公开(公告)号：US20050181608A1

公开(公告)日：2005-08-18

申请号：US10391071

申请日：2003-03-18

申请人： Brigitte Stoeher ,  Michael Welch ,  Melisa Buie

发明人： Brigitte Stoeher ,  Michael Welch ,  Melisa Buie

IPC分类号： G03F1/00 ,  H01L21/311 ,  H01L21/302 ,  H01L21/461

CPC分类号： H01J37/321 ,  G03F1/30 ,  H01J2237/334 ,  H01L21/31116

摘要： A process is provided for etching a silicon based material in a substrate, such as a photomask, to form features with straight sidewalls, flat bottoms, and high profile angles between the sidewalls and bottom, and minimizing the formation of polymer deposits on the substrate. In the etching process, the substrate is positioned in a processing chamber, a processing gas comprising a fluorocarbon, which advantageously is a hydrogen free fluorocarbon, is introduced into the processing chamber, wherein the substrate is maintained at a reduced temperature, and the processing gas is excited into a plasma state at a reduced power level to etch the silicon based material of the substrate. The processing gas may further comprise an inert gas, such as argon.

摘要翻译： 提供了一种用于在诸如光掩模的基底中蚀刻硅基材料以形成具有直的侧壁，平坦的底部以及在侧壁和底部之间的高轮廓角度的特征并且使基底上的聚合物沉积物的形成最小化的方法。 在蚀刻工艺中，将基板定位在处理室中，将含氟碳氟化合物的处理气体（有利地是无氢氟碳化合物）引入处理室，其中基板保持在降低的温度，并且处理气体 在降低的功率水平下被激发成等离子体状态以蚀刻基板的硅基材料。 处理气体还可以包括惰性气体，例如氩气。

公开(公告)号：US06387288B1

公开(公告)日：2002-05-14

申请号：US09556951

申请日：2000-04-21

申请人： Claes Bjorkman ,  Hongching Shan ,  Michael Welch

发明人： Claes Bjorkman ,  Hongching Shan ,  Michael Welch

IPC分类号： H01L21302

CPC分类号： H01J37/32871

摘要： An apparatus and method for scavenging etchant species from a plasma formed of etchant gas prior to the etchant gas entering a primary processing chamber of a plasma reactor. There is at least one scavenging chamber, each of which is connected at an inlet thereof to an etchant gas source and at an outlet thereof to a gas distribution device of the primary processing chamber. Each scavenging chamber has a radiation applicator that irradiates the interior of the scavenging chamber and creates a plasma therein from etchant gas flowing through the chamber from the etchant gas source to the gas distribution apparatus of the primary processing chamber. The applicator uses either an inductive discharge, capacitive discharge, direct current (DC) discharge or microwave discharge to irradiate the interior of the scavenging chamber and ignite the plasma. An etchant species scavenging source is also disposed within the scavenging chamber. This source provides scavenging material that interacts with the plasma to scavenge etchant species created by the dissociation of the etchant gas in the plasma and form etch by-products comprised of substances from both the etchant species and the scavenging source. The scavenging chambers can be employed, as is or in a modified form, as excitation chambers to excite gases at optimal conditions and feed the modified gases into the primary chamber. The scavenging chamber is modified by removing its scavenging source if this source would adversely interact with the gas being excited.

摘要翻译： 在蚀刻剂气体进入等离子体反应器的初级处理室之前，从蚀刻剂气体形成的等离子体中清除蚀刻剂物质的装置和方法。 至少有一个清除室，每个清除室在其入口处连接到蚀刻剂气体源，并在其出口连接到主处理室的气体分配装置。 每个清扫室具有辐射施加器，其辐射扫气室的内部，并从流化床中的蚀刻剂气体从蚀刻剂气体源到主处理室的气体分配装置产生等离子体。 施加器使用感应放电，电容放电，直流（DC）放电或微波放电来照射扫气室的内部并点燃等离子体。 清扫室内还设有一种蚀刻物质清除源。 该源提供与等离子体相互作用的清除材料，以清除由等离子体中的蚀刻剂气体解离产生的蚀刻剂物质，并形成由来自蚀刻剂物质和清除源的物质构成的蚀刻副产物。 清除室可以按原样或以改进形式用作激发室，以在最佳条件下激发气体并将改性气体进料到主室中。 如果该源与被激发的气体不利地相互作用，则通过去除其清除源来改进扫气室。

