Abstract:
A permanent magnetic machine includes a stator body having a first end, a second end, and a plurality of generally radial slots formed therein for accepting a set of windings having a first set of end-turns at the first end and a second set of end-turns at the second end. The stator body has a plurality of channels adjacent to the slots and extending from the first end of the stator body to the second end of the stator body, wherein the channels are configured to allow the flow of a cooling fluid therethrough. A plurality of nozzles in fluid communication with the plurality of channels are configured to spray the cooling fluid onto the first and second set of end turns.
Abstract:
A low resistance contact structure and method of making the structure. The structure includes a polysilicon contact through an upper silicon layer and buried oxide layer to a lower silicon layer of a silicon-on-insulation substrate. A region of the upper silicon layer surrounds the polysilicon contact and top surface of the polysilicon contact and surrounding region of upper silicon layer are metal silicided providing an extended contact area greater than the area of the top surface of polysilicon contact.
Abstract:
A semiconductor structure. The structure includes (a) a semiconductor substrate; (b) a hard mask layer on top of the semiconductor substrate; and (c) a hard mask layer opening in the hard mask layer. The semiconductor substrate is exposed to the atmosphere through the hard mask layer opening. The hard mask layer opening comprises a top portion and a bottom portion, wherein the bottom portion is disposed between the top portion and the semiconductor substrate. The bottom portion has a greater lateral width than the top portion.
Abstract:
A semiconductor structure. The structure includes (a) a semiconductor substrate; (b) a hard mask layer on top of the semiconductor substrate; and (c) a hard mask layer opening in the hard mask layer. The semiconductor substrate is exposed to the atmosphere through the hard mask layer opening. The hard mask layer opening comprises a top portion and a bottom portion, wherein the bottom portion is disposed between the top portion and the semiconductor substrate. The bottom portion has a greater lateral width than the top portion.
Abstract:
The present invention provides compositions and methods for modulating plant development by modulating the expression or activity of plant polycomb genes including FIE and MEA.
Abstract:
The present invention provides compositions and methods for modulating plant development by modulating the expression or activity of plant polycomb genes including FIE and MEA.
Abstract:
Crystalline molecular sieves containing octahedral sites such as the sieves known as ETS-4, ETS-10 and ETAS-10 are used to remove volatile organic compounds from a mixture of the same with moist air at ambient temperature.
Abstract:
A low harmonic radio-frequency (RF) switch in a silicon-on-insulator (SOI) substrate and methods of manufacture. A method includes forming at least one trench through an insulator layer. The at least one trench is adjacent a device formed in an active region on the insulator layer. The method also includes forming at least one cavity in a substrate under the insulator layer and extending laterally from the at least one trench to underneath the device.
Abstract:
An electric motor assembly includes a motor shaft rotatable about a longitudinal axis, an angular position sensor, and a deformable pin. The motor shaft has an axial keyway formed therein, and the axial keyway has a nominal keyway dimension. The angular position is coupled to the motor shaft to rotate with the motor shaft. The angular position sensor has an axial key to fit within the axial keyway of the motor shaft, and the axial key has a nominal key dimension that is less than the nominal keyway dimension. The deformable pin is located in the axial keyway under compression between the axial key and the motor shaft to inhibit rotational shifting of the angular position sensor relative to the motor shaft.
Abstract:
Planar cavity Micro-Electro-Mechanical System (MEMS) structures, methods of manufacture and design structure are provided. The method includes forming at least one Micro-Electro-Mechanical System (MEMS) cavity having a planar surface using a reverse damascene process.