公开(公告)号：US09644259B2

公开(公告)日：2017-05-09

申请号：US13642086

申请日：2011-04-20

Applicant: Juergen Hotz ,  Pavel Seserko ,  Joerg Wittich ,  Helmut Eberhardt ,  Manfred Kirschner ,  Wolfgang Rieth

Inventor： Juergen Hotz ,  Pavel Seserko ,  Joerg Wittich ,  Helmut Eberhardt ,  Manfred Kirschner ,  Wolfgang Rieth

IPC: C23C16/00 ,  C23C14/24 ,  C23C14/30 ,  H01J37/20 ,  H01J37/305

CPC classification number: C23C14/246 ,  C23C14/30 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/202 ,  H01J2237/3132

Abstract: An apparatus for coating substrates with a coating material is disclosed. The apparatus includes a frame, a crucible arrangement including a first crucible and a second crucible disposed offset from one another in a horizontal plane, where the crucible arrangement is disposed on the frame. At least one first shaft is associated with the first crucible and at least one second shaft is associated with the second crucible, where the at least one first and second shafts are disposed in the frame beneath the first and second crucibles, respectively. A first lifting device is associated with the at least one first shaft and a second lifting device is associated with the at least one second shaft, where the first and second lifting devices are disposed in the frame. The frame is linearly displaceable in the horizontal plane.

公开(公告)号：US09218936B2

公开(公告)日：2015-12-22

申请号：US13514230

申请日：2010-12-10

Applicant: Juergen Zinsstag ,  Cristian Jans

Inventor： Juergen Zinsstag ,  Cristian Jans

IPC: H01J3/32 ,  H01J37/147 ,  C23C14/30 ,  C23C14/54 ,  H01J37/305

CPC classification number: H01J37/1475 ,  C23C14/30 ,  C23C14/542 ,  H01J37/1472 ,  H01J37/3053 ,  H01J2237/1523 ,  H01J2237/3132

Abstract: A vaporizing device is provided, wherein an elongated pot having material to be vaporized is impinged upon by an electron beam, preferably via several electron guns. Each electron gun is responsible for a certain section of the pot. The electron beam is guided over the melt in a pendular manner. For this purpose, a first magnetic deflecting unit is provided, which produces a variable parallel displacement of the electron beam. In order to achieve this, two magnetic fields are provided, the magnetic field boundaries of which form a type of lens system, wherein the outlet side of the first magnetic field is convex and the inlet side of the second magnetic field is concave. In order to deflect the electron beam into the pot, a second magnetic deflecting unit is provided, the magnetic field of which can be moved synchronously with the beam displacement parallel to the pot.

Abstract translation: 提供了一种蒸发装置，其中具有待蒸发的材料的细长的罐优选通过几个电子枪被电子束撞击。 每个电子枪负责锅的某一部分。 电子束以圆柱形的方式引导到熔体上。 为此，提供了第一磁偏转单元，其产生电子束的可变的平行位移。 为了实现这一点，提供了两个磁场，其磁场边界形成一种透镜系统，其中第一磁场的出口侧是凸的，并且第二磁场的入口侧是凹的。 为了将电子束偏转到电池中，提供了第二磁偏转单元，其磁场可以与平行于电位器的光束位移同步地移动。

公开(公告)号：US08419857B2

公开(公告)日：2013-04-16

申请号：US12414697

申请日：2009-03-31

Applicant: James W. Neal

Inventor： James W. Neal

IPC: C23C16/00

CPC classification number: C23C14/30 ,  C23C14/046 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/3132

Abstract: An electron beam vapor deposition apparatus includes a coating chamber including a coating zone for depositing a coating on a work piece. A coating device includes at least one crucible for presenting at least one source coating material. The coating device includes a first deposition mode of depositing the at least one source coating material and a second deposition mode of depositing the at least one source coating material. At least one electron beam source evaporates the at least one source coating material for deposit onto the work piece. A controller is configured to control a speed of movement of the work piece in the coating zone during the coating operation in response to the first deposition mode and the second deposition mode.