公开(公告)号：US6113731A

公开(公告)日：2000-09-05

申请号：US735444

申请日：1997-01-02

申请人： Hongching Shan ,  Roger Lindley ,  Claes Bjorkman ,  Xue Yu Qian ,  Richard Plavidal ,  Bryan Pu ,  Ji Ding ,  Zongyu Li ,  Kuang-Han Ke ,  Michael Welch

发明人： Hongching Shan ,  Roger Lindley ,  Claes Bjorkman ,  Xue Yu Qian ,  Richard Plavidal ,  Bryan Pu ,  Ji Ding ,  Zongyu Li ,  Kuang-Han Ke ,  Michael Welch

IPC分类号： H05H1/46 ,  H01J37/32 ,  H01L21/00 ,  H01L21/02 ,  H01L21/203 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/687 ,  C23F1/02

CPC分类号： H01L21/67069 ,  H01J37/32623 ,  H01J37/3266 ,  H01L21/68735

摘要： A plasma chamber having a magnet which produces a magnetic field such that, within a region parallel to and adjacent to the workpiece, the direction of the magnetic field is approximately the vector cross product of (i) the gradient of the magnitude of the magnetic field, and (ii) a vector extending perpendicularly from the workpiece surface toward the plasma. Alternatively, the plasma chamber includes a north magnetic pole and a south magnetic pole located at distinct azimuths around the periphery of the workpiece. The azimuth of the south magnetic pole relative to the north magnetic pole is clockwise around the central axis, and each magnetic pole faces a direction which is more toward than away from a central axis of the workpiece area. An additional aspect of the invention is a plasma chamber having a rotating magnetic field produced by electromagnets spaced around the periphery of the workpiece which receive successive fixed amounts of electrical current during successive time intervals. During each transition between the time intervals, the current supplied to each electromagnet is changed relatively slowly or relatively quickly according to whether the current change includes a change in polarity.

摘要翻译： 具有磁体的等离子体室产生磁场，使得在与工件平行并邻近工件的区域内，磁场的方向近似为（i）磁场强度梯度的矢量交叉积 ，和（ii）从工件表面朝向等离子体垂直延伸的矢量。 或者，等离子体室包括北磁极和位于工件周围的不同方位角处的南磁极。 南磁极相对于北磁极的方位角是围绕中心轴顺时针旋转的，每个磁极面对的方向远离工件区域的中心轴线。 本发明的另一方面是等离子体室，其具有由围绕工件周边间隔开的电磁体产生的旋转磁场，其在连续的时间间隔期间接收连续的固定量的电流。 在时间间隔期间的每个转换期间，根据电流变化是否包括极性变化，提供给每个电磁体的电流相对缓慢或相对较快地改变。

公开(公告)号：US5400651A

公开(公告)日：1995-03-28

申请号：US252142

申请日：1994-06-01

申请人： Michael Welch

发明人： Michael Welch

IPC分类号： G01F23/26 ,  G01F23/28 ,  G01F23/284

CPC分类号： G01F23/284

摘要： An apparatus and method for measuring the water level at the bottom of a storage tank, the water level being the product-water interface between product and water within the storage tank. The apparatus includes a sensor assembly which is located at the tank bottom. The assembly has a plurality of measurement sensors arranged in a housing having slots for product and water to enter and leave the housing. Each measurement sensor is an open-circuited co-axial transmission line with a probe at its open end which functions as a monopole antenna. In preferred embodiments, the transmission lines are quarter wavelength open-circuited coaxial transmission lines. Each probe is located at a different distance from the tank bottom to cover a measurement range. The transmission lines are excited with signals which are reflected by the probes. As the level of the product-water interface changes on the probes, the capacitance of the probes also change which, in turn, change the amplitude or voltage level of the reflected signals. The voltage measurements are converted to level by a microprocessor.

