公开(公告)号：US09284264B2

公开(公告)日：2016-03-15

申请号：US13511179

申请日：2010-11-25

申请人： Andrew Peter Abbott ,  Hadi Mohammad Ali Abood

发明人： Andrew Peter Abbott ,  Hadi Mohammad Ali Abood

IPC分类号： C07C233/05 ,  C07C275/02 ,  C25D3/56 ,  C25D3/66 ,  C07C275/06 ,  C25D3/44

CPC分类号： C07C233/05 ,  C07C275/02 ,  C07C275/06 ,  C25D3/44 ,  C25D3/665

摘要： There is provided a mixture having a freezing point of up to 100° C. formed by a process comprising the step of contacting: (A) from 1 to 2 equivalents of a compound of formula (I) AlX3 (I) wherein each X independently represents Cl, Br or F; with (B) 1 equivalent of a compound of formula (II) R1—C(O)—N(R2)(R3) (II) wherein R1 to R3 have meanings given in the description. There is also provided further mixtures containing additional components, as well as methods of using the mixtures in various applications, such as for the electroreduction of the mixtures to produce aluminum metal.

摘要翻译： 提供具有高达100℃的凝固点的混合物，其通过包括以下步骤的方法形成：（A）1至2当量的式（I）化合物AlX 3（I），其中每个X独立地 表示Cl，Br或F; 与（B）1当量的式（II）化合物R 1 -C（O）-N（R 2）（R 3）（II）其中R 1至R 3具有在说明书中给出的含义。 还提供了含有另外的组分的另外的混合物，以及在各种应用中使用混合物的方法，例如电解还原混合物以产生铝金属。

公开(公告)号：US09267216B2

公开(公告)日：2016-02-23

申请号：US13883643

申请日：2011-11-10

申请人： Atsushi Okamoto ,  Hiroyuki Hoshi ,  Setsuo Andou

发明人： Atsushi Okamoto ,  Hiroyuki Hoshi ,  Setsuo Andou

IPC分类号： C25D3/44 ,  H01G11/30 ,  H01M4/66 ,  C25D1/04 ,  C25D5/50 ,  C25D7/06 ,  H01G9/00 ,  H01G11/22 ,  H01G11/84 ,  H01M10/052

CPC分类号： C25D3/44 ,  C25D1/04 ,  C25D5/50 ,  C25D7/0614 ,  H01G9/0032 ,  H01G11/22 ,  H01G11/30 ,  H01G11/84 ,  H01M4/661 ,  H01M10/052 ,  Y02E60/13 ,  Y10T428/12431

摘要： A method for producing an aluminum foil of the present invention is characterized in that an aluminum film is formed on a surface of a substrate by electrolysis using a plating solution containing at least (1) a dialkyl sulfone, (2) an aluminum halide, and (3) at least one nitrogen-containing compound selected from the group consisting of an ammonium halide, a hydrogen halide salt of a primary amine, a hydrogen halide salt of a secondary amine, a hydrogen halide salt of a tertiary amine, and a quaternary ammonium salt represented by the general formula: R1R2R3R4N.X (R1 to R4 independently represent an alkyl group and are the same as or different from one another, and X represents a counteranion for the quaternary ammonium cation), then the film is separated from the substrate to obtain an aluminum foil, and the obtained aluminum foil is subjected to a heat treatment.

摘要翻译： 本发明的铝箔的制造方法的特征在于，使用含有至少（1）二烷基砜的电镀液，（2）卤化铝和 （3）至少一种选自卤化铵，伯胺的卤化氢盐，仲胺的卤化氢盐，叔胺的卤化氢盐和季铵盐的含氮化合物， 由以下通式表示的铵盐：R1R2R3R4N.X（R1至R4独立地表示烷基并且彼此相同或不同，X表示季铵阳离子的抗衡阴离子），然后将膜从 基板以获得铝箔，并将所获得的铝箔进行热处理。

公开(公告)号：US09260789B2

公开(公告)日：2016-02-16

申请号：US13470713

申请日：2012-05-14

申请人： Weilong Zhang ,  Xiaomei Yu ,  Lei Chen ,  Mark R. Jaworowski ,  Joseph J. Sangiovanni

发明人： Weilong Zhang ,  Xiaomei Yu ,  Lei Chen ,  Mark R. Jaworowski ,  Joseph J. Sangiovanni

IPC分类号： C25D5/10 ,  C25D5/00 ,  C25D5/34 ,  C25D5/44 ,  C25D5/48 ,  C25D3/66 ,  C23C28/00 ,  B32B15/01 ,  C23C28/02 ,  C25D3/44 ,  C25D5/18 ,  C25D5/40

CPC分类号： B32B15/016 ,  B32B15/01 ,  B32B15/017 ,  C23C28/02 ,  C25D3/44 ,  C25D3/665 ,  C25D5/003 ,  C25D5/10 ,  C25D5/18 ,  C25D5/40 ,  C25D5/44 ,  Y10T428/12764 ,  Y10T428/24942

摘要： A metal article comprises an alloy substrate having a surface and a non-diffused metal monolayer disposed thereon. The surface has a first surface work function value Φs. The non-diffused monolayer deposited on the surface has a second surface work function value Φs that is less negative than the first surface work function value. A method for depositing the monolayer via underpotential deposition (UPD) is also disclosed.

