System and method for delay compensation for a pulsed laser
    31.
    发明授权
    System and method for delay compensation for a pulsed laser 有权
    用于脉冲激光器的延迟补偿的系统和方法

    公开(公告)号:US06993052B2

    公开(公告)日:2006-01-31

    申请号:US10441768

    申请日:2003-05-20

    CPC classification number: H01S3/097 H01S3/225

    Abstract: Method and system provide a variable delay between the external trigger pulse for a laser system and the light pulse such that the total delay is controlled. The method and system utilize a digital time measuring circuit which measure a time interval which corresponds to a time between the generation of the trigger pulse and generation or a laser light pulse. Based on the measurement by the digital time measuring circuit a processor controls a delay circuit which thereby controls the time between the trigger pulse and the generation of the laser light pulse.

    Abstract translation: 方法和系统在激光系统的外部触发脉冲与光脉冲之间提供可变延迟,使得总延迟受到控制。 该方法和系统利用数字时间测量电路,其测量对应于产生触发脉冲与产生或激光脉冲之间的时间的时间间隔。 基于数字时间测量电路的测量,处理器控制延迟电路,从而控制触发脉冲与激光脉冲的产生之间的时间。

    Energy monitor for molecular fluorine laser
    32.
    发明授权
    Energy monitor for molecular fluorine laser 失效
    分子氟激光能量监测仪

    公开(公告)号:US06907058B2

    公开(公告)日:2005-06-14

    申请号:US09771013

    申请日:2001-01-25

    CPC classification number: G01J1/4257 H01S3/223

    Abstract: A beam parameter monitoring unit for coupling with a molecular fluorine (F2) or ArF laser resonator that produces an output beam having a wavelength below 200 nm includes a detector and a beam path enclosure. The unit may also include a beam splitter within the enclosure for separating the output beam into first and second components, or first and second beam are attained by other means. The detector measures at least one optical parameter of the second component of the output beam. The beam path enclosure includes one or more ports for purging the beam path enclosure with an inert gas to maintain the enclosure substantially free of sub-200 nm photoabsorbing species. An optical path of the second component of the output beam through the enclosure from the laser resonator to the detector is substantially free of ssub-200 nm photoabsorbing species so that the second beam component reaches the detector without substantial attenuation from the photoabsorbing species, while the first component is used for processing a workpiece.

    Abstract translation: 用于与产生具有低于200nm的波长的输出光束的分子氟(F 2 N 2)或ArF激光谐振器耦合的光束参数监测单元包括检测器和光束路径外壳。 该单元还可以包括在外壳内的分束器,用于将输出光束分离成第一和第二部件,或者通过其它方式获得第一和第二光束。 检测器测量输出光束的第二分量的至少一个光学参数。 光束路径外壳包括用于用惰性气体吹扫光束路径外壳的一个或多个端口,以保持外壳基本上不含亚200nm光吸收物质。 从激光谐振器到检测器的通过外壳的输出光束的第二分量的光路基本上不含ssub-200nm光吸收物质,使得第二光束分量到达检测器而不受光吸收物质的实质衰减,而 第一部件用于加工工件。

    Intra-cavity beam homogenizer resonator
    33.
    发明申请
    Intra-cavity beam homogenizer resonator 失效
    腔内光束均匀器谐振器

    公开(公告)号:US20030227956A1

    公开(公告)日:2003-12-11

    申请号:US10035919

    申请日:2001-10-18

    CPC classification number: H01S3/225 H01S3/005 H01S3/08004 H01S3/2258

    Abstract: An excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber and connected to the discharge circuit for energizing the gas mixture, a resonant cavity including the discharge chamber for generating a laser beam, and an intracavity homogenizer for homogenizing an intensity profile of the laser beam generated in the resonator. The intracavity homogenizer may include each of a first bi-prism and a second bi-prism disposed at opposite ends of the resonant cavity and having the discharge chamber disposed therebetween. In this case, optical axes of the first bi-prism and the second bi-prism are each at least substantially parallel to the optical axis of the laser beam.

    Abstract translation: 准分子或分子氟激光系统包括填充有气体混合物的放电室,放电室内的多个电极,并连接到用于激励气体混合物的放电电路,包括用于产生激光束的放电室的谐振腔,以及 腔内均匀器,用于均化在谐振器中产生的激光束的强度分布。 腔内均质器可以包括设置在谐振腔的相对端处并且其间布置有放电室的第一双棱镜和第二双棱镜中的每一个。 在这种情况下,第一双棱镜和第二双棱镜的光轴至少基本上平行于激光束的光轴。

    Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
    35.
    发明申请
    Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays 有权
    用于产生高输出功率气体放电源的极紫外辐射和/或软X射线的方法和装置

