PACKAGE TYPE MULTI LAYER THIN FILM CAPACITOR FOR HIGH CAPACITANCE
    32.
    发明申请
    PACKAGE TYPE MULTI LAYER THIN FILM CAPACITOR FOR HIGH CAPACITANCE 有权
    包装类型多层薄膜电容器用于高电容

    公开(公告)号:US20130058005A1

    公开(公告)日:2013-03-07

    申请号:US13599034

    申请日:2012-08-30

    CPC classification number: H01G4/005 H01G4/008 H01G4/12 Y02T10/7022

    Abstract: Provided is a package type multi-layer thin film capacitor for large capacitance, including: a ceramic sintered body formed with slots on one side and another side thereof, respectively; a plurality of first internal electrode layers formed within the ceramic sintered body; a plurality of second internal electrode layers formed within the ceramic sintered body to be positioned between the plurality of first internal electrode layers; a pair of first main connection electrode members inserted into the slots to be connected to the first internal electrode layers or the second internal electrode layers, respectively; a pair of first main lead members inserted into the slots and to be connected to the first main connection electrode members, respectively; and a sealing member sealing the ceramic sintered body to partially expose each of the pair of first main lead members.

    Abstract translation: 提供一种用于大容量的封装型多层薄膜电容器,其包括:分别在一侧和另一侧形成有狭槽的陶瓷烧结体; 形成在陶瓷烧结体内的多个第一内部电极层; 多个第二内部电极层,形成在陶瓷烧结体内,位于多个第一内部电极层之间; 一对第一主连接电极部件分别插入到与第一内部电极层或第二内部电极层连接的槽中; 一对第一主引线部件分别插入到所述槽中并与所述第一主连接电极部件连接; 以及密封构件,其密封所述陶瓷烧结体以部分地暴露所述一对第一主引导构件中的每一个。

    Methods of forming an amorphous silicon thin film
    36.
    发明授权
    Methods of forming an amorphous silicon thin film 有权
    形成非晶硅薄膜的方法

    公开(公告)号:US08076242B2

    公开(公告)日:2011-12-13

    申请号:US12433629

    申请日:2009-04-30

    CPC classification number: H01L21/02592 H01L21/02532 H01L21/0262

    Abstract: A method for forming an amorphous silicon thin film is disclosed. In some embodiments, a method includes loading a substrate into a reaction chamber; and conducting a plurality of deposition cycles on the substrate. Each of at least two of the cycles includes: supplying a silicon precursor to the reaction chamber during a first time period; applying radio frequency power to the reaction chamber at least partly during the first time period; stopping supplying of the silicon precursor and applying of the radio frequency power during a second time period between the first time period and an immediately subsequent deposition cycle; and supplying hydrogen plasma to the reaction chamber during a third time period between the second time period and the immediately subsequent deposition cycle. The method allows formation of an amorphous silicon film having an excellent step-coverage and a low roughness at a relatively low deposition temperature.

    Abstract translation: 公开了一种形成非晶硅薄膜的方法。 在一些实施例中,一种方法包括将基底装载到反应室中; 以及在所述衬底上进行多个沉积循环。 至少两个循环中的每一个包括:在第一时间段内将硅前体供应到反应室; 至少部分地在第一时间段内向反应室施加射频功率; 在第一时间段和紧随其后的沉积循环之间的第二时间段期间,停止供应硅前体和施加射频功率; 以及在第二时间段和紧随其后的沉积循环之间的第三时间段期间向反应室供应氢等离子体。 该方法允许在相对低的沉积温度下形成具有优异的阶梯覆盖和低粗糙度的非晶硅膜。

    TOUCH TYPE DISPLAY APPARATUS, SCREEN DIVISION METHOD, AND STORAGE MEDIUM THEREOF
    40.
    发明申请
    TOUCH TYPE DISPLAY APPARATUS, SCREEN DIVISION METHOD, AND STORAGE MEDIUM THEREOF 审中-公开
    触摸式显示设备,屏幕分割方法及其存储介质

    公开(公告)号:US20110193810A1

    公开(公告)日:2011-08-11

    申请号:US13023174

    申请日:2011-02-08

    CPC classification number: G06F3/04886

    Abstract: A touch type display apparatus is provided that includes a memory for storing at least one application, a processor for dividing a screen based on a number of users and for controlling display of an application executed for each divided screen, and a touch screen unit controlled by the processor for displaying data based on the application executed for each divided screen.

    Abstract translation: 提供了一种触摸型显示装置,其包括用于存储至少一个应用的存储器,用于基于用户数分割屏幕并且用于控制针对每个划分的屏幕执行的应用的显示的处理器,以及由 用于基于针对每个划分的屏幕执行的应用来显示数据的处理器。

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