摘要翻译： 金属制品包括其上设置有表面和非扩散金属单层的合金基底。 表面具有第一表面功函数值Φs。 沉积在表面上的非扩散单层具有比第一表面功函数值小的第二表面功函数值Φs。 还公开了通过底电位沉积（UPD）沉积单层的方法。

公开(公告)号：US20160024637A1

公开(公告)日：2016-01-28

申请号：US14773136

申请日：2013-03-07

申请人： HITACHI, LTD.

发明人： Hiroshi NAKANO ,  Yoshinori NEGISHI ,  Haruo AKAHOSHI ,  Takeshi IZUMI ,  Yoshitaka KOJIMA ,  Hideyuki ARIKAWA

IPC分类号： C23C10/04 ,  C25D5/50 ,  C25D7/00 ,  F01D5/28 ,  C22F1/10 ,  C22F1/18 ,  C21D6/00 ,  B32B15/01 ,  C25D3/44 ,  C25D5/02

CPC分类号： C23C10/04 ,  B32B15/012 ,  B32B15/017 ,  C21D6/00 ,  C22F1/10 ,  C22F1/18 ,  C23C10/28 ,  C25D3/44 ,  C25D3/665 ,  C25D5/02 ,  C25D5/022 ,  C25D5/34 ,  C25D5/50 ,  C25D7/00 ,  C25D17/02 ,  C25D21/11 ,  F01D5/288 ,  F05D2230/31 ,  F05D2300/173 ,  Y02T50/671 ,  Y02T50/6765

摘要： There is provided a method for forming an aluminide coating on a surface of a heat resistant superalloy substrate, comprising the steps of: exposing a base metal of the substrate in a selective area; forming a aluminum or an aluminum alloy film on the exposed base metal, by a non-aqueous electroplating; and conducting a heat treatment to the substrate on which the film is formed, in order to make a diffusion reaction between an aluminum component in the film and the base metal, and form the aluminide coating, wherein: there is used, as a plating liquid, a non-aqueous plating liquid containing a halide of the metal to be plated and an organic compound which forms an ion pair with the metal halide; and the electroplating is conducted by immersing the selective area into the plating liquid through the use of predetermined means for shielding the plating liquid from the atmosphere.

摘要翻译： 提供了一种在耐热超合金基板的表面上形成铝化物涂层的方法，包括以下步骤：在选择区域中曝光基板的母材; 通过非水电镀在暴露的基底金属上形成铝或铝合金膜; 对形成有膜的基板进行热处理，以使膜中的铝成分与基体金属发生扩散反应，形成铝化物涂层，其中：作为电镀液 ，含有待镀金属的卤化物的非水性电镀液和与金属卤化物形成离子对的有机化合物; 并且通过使用用于屏蔽来自大气的电镀液的预定装置将选择区域浸入电镀液中进行电镀。

公开(公告)号：US09068270B2

公开(公告)日：2015-06-30

申请号：US13123760

申请日：2009-07-31

申请人： Hiroyuki Hoshi ,  Atsushi Okamoto

发明人： Hiroyuki Hoshi ,  Atsushi Okamoto

IPC分类号： C25D3/66 ,  C25D3/56 ,  C25D3/00 ,  C25D3/44

CPC分类号： C25D3/665 ,  C25D3/44 ,  C25D3/66

摘要： An object of the present invention is to provide an extended-life plating solution that allows an aluminum electroplating process to be performed stably for a long period of time, and also a method for forming an aluminum plating film using the same. An aluminum electroplating solution according to the present invention is characterized by comprising 1.5 to 4.0 mol of an aluminum halide per 10.0 mol of dimethyl sulfone and, relative to the aluminum halide, ammonium chloride in a molar ratio of 1/15 to 1/4 or a tetraalkylammonium chloride in a molar ratio of 1/15 to 1/2. The plating solution has improved electrical conductivity and thus has a further advantage in that it allows the formation of a uniform aluminum plating film on a substrate to be plated even when the plating process is performed by a barrel method.