Abstract translation: 电子束气相沉积设备包括涂覆室，其包括用于在工件上沉积涂层的涂层区域。 涂覆装置包括至少一个用于呈现至少一种源涂料的坩埚。 涂覆装置包括沉积至少一种源涂料的第一沉积模式和沉积所述至少一种源涂料的第二沉积模式。 至少一个电子束源蒸发至少一个源涂料以沉积到工件上。 控制器被配置为响应于第一沉积模式和第二沉积模式，在涂覆操作期间控制工件在涂覆区域中的移动速度。

公开(公告)号：US08373427B2

公开(公告)日：2013-02-12

申请号：US12831855

申请日：2010-07-07

Applicant: Kezia Cheng

Inventor： Kezia Cheng

IPC: G01R27/08

CPC classification number: H01L22/14 ,  C23C14/30 ,  C23C14/548 ,  G01N27/00 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/24475 ,  H01J2237/30472 ,  H01J2237/3132 ,  H01L21/02 ,  Y10T29/41

Abstract: Disclosed herein are systems and methods for in-situ measurement of impurities on metal slugs utilized in electron-beam metal evaporation/deposition systems, and for increasing the production yield of a semiconductor manufacturing processes utilizing electron-beam metal evaporation/deposition systems. A voltage and/or a current level on an electrode disposed in a deposition chamber of an electron-beam metal evaporation/deposition system is monitored and used to measure contamination of the metal slug. Should the voltage or current reach a certain level, the deposition is completed and the system is inspected for contamination.

公开(公告)号：US20120135157A1

公开(公告)日：2012-05-31

申请号：US13365692

申请日：2012-02-03

Applicant: Jaewon Park ,  Chang-Kue Park ,  Jonghwa Chang ,  Byungho Choi ,  Yongwan Kim

Inventor： Jaewon Park ,  Chang-Kue Park ,  Jonghwa Chang ,  Byungho Choi ,  Yongwan Kim

IPC: C23C16/48 ,  C23C14/08 ,  C23C14/46 ,  C23C14/10

CPC classification number: C23C14/5833 ,  C23C14/0635 ,  C23C14/30 ,  C23C14/48 ,  C23C14/505 ,  C23C14/5893 ,  H01J37/317 ,  H01J37/3233 ,  H01J2237/3132 ,  H01J2237/316 ,  H01J2237/3165 ,  H01J2237/31701

Abstract: The present invention relates to a ceramic coating and ion beam mixing apparatus for improving corrosion resistance, and a method of reforming an interface between a coating material and a base material. In samples fabricated using the coating and ion beam mixing apparatus, adhesiveness is improved, and the base material is reinforced, thereby improving resistance to thermal stress at high temperatures and high-temperature corrosion resistance of a material to be used in a sulfuric acid decomposition apparatus for producing hydrogen.

Abstract translation: 本发明涉及一种用于提高耐腐蚀性的陶瓷涂层和离子束混合装置，以及重整涂料和基材之间的界面的方法。 在使用涂布和离子束混合装置制造的样品中，提高了粘合性，并且增强了基材，从而提高了在硫酸分解装置中使用的材料在高温下的耐热应力和高温耐腐蚀性 用于生产氢气。

公开(公告)号：US20110262656A1

公开(公告)日：2011-10-27

申请号：US13179004

申请日：2011-07-08

Applicant: Ekishu Nagae ,  Yousong Jiang ,  Ichiro Shiono ,  Tadayuki Shimizu ,  Tatsuya Hayashi ,  Makoto Furukawa ,  Takanori Murata

Inventor： Ekishu Nagae ,  Yousong Jiang ,  Ichiro Shiono ,  Tadayuki Shimizu ,  Tatsuya Hayashi ,  Makoto Furukawa ,  Takanori Murata

IPC: B05D3/06

CPC classification number: C23C14/22 ,  C23C14/083 ,  C23C14/10 ,  C23C14/221 ,  C23C14/225 ,  H01J2237/0041 ,  H01J2237/3132

Abstract: A method of vapor depositing a vapor deposition substance onto substrates within a vacuum vessel includes holding the substrates with a dome shaped holder disposed within the vacuum vessel, rotating the dome shaped holder, vapor depositing a substance from a vapor deposition source disposed oppositely to the substrates, supplying ions from an ion source to the substrates, and supplying neutralizing electrons from a neutralizer to the substrates.

