DEVICE AND METHOD WITH RESONANCE FREQUENCY CONTROL

    公开(公告)号:US20250081858A1

    公开(公告)日:2025-03-06

    申请号:US18602554

    申请日:2024-03-12

    Abstract: A superconducting device includes a frequency-tunable device including a first conductive pad and a second conductive pad which are connected to each other by a Josephson junction, a ferromagnet having a magnetic domain wall, and a control circuit configured to apply a current to the ferromagnet to adjust a position of the magnetic domain wall of the ferromagnet, and to control a resonance frequency of the frequency-tunable device.

    SEMICONDUCTOR PACKAGE INCLUDING MULTIPLE SEMICONDUCTOR CHIPS

    公开(公告)号:US20250081654A1

    公开(公告)日:2025-03-06

    申请号:US18458991

    申请日:2023-08-30

    Inventor: IKJUN CHOI

    Abstract: A semiconductor package includes a semiconductor chip structure and a transparent substrate. The semiconductor chip structure includes first and second semiconductor chips. The first semiconductor chip includes a semiconductor substrate including first and second surfaces, a wiring layer, and a through electrode. The first semiconductor chip has a step structure on an edge of the semiconductor chip structure and connected to the second surface. The step structure includes first to fourth steps. The first step includes a first bottom surface and a first lateral surface. The second step includes a second bottom surface and a second lateral surface. The third step includes a third bottom surface and a third lateral surface. The through electrode extends from the second bottom surface toward the wiring layer.

    IMAGE SENSOR
    377.
    发明申请

    公开(公告)号:US20250081645A1

    公开(公告)日:2025-03-06

    申请号:US18661946

    申请日:2024-05-13

    Inventor: Jungwook LIM

    Abstract: Disclosed is an image sensor comprising a first semiconductor substrate that includes a first pixel region and a second pixel region, a first photoelectric conversion element on the first pixel region, a second photoelectric conversion element on the second pixel region, a first floating diffusion section on the first pixel region, a second floating diffusion section on the second pixel region, a first transfer gate electrode between the first photoelectric conversion element and the first floating diffusion section, a second transfer gate electrode between the second photoelectric conversion element and the second floating diffusion section, a second semiconductor substrate on the first semiconductor substrate, and pixel transistors connected to the first and second photoelectric conversion elements. A width of the second photoelectric conversion element is less than that of the first photoelectric conversion element. At least one of the pixel transistors is on the second semiconductor substrate.

    VERTICAL SEMICONDUCTOR DEVICE
    378.
    发明申请

    公开(公告)号:US20250081469A1

    公开(公告)日:2025-03-06

    申请号:US18812283

    申请日:2024-08-22

    Abstract: A vertical semiconductor device includes: a plurality of insulation patterns on a substrate, the plurality of insulation patterns being spaced apart from each other in a vertical direction; a plurality of channel structures being spaced apart from each other in a first direction, each of the plurality of channel structures including interface insulation patterns, and the plurality of channel structures disposed in a first trench extending in the first direction and passing through the insulation patterns in the vertical direction; a ferroelectric structure on an outer surface of each of the plurality channel structures, the ferroelectric structure protruding in a direction toward a gap between some of the insulation patterns in the vertical direction; and a conductive pattern on a sidewall of the ferroelectric structure, the conductive pattern filling the gap in the vertical direction.

    SEMICONDUCTOR DEVICE
    379.
    发明申请

    公开(公告)号:US20250081462A1

    公开(公告)日:2025-03-06

    申请号:US18952236

    申请日:2024-11-19

    Abstract: A semiconductor device includes gate electrodes stacked and spaced apart from each other in a first direction perpendicular to an upper surface of a substrate; interlayer insulating layers alternately stacked with the gate electrodes on the substrate; channel structures extending through the gate electrodes; and a separation region extending through the gate electrodes in the first direction and extending in a second direction perpendicular to the first direction, wherein each of the gate electrodes comprises a first conductive layer and a second conductive layer sequentially stacked, the second conductive layer including a metal nitride, and wherein the first conductive layer and the second conductive layer are each in physical contact with the separation region.

    SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME

    公开(公告)号:US20250081444A1

    公开(公告)日:2025-03-06

    申请号:US18610790

    申请日:2024-03-20

    Abstract: A semiconductor memory device includes a peripheral gate structure, bit lines above the peripheral gate structure, being apart from each other in a first direction, and extending in a second direction different from the first direction, first and second active patterns above the bit lines and apart from each other in the second direction, first and second word lines between the first and active patterns and being adjacent to the first and second active patterns, respectively, a first back gate electrode corresponding to the first word line, the first active pattern being between the first back gate electrode and the first word line, a second back gate electrode corresponding to the second word line, the second active being between the second back gate electrode and the second word line, and a word line shielding structure between the first word line and the second word line.

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