摘要翻译： 本发明的目的在于提供一种使铝电镀工艺长时间稳定地实施的延长寿命的电镀液，以及使用其的形成铝电镀膜的方法。 根据本发明的铝电镀溶液的特征在于，相对于铝卤化物，摩尔比为1/15至1/4的氯化铵为1.5至4.0摩尔的铝卤化物，相对于10.0摩尔二甲基砜， 摩尔比为1/15至1/2的四烷基氯化铵。 电镀液具有提高的导电性，因此具有的另外的优点在于，即使通过桶法进行电镀处理，也能够在待镀的基板上形成均匀的铝电镀膜。

公开(公告)号：US09012030B2

公开(公告)日：2015-04-21

申请号：US13368255

申请日：2012-02-07

申请人： Nianci Han ,  Li Xu ,  Hong Shih

发明人： Nianci Han ,  Li Xu ,  Hong Shih

IPC分类号： C23C4/10 ,  B05C11/00 ,  B32B15/04 ,  B32B15/20 ,  C25D3/54 ,  C23C16/44 ,  C23C30/00 ,  C25D5/50 ,  H01J37/32 ,  H01L21/67 ,  C23C28/00 ,  C25D3/44 ,  C25D3/56 ,  C25D5/18

CPC分类号： C25D3/54 ,  C23C16/4404 ,  C23C16/4411 ,  C23C28/321 ,  C23C28/322 ,  C23C28/34 ,  C23C28/345 ,  C23C28/3455 ,  C23C28/36 ,  C23C28/42 ,  C23C30/00 ,  C23C30/005 ,  C25D3/44 ,  C25D3/56 ,  C25D5/18 ,  C25D5/50 ,  H01J37/32477 ,  H01L21/67115 ,  Y10T428/12458 ,  Y10T428/12611 ,  Y10T428/12618 ,  Y10T428/12667 ,  Y10T428/12736 ,  Y10T428/12778 ,  Y10T428/12806

摘要： A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.

摘要翻译： 一种基板处理室部件，包括具有钇 - 铝涂层的室部件结构。 钇铝涂层包括通过涂层厚度的组成梯度。

公开(公告)号：US20150068909A1

公开(公告)日：2015-03-12

申请号：US14381753

申请日：2013-02-27

申请人： HITACHI METALS, LTD.

发明人： Atsushi Okamoto ,  Junichi Matsuda

IPC分类号： C25D3/44 ,  C25D1/04

CPC分类号： C25D3/44 ,  C25D1/04 ,  C25D3/665 ,  H01G11/68 ,  H01G11/84 ,  H01M4/661 ,  H01M10/0525 ,  Y02E60/13 ,  Y02T10/7011 ,  Y02T10/7022

摘要： An object of the present invention is to provide a method for preparing a plating solution for aluminum electroplating useful for the production of a high-ductility, high-purity aluminum foil at a high film formation rate, etc., which is an easy-to-handle plating solution that does not solidify and allows for an electroplating treatment even at 25° C. The present invention as a means for achieving the object is characterized in that in a preparation of a plating solution containing at least (1) a dialkyl sulfone, (2) an aluminum halide, and (3) a nitrogen-containing compound, the blending proportions of the dialkyl sulfone, the aluminum halide, and the nitrogen-containing compound are such that per 10 mol of the dialkyl sulfone, the aluminum halide is 3.5+n to 4.2+n mol, and the nitrogen-containing compound is n mol (wherein n is 0.001 to 2.0 mol). In addition, a plating solution for aluminum electroplating prepared by the method of the present invention allows for an electroplating treatment with high aluminum deposition efficiency relative to the current flow, and is thus advantageous in that electricity usage can be reduced, resulting in excellent economic efficiency.

摘要翻译： 本发明的目的是提供一种用于制备用于制备高成膜速率等的高延展性，高纯度铝箔的铝电镀用溶液的方法，该方法易于制备 即使在25℃下也不固化并允许进行电镀处理的手提电镀液。作为实现该目的的手段的本发明的特征在于，在制备含有至少（1）二烷基砜 ，（2）卤化铝和（3）含氮化合物，二烷基砜，卤化铝和含氮化合物的配合比例使得每10摩尔二烷基砜，卤化铝 为3.5 + n〜4.2 + n摩尔，含氮化合物为n摩尔（n为0.001〜2.0摩尔）。 此外，通过本发明的方法制备的用于电镀铝的电镀溶液允许相对于电流流动具有高的铝沉积效率的电镀处理，因此有利的是可以减少电力使用，从而获得优异的经济效率 。

