摘要:
Provided is a pixel of a multi-stacked complementary metal-oxide semiconductor (CMOS) image sensor and a method of manufacturing the image sensor including a light-receiving unit that may include first through third photodiode layers that are sequentially stacked, an integrated circuit (IC) that is formed below the light-receiving unit, electrode layers that are formed on and below each of the first through third photodiode layers, and a contact plug that connects the electrode layer formed below each of the first through third photodiode layers with a transistor of the IC.
摘要:
An imaging apparatus includes: a rotator having a shape of a perforated circular plate and rotating around a rotating axis of a center of the perforated circular plate; and a supporter having a perforated circular plate and one side of which is connected to one side of the rotator such that the rotator is restricted only to rotation movement. The supporter includes a supporter opening/closing part a part of which is separated along the rotating axis and then rotates by a predetermined angle around the rotating axis, and the rotator includes a rotator opening/closing part a part of which integrally moves with the supporter opening/closing part.
摘要:
A dispersible carbon nanotube (“CNT”) comprising a CNT backbone and an organic moiety attached to the carbon nanotube backbone and comprising a hydroxyl substituted C6 to C14 aromatic group are described, as well as a CNT-polymer composite and a method of manufacturing the CNT-polymer composite.
摘要:
A method of detecting defects in an image sensor that may occur from a floating diffusion area of the image sensor, a tester using the method, and a control signal generator using the method include a photo diode generating charges corresponding to an image signal; a transmission transistor having a first terminal connected to a the photodiode and a second terminal connected to a floating diffusion area, thereby transmitting the charges generated in the photo diode to the floating diffusion area in response to a charge transmission control signal; and a reset transistor having a first terminal applied by a reset voltage and a second transistor connected to the floating diffusion area, thereby transmitting the reset voltage to the floating diffusion area in response to a reset control signal. The reset transistor is turned on during at least one sampling zone selected between reset level sampling and signal level sampling that are performed with respect to the image sensor.
摘要:
An imaging apparatus includes: a rotator having a shape of a perforated circular plate and rotating around a rotating axis of a center of the perforated circular plate; and a supporter having a perforated circular plate and one side of which is connected to one side of the rotator such that the rotator is restricted only to rotation movement. The supporter includes a supporter opening/closing part a part of which is separated along the rotating axis and then rotates by a predetermined angle around the rotating axis, and the rotator includes a rotator opening/closing part a part of which integrally moves with the supporter opening/closing part.
摘要:
Provided is a method of manufacturing a semiconductor device. The method includes: forming a charge storage layer on a substrate on which a gate insulating layer is formed; forming a first metal oxide layer on the charge storage layer using a first reaction source including a metal oxide layer precursor and a first oxidizing agent and changing the first metal oxide layer to a second metal oxide layer using a second reaction source including a second oxidizing agent having larger oxidizing power than the first oxidizing agent and repeating the forming of the first metal oxide layer and the changing of the first metal oxide layer to the second metal oxide layer several times to form a blocking insulating layer; and forming an electrode layer on the blocking insulating layer.
摘要:
Provided is an in-situ method of cleaning a vaporizer of an atomic layer deposition apparatus during a dielectric layer deposition process, to prevent nozzle blocking in the vaporizer and an atomic layer deposition apparatus. During the dielectric layer deposition process, the following steps are repeated: supplying a first source gas for dielectric layer deposition into a chamber of an atomic layer deposition apparatus; purging the first source gas; supplying a second source gas into the chamber of the atomic layer deposition apparatus; purging the second source gas, the in-situ method of cleaning the vaporizer is performed after supplying the first source gas for dielectric layer deposition and before supplying the first source gas again.
摘要:
Provided are 1) a method for forming a ruthenium film under a single process condition, whereby high adhesion of the ruthenium film to a lower layer is maintained, and 2) a method for manufacturing an metal-insulator-metal (MIM) capacitor using the ruthenium film forming method. The method for forming a ruthenium film includes supplying bis(isoheptane-2,4-dionato)norbornadiene ruthenium at a flow rate of 0.2–1 ccm and oxygen at a flow rate of 20–60 sccm, and depositing the ruthenium film at a temperature of 330–430° C. under a pressure of 0.5–5 Torr using chemical vapor deposition (CVD).
摘要:
The processing for controlling brake systems, which can control the release time of the brake force in consideration of the gradient degree and the load and vehicle weight when the vehicle starts after a stop, so as to prevent the vehicle from rolling backward on the slope, comprising the steps of determining if conditions of a vehicle are suitable for entering a slope start control mode; determining if air pressure in air tanks are maintained over a predetermined pressure after entering the slope start control mode, when it has been determined that the conditions of the vehicle were suitable for the slope start control mode; maintaining brake force by controlling of solenoid valves without brake pedal operation, when it has been determined that the air pressure in the air tanks were maintained over the predetermined pressure; determining if conditions of doors and transmission gear position, clutch stroke, and acceleration pedal operation are suitable for the vehicle's start, while maintaining the brake force without brake pedal operation; determining if the degree of the road gradient is within a predetermined range for the vehicle's steady start on the basis of the data detected by gradient sensor or by a driver's mode selection, when it has been determined that the various conditions were suitable for the vehicle's steady start; calculating pressure reduction rates for the air pressure in order to release the brake force on the basis of the RPM of the engine, vehicle's weight, and amount of stroke displacement applied on the clutch pedal, when it has been determined that the gradient degree is in the range for the vehicle's steady start; releasing the brake force by opening of solenoid valves according to the calculated reduced air pressure rate; and controlling ABS or ASR according to the wheel speed detected by the speed sensors, if an operation of the brake pedal is detected while the vehicle is running.