CAVITY SUBSTRATE HAVING DIRECTIONAL OPTOELECTRONIC TRANSMISSION CHANNEL AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230161103A1

    公开(公告)日:2023-05-25

    申请号:US18093981

    申请日:2023-01-06

    CPC classification number: G02B6/122 G02B6/132 G02B6/136 G02B2006/121

    Abstract: A cavity substrate may have a directional optoelectronic transmission channel. The cavity substrate includes a support frame, a first dielectric layer on a first surface of the support frame, and a second dielectric layer on a second surface of the support frame. The support frame, the first dielectric layer and the second dielectric layer constitute a closed cavity having an opening on one side in the length direction of the substrate, a first circuit layer is arranged on the inner surface of the first dielectric layer facing the cavity, an electrode connected with an optical communication device is arranged on the first circuit layer, the electrode is electrically conducted with the first circuit layer, a second circuit layer is arranged on the outer surfaces of the first dielectric layer and the second dielectric layer, and the first circuit layer and the second circuit layer are communicated through a via column.

    SUPPORT FRAME STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230154859A1

    公开(公告)日:2023-05-18

    申请号:US18099107

    申请日:2023-01-19

    Abstract: Disclosed are a method for manufacturing a support frame structure and a support frame structure. The support frame structure is used for embedded packaging, and includes: a metal plate comprising a support region and an opening region, at least one upper dielectric hole and at least one lower dielectric hole being formed respectively in upper and lower surfaces of the support region, the upper dielectric hole being communicated with the lower dielectric hole; at least one set of metal pillars comprising an upper metal pillar and a lower metal pillar, the upper metal pillar and the lower metal pillar being vertically connected to upper and lower surfaces of the metal plate, respectively; a dielectric layer comprising an upper dielectric layer and a lower dielectric layer, the upper dielectric layer and the lower dielectric layer being correspondingly formed on the upper surface of the metal plate and the upper dielectric hole and on a lower surface of the metal plate and the lower dielectric hole, respectively; and at least one core embedding cavity arranged in the opening region, running through the dielectric layer and the metal plate, and spaced from the upper dielectric hole and the lower dielectric hole by the dielectric layer.

    SIGNAL-HEAT SEPARATED TMV PACKAGING STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230127494A1

    公开(公告)日:2023-04-27

    申请号:US17821725

    申请日:2022-08-23

    Abstract: A signal-heat separated TMV packaging structure includes an insulating dielectric material, an inner signal line layer arranged in the insulating dielectric material, an outer signal line layer, a heat dissipation metal face and a chip. A first side of the insulating dielectric material is provided with an isolating layer. The outer signal line layer is arranged on a surface of a second side of the insulating dielectric material and is connected with the inner signal line layer through a TMV structure. The heat dissipation metal face is arranged on a surface of the first side of the insulating dielectric material, and is separated from the inner signal line layer. The chip is embedded in the insulating dielectric material, with an active face in electrically-conductive connection with the inner signal line layer and a passive face in heat transfer connection with the heat dissipation metal face.

    CYCLIC COOLING EMBEDDED PACKAGING SUBSTRATE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20230010115A1

    公开(公告)日:2023-01-12

    申请号:US17664417

    申请日:2022-05-22

    Abstract: A cyclic cooling embedded packaging substrate and a manufacturing method thereof are disclosed. The packaging substrate includes a dielectric material body, a chip, a first metal face, a second metal face and a first trace. The dielectric material body is provided with a packaging cavity, the chip is packaged in the packaging cavity, the first metal face is embedded in the dielectric material body, covers and is connected to a heat dissipation face of the chip. The second metal face is embedded in the dielectric material body, connected to a surface of the first metal face, and is provided with a first cooling channel pattern for forming a cooling channel. The first trace is arranged on a surface of the dielectric material body or embedded therein, and is connected with a corresponding terminal on an active face of the chip through a first conductive structure.

    CIRCUIT PREARRANGED HEAT DISSIPATION EMBEDDED PACKAGING STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20220068760A1

    公开(公告)日:2022-03-03

    申请号:US17411144

    申请日:2021-08-25

    Abstract: A circuit prearranged heat dissipation embedded packaging structure according to an embodiment of the present disclosure includes at least one chip and a support frame surrounding the at least one chip. The support frame may include a via pillar passing through the support frame in the height direction, a first wiring layer on a first surface of the support frame, and a heat dissipation layer on the back face of the chip. The first wiring layer is flush with or higher than the first surface, the first wiring layer is in conductive connection with the heat dissipation layer, a gap between the chip and the frame is completely filled with the dielectric material, a second wiring layer is formed on a terminal face of the chip, and the second wiring layer is in conductive connection with the first wiring layer through the via pillar.

    SUPPORT FRAME STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20210407921A1

    公开(公告)日:2021-12-30

    申请号:US16948518

    申请日:2020-09-22

    Abstract: Disclosed are a method for manufacturing a support frame structure and a support frame structure. The method includes steps of: providing a metal plate including a support region and an opening region; forming an upper dielectric hole and a lower dielectric hole respectively at an upper surface and a lower surface of the support region by photolithography, with a metal spacer connected between the upper dielectric hole and the lower dielectric hole; forming an upper metal pillar on an upper surface of the metal plate, and laminating an upper dielectric layer which covers the upper metal pillar and the upper dielectric hole; etching the metal spacer, forming a lower metal pillar on the lower surface of the metal plate, and laminating a lower dielectric layer which covers the lower metal pillar and the lower dielectric hole.

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