Abstract:
Method and system provide a variable delay between the external trigger pulse for a laser system and the light pulse such that the total delay is controlled. The method and system utilize a digital time measuring circuit which measure a time interval which corresponds to a time between the generation of the trigger pulse and generation or a laser light pulse. Based on the measurement by the digital time measuring circuit a processor controls a delay circuit which thereby controls the time between the trigger pulse and the generation of the laser light pulse.
Abstract:
A beam parameter monitoring unit for coupling with a molecular fluorine (F2) or ArF laser resonator that produces an output beam having a wavelength below 200 nm includes a detector and a beam path enclosure. The unit may also include a beam splitter within the enclosure for separating the output beam into first and second components, or first and second beam are attained by other means. The detector measures at least one optical parameter of the second component of the output beam. The beam path enclosure includes one or more ports for purging the beam path enclosure with an inert gas to maintain the enclosure substantially free of sub-200 nm photoabsorbing species. An optical path of the second component of the output beam through the enclosure from the laser resonator to the detector is substantially free of ssub-200 nm photoabsorbing species so that the second beam component reaches the detector without substantial attenuation from the photoabsorbing species, while the first component is used for processing a workpiece.
Abstract translation:用于与产生具有低于200nm的波长的输出光束的分子氟(F 2 N 2)或ArF激光谐振器耦合的光束参数监测单元包括检测器和光束路径外壳。 该单元还可以包括在外壳内的分束器,用于将输出光束分离成第一和第二部件,或者通过其它方式获得第一和第二光束。 检测器测量输出光束的第二分量的至少一个光学参数。 光束路径外壳包括用于用惰性气体吹扫光束路径外壳的一个或多个端口,以保持外壳基本上不含亚200nm光吸收物质。 从激光谐振器到检测器的通过外壳的输出光束的第二分量的光路基本上不含ssub-200nm光吸收物质,使得第二光束分量到达检测器而不受光吸收物质的实质衰减,而 第一部件用于加工工件。
Abstract:
An excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber and connected to the discharge circuit for energizing the gas mixture, a resonant cavity including the discharge chamber for generating a laser beam, and an intracavity homogenizer for homogenizing an intensity profile of the laser beam generated in the resonator. The intracavity homogenizer may include each of a first bi-prism and a second bi-prism disposed at opposite ends of the resonant cavity and having the discharge chamber disposed therebetween. In this case, optical axes of the first bi-prism and the second bi-prism are each at least substantially parallel to the optical axis of the laser beam.
Abstract:
An excimer or molecular fluorine laser system generates a laser output bandwidth of less than 0.6 pm, and preferably 0.5-0.4 pm or less. The laser resonator has a line-narrowing unit preferably including a grating, and preferably also a beam expander, and may include one or more etalons or other interferometric devices. The grating may be preferably a blazed grating having a blaze angle greater than 76null, and is preferably around 80null. The grating structure is preferably defined by the surface of the grating substrate. The substrate is preferably aluminum. The system may further include an amplifier for increasing the energy of the sub-0.6 nm output beam.
Abstract:
An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and/or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.
Abstract:
A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.
Abstract:
An efficient F2 laser is provided with improvements in line selection, monitoring capabilities, alignment stabilization, performance at high repetition rates and polarization characteristics. Line selection is preferably provided by a transmission grating or a grism. The grating or grism preferably outcouples the laser beam. The line selection may be fully provided at the front optics module. A monitor grating and an array detector monitor the intensity of the selected (and unselected) lines for line selection control. An energy detector is enclosed in an inert gas purged environment at slight overpressure. A blue or green reference beam is used for F2 laser beam alignment stabilization and/or spectral monitoring of the output laser beam. The blue or green reference beam advantageously is not reflected out with a atomic fluorine red emission of the laser and is easily resolved from the red emission. The clearing ratio of the laser gas flow through the discharge area is reduced by narrowing the discharge width using improved laser electrodes and/or by increasing the gas flow rate through the discharge while maintaining uniformity by using a more aerodynamic discharge chamber. The F2 laser beam is substantially polarized, e.g., 98% or better, using at least one intracavity polarization element preferably in combination with Brewster discharge chamber windows.
Abstract:
An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.
Abstract:
An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.
Abstract:
Method and system for providing an excimer or molecular fluorine laser including a laser tube filled with a laser gas surrounded by an optical resonator, where the laser tube has multiple electrodes including a pair of main discharge electrodes connected to a discharge circuit for exciting the laser gas to produce a laser output beam. The discharge circuit has an all solid state switch and preferably does not include a transformer. The solid state switch includes multiple solid state devices that may be capable of switching voltages in excess of 12 kV, such as 14-32 kV or more, or the voltage needed to switch the laser. The series of switches has a rise time of approximately less than 300 ns, and preferably around 100 ns or less. The switch may be capable of switching voltages of slightly more than half, but less than the entire voltage needed to produce laser pulses of desired energies, and a voltage doubling circuit may be used to produce the voltage required to produce the desired output pulse energies. An oscillator-amplifier configuration may be used, wherein an oscillator switch may be capable of switching voltages less than the entire voltage needed to produce the desired laser pulse energies, while the amplifier amplifies the pulses to the desired pulse energies.