摘要翻译： 用于测量储罐底部水位的装置和方法，水位是储罐内产品与水之间的产品 - 水界面。 该装置包括位于罐底部的传感器组件。 组件具有多个测量传感器，其布置在壳体中，该壳体具有用于产品和水进入和离开壳体的槽。 每个测量传感器是一个开路的同轴传输线，其开口端具有探头，用作单极天线。 在优选实施例中，传输线是四分之一波长的开路同轴传输线。 每个探头位于与罐底部不同的距离以覆盖测量范围。 传输线被由探针反射的信号激发。 随着探针上产品 - 水界面的水平变化，探针的电容也会发生变化，从而改变了反射信号的幅度或电压电平。 电压测量由微处理器转换为电平。

公开(公告)号：US08329686B2

公开(公告)日：2012-12-11

申请号：US11847330

申请日：2007-08-29

申请人： Robert H. Mach ,  Michael Welch ,  Wenhua Chu ,  Justin Rothfuss

发明人： Robert H. Mach ,  Michael Welch ,  Wenhua Chu ,  Justin Rothfuss

IPC分类号： A61K31/4439 ,  A61K31/404 ,  C07D401/14 ,  C07D403/12

CPC分类号： C07D403/14 ,  A61K51/0446 ,  A61K51/0455 ,  C07D403/12

摘要： Novel isatin analogues, including isatin analogues comprising Michael Acceptors (IMAs) are disclosed. Further disclosed are methods of synthesis of the isatin analogues, and uses of the analogues, including inhibition of caspase-3 and caspase-7, and in vivo imaging of apoptosis by Positron emission tomography (PET) or Single Photon Emission Computed Tomography (SPECT).

摘要翻译： 公开了包括Michael受体（IMA）的靛红类似物的新型靛红类似物。 进一步公开的是靛红类似物的合成方法，以及通过正电子发射断层扫描（PET）或单光子发射计算机断层扫描（SPECT）技术对胱天蛋白酶-3和半胱天冬酶-7的抑制以及细胞凋亡的体内成像的方法， 。

公开(公告)号：US07906540B2

公开(公告)日：2011-03-15

申请号：US12079649

申请日：2008-03-28

申请人： Zachary Kevin Sweeney ,  Michael Welch

发明人： Zachary Kevin Sweeney ,  Michael Welch

IPC分类号： A61K31/4196 ,  C07D249/12

CPC分类号： C07D249/12

摘要： Compounds of formula I, wherein R1, R2, R3, R4, R5, X, Y, and Ar are as defined herein or pharmaceutically acceptable salts thereof, inhibit HIV-1 reverse transcriptase and afford a method for prevention and treatment of HIV-1 infections and the treatment of AIDS and/or ARC. The present invention also relates to compositions containing compounds of formula I useful for the prevention and treatment of HIV-1 infections and the treatment of AIDS and/or ARC.

摘要翻译： 其中R1，R2，R3，R4，R5，X，Y和Ar如本文所定义的式I化合物或其药学上可接受的盐抑制HIV-1逆转录酶，并提供预防和治疗HIV-1的方法 感染和治疗艾滋病和/或ARC。 本发明还涉及含有用于预防和治疗HIV-1感染和治疗AIDS和/或ARC的式I化合物的组合物。

公开(公告)号：US20100278751A1

公开(公告)日：2010-11-04

申请号：US12771040

申请日：2010-04-30

申请人： Robert H. Mach ,  Dong Zhou ,  Michael Welch

发明人： Robert H. Mach ,  Dong Zhou ,  Michael Welch

IPC分类号： A61K49/04 ,  C07D401/04 ,  A61P43/00

CPC分类号： C07D213/73 ,  A61K51/0455

摘要： Radiolabeled 2-amino-4-alkyl-6-(haloalkyl)pyridine compounds are disclosed. In some aspects, the compounds bind to inducible nitric oxide synthase (iNOS) with high specificity. In some configurations, a compound comprising a radioisotope can be used for diagnostic imaging of iNOS distribution in a mammalian subject such as a human, using a scanning method such as positron emission tomography (PET scanning). Methods of synthesis of the compounds are also disclosed.

摘要翻译： 公开了放射性标记的2-氨基-4-烷基-6-（卤代烷基）吡啶化合物。 在一些方面，化合物以高特异性结合诱导型一氧化氮合酶（iNOS）。 在一些配置中，包括放射性同位素的化合物可以用于使用诸如正电子发射断层摄影（PET扫描）的扫描方法在诸如人类的哺乳动物受试者中iNOS分布的诊断成像。 还公开了合成方法。

公开(公告)号：US07299148B2

公开(公告)日：2007-11-20

申请号：US11177922

申请日：2005-07-08

申请人： Dean Hunt ,  Costas J. Spanos ,  Michael Welch ,  Kameshwar Poolla ,  Mason L. Freed

发明人： Dean Hunt ,  Costas J. Spanos ,  Michael Welch ,  Kameshwar Poolla ,  Mason L. Freed

IPC分类号： G01K1/12

CPC分类号： G01K1/18 ,  H05K1/147 ,  H05K1/148

摘要： This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.

