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公开(公告)号：US20170003605A1
公开(公告)日：2017-01-05
申请号：US15266453
申请日：2016-09-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Sergei SHULEPOV
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , H01L21/67034
Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。
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公开(公告)号：US20160085161A1
公开(公告)日：2016-03-24
申请号：US14956075
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich KOLESNYCHENKO , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Felix Godfried Peter PEETERS , Bob STREEFKERK , Franciscus Johannes Herman Maria TEUNISSEN , Helmar VAN SANTEN
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号：US20160026091A1
公开(公告)日：2016-01-28
申请号：US14775263
申请日：2014-02-26
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GMBH
Inventor： Erik Roelof LOOPSTRA , Olav Waldemar Vladimir FRIJNS , Stig BIELING , Antonius Theodorus Wilhelmus KEMPEN , Ivo VANDERHALLEN , Nicolaas TEN KATE , Ruud Antonius Catharina Maria BEERENS , Richard Henricus Adrianus VAN LIESHOUT , Theodorus Petrus Maria CADEE , Sjoerd Nicolaas Lambertus DONDERS , Alexander Matthijs STRUYCKEN , Marcus Petrus SCHEEPERS
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。
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公开(公告)号：US20240411233A1
公开(公告)日：2024-12-12
申请号：US18699358
申请日：2022-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Gosse Charles DE VRIES , Sjoerd Nicolaas Lambertus DONDERS , Franciscus Johannes Joseph JANSSEN , Evgenia KURGANOVA , Abraham Jan WOLF , Ties Jan Willem BAKKER , Volker Dirk HILDENBRAND , Paul Alexander VERMEULEN , Michael ENGEL , Bernardus Antonius Johannes LUTTIKHUIS , Ronald VAN DER HAM , Jeroen Peterus Johannes VAN LIPZIG
Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.
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公开(公告)号：US20190324374A1
公开(公告)日：2019-10-24
申请号：US16460159
申请日：2019-07-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC: G03F7/20
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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Patent Agency Ranking
公开(公告)号：US20190302631A1
公开(公告)日：2019-10-03
申请号：US16382483
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Erik Theodorus Maria BIJLAART , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN , Antonius Theodorus Anna Maria DERKSEN , Hans JANSEN , Jacobus Johannus Leonardus Hendricus VERSPAY
IPC: G03F7/20
Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20190212661A1
公开(公告)日：2019-07-11
申请号：US16229102
申请日：2018-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Hans BUTLER , Sjoerd Nicolaas Lambertus DONDERS , Aleksey Yurievich KOLESNYCHENKO , Erik Roelof LOOPSTRA , Hendricus Johannes Maria MEIJER , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Frank VAN SCHAIK , Timotheus Franciscus SENGERS , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Helmar VAN SANTEN
IPC: G03F7/20
Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
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公开(公告)号：US20190086820A1
公开(公告)日：2019-03-21
申请号：US16197461
申请日：2018-11-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Timotheus Franciscus SENGERS , Sjoerd Nicolaas Lambertus DONDERS , Hans JANSEN , Arjen BOOGAARD
IPC: G03F7/20
CPC classification number: G03F7/70866 , G03F7/70341 , G03F7/70591 , G03F7/7085 , G03F7/7095
Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
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公开(公告)号：US20180173116A1
公开(公告)日：2018-06-21
申请号：US15568122
申请日：2016-04-04
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik KOEVOETS , Erik Johan ARLEMARK , Sander Catharina Reinier DERKS , Sjoerd Nicolaas Lambertus DONDERS , Wilfred Edward ENDENDIJK , Franciscus Johannes Joseph JANSSEN , Raymond Wilhelmus Louis LAFARRE , Leon Martin LEVASIER , Jim Vincent OVERKAMP , Nicolaas TEN KATE , Jacobus Cornelis Gerardus VAN DER SANDEN
CPC classification number: G03F7/70875 , G03F7/2041 , G03F7/70258 , G03F7/70783 , H01L21/67098 , H01L21/683
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US20180081285A1
公开(公告)日：2018-03-22
申请号：US15824686
申请日：2017-11-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcel BECKERS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Nicolaas Rudolf KEMPER , Ferdy MIGCHELBRINK , Elmar EVERS
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/70808
Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
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