    公开(公告)号:US20020168049A1

    公开(公告)日:2002-11-14

    申请号:US10109581

    申请日:2002-03-27

    Abstract: An EUV photon source includes a plasma chamber filled with a gas mixture, multiple electrodes within the plasma chamber defining a plasma region and a central axis, a power supply circuit connected to the electrodes for delivering a main pulse to the electrodes for energizing the plasma around the central axis to produce an EUV beam output along the central axis, and a preionizer for ionizing the gas mixture in preparing to form a dense plasma around the central axis upon application of the main pulse from the power supply circuit to the electrodes. The EUV source preferably includes an ionizing unit and precipitator for collecting contaminant particulates from the output beam path. A set of baffles may be disposed along the beam path outside of the pinch region to diffuse gaseous and contaminant particulate flow emanating from the pinch region and to absorb or reflect acoustic waves emanating from the pinch region away from the pinch region. A clipping aperture, preferably formed of ceramic and/or Al2O3, for at least partially defining an acceptance angle of the EUV beam. The power supply circuit may generates the main pulse and a relatively low energy prepulse for homogenizing the preionized plasma prior to the main pulse. A multi-layer EUV mirror is preferably disposed opposite a beam output side of the pinch region for reflecting radiation along the central axis for output along the beam path of the EUV beam. The EUV mirror preferably has a curved contour for substantially collimating or focusing the reflected radiation. In particular, the EUV mirror may preferably have a hyperbolic contour.

    Abstract translation: EUV光子源包括填充有气体混合物的等离子体室,等离子体室内限定等离子体区域和中心轴线的多个电极,连接到电极的电源电路,用于将主脉冲传送到电极以激励等离子体周围 沿着中心轴产生EUV射束的中心轴线,以及用于使气体混合物离子化的准分子离子化器,用于在将电脉冲从电源电路施加到电极上时在中心轴周围形成致密等离子体。 EUV源优选地包括用于从输出光束路径收集污染物微粒的电离单元和沉淀器。 可以沿着夹紧区域外的光束路径布置一组挡板以扩散从夹持区域发出的气体和污染物颗粒流,并吸收或反射从夹紧区域远离夹点区域发出的声波。 剪切孔,优选地由陶瓷和/或Al 2 O 3形成,用于至少部分地限定EUV束的接受角。 电源电路可以产生主脉冲和相对较低能量的前脉冲,用于在主脉冲之前均化预电离的等离子体。 多层EUV反射镜优选地设置成与夹持区域的光束输出侧相对,用于沿着中心轴反射辐射,以沿着EUV光束的光束路径输出。 EUV镜子优选地具有弯曲轮廓,用于基本上准直或聚焦反射的辐射。 特别地,EUV镜可以优选地具有双曲线轮廓。

    Resonator arrangement for bandwidth control
    36.
    发明申请
    Resonator arrangement for bandwidth control 失效
    用于带宽控制的谐振器布置

    公开(公告)号:US20020141471A1

    公开(公告)日:2002-10-03

    申请号:US10035351

    申请日:2001-10-19

    Abstract: A line-narrowed excimer or molecular fluorine laser system includes a discharge chamber filled with a gas mixture at least including molecular fluorine and a buffer gas, multiple electrodes within the discharge chamber connected to a discharge circuit for energizing the gas mixture, a resonator including a pair of resonator reflecting surfaces disposed on either side of the discharge chamber for generating a laser beam, and a line-narrowing/selection unit within the resonator for narrowing the bandwidth of the laser beam. The resonator further includes a third reflecting surface which is deformable and disposed between the pair of resonator reflecting surfaces. The line-narrowing/selection unit preferably includes a beam expander and a dispersive element, wherein the deformable third reflecting surface is disposed between the beam expander and the dispersive element.

    Abstract translation: 线狭窄的准分子或分子氟激光系统包括填充有至少包括分子氟和缓冲气体的气体混合物的放电室,放电室内的多个电极连接到用于激励气体混合物的放电电路,包括 一对谐振器反射表面,设置在用于产生激光束的放电室的任一侧上;以及在谐振器内的线窄选择单元,用于使激光束的带宽变窄。 谐振器还包括可变形并设置在该对谐振器反射表面之间的第三反射表面。 线条变窄/选择单元优选地包括光束扩展器和分散元件,其中可变形的第三反射表面设置在光束扩展器和色散元件之间。

    Molecular fluorine laser
    37.
    发明申请
    Molecular fluorine laser 失效
    分子氟激光

    公开(公告)号:US20020114362A1

    公开(公告)日:2002-08-22

    申请号:US10116903

    申请日:2002-04-05

    Abstract: An efficient F2 laser is provided with improvements in line selection, monitoring capabilities, alignment stabilization, performance at high repetition rates and polarization characteristics. Line selection is preferably provided by a transmission grating or a grism. The grating or grism preferably outcouples the laser beam. The line selection may be fully provided at the front optics module. A monitor grating and an array detector monitor the intensity of the selected (and unselected) lines for line selection control. An energy detector is enclosed in an inert gas purged environment at slight overpressure. A blue or green reference beam is used for F2 laser beam alignment stabilization and/or spectral monitoring of the output laser beam. The blue or green reference beam advantageously is not reflected out with a atomic fluorine red emission of the laser and is easily resolved from the red emission. The clearing ratio of the laser gas flow through the discharge area is reduced by narrowing the discharge width using improved laser electrodes and/or by increasing the gas flow rate through the discharge while maintaining uniformity by using a more aerodynamic discharge chamber. The F2 laser beam is substantially polarized, e.g., 98% or better, using at least one intracavity polarization element preferably in combination with Brewster discharge chamber windows.

