公开(公告)号：US20140206527A1

公开(公告)日：2014-07-24

申请号：US14235460

申请日：2012-07-30

申请人： Kimito Okumura ,  Yasushi Kobayashi ,  Ryota Hiraoka ,  Jean-Luc Dubois

发明人： Kimito Okumura ,  Yasushi Kobayashi ,  Ryota Hiraoka ,  Jean-Luc Dubois

IPC分类号： B01J27/188 ,  B01J23/30

CPC分类号： B01J27/188 ,  B01J23/30 ,  B01J35/1038 ,  B01J35/108 ,  C07C45/52 ,  C07C51/235 ,  C07C51/25 ,  C07C57/04 ,  C07C47/22

摘要： An object of the present invention is to provide a catalyst for glycerin dehydration reaction for producing unsaturated aldehyde and unsaturated carboxylic acid at higher yield by a dehydration reaction of glycerin, and that can reduce a decrease in time of the conversion ratio of glycerin and the yields of unsaturated aldehyde and of unsaturated carboxylic acid. Another object of the present invention is to provide a catalyst for glycerin dehydration reaction that can produce acrolein and acrylic acid at higher yield by the dehydration reaction of glycerin, and the catalyst has a longer life. Still another object of the present invention is to provide a method for preparing the catalysts above. A catalyst for glycerin dehydration comprising a carrier, wherein the carrier includes at least one metal oxide selected from the group consisting TiO2, SiO2, Al2O3, ZrO2, and Nb2O5, wherein the carrier includes a bimodal porous structure in which the volume ratio between a pore volume of mesopores having a pore size of more than 2 nm to less than 50 nm to a pore volume of macropores having a pore size of 50 nm or more is equal to or more than 0.5, and wherein the carrier configures to support a W-containing metal oxide thereon or a metal oxide containing at least one element selected from the group consisting of P, Si, Mo, and V, in addition to the W-containing metal oxide thereon, and to cause a catalytic dehydrogenation reaction with glycerin to produce acrolein and acrylic acid.

摘要翻译： 本发明的目的是提供一种用于甘油脱水反应的催化剂，其通过甘油的脱水反应以更高的产率生产不饱和醛和不饱和羧酸，并且可以减少甘油的转化率和产率的时间的减少 的不饱和醛和不饱和羧酸。 本发明的另一个目的是提供一种用于甘油脱水反应的催化剂，其可以通过甘油的脱水反应以更高的产率生产丙烯醛和丙烯酸，并且催化剂具有更长的使用寿命。 本发明的另一个目的是提供一种制备上述催化剂的方法。 一种用于甘油脱水的催化剂，其包含载体，其中所述载体包括选自TiO 2，SiO 2，Al 2 O 3，ZrO 2和Nb 2 O 5中的至少一种金属氧化物，其中载体包括双峰多孔结构，其中孔 孔径为50nm以上的大孔的细孔容积大于2nm〜小于50nm的介孔的体积为0.5以上，并且其中载体配置为支持W- 含有金属氧化物的金属氧化物或含有选自P，Si，Mo和V中的至少一种元素的金属氧化物，并且与其上的含W金属氧化物一起，并且与甘油进行催化脱氢反应以产生 丙烯醛和丙烯酸。

公开(公告)号：US20130236762A1

公开(公告)日：2013-09-12

申请号：US13885601

申请日：2011-08-29

申请人： Yasushi Kobayashi

发明人： Yasushi Kobayashi

IPC分类号： H01M2/10

CPC分类号： H01M2/1022 ,  H01M2/1066 ,  H04M1/026 ,  H04M1/0262

摘要： An object of the present invention is to provide a cover that is made less prone to be removed even if receiving an impact due to falling or the like, and an operation for removing the cover is made easy. An engaging piece position regulating member made of a viscoelastic body such as an urethane-based resin is provided on a left side of an elastically-deformable engaging piece of a cover, which allows an engaging projection of the engaging piece to leave from an engaging hole when the cover is removed from a device casing by manual operation and inhibits the engaging projection of the engaging piece from leaving from the engaging hole when a rate of deformation larger than a rate of deformation by manual operation is provided to the engaging piece by an impact due to falling or the like.

