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    Precise metrology with adaptive milling
    31.
    发明授权
    Precise metrology with adaptive milling 有权
    具有自适应铣削的精确计量

    公开(公告)号：US08222599B1

    公开(公告)日：2012-07-17

    申请号：US12424323

    申请日：2009-04-15

    Applicant: Chester Xiaowen Chien

    Inventor： Chester Xiaowen Chien

    IPC: H01J37/30 ,  H01J37/252 ,  G01N23/00

    CPC classification number: H01J37/28 ,  H01J37/3056 ,  H01J2237/281 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: A method of measuring a three-dimensional device in a wafer is provided. The method comprises the step of forming a trench in the wafer. The trench has a facet passing through the three-dimensional device a predetermined offset from a desired image position. The method further comprises iteratively, until a remaining distance between the facet and the desired image position is less than a predetermined threshold, adjusting one or more parameters of a polishing beam based on the remaining distance, polishing the facet with the polishing beam to position the facet closer to the desired image position, and measuring the remaining distance.

    Abstract translation: 提供了一种测量晶片中的三维器件的方法。 该方法包括在晶片中形成沟槽的步骤。 沟槽具有从所需图像位置穿过三维装置预定偏移的小平面。 该方法还包括迭代地，直到小面和期望图像位置之间的剩余距离小于预定阈值，基于剩余距离调整抛光光束的一个或多个参数，用抛光光束抛光小面以将抛光光束定位 小面更靠近所需的图像位置，并测量剩余距离。

    PATTERN OBSERVATION METHOD
    33.
    发明申请
    PATTERN OBSERVATION METHOD 有权
    模式观察方法

    公开(公告)号：US20110012029A1

    公开(公告)日：2011-01-20

    申请号：US12709264

    申请日：2010-02-19

    Applicant: Hideaki ABE

    Inventor： Hideaki ABE

    IPC: G21K5/00

    CPC classification number: H01J37/28 ,  H01J37/263 ,  H01J2237/0048 ,  H01J2237/281 ,  H01J2237/2817 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: The pattern observation method for observing a pattern which is formed on an insulating film, includes: irradiating an entirety of the pattern with a charged particle beam, to obtain a temporary image of the pattern which has region information of a convex pattern and a concave pattern; irradiating the convex and concave patterns with the charged particle beam having a first and second voltages based on the region information, to thereby form an electric field between a top surface of the convex pattern and a bottom surface of the concave pattern so that charged particles emitted from the bottom surface of the concave pattern may be drawn out to an outside of the pattern; and irradiating the entirety of the pattern with the charged particle beam to obtain an image of the pattern having the information of the bottom surface of the concave pattern.

    Abstract translation: 用于观察形成在绝缘膜上的图案的图案观察方法包括：用带电粒子束照射整个图案，以获得具有凸形图案和凹图案的区域信息的图案的临时图像 ; 利用基于区域信息的具有第一和第二电压的带电粒子束照射凸和凹图案，从而在凸形图案的顶表面和凹图案的底表面之间形成电场，使得带电粒子发射 从凹形图案的底面可以被拉出到图案的外侧; 并用带电粒子束照射整个图案，以获得具有凹形图案底面信息的图案的图像。

    Method for defect detection and process monitoring based on SEM images
    34.
    发明授权
    Method for defect detection and process monitoring based on SEM images 有权
    基于SEM图像的缺陷检测和过程监控方法

    公开(公告)号：US07764824B2

    公开(公告)日：2010-07-27

    申请号：US10564846

    申请日：2004-07-15

    Applicant: Laurent Karsenti

    Inventor： Laurent Karsenti

    IPC: G06K9/00

    CPC classification number: G06T5/30 ,  G06T7/001 ,  G06T7/11 ,  G06T7/155 ,  G06T2207/10061 ,  G06T2207/20101 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/281 ,  H01J2237/2814 ,  H01J2237/2817

    Abstract: A morphological operation is applied to an SEM image to obtain a idealized image, and the idealized image is used to detect a defect in a subject of the SEM image. The defect is detected by subtraction of the idealized image from the original image. Morphological operations are used also to entrance the visibility of defects or to check for irregularities in patterns. Other described methods comprise: growing a flow from seed points in the image, in order to define maps in which particles can be identified; checking for separation of objects in the image by growing flows from seed points located on the objects; segmenting the image into supposed identical objects and applying statistical methods to identify the defective ones.