    Abstract translation: 提供高效的F2激光器,具有线路选择,监视功能,对准稳定性,高重复率性能和极化特性的改进。 线选择优选地由透射光栅或棱镜提供。 光栅或棱镜优选地将激光束输出耦合。 线路选择可以完全提供在前光学模块。 监视器光栅和阵列检测器监视所选(和未选择)线的强度用于线选择控制。 一个能量检测器被封闭在惰性气体吹扫的环境中,轻微的超压。 使用蓝色或绿色参考光束进行F2激光束对准稳定和/或输出激光束的光谱监测。 蓝色或绿色参考光束有利地不被激光的原子氟红色发射反射,并且容易地从红色发射中消除。 通过使用改进的激光电极使放电宽度变窄并且/或通过增加通过放电的气体流量而减小激光气体流过放电区域的清除率,同时通过使用更多的空气动力学放电室来保持均匀性。 使用至少一个腔内偏振元件,优选与布鲁斯特放电室窗口组合,F2激光束基本上被极化,例如98%或更好。

    F2-laser with line selection
    38.
    发明申请

    公开(公告)号:US20020034206A1

    公开(公告)日:2002-03-21

    申请号:US09925040

    申请日:2001-08-07

    CPC classification number: H01S3/225 H01S3/08004 H01S3/08009 H01S3/1062

    Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

    Excimer laser
    39.
    发明申请

    公开(公告)号:US20020015432A1

    公开(公告)日:2002-02-07

    申请号:US09924817

    申请日:2001-08-07

    CPC classification number: H01S3/225 H01S3/08004 H01S3/08009 H01S3/1062

    Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost. The wavelength selection unit preferably includes a prism having a front surface oriented at Brewster's angle and a back surface oriented to receive and reflect an ordinary refracted ray travelling within the prism at a right angle to the back surface. The back surface also preferably includes a highly reflective coating to serve as the highly reflective surface of the resonator. The wavelength selection unit preferably further comprises an adjustment component for adjusting the orientation of the prism and for enclosing the other end of the housing, opposite the outcoupling end.

    Electrical excitation circuit for a pulsed gas laser
    40.
    发明申请
    Electrical excitation circuit for a pulsed gas laser 失效
    脉冲气体激光器的电激励电路

    公开(公告)号:US20020015430A1

    公开(公告)日:2002-02-07

    申请号:US09858147

    申请日:2001-05-14

    Abstract: Method and system for providing an excimer or molecular fluorine laser including a laser tube filled with a laser gas surrounded by an optical resonator, where the laser tube has multiple electrodes including a pair of main discharge electrodes connected to a discharge circuit for exciting the laser gas to produce a laser output beam. The discharge circuit has an all solid state switch and preferably does not include a transformer. The solid state switch includes multiple solid state devices that may be capable of switching voltages in excess of 12 kV, such as 14-32 kV or more, or the voltage needed to switch the laser. The series of switches has a rise time of approximately less than 300 ns, and preferably around 100 ns or less. The switch may be capable of switching voltages of slightly more than half, but less than the entire voltage needed to produce laser pulses of desired energies, and a voltage doubling circuit may be used to produce the voltage required to produce the desired output pulse energies. An oscillator-amplifier configuration may be used, wherein an oscillator switch may be capable of switching voltages less than the entire voltage needed to produce the desired laser pulse energies, while the amplifier amplifies the pulses to the desired pulse energies.

    Abstract translation: 用于提供准分子或分子氟激光的方法和系统,其包括填充有由光学谐振器包围的激光气体的激光管,其中激光管具有多个电极,其包括连接到用于激发激光气体的放电电路的一对主放电电极 以产生激光输出光束。 放电电路具有全固态开关,并且优选地不包括变压器。 固态开关包括多个固态器件,其能够切换超过12kV的电压,例如14-32kV或更高,或切换激光所需的电压。 该系列开关具有大约小于300ns的上升时间,优选地在约100ns以下。 该开关可能能够切换稍大于一半但小于产生所需能量的激光脉冲所需的整个电压的电压,并且可以使用倍压电路来产生产生所需输出脉冲能量所需的电压。 可以使用振荡器放大器配置,其中振荡器开关可以能够切换小于产生所需激光脉冲能量所需的整个电压的电压,而放大器将脉冲放大到期望的脉冲能量。

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