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92 条记录 (耗时 0.042 秒)

    Chemical vapor reaction process by virtue of uniform irradiation
    31.
    发明授权
    Chemical vapor reaction process by virtue of uniform irradiation 失效
    化学蒸汽反应过程凭借均匀的照射

    公开(公告)号：US4803095A

    公开(公告)日：1989-02-07

    申请号：US154290

    申请日：1988-02-10

    申请人： Shigenori Hayashi ,  Naoki Hirose ,  Takashi Inujima ,  Kenji Ito

    发明人： Shigenori Hayashi ,  Naoki Hirose ,  Takashi Inujima ,  Kenji Ito

    IPC分类号： C23C16/48 ,  B05D3/06

    CPC分类号： C23C16/482

    摘要： An improved chemical vapor reaction system is described. The system is characterized by its light source which radiates ultraviolet light to a substrate to be processed. Before the light source, an obturating plate is placed so that the intensity of the light source is apparently reduced at the center position. With this light, the substrate is irradiated with light having uniform intensity over the surface of the substrate to be processed.

    摘要翻译： 描述了改进的化学气相反应系统。 该系统的特征在于其光源将紫外光辐射到待处理的基板。 在光源之前，放置一个闭孔板，使得光源的强度在中心位置明显减小。 利用该光，在被处理基板的表面上照射具有均匀强度的光。

    Method of fabricating the coating
    35.
    发明授权
    Method of fabricating the coating 失效
    制造涂层的方法

    公开(公告)号：US06183816B2

    公开(公告)日：2001-02-06

    申请号：US08998008

    申请日：1997-08-13

    申请人： Shunpei Yamazaki ,  Kenji Itoh ,  Shigenori Hayashi

    发明人： Shunpei Yamazaki ,  Kenji Itoh ,  Shigenori Hayashi

    IPC分类号： C23C1650

    CPC分类号： C23C16/26 ,  C23C16/5096 ,  C23C16/545 ,  G11B5/72 ,  G11B5/74 ,  G11B5/78 ,  G11B5/82 ,  G11B5/8408 ,  G11B11/10582 ,  G11B11/10584 ,  G11B11/10586 ,  Y10S427/104 ,  Y10S428/90 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/12729 ,  Y10T428/21

    摘要： In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.

    摘要翻译： 在用于制造碳涂层的装置中，诸如磁记录介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电，以在物体表面上制造碳涂层。 此外，将电极间隔设定为6mm以下，将电极间的压力设定为15Torr〜100Torr，由此产生高密度等离子体，以在阳极侧形成离子鞘。 因此，通过轰击离子在物体的表面上制造涂层。

    Hard carbon coating for magnetic recording medium
    36.
    发明授权
    Hard carbon coating for magnetic recording medium 失效
    用于磁记录介质的硬碳涂层

    公开(公告)号：US06171674B2

    公开(公告)日：2001-01-09

    申请号：US08910352

    申请日：1997-08-13

    申请人： Shunpei Yamazaki ,  Kenji Itoh ,  Shigenori Hayashi

    发明人： Shunpei Yamazaki ,  Kenji Itoh ,  Shigenori Hayashi

    IPC分类号： G11B560

    CPC分类号： C23C16/26 ,  C23C16/5096 ,  C23C16/545 ,  G11B5/72 ,  G11B5/74 ,  G11B5/78 ,  G11B5/82 ,  G11B5/8408 ,  G11B11/10582 ,  G11B11/10584 ,  G11B11/10586 ,  Y10S427/104 ,  Y10S428/90 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/12729 ,  Y10T428/21

    摘要： In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.

    摘要翻译： 在用于制造碳涂层的装置中，诸如磁记录介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电，以在物体表面上制造碳涂层。 此外，将电极间隔设定为6mm以下，将电极间的压力设定为15Torr〜100Torr，由此产生高密度等离子体，以在阳极侧形成离子鞘。 因此，通过轰击离子在物体的表面上制造涂层。

    Plasma Processing method
    37.
    发明授权
    Plasma Processing method 失效
    等离子体处理方法