摘要翻译： 本发明的目的是提供一种即使接收到由于下落等引起的冲击也不容易被去除的盖，并且容易地移除盖的操作。 在盖的可弹性变形的接合件的左侧设置有由诸如聚氨酯类树脂的粘弹性体制成的接合件位置限制件，其允许接合件从接合孔离开的接合突起 当通过手动操作将盖从装置壳体移除时，当通过手动操作将变形率大于变形速率的变形率通过冲击提供给接合件时，可以阻止接合件从接合孔离开的接合突起 由于坠落等。

公开(公告)号：US08461041B2

公开(公告)日：2013-06-11

申请号：US12955525

申请日：2010-11-29

申请人： Shirou Ozaki ,  Yoshihiro Nakata ,  Yasushi Kobayashi ,  Yuichi Minoura

发明人： Shirou Ozaki ,  Yoshihiro Nakata ,  Yasushi Kobayashi ,  Yuichi Minoura

IPC分类号： H01L21/4763

CPC分类号： H01L23/53238 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/3105 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/76825 ,  H01L21/76826 ,  H01L21/76829 ,  H01L21/76831 ,  H01L23/485 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： The method of manufacturing a semiconductor device includes forming an insulating film of a silicon compound-group insulation film; forming an opening in the insulation film, applying an active energy beam in an atmosphere containing hydrocarbon gas to form a barrier layer of a crystalline SiC, and forming an interconnection structure of copper in the opening with the barrier layer formed in.

摘要翻译： 制造半导体器件的方法包括：形成硅化合物基绝缘膜的绝缘膜; 在所述绝缘膜上形成开口，在含有烃气体的气氛中施加活性能量束，形成结晶SiC的阻挡层，并且在所述开口中形成所述阻挡层中的铜的互连结构。

公开(公告)号：US08447460B2

公开(公告)日：2013-05-21

申请号：US12738301

申请日：2008-11-04

申请人： Toshihisa Nihei ,  Yasushi Kobayashi

发明人： Toshihisa Nihei ,  Yasushi Kobayashi

IPC分类号： G01M17/00

CPC分类号： G06F17/00 ,  B60K23/0808 ,  B60K2350/962 ,  B60W10/06 ,  B60W10/11 ,  B60W10/14 ,  B60W10/184 ,  B60W30/18009 ,  B60W50/082 ,  B60W50/14 ,  F16H59/08 ,  F16H63/42 ,  F16H2059/0221 ,  F16H2059/082 ,  F16H2063/426

摘要： A control state of the vehicle is switched upon operation of a control switch. Besides, a mode of travel for a travel of a vehicle is selected by operation of a travel mode selection portion. Then, it is determined whether the recommended control state recommended for the selected mode of travel and the actual control state are the same. If it is determined that they are not the same, that is, that there is a deviation between the recommended control state and the actual control state, an operation method for a control switch for realizing the control state recommended for the selected mode of travel is presented to a driver.

公开(公告)号：US20110068471A1

公开(公告)日：2011-03-24

申请号：US12955525

申请日：2010-11-29

申请人： Shirou Ozaki ,  Yoshihiro Nakata ,  Yasushi Kobayashi ,  Yuichi Minoura

发明人： Shirou Ozaki ,  Yoshihiro Nakata ,  Yasushi Kobayashi ,  Yuichi Minoura

IPC分类号： H01L23/532 ,  H01L21/768

CPC分类号： H01L23/53238 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02282 ,  H01L21/3105 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/76825 ,  H01L21/76826 ,  H01L21/76829 ,  H01L21/76831 ,  H01L23/485 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/00

摘要： The method of manufacturing a semiconductor device includes forming an insulating film of a silicon compound-group insulation film; forming an opening in the insulation film, applying an active energy beam in an atmosphere containing hydrocarbon gas to form a barrier layer of a crystalline SiC, and forming an interconnection structure of copper in the opening with the barrier layer formed in.

