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    THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND SHIELD COMPONENT
    31.
    发明申请
    THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND SHIELD COMPONENT 有权
    薄膜成型装置，薄膜​​成型方法和屏蔽部件

    公开(公告)号：US20110155059A1

    公开(公告)日：2011-06-30

    申请号：US12974245

    申请日：2010-12-21

    Applicant: Akihiro Egami ,  Toshikazu Nakazawa ,  Katsuhiro Suzuki ,  Shinya Hasegawa

    Inventor： Akihiro Egami ,  Toshikazu Nakazawa ,  Katsuhiro Suzuki ,  Shinya Hasegawa

    IPC: C23C16/50 ,  C23C16/00

    CPC classification number: C23C14/564 ,  C23C14/0036 ,  C23C14/34 ,  C23C16/4401 ,  C23C16/45591 ,  C23C16/4585 ,  H01J37/32477 ,  H01J37/32651 ,  H01J37/3405 ,  H01J37/3411 ,  H01J37/3441 ,  H01J2237/026 ,  H01J2237/0268

    Abstract: The inventors of this invention conducted a test and found out that to prevent peel-off of an adherent film, it is not of essential importance to set the radius of curvature equal to or larger than a predetermined threshold. The inventors of the present invention also found out that peel-off of an adherent film occurs in the region in which the curvature of a shield changes and is less likely to occur when the change in curvature of the shield is small. Accordingly, the key to the problem is the magnitude of a change in curvature of the shield, so changing the curvature stepwise makes it possible to suppress a large change in curvature, and thus to prevent peel-off of an adherent film free from any disadvantages such as deterioration in film thickness distribution, which may occur due to an increase in size of the shield.

    Abstract translation: 本发明人进行了测试，发现为了防止粘附膜的剥离，将曲率半径设定为等于或大于预定阈值不是重要的。 本发明的发明人还发现，粘合膜的剥离发生在屏蔽的曲率变化的区域中，并且当屏蔽的曲率变化小时不太可能发生。 因此，问题的关键在于屏蔽体的曲率变化的大小，因此逐渐改变曲率使得可以抑制曲率的大的变化，从而防止粘附膜的剥离没有任何缺点 例如由于屏蔽件的尺寸增加而可能发生的膜厚分布的劣化。

    Substrate cleaning chamber and components
    32.
    发明授权
    Substrate cleaning chamber and components 有权
    基材清洗室和部件

    公开(公告)号：US07942969B2

    公开(公告)日：2011-05-17

    申请号：US11857975

    申请日：2007-09-19

    Applicant: Martin Riker ,  Wei W. Wang

    Inventor： Martin Riker ,  Wei W. Wang

    IPC: C23C16/00

    CPC classification number: H01J37/32724 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32477 ,  H01J37/32871 ,  H01J2237/0213 ,  H01J2237/0268 ,  H01J2237/2001 ,  H01J2237/335 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/67207 ,  Y10T29/49826

    Abstract: A substrate cleaning chamber comprises various components, such as for example, a consumable ceramic liner, substrate heating pedestal, and process kit. The consumable ceramic liner is provided for connecting a gas outlet channel of a remote gas energizer to a gas inlet channel of a substrate cleaning chamber. The substrate heating pedestal comprises an annular plate having a substrate receiving surface with a plurality of ceramic balls positioned in an array of recesses. A process kit comprises a top plate, top liner, gas distributor plate, bottom liner, and focus ring.

    Abstract translation: 衬底清洁室包括各种部件，例如可消耗陶瓷衬垫，衬底加热基座和处理套件。 消耗性陶瓷衬套用于将远程气体激发器的气体出口通道连接到衬底清洁室的气体入口通道。 基板加热基座包括具有基板接收表面的环形板，多个陶瓷球定位在凹槽阵列中。 处理套件包括顶板，顶衬，气体分配器板，底衬和聚焦环。

    Extended life source arc chamber liners
    36.
    发明授权
    Extended life source arc chamber liners 有权
    延长寿命源电弧室内衬

    公开(公告)号：US06583427B1

    公开(公告)日：2003-06-24

    申请号：US09652440

    申请日：2000-08-31

    Applicant: Walter J. Edmonds ,  Timothy B. Vaughn

    Inventor： Walter J. Edmonds ,  Timothy B. Vaughn

    IPC: H01J2700

    CPC classification number: H01J37/08 ,  H01J2237/0268 ,  H01J2237/31701

    Abstract: A liner (102) for an arc chamber (100) of an ion implanter. The arc chamber (100) comprises a liner (102) on the inner surface (104) of the arc chamber (100) that extends the life of the arc chamber (100). The liner (102) comprises a one piece portion (102a) that covers the bottom and long sidewalls of the arc chamber (100) and two end plates (102b) for covering the end walls of the arc chamber (100). When the liner (102) wears out it is replaced at a significantly reduced cost compared to replacing the entire arc chamber (100).

    Abstract translation: 一种用于离子注入机的电弧室（100）的衬套（102）。 电弧室（100）包括在电弧室（100）的内表面（104）上延伸电弧室（100）的寿命的衬垫（102）。 衬套（102）包括覆盖电弧室（100）的底部和长侧壁的一个部分（102a）和用于覆盖电弧室（100）的端壁的两个端板（102b）。 当衬垫（102）磨损时，与更换整个电弧室（100）相比，以显着降低的成本更换衬垫（102）。

    Scanning electron microscope and method for controlling a scanning electron microscope
    37.
    发明授权
    Scanning electron microscope and method for controlling a scanning electron microscope 失效
    扫描电子显微镜及扫描电子显微镜的控制方法

    公开(公告)号：US5424541A

    公开(公告)日：1995-06-13

    申请号：US312181

    申请日：1994-09-26

    Applicant: Hideo Todokoro ,  Tadashi Ohtaka

    Inventor： Hideo Todokoro ,  Tadashi Ohtaka

    IPC: H01J37/073 ,  H01J37/244 ,  H01J37/28 ,  H01J37/09

    CPC classification number: H01J37/28 ,  H01J2237/004 ,  H01J2237/0268 ,  H01J2237/04756 ,  H01J2237/24435 ,  H01J2237/2448

    Abstract: A scanning electron microscope is provided with a channel cylinder between a sample and an electron source. The channel cylinder generates a deceleration electrical field to decelerate an electron beam emitted from the electron source. The channel cylinder has a portion having an electron source side and sample side. A detector is provided on the electron source side and sample channel cylinder portion. The detector detects the secondary signal emitted from the sample, so that a scan image is obtained with a high spatial resolution.

    Abstract translation: 扫描电子显微镜在样品和电子源之间设置有通道柱。 通道气缸产生减速电场，以使从电子源发射的电子束减速。 通道圆筒具有电子源侧和样品侧的部分。 检测器设置在电子源侧和样品通道圆筒部分上。 检测器检测从样品发射的二次信号，使得以高空间分辨率获得扫描图像。

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