公开(公告)号：US11961698B2

公开(公告)日：2024-04-16

申请号：US17344446

申请日：2021-06-10

Applicant: ASML Netherlands B.V.

Inventor： Christiaan Otten ,  Peter-Paul Crans ,  Marc Smits ,  Laura Del Tin ,  Christan Teunissen ,  Yang-Shan Huang ,  Stijn Wilem Herman Karel Steenbrink ,  Xuerang Hu ,  Qingpo Xi ,  Xinan Luo ,  Xuedong Liu

IPC: H01J37/15 ,  H01J37/02 ,  H01J37/14 ,  H01J37/147 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/15 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/18 ,  H01J37/244 ,  H01J37/28 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817

Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：USRE49784E1

公开(公告)日：2024-01-02

申请号：US17005212

申请日：2020-08-27

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/06 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  G01N23/2251 ,  H01J37/145 ,  H01J37/05 ,  H01J37/244

CPC classification number: H01J37/06 ,  G01N23/2251 ,  H01J37/05 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/226 ,  H01J37/244 ,  H01J37/28 ,  G01N2223/418 ,  G01N2223/6116 ,  H01J2237/057 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.

公开(公告)号：US11688580B2

公开(公告)日：2023-06-27

申请号：US17353790

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Weiming Ren ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

CPC classification number: H01J37/147 ,  H01J37/04 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2817

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US11676792B2

公开(公告)日：2023-06-13

申请号：US16652025

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Qingpo Xi ,  Youfei Jiang ,  Weiming Ren ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/12 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J2237/0048

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

公开(公告)号：US11469076B2

公开(公告)日：2022-10-11

申请号：US17251724

申请日：2019-06-07

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus Maria Johannes Massen ,  Joost Jeroen Ottens ,  Long Ma ,  Youfei Jiang ,  Weihua Yin ,  Wei-Te Li ,  Xuedong Liu

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US11282675B2

公开(公告)日：2022-03-22

申请号：US17146409

申请日：2021-01-11

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhong-wei Chen

IPC: H01J37/31 ,  H01J37/14 ,  H01J37/30 ,  H01J37/28 ,  H01J37/317 ,  H01J37/147 ,  B82Y10/00 ,  B82Y40/00

Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.

公开(公告)号：US11217423B2

公开(公告)日：2022-01-04

申请号：US16357309

申请日：2019-03-18

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Shuai Li ,  Xuedong Liu ,  Zhongwei Chen ,  Jack Jau

IPC: H01J37/28

Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.

公开(公告)号：US12142455B2

公开(公告)日：2024-11-12

申请号：US17226017

申请日：2021-04-08

Applicant: ASML Netherlands B.V.

Inventor： Xuedong Liu ,  Weimin Zhou ,  Xiaoxue Chen ,  Xiaoyu Ji ,  Heng Li ,  Shahedul Hoque ,  Zongyao Li ,  Shuhao Liu ,  Weiming Ren

IPC: H01J37/28 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244

Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.

公开(公告)号：US12142453B2

公开(公告)日：2024-11-12

申请号：US17583176

申请日：2022-01-24

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Qian Zhang ,  Xuerang Hu ,  Xuedong Liu

IPC: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/317

Abstract: A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.

公开(公告)号：US12080515B2

公开(公告)日：2024-09-03

申请号：US17718225

申请日：2022-04-11

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1474 ,  H01J2237/0492 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/2806

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.