摘要翻译： 制造半导体器件的方法包括：形成硅化合物基绝缘膜的绝缘膜; 在绝缘膜上形成开口，在含有烃气体的气氛中施加活性能量束，形成结晶SiC的阻挡层，并在形成有阻挡层的开口中形成铜的互连结构。

公开(公告)号：US07875981B2

公开(公告)日：2011-01-25

申请号：US12037439

申请日：2008-02-26

申请人： Yasushi Kobayashi ,  Yoshihiro Nakata ,  Shirou Ozaki

发明人： Yasushi Kobayashi ,  Yoshihiro Nakata ,  Shirou Ozaki

IPC分类号： H01L23/485

CPC分类号： H01L21/31695 ,  C09D183/04 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02208 ,  H01L21/02282 ,  H01L21/3122 ,  H01L21/76801 ,  H01L21/76807 ,  H01L21/76829 ,  H01L21/76834 ,  H01L2924/0002 ,  C08L2666/54 ,  H01L2924/00

摘要： To provide an insulating film material that can be advantageously used for forming an insulating film having a low dielectric constant and excellent resistance to damage, such as etching resistance and resistance to liquid reagents, a multilayer interconnection structure in which a parasitic capacitance between the interconnections can be reduced, efficient methods for manufacturing the multilayer interconnection structure, and an efficient method for manufacturing a semiconductor device with a high speed and reliability. The insulating film material contains at least a silicon compound having a steric structure represented by Structural Formula (1) below. where, R1, R2, R3, and R4 may be the same or different and at least one of them represents a functional group containing any of a hydrocarbon and an unsaturated hydrocarbon.

摘要翻译： 为了提供一种绝缘膜材料，其可以有利地用于形成具有低介电常数和优异的耐腐蚀性（如抗蚀刻性和耐液体试剂）的绝缘膜，其中互连之间的寄生电容可以 减少用于制造多层互连结构的有效方法，以及用于制造具有高速度和可靠性的半导体器件的有效方法。 绝缘膜材料至少含有具有由下述结构式（1）表示的空间结构的硅化合物。 其中，R 1，R 2，R 3和R 4可以相同或不同，并且它们中的至少一个表示含有任何烃和不饱和烃的官能团。

公开(公告)号：US20100140807A1

公开(公告)日：2010-06-10

申请号：US12648804

申请日：2009-12-29

申请人： Yasushi Kobayashi ,  Yoshihiro Nakata ,  Shirou Ozaki

发明人： Yasushi Kobayashi ,  Yoshihiro Nakata ,  Shirou Ozaki

IPC分类号： H01L23/48 ,  H05K1/03 ,  C23F1/00 ,  H01L21/50 ,  C07F7/10

CPC分类号： H01L21/3121 ,  C08G77/60 ,  C09D183/16 ,  H01B3/46 ,  H01L21/02123 ,  H01L21/02211 ,  H01L21/02282 ,  H01L21/4857 ,  H01L21/76807 ,  H01L21/76829 ,  H01L24/02 ,  H01L24/03 ,  H01L24/11 ,  H01L2224/02319 ,  H01L2224/02333 ,  H01L2224/02381 ,  H01L2224/0401 ,  H01L2224/13111 ,  H01L2224/94 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01025 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01038 ,  H01L2924/0104 ,  H01L2924/01041 ,  H01L2924/01042 ,  H01L2924/01047 ,  H01L2924/01051 ,  H01L2924/01052 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/10253 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15787 ,  H05K3/4676 ,  H01L2224/11 ,  H01L2924/00014 ,  H01L2924/00

摘要： An insulating film material, which contains a polycarbosilane compound expressed by the following structural formula 1; where R1 may be the same or different to each other in the unit repeated “n” times, and each represents C1-4 hydrocarbon or aromatic hydrocarbon; R2 may be the same or different to each other in the unit repeated “n” times, and each represents C1-4 hydrocarbon or aromatic hydrocarbon; n is an integer of 5 to 5,000.

摘要翻译： 一种绝缘膜材料，其含有由以下结构式1表示的聚碳硅烷化合物; 其中R1可以在重复“n”次的单位中彼此相同或不同，并且各自表示C1-4烃或芳香烃; R2可以在重复“n”次的单位中彼此相同或不同，并且各自表示C1-4烃或芳族烃; n为5〜5000的整数。

公开(公告)号：US20100123194A1

公开(公告)日：2010-05-20

申请号：US12613150

申请日：2009-11-05

申请人： Kohei MIYAGAWA ,  Yasushi Kobayashi ,  Daigo Yamashina

发明人： Kohei MIYAGAWA ,  Yasushi Kobayashi ,  Daigo Yamashina

IPC分类号： H01L29/78 ,  H01L21/336

CPC分类号： H01L29/7816 ,  H01L29/0878 ,  H01L29/66689

摘要： In a semiconductor substrate of a first conductivity type, first to third drain offset regions of a second conductivity type are formed in that order in a bottom up manner. A body region of the first conductivity type is formed partly in the second drain offset region and partly in the third drain offset region. The second drain offset region has a lower impurity concentration than the first and third drain offset regions. A curvature portion of the body region is located in the second drain offset region.

