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83 条记录 (耗时 0.03 秒)

    Method of in-line purification of CVD reactive precursor materials
    31.
    发明申请
    Method of in-line purification of CVD reactive precursor materials 有权
    CVD反应性前体材料的在线纯化方法

    公开(公告)号：US20080083329A1

    公开(公告)日：2008-04-10

    申请号：US11903397

    申请日：2007-09-20

    申请人： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

    发明人： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

    IPC分类号： B01D46/46

    CPC分类号： C23C16/4402

    摘要： We have devised an apparatus useful for and a method of removing impurities from vaporous precursor compositions used to generate reactive precursor vapors from which thin films/layers are formed under sub-atmospheric conditions. The method is particularly useful when the layer deposition apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the layer formation process, where the presence of impurities has a significant affect on both the quantity of reactants being charged and the overall composition of the reactant mixture from which the layer is deposited. The method is particularly useful when the vapor pressure of a liquid reactive precursor is less than about 250 Torr at atmospheric pressure.

    摘要翻译： 我们已经设计了一种可用于从用于产生反应性前体蒸气的气态前体组合物中除去杂质的装置，其中在大气下条件下形成薄膜/层。 当层沉积设备在单一步骤期间提供量的不同组合的反应物的精确添加时或当层形成过程中存在多个不同的单独步骤时，该方法是特别有用的，其中杂质的存在具有显着的影响 在被充电的反应物的量和沉积层的反应物混合物的总体组成。 当液体反应性前体的蒸气压在大气压下小于约250乇时，该方法特别有用。

    Controlled vapor deposition of biocompatible coatings for medical devices
    33.
    发明申请
    Controlled vapor deposition of biocompatible coatings for medical devices 审中-公开
    用于医疗器械的生物相容性涂层的受控气相沉积

    公开(公告)号：US20060251795A1

    公开(公告)日：2006-11-09

    申请号：US11123487

    申请日：2005-05-05

    申请人： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

    发明人： Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

    IPC分类号： A61L33/00

    CPC分类号： B82Y30/00 ,  A61L27/34 ,  A61L29/085 ,  A61L31/10 ,  B82Y40/00 ,  Y10T428/261 ,  Y10T428/31667 ,  C08L71/02

    摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, oxide/polyethylene glycol coatings provide increased hydrophilicity and improved biocompatibility for medical devices and implants.

    摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在各种基底上施加层和涂层。 该方法和装置可用于制造生物功能装置，生物MEMS装置以及制造用于生物应用的微流体装置。 在一个重要的实施方案中，氧化物/聚乙二醇涂层为医疗装置和植入物提供增加的亲水性和改善的生物相容性。

    Durable, heat-resistant multi-layer coatings and coated articles
    34.
    发明授权
    Durable, heat-resistant multi-layer coatings and coated articles 有权
    耐用，耐热的多层涂层和涂层制品

    公开(公告)号：US08501277B2

    公开(公告)日：2013-08-06

    申请号：US12151323

    申请日：2008-05-05

    申请人： Boris Kobrin ,  Dangaria Nikunji Hirji ,  Romuald Nowak ,  Michael T. Grimes

    发明人： Boris Kobrin ,  Dangaria Nikunji Hirji ,  Romuald Nowak ,  Michael T. Grimes

    IPC分类号： C23C16/00

    CPC分类号： H01L23/564 ,  B81B3/0075 ,  B81B2207/115 ,  B81C1/00206 ,  B81C1/0038 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02214 ,  H01L21/02271 ,  H01L21/02304 ,  H01L21/3127 ,  H01L21/3141 ,  H01L21/31604 ,  H01L21/31612 ,  H01L21/3162 ,  H01L23/29 ,  H01L2924/0002 ,  H01L2924/12044 ,  H01L2924/00

    摘要： A method of providing a durable protective coating structure which comprises at least three layers, and which is stable at temperatures in excess of 400° C., where the method includes vapor depositing a first layer deposited on a substrate, wherein the first layer is a metal oxide adhesion layer selected from the group consisting of an oxide of a Group IIIA metal element, a Group IVB metal element, a Group VB metal element, and combinations thereof; vapor depositing a second layer upon said first layer, wherein said second layer includes a silicon-containing layer selected from the group consisting of silicon oxide, silicon nitride, and silicon oxynitride; and vapor depositing a third layer upon said second layer, wherein said third layer is a functional organic-comprising layer. Numerous articles useful in electronics, MEMS, nanoimprinting lithography, and biotechnology applications can be fabricated using the method.

    摘要翻译： 一种提供耐久保护涂层结构的方法，其包括至少三层，并且在超过400℃的温度下是稳定的，其中所述方法包括气相沉积沉积在基底上的第一层，其中所述第一层为 金属氧化物粘附层，其选自由IIIA族金属元素的氧化物，IVB族金属元素，VB族金属元素及其组合组成的组中; 在所述第一层上气相沉积第二层，其中所述第二层包括选自氧化硅，氮化硅和氮氧化硅的含硅层; 并在所述第二层上气相沉积第三层，其中所述第三层是含功能的有机物层。 可以使用该方法制造在电子，MEMS，纳米压印光刻和生物技术应用中有用的许多制品。

    Controlled vapor deposition of biocompatible coatings over surface-treated substrates
    37.
    发明申请
    Controlled vapor deposition of biocompatible coatings over surface-treated substrates 有权
    经表面处理的基材上生物相容性涂层的控制气相沉积

    公开(公告)号：US20060088666A1

    公开(公告)日：2006-04-27

    申请号：US11295129

    申请日：2005-12-05

    申请人： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak

    发明人： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak

    IPC分类号： C23C16/00

    CPC分类号： B05D1/60 ,  B05D3/064 ,  B82Y30/00

    摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, a siloxane substrate surface is treated using a combination of ozone and UV radiation to render the siloxane surface more hydrophilic, and subsequently a functional coating is applied in-situ over the treated surface of the siloxane substrate.

    摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在各种基底上施加层和涂层。 该方法和装置可用于制造生物功能装置，生物MEMS装置以及制造用于生物应用的微流体装置。 在一个重要的实施方案中，使用臭氧和UV辐射的组合处理硅氧烷底物表面，以使硅氧烷表面更亲水，随后在硅氧烷底物的处理表面上原位施加功能性涂层。

    Vapor deposited functional organic coatings
    38.
    发明申请
    Vapor deposited functional organic coatings 审中-公开
    气相沉积功能有机涂层

    公开(公告)号：US20060029732A1

    公开(公告)日：2006-02-09

    申请号：US10912656

    申请日：2004-08-04

    申请人： Boris Kobrin ,  William Ashurst ,  Jeffrey Chinn ,  Romuald Nowak

    发明人： Boris Kobrin ,  William Ashurst ,  Jeffrey Chinn ,  Romuald Nowak

    IPC分类号： C23C16/00

    CPC分类号： C23C16/0272 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/56

    摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of organic films/coatings containing a variety of functional groups on substrates. Most substrates can be coated using the method of the invention. The substrate surface is halogenated using a vaporous halogen-containing compound, followed by a reaction with at least one organic molecule containing at least one nucleophilic functional group capable of reacting with a halogenated substrate surface. The halogenation of the substrate surface and the subsequent reaction with the organic molecule nucleophilic functional group are carried out in the same process chamber in a manner such that the halogenated substrate surface does not lose its functionality prior to reaction with the nucleophilic functional group(s) on the organic molecule. Typically the process chamber is operated under a pressure ranging from about 1 mTorr to about 10 Torr.

    摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上应用含有各种官能团的有机膜/涂层。 可以使用本发明的方法涂覆大多数基底。 使用含卤素的化合物将底物表面卤化，然后与至少一种含有至少一个能够与卤化基质表面反应的亲核官能团的有机分子反应。 衬底表面的卤化和随后与有机分子亲核官能团的反应在相同的处理室中进行，使得卤化的衬底表面在与亲核官能团反应之前不失去其官能团， 在有机分子上。 通常，处理室在约1mTorr至约10Torr的压力下操作。

    Controlled deposition of silicon-containing coatings adhered by an oxide layer
    39.
    发明申请
    Controlled deposition of silicon-containing coatings adhered by an oxide layer 有权
    由氧化物层附着的含硅涂层的控制沉积

    公开(公告)号：US20050271809A1

    公开(公告)日：2005-12-08

    申请号：US10862047

    申请日：2004-06-04

    申请人： Boris Kobrin ,  Romuald Nowak ,  Richard Yi ,  Jeffrey Chinn

    发明人： Boris Kobrin ,  Romuald Nowak ,  Richard Yi ,  Jeffrey Chinn

    IPC分类号： C23C16/00 ,  C23C16/02 ,  C23C16/40

    CPC分类号： B82Y30/00 ,  C23C16/0227 ,  C23C16/402

    摘要： We have developed an improved vapor-phase deposition method and apparatus for the application of films/coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.

    摘要翻译： 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上施加膜/涂层。 该方法提供在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 除了控制添加到处理室中的反应物的量之外，本发明需要精确控制处理室中的总压力（其小于大气压），存在于处理室中的每种气态组分的部分蒸气压 处理室，衬底温度以及典型地在所述处理室内的主处理表面的温度。 对这种变量组合的控制决定了使用该方法形成的膜/涂层或多层膜/涂层的许多特性。 通过改变这些工艺参数，可以控制所生产的膜/涂层的粗糙度和厚度。

    Method for controlled application of reactive vapors to produce thin films and coatings
    40.
    发明申请
    Method for controlled application of reactive vapors to produce thin films and coatings 有权
    用于控制应用反应蒸气以产生薄膜和涂层的方法

    公开(公告)号：US20050109277A1

    公开(公告)日：2005-05-26

    申请号：US11018173

    申请日：2004-12-21

    申请人： Boris Kobrin ,  Romuald Nowak ,  Richard Yi ,  Jeffrey Chinn

    发明人： Boris Kobrin ,  Romuald Nowak ,  Richard Yi ,  Jeffrey Chinn

    IPC分类号： B05D1/18 ,  B05D3/14 ,  B05D7/24 ,  C09D4/00 ,  C23C16/00 ,  C23C16/455 ,  H01L20060101

    CPC分类号： B82Y30/00 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  B82Y40/00 ,  C09D4/00 ,  C23C16/4485 ,  C08G77/04

    摘要： A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant.

    摘要翻译： 一种用于在基底上施加薄层和涂层的气相沉积方法和装置。 该方法和装置可用于制造电子设备，微机电系统（MEMS），生物MEMS装置，微型和纳米压印光刻以及微流体装置。 用于实施该方法的装置提供了在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 该装置提供在单一步骤期间或当涂层形成过程中存在许多不同的单独步骤时精确添加量的不同组合的反应物。 将蒸气形式的每种反应物的精确加入在指定温度下计量到预定设定体积至指定压力，以提供高精度的反应物。