摘要翻译： 本发明寻求提供可以提高用于处理工件的测量参数数据的精度的方法和装置。 本发明的一个方面包括测量由测量装置引起的测量的低变形的工艺条件的方法。 这些测量包括应用程序的数据，例如用于监视，控制和优化流程和流程工具的数据。 本发明的另一方面包括用于测量用于诸如生成用于监控，控制和优化过程和处理工具的数据的应用的基本上正确的数据的装置。

公开(公告)号：US20070091535A1

公开(公告)日：2007-04-26

申请号：US11561112

申请日：2006-11-17

申请人： Hamid Noorbakhsh ,  Siamak Salimian ,  Paul Luscher ,  James Carducci ,  Evans Lee ,  Kaushik Vaidya ,  Hongqing Shan ,  Michael Welch

发明人： Hamid Noorbakhsh ,  Siamak Salimian ,  Paul Luscher ,  James Carducci ,  Evans Lee ,  Kaushik Vaidya ,  Hongqing Shan ,  Michael Welch

IPC分类号： H01H47/26 ,  H01H47/32 ,  H01H50/12

CPC分类号： C23C16/45563 ,  C23C16/4401 ,  C23C16/4411 ,  H01J37/32522 ,  H01J37/32623 ,  H01J37/32633 ,  H01J2237/2001

摘要： A thermally controlled chamber liner comprising a passage having an inlet and outlet adapted to flow a fluid through the one or more fluid passages formed at least partially therein. The chamber liner may comprise a first liner, a second liner or both a first liner and a second liner. The thermally controlled chamber liner maintains a predetermined temperature by running fluid from a temperature controlled, fluid source through the fluid passages. By maintaining a predetermined temperature, deposition of films on the chamber liner is discouraged and particulate generation due to stress cracking of deposited films is minimized.

摘要翻译： 一种热控腔室衬套，其包括具有入口和出口的通道，其适于使流体流过至少部分地形成在其中的一个或多个流体通道。 腔室衬套可以包括第一衬垫，第二衬垫或第一衬垫和第二衬垫两者。 热控腔室衬里通过将流体从温度受控的流体源流过流体通道来维持预定的温度。 通过保持预定的温度，阻止膜在室衬里上的沉积，并且由于沉积膜的应力开裂引起的颗粒的产生被最小化。

公开(公告)号：US20050201505A1

公开(公告)日：2005-09-15

申请号：US10913950

申请日：2004-08-07

申请人： Michael Welch ,  Lucie Tang ,  Douglas Rowland

发明人： Michael Welch ,  Lucie Tang ,  Douglas Rowland

IPC分类号： B01D20060101 ,  G21G1/06

CPC分类号： H05H6/00 ,  G21G1/10

摘要： An automated process for preparing and recovering 76Br, 77Br and 124I comprises (I) bombarding enriched 76 or 77Se or enriched 124Te with a beam of protons on a targeted disk respectively to produce 76Br, 77Br and 124I respectively wherein the target is selected from (a) a round tungsten disk with a depression at its center and (b) an inclined target having about a 20° inclination with respect to the beam direction and (II) recovering the 76Br, 77Br and 124I in an automated process comprising by placing the irradiated target face up in a quartz tube in the center of a high temperature furnace utilizing a target holder and heating the irradiated target sufficient to release and recover 76Br, 77Br and 124I therefrom.

摘要翻译： 用于制备和回收76 Br，76 Br和124的自动化方法包括（I）轰击富集的76或77 / 在目标盘上分别具有一束质子束的SUP> Se或富集的124 Te，以产生76 Br Br，以及< 其目标选自（a）在其中心具有凹陷的圆形钨盘，（b）相对于光束方向具有大约20度倾斜的倾斜目标，（II）回收 在自动化过程中包括通过将照射的目标物体朝上放置在石英管的中心位置的自动化过程中，将76 Br，77 Br和124 I 高温炉利用目标保持器并加热照射的靶足以释放并从其中回收和/或从其中回收和/或从其中回收。