摘要翻译： 在第一导电类型的半导体衬底中，以自下而上的顺序形成第二导电类型的第一至第三漏极偏移区域。 第一导电类型的主体区域部分地形成在第二漏极偏移区域中，部分地形成在第三漏极偏移区域中。 第二漏极偏移区域具有比第一和第三漏极偏移区域更低的杂质浓度。 身体区域的曲率部分位于第二漏极偏移区域中。

公开(公告)号：US20090184572A1

公开(公告)日：2009-07-23

申请号：US12375546

申请日：2007-11-28

申请人： Yoshihisa Yamada ,  Yasushi Kobayashi ,  Tatsushi Takasu ,  Kota Shimoga

发明人： Yoshihisa Yamada ,  Yasushi Kobayashi ,  Tatsushi Takasu ,  Kota Shimoga

IPC分类号： B60T8/1755

CPC分类号： B60T8/1755 ,  B60T2201/14

摘要： A brake control device that controls braking forces applied to wheels to stabilize the behavior of a vehicle turning a corner, and includes a turning condition detection unit detecting a turning condition of the vehicle; a braking amount setting unit setting braking amounts for the respective wheels based on the turning condition detected by the turning condition detection unit; a brake control unit applying braking forces to the wheels according to the braking amounts set by the braking amount setting unit; and a road surface friction coefficient estimation unit estimating a road surface friction coefficient of the road on which the vehicle is running. The braking amount setting unit changes upper limits of the braking amounts for the respective wheels according to the road surface friction coefficient when the vehicle is in a center differential lock mode or a direct four-wheel drive mode.

摘要翻译： 一种制动控制装置，其控制施加于车轮的制动力，以稳定车辆转弯的行为，并且包括检测车辆的转弯状态的转弯状态检测部; 制动量设定单元，基于由所述转弯条件检测单元检测到的转弯状态来设定各个车轮的制动量; 制动控制单元，根据由制动量设定单元设定的制动量向车轮施加制动力; 以及估计车辆行驶的道路的路面摩擦系数的路面摩擦系数估计单元。 制动量设定单元根据车辆处于中央差速锁定模式或直接四轮驱动模式时的路面摩擦系数来改变各车轮的制动量的上限。

公开(公告)号：US20090036707A1

公开(公告)日：2009-02-05

申请号：US11919911

申请日：2006-05-11

申请人： Atsushi Sudo ,  Tatsuhiko Kurakami ,  Toshitake Kojima ,  Shigeo Hayashimoto ,  Yasushi Kobayashi

发明人： Atsushi Sudo ,  Tatsuhiko Kurakami ,  Toshitake Kojima ,  Shigeo Hayashimoto ,  Yasushi Kobayashi

IPC分类号： C07C51/23 ,  B01J27/24 ,  C07C51/235

CPC分类号： C07C51/235 ,  B01J23/002 ,  B01J27/199 ,  B01J35/08 ,  B01J37/0045 ,  B01J37/0221 ,  B01J2231/70 ,  B01J2523/00 ,  C07C51/00 ,  C07C51/377 ,  C07C57/04 ,  B01J2523/15 ,  B01J2523/17 ,  B01J2523/51 ,  B01J2523/53 ,  B01J2523/55 ,  B01J2523/68

摘要： It is an object of the present invention to provide a catalyst having excellent performance and high mechanical strength for use in the production of methacrylic acid.A method for manufacturing a catalyst comprising essential active components of molybdenum, phosphorus, vanadium, cesium, ammonia, copper, and antimony for use in the production of methacrylic acid, comprising drying a slurry prepared by mixing a compound(s) containing the essential active components with water and then calcining the resulting dry powder and molding the calcined powder.

摘要翻译： 本发明的目的是提供一种用于生产甲基丙烯酸的具有优异性能和高机械强度的催化剂。 一种用于制造催化剂的方法，其包括用于生产甲基丙烯酸的钼，磷，钒，铯，氨，铜和锑的必需活性组分，包括干燥通过将含有必需活性物质的化合物 用水组分，然后煅烧所得干粉，并将煅烧粉末成型。