公开(公告)号：US08916039B2

公开(公告)日：2014-12-23

申请号：US13502442

申请日：2010-10-19

申请人： Manabu Inoue ,  Tadahiro Ohnuma ,  Toshiki Inomata ,  Tsutomu Miyadera

发明人： Manabu Inoue ,  Tadahiro Ohnuma ,  Toshiki Inomata ,  Tsutomu Miyadera

IPC分类号： C25D5/00 ,  C25D17/20 ,  C25D3/56 ,  C25D5/04 ,  C25D3/66 ,  C25D7/00 ,  C25D3/44

CPC分类号： C25D17/20 ,  C25D3/44 ,  C25D3/56 ,  C25D3/665 ,  C25D5/04 ,  C25D7/001

摘要： To provide a barrel electroplating method which is less prone to bare spots and adhesion failure such as blisters and peeling, and which makes it possible to obtain uniform plated coatings free from burnt deposits and poor brightness, irrespective of the amount of workpieces.The present invention provides a method for performing barrel electroplating by use of an aluminum or aluminum alloy plating bath, the method comprising rotating, swinging, or vibrating an anode (6) placed inside a barrel (4) receiving workpieces, and simultaneously rotating, swinging, or vibrating the barrel, with a voltage being applied between the anode and a cathode provided on an inner wall surface of the barrel.

摘要翻译： 提供一种不容易发生裸露斑点和粘附破坏（诸如水泡和剥离）的圆筒电镀方法，并且这使得可以获得均匀的镀覆涂层，不受烧焦沉积物和不良亮度的影响，而与工件数量无关。 本发明提供了一种通过使用铝或铝合金电镀液进行圆筒形电镀的方法，所述方法包括旋转，摆动或振动放置在容纳工件的筒体（4）内的阳极（6），同时旋转，摆动 或振动筒体，其中施加在阳极和设置在筒体的内壁表面上的阴极之间的电压。

公开(公告)号：US20110259755A1

公开(公告)日：2011-10-27

申请号：US13128131

申请日：2009-11-04

申请人： Gerhard Reusmann ,  Werner Schauf ,  Martin Wiese

发明人： Gerhard Reusmann ,  Werner Schauf ,  Martin Wiese

IPC分类号： C25D17/00 ,  C25D3/44 ,  C25D5/00

CPC分类号： C25D17/02 ,  C25D17/24

摘要： The invention relates to an apparatus (1, 101, 201) for electrochemically coating a workpiece (22), including a coating reservoir (2, 102, 202) with a charge opening (5) and a supply reservoir (3, 103, 203), wherein the two reservoirs are in communication through a passage opening (4, 104, 204). The apparatus has at least one electrode (11) and one counter electrode (14). In order to prevent contamination of a coating liquid (20, 120, 220) during an electrochemical deposition process, the apparatus can be switched between a coating position and a rest position by rotating the supply and the coating reservoirs about at least one common axis (A, A′, A″) so that the center of gravity of the volume of the coating reservoir (2, 102, 202) in the coating position is lower in relation to the center of gravity of the volume of the supply reservoir (3, 103, 203) than in the rest position. The invention further relates to a method for coating workpieces.

摘要翻译： 本发明涉及一种用于电化学涂覆工件（22）的装置（1,101,201），其包括具有加料口（5）和供给储存器（3,103,203）的涂料储存器（2,102,202） ），其中两个储存器通过通道开口（4,104,204）连通。 该装置具有至少一个电极（11）和一个对电极（14）。 为了在电化学沉积过程中防止涂覆液体（20,120,220）的污染，可以通过围绕至少一个公共轴线旋转供给源和涂层储存器，从而在涂覆位置和静止位置之间切换设备（ A，A'，A“），使得涂层位置中的涂层储存器（2,102,202）的体积的重心相对于供应储存器（3）的体积的重心较低 ，103,203）比在休息位置。 本发明还涉及一种用于涂覆工件的方法。

公开(公告)号：US5091063A

公开(公告)日：1992-02-25

申请号：US533322

申请日：1990-06-05

申请人： Herbert Lehmkuhl ,  Klaus-Dieter Mehler

发明人： Herbert Lehmkuhl ,  Klaus-Dieter Mehler

IPC分类号： C25D3/44

CPC分类号： C25D3/44

摘要： The invention relates to organoaluminum electrotyles for the electrolytic deposition of aluminum which are characterized in that they consist of KF . 2 AlEt.sub.3 (A), KF . 2 AlMe.sub.3 (B) and MF . 2 Al(iBu).sub.3 (C), wherein M=sodium or potassium or a mixture of both, in a molar ratio of A:B:C of from 2:1:1 to 7:1:1. The organoaluminum electrolytes are dissolved in from 2 to 4.5 moles, based on the amount of MF employed, of an aromatic hydrocarbon which is liquid at 0.degree. C. The invention further relates to a process for the electrolytic deposition of aluminum on electrically conductive materials by using said electrolytes.