    Abstract translation: 将形态学操作应用于SEM图像以获得理想化图像，并且使用理想图像来检测SEM图像的对象中的缺陷。 通过从原始图像中减去理想化图像来检测缺陷。 形态操作也用于引入缺陷的可视性或检查图案中的不规则性。 其他描述的方法包括：从图像中的种子点生长流，以便定义可以识别颗粒的图; 通过从位于物体上的种子点生长流来检查图像中物体的分离; 将图像分解为假定的相同对象，并应用统计方法来识别有缺陷的对象。

    Specimen current mapper
    35.
    发明授权
    Specimen current mapper 失效
    样本电流映射器

    公开(公告)号：US07473911B2

    公开(公告)日：2009-01-06

    申请号：US10695620

    申请日：2003-10-27

    Applicant: Alexander Kadyshevitch ,  Dror Shemesh ,  Yaniv Brami ,  Dmitry Shur

    Inventor： Alexander Kadyshevitch ,  Dror Shemesh ,  Yaniv Brami ,  Dmitry Shur

    IPC: H01J49/44

    CPC classification number: H01L22/34 ,  H01J37/32935 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L21/67253 ,  H01L22/12 ,  H01L2924/3011

    Abstract: A method for process monitoring includes receiving a sample having a first layer that is at least partly conductive and a second layer formed over the first layer, following production of contact openings in the second layer. A beam of charged particles is directed along a beam axis that deviates substantially in angle from a normal to a surface of the sample, so as to irradiate one or more of the contact openings in each of a plurality of locations distributed over at least a region of the sample. A specimen current flowing through the first layer is measured in response to irradiation of the one or more of the contact openings at each of the plurality of locations. A map of at least the region of the sample is created, indicating the specimen current measured in response to the irradiation at the plurality of the locations.

    Abstract translation: 一种用于过程监测的方法包括在第二层中产生接触开口之后，接收具有至少部分导电的第一层的样品和在第一层上形成的第二层。 带电粒子束沿着光束轴线被引导，所述光束轴线基本上偏离于与样品表面的法线的角度，以便照射分布在至少一个区域上的多个位置中的每一个中的一个或多个接触开口 的样品。 响应于多个位置中的每一个处的一个或多个接触开口的照射来测量流过第一层的样本电流。 产生至少样品区域的图，指示响应于多个位置处的照射测量的样本电流。

    Dual electron beam instrument for multi-perspective
    39.
    发明授权
    Dual electron beam instrument for multi-perspective 有权
    双电子束仪多视角

    公开(公告)号：US06812462B1

    公开(公告)日：2004-11-02

    申请号：US10435011

    申请日：2003-05-09

    Applicant: Gabor D. Toth ,  John A. Notte, IV ,  Richard A. Price

    Inventor： Gabor D. Toth ,  John A. Notte, IV ,  Richard A. Price

    IPC: H01J3728

    CPC classification number: H01J37/28 ,  H01J2237/281 ,  H01J2237/2814 ,  H01J2237/2815

    Abstract: Method and apparatus for imaging at multiple perspectives of a specimen are disclosed. In one embodiment, an apparatus for generating a multi-perspective image using multiple charged particle beams (e.g., electron beams) is disclosed. In one embodiment, the apparatus generally includes a charged particle beam generator system arranged to generate and control a first charged particle beam directed substantially at a first angle towards the specimen and a second charged particle beam directed substantially at a second angle towards the specimen. The apparatus also includes an image generator arranged to generate one or more images based on charged particles emitted from the specimen in response to the first and second charged particle beams and a controller arranged to cause the charged particle beam generator to direct both the first charged particle beam and the second charged particle beam at a first area of the specimen. In a specific implementation, the charged particles are in the form of electrons and the apparatus is a dual electron beam scanning electron microscope (SEM).

    Abstract translation: 公开了用于在样本的多个观点进行成像的方法和装置。 在一个实施例中，公开了一种使用多个带电粒子束（例如电子束）产生多视角图像的装置。 在一个实施例中，装置通常包括带电粒子束发生器系统，其被布置成产生并控制基本上以第一角度朝向试样的第一带电粒子束和基本上以第二角度朝向试样的第二带电粒子束。 该装置还包括图像发生器，其被布置为响应于第一和第二带电粒子束而基于从样本发射的带电粒子产生一个或多个图像;以及控制器，布置成使带电粒子束发生器引导第一带电粒子 光束和第二带电粒子束在样品的第一区域。 在具体实施方案中，带电粒子是电子的形式，并且该装置是双电子束扫描电子显微镜（SEM）。

    Charged particle beam apparatus
    40.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20030136907A1

    公开(公告)日：2003-07-24

    申请号：US10356498

    申请日：2003-02-03

    Applicant: HITACHI, LTD.

    Inventor： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

    IPC: G01N023/225

    CPC classification number: G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

    Abstract: It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles obtained at a portion of said sample irradiated with the charged particle beam, and means for composing a two-dimensional image of the sample as viewed from a direction of said charged particle beam source, based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

    Abstract translation: 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的焦点的装置，用于检测在照射了带电粒子束的所述样本的一部分处获得的带电粒子的带电粒子检测器 以及根据所述带电粒子束聚焦的信号，从所述带电粒子束源的方向观察样品的二维图像的装置，所述信号是从带电粒子检测器输出的信号。

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