    公开(公告)号：US5648000A

    公开(公告)日：1997-07-15

    申请号：US308296

    申请日：1994-09-19

    申请人： Shunpei Yamazaki ,  Shigenori Hayashi

    发明人： Shunpei Yamazaki ,  Shigenori Hayashi

    IPC分类号： H01L21/302 ,  G03F7/42 ,  H01L21/027 ,  H01L21/3065 ,  H01L21/311

    CPC分类号： H01L21/31138 ,  G03F7/427 ,  Y10S438/906

    摘要： Ashing processing is performed using an atmosphere pressure discharge apparatus for stably producing discharge at an atmosphere pressure. Dielectric substance is arranged in a space between a pair of electrodes. A rare gas is flowed into the space. An electric field is generated in the space, thereby to produce plasma. A gas for providing oxygen to a rare gas is used as a reactive gas. The concentration of the reactive gas is 3% or less, in particular, 1% or less. Therefore, A resist film or the like formed on a substrate is removed (peeled).

    摘要翻译： 使用用于在大气压下稳定地产生放电的气氛压力排放装置进行灰化处理。 电介质物质被布置在一对电极之间的空间中。 稀有气体流入空间。 在空间中产生电场，从而产生等离子体。 将用于向稀有气体提供氧气的气体用作反应气体。 反应气体的浓度为3％以下，特别优选为1％以下。 因此，除去（剥离）形成在基板上的抗蚀剂膜等。

    Plasma processing method and plasma generating device
    39.
    发明授权
    Plasma processing method and plasma generating device 失效
    等离子体处理方法和等离子体发生装置

    公开(公告)号：US5198724A

    公开(公告)日：1993-03-30

    申请号：US777708

    申请日：1991-10-21

    申请人： Hideomi Koinuma ,  Shunpei Yamazaki ,  Shigenori Hayashi ,  Akiharu Miyanaga ,  Tadashi Shiraishi

    发明人： Hideomi Koinuma ,  Shunpei Yamazaki ,  Shigenori Hayashi ,  Akiharu Miyanaga ,  Tadashi Shiraishi

    IPC分类号： C23F4/00 ,  B29C47/12 ,  B29C59/14 ,  H01J37/305 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H05H1/26 ,  H05H1/46

    CPC分类号： H01J37/32009 ,  B29C47/12 ,  B29C59/14 ,  H01J37/32532 ,  H05H1/46 ,  B29C47/0021 ,  B29K2079/08

    摘要： A plasma generating device includes a central conductor, a peripheral cylindrical conductor surrounding the central conductor, an insulating cylinder interposed between the central conductor and the peripheral conductor in order to prevent direct arc discharge from occurring between the central conductor and the peripheral conductor. The central and peripheral conductors and the insulating cylinder are coaxially arranged in order to define a cylindrical discharging space therein. By applying a high frequency energy to the central conductor, glow discharge is caused between the central and peripheral conductors. A reactive gas is introduced from one end of the discharging space, excited by the glow discharge and goes out from the other end as an excited plasma to a working place where a work piece is processed by the plasma.

    摘要翻译： 等离子体产生装置包括中心导体，围绕中心导体的外围圆柱形导体，插入在中心导体和外围导体之间的绝缘圆筒，以便防止在中心导体和外围导体之间发生直接电弧放电。 中心和周边导体和绝缘筒同轴地布置以便在其中限定圆柱形放电空间。 通过向中心导体施加高频能量，在中心导体和外围导体之间产生辉光放电。 从放电空间的一端引入反应性气体，由辉光放电激发，并作为激发的等离子体从另一端排出到等离子体处理工件的工作场所。

    Carbon material containing a halogen and deposition method for same
    40.
    发明授权
    Carbon material containing a halogen and deposition method for same 失效
    含有卤素和沉积方法的碳材料

    公开(公告)号：US5120625A

    公开(公告)日：1992-06-09

    申请号：US587659

    申请日：1990-09-26

    申请人： Shunpei Yamazaki ,  Shigenori Hayashi

    发明人： Shunpei Yamazaki ,  Shigenori Hayashi

    IPC分类号： C23C16/26

    CPC分类号： C23C16/26

    摘要： An electrophotographic member and method of using same where the electrophotographic member includes an organic photosensitive member and a passivation film formed on the organic photosensitive member where the film includes a first carbon containing layer including halogen atoms and being in direct contact with the organic photosensitive member and a second carbon containing layer including halogen atoms and formed on the first carbonaceous layer, wherein the concentration of halogen atoms in the first layer is lower than that in the second layer and the thickness of the first layer is substantially less than that of the second layer.