高压变频电磁辐射的系统和方法

    公开(公告)号:US20150343230A1

    公开(公告)日:2015-12-03

    申请号:US14729627

    申请日:2015-06-03

    CPC classification number: A61N1/403 A61N1/025 A61N1/08 A61N1/40 H01J37/241

    Abstract: In a high voltage, variable frequency radiation generation system, a carrier signal supplied to a primary coil of a transformer is varied, e.g., turned ON and OFF at variable frequencies. The ON duration and/or the average amplitude of the carrier signal may also be varied. Moreover, the carrier signal may be modulated using an audio signal. The parameters to control the variation of the carrier can be provided as a recipe via a software application. A server can provide different types of apps providing different control features. The server may also collect user characteristic data and recipe usage data, and may facilitate exchange of these data and may recommend recipes based on a particular user characteristic.

    Abstract translation: 在高电压,可变频率辐射发生系统中,提供给变压器的初级线圈的载波信号被改变,例如以可变频率接通和断开。 载波信号的ON持续时间和/或平均幅度也可以变化。 此外,可以使用音频信号来调制载波信号。 用于控制载体变化的参数可以通过软件应用程序作为配方提供。 服务器可以提供不同类型的应用程序,提供不同的控制功能。 服务器还可以收集用户特征数据和食谱使用数据,并且可以促进这些数据的交换并且可以基于特定的用户特征推荐配方。

    CHARGED PARTICLE BEAM GENERATING APPARATUS, CHARGED PARTICLE BEAM APPARATUS, HIGH VOLTAGE GENERATING APPARATUS, AND HIGH POTENTIAL APPARATUS
    30.
    发明申请
    CHARGED PARTICLE BEAM GENERATING APPARATUS, CHARGED PARTICLE BEAM APPARATUS, HIGH VOLTAGE GENERATING APPARATUS, AND HIGH POTENTIAL APPARATUS 有权
    充电颗粒光束发生装置,充电颗粒光束装置,高电压发生装置和高电位装置

    公开(公告)号:US20150179387A1

    公开(公告)日:2015-06-25

    申请号:US14406909

    申请日:2013-05-08

    Abstract: An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

    Abstract translation: 根据本发明的产生带电粒子束的仪器具有:带电粒子源; 多个第一电极,其沿带电粒子源的带电粒子的照射方向设置; 设置在所述第一电极之间的多个绝缘构件; 以及围绕所述多个第一电极安装的壳体。 壳体由绝缘固体材料形成,并且包括设置在靠近多个第一电极的位置处的多个第二电极。 所述多个第二电极中的至少一个电连接到所述多个第一电极中的至少一个,所述多个第二电极中的每一个具有与所述第一电极中的所述第一电极的电位相同的电位。

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