摘要:
A normally-off operation type HEMT device excellent in characteristics can be realized. A two-dimensional electron gas region is formed in a periphery of a hetero-junction interface of a base layer and a barrier layer, so that access resistance in an access portion, that is, between a drain and a gate and between a gate and a source is sufficiently lowered, and at the same time, a P-type region is formed immediately under the gate. This realizes a normally-off type HEMT device having a low on-resistance. Further, when a film thickness of an insulating layer is defined as t (nm) and a relative permittivity of a substance forming the insulating layer is defined as k, a threshold voltage as high as +3 V or more can be attained by satisfying k/t≦0.85 (nm−1).
摘要:
A semiconductor device includes an underlying layer made of a group-III nitride containing at least Al and formed on. a substrate, and a group of stacked semiconductor layers including a first semiconductor layer made of a group-III nitride, preferably GaN, a second semiconductor layer made of AlN and a third semiconductor layer made of a group-III nitride containing at least Al, preferably AlxGa1-xN where x≧0.2. The semiconductor device suppresses the reduction in electron mobility resulting from lattice defects and crystal lattice randomness. This achieves a HEMT device having a sheet carrier density of not less than 1×1013/cm2 and an electron mobility of not less than 20000 cm2/V·s at a temperature of 15 K.
摘要翻译:半导体器件包括由至少包含Al并且形成在其上的III-III族氮化物制成的下层。 衬底和包括由III族氮化物制成的第一半导体层,优选GaN,由AlN制成的第二半导体层和由至少含有Al的III-III族氮化物制成的第三半导体层的堆叠半导体层组, 优选为Al x Ga 1-x N,其中x> = 0.2。 半导体器件抑制由晶格缺陷和晶格随机性引起的电子迁移率的降低。 这实现了具有不小于1×10 13 / cm 2的片载体密度的HEMT器件,并且电子迁移率不小于20000cm 2 / > / Vs。
摘要:
A method for manufacturing a nitride film including a high-resistivity GaN layer includes a step of allowing a Group-III source gas containing an organic metal compound, a Group-V source gas containing ammonia, a carrier gas for the Group-III source gas, and a carrier gas for the Group-V source gas to flow over a predetermined monocrystalline wafer maintained at 1,000° C. or more and also includes a step of epitaxially growing a nitride film, including a GaN layer, on the monocrystalline wafer by a vapor phase reaction of the source gases. At least one of the carrier gases contains nitrogen while the wafer temperature is being increased before the reaction is carried out. At least one of the carrier gases contains hydrogen and nitrogen and has a total hydrogen and nitrogen content of 90 percent by volume or more in at least one part of the epitaxially growing step.
摘要:
A power steering system for automotive vehicles includes devices for decreasing reaction force and for increasing assisting force applied to the steering wheel in cases where steering operation is performed while the vehicle is stopped. The device comprises a cut-off valve and a bias spring biasing the cut-off valve upwardly. The area of the upper surface of the cut-off valve is larger than that of the lower surface thereof. Therefore, the cut-off valve can move downwardly against the biasing force of the bias spring to block fluid communication between a fluid pressure source and chambers of a power cylinder when fluid pressure exceeding a predetermined value is applied to the upper and lower surfaces of the cut-off valve.
摘要:
Provided is an epitaxial substrate having excellent two-dimensional electron gas characteristics and reduced internal stress due to strains. A channel layer is formed of a first group III nitride represented by Inx1Aly1Gaz1N (x1+y1+z1=1) so as to have a composition in a range determined by x1=0 and 0≦y1≦0.3. A barrier layer is formed of a second group III nitride represented by Inx2Aly2Gaz2N (x2+y2+z2=1) so as to have a composition, in a ternary phase diagram with InN, AlN and GaN being vertices, in a range surrounded by five straight lines determined in accordance with the composition (AlN molar fraction) of the first group III nitride.
摘要:
Provided is a light-receiving device which has light-receiving sensitivity superior to that of a conventional Schottky diode type light-receiving device and also has sufficiently-strengthened junction of a Schottky electrode. A first contact layer formed of AlGaN and having conductivity, a light-receiving layer formed of AlGaN, and a second contact layer formed of AlN and having a thickness of 5 nm are epitaxially formed on a predetermined substrate in the stated order, and a second electrode is brought into Schottky junction with the second contact layer, to thereby form MIS junction. Further, after the Schottky junction, heat treatment is performed under a nitrogen gas atmosphere at 600° C. for 30 seconds.
摘要:
A semiconductor device is provided such that a reverse leak current is suppressed, and a Schottky junction is reinforced. The semiconductor device includes an epitaxial substrate formed by laminating a group of group-III nitride layers on a base substrate in such a manner that (0001) surfaces of said group-III nitride layers are substantially parallel to a substrate surface, and a Schottky electrode, in which the epitaxial substrate includes a channel layer formed of a first group-III nitride having a composition of Inx1Aly1Gaz1N, a barrier layer formed of a second group-III nitride having a composition of Inx2Aly2N, and a contact layer formed of a third group-III nitride having insularity and adjacent to the barrier layer, and the Schottky electrode is connected to the contact layer. In addition, a heat treatment is performed under a nitrogen atmosphere after the gate electrode has been formed.
摘要翻译:提供半导体器件,使得抑制反向泄漏电流,并且增强肖特基结。 半导体器件包括:外延衬底,其通过在基底衬底上层叠一组III族氮化物层而形成,使得所述III族氮化物层的(0001)表面基本上平行于衬底表面,并且肖特基电极 ,其中外延衬底包括由具有In x Al 1 Al 1 Ga z N 1的组成的第一III族氮化物形成的沟道层,由具有In x 2 Al 2 N的组成的第二III族氮化物形成的阻挡层和由第三组形成的接触层 -III氮化物与隔离层相邻,并且肖特基电极连接到接触层。 此外,在形成栅电极之后,在氮气氛下进行热处理。
摘要:
An optical module includes a housing including a groove part formed inside the housing; and a receptacle received in the housing, the receptacle to which an optical connector having an optical fiber is connected, the receptacle including a brim part and a stub part where the brim part is formed in a body. An elastic body is provided in the groove part, the groove part where the brim part is provided. The elastic body is configured to adhere to and hold the stub part.
摘要:
An underlying film 2 of a group III nitride is formed on a substrate 1 by vapor phase deposition. The substrate 1 and the underlying film 2 are subjected to heat treatment in the present of hydrogen to remove the underlying film 2 so that the surface of the substrate 1 is roughened. A seed crystal film 4 of a group III nitride single crystal is formed on a surface of a substrate 1A by vapor phase deposition. A group III nitride single crystal 5 is grown on the seed crystal film 4 by flux method.
摘要:
An optical module includes a housing including a groove part formed inside the housing; and a receptacle received in the housing, the receptacle to which an optical connector having an optical fiber is connected, the receptacle including a brim part and a stub part where the brim part is formed in a body. An elastic body is provided in the groove part, the groove part where the brim part is provided. The elastic body is configured to adhere to and hold the stub part.