Abstract translation: 将真空容器内的气相沉积物质气相沉积到基板上的方法包括：将基板保持在设置在真空容器内的圆顶形保持器，旋转圆顶形夹持器，从与基板相对设置的气相沉积源汽相沉积物质 将离子源从离子源供给到衬底，并将中和电子从中和剂供给到衬底。

公开(公告)号：US20110151135A1

公开(公告)日：2011-06-23

申请号：US13058557

申请日：2009-08-17

Applicant: Ekishu Nagae ,  Yousong Jiang ,  Ichiro Shiono ,  Tadayuki Shimizu ,  Tatsuya Hayashi ,  Makoto Furukawa ,  Takanori Murata

Inventor： Ekishu Nagae ,  Yousong Jiang ,  Ichiro Shiono ,  Tadayuki Shimizu ,  Tatsuya Hayashi ,  Makoto Furukawa ,  Takanori Murata

IPC: C23C14/48

CPC classification number: C23C14/22 ,  C23C14/083 ,  C23C14/10 ,  C23C14/221 ,  C23C14/225 ,  H01J2237/0041 ,  H01J2237/3132

Abstract: An optical thin-film vapor deposition apparatus and method are capable of producing an optical thin-film by vapor depositing a vapor deposition substance onto substrates (14) within a vacuum vessel (10). A dome shaped holder (12) is disposed within the vacuum vessel (10) and holds the substrates (14). A drive rotates the dome shaped holder (12). A vapor depositing source (34) is disposed oppositely to the substrates (14). An ion source (38) irradiates ions to the substrates (14). A neutralizer (40) irradiates electrons to the substrates (14). The ion source (38) is disposed at an angle between an axis, along which ions are irradiated from the ion source (38), and a line perpendicular to a surface of each of the substrates (14). The angle is between 8° inclusive and 40° inclusive. A ratio of a distance in a vertical direction between (i) a center of rotational axis of the dome shaped holder (12), and (ii) a center of the ion source (38), relative to a diameter of the dome shaped holder (12), is between 0.5 inclusive and 1.2 inclusive.

Abstract translation: 光学薄膜蒸镀装置和方法能够通过将气相沉积物质蒸镀在真空容器（10）内的基板（14）上来制造光学薄膜。 圆顶形保持器（12）设置在真空容器（10）内并保持基板（14）。 驱动器旋转圆顶形保持器（12）。 气相沉积源（34）与衬底（14）相对设置。 离子源（38）将离子照射到衬底（14）上。 中和器（40）将电子照射到衬底（14）上。 离子源（38）以垂直于每个基板（14）的表面的线与离子源（38）照射的轴线之间成角度地设置。 角度介于8°至40°之间。 （i）圆顶状保持器（12）的旋转轴的中心与（ii）离子源（38）的中心之间的垂直方向上的距离相对于圆顶状保持器的直径的比例 （12），介于0.5和0.5之间。

公开(公告)号：US20100003423A1

公开(公告)日：2010-01-07

申请号：US12541002

申请日：2009-08-13

Applicant: Hitoshi Nakagawara

Inventor： Hitoshi Nakagawara

IPC: C23C16/50 ,  C23C16/00 ,  H05H1/10 ,  H05H1/24

CPC classification number: H01J37/08 ,  C23C14/081 ,  C23C14/28 ,  H01J37/04 ,  H01J37/1472 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/061 ,  H01J2237/083 ,  H01J2237/103 ,  H01J2237/152 ,  H01J2237/3132 ,  H01J2237/3146

Abstract: The cross section of a beam is flattened by causing a plasma beam (25) extracted by a convergence coil from a plasma gun to pass through the magnetic field that extends to the direction orthogonal to the direction in which the plasma beam travels and is formed by magnets (27) made of permanent magnets which are oppositely arranged in pairs in parallel with each other. A plasma apparatus is provided using a plasma beam with 0.7≦Wi/Wt with a half-value of beam intensity with respect to a width Wt of a flattened beam 28 as Wi. At least one magnet is included which is stronger in intensity of a repulsive magnetic field at the center of the beam.

Abstract translation: 通过使来自等离子体枪的会聚线圈提取的等离子体束（25）通过延伸到与等离子体束行进的方向正交的方向的磁场而使束的横截面平坦化，并且由 由永久磁铁制成的磁体（27）彼此成对平行配置。 使用具有0.7 <= Wi / Wt的等离子体束提供等离子体装置，其中光束强度的一半值相对于扁平光束28的宽度Wt为Wi。 包括至少一个磁体，其在梁的中心处的排斥磁场的强度更强。

公开(公告)号：US06983718B1

公开(公告)日：2006-01-10

申请号：US09624810

申请日：2000-07-24

Applicant: Robert William Bruce ,  John Douglas Evans, Sr.

Inventor： Robert William Bruce ,  John Douglas Evans, Sr.

IPC: C23C16/48 ,  C23F1/00 ,  H01L21/306

CPC classification number: C23C14/083 ,  C23C14/30 ,  C23C14/548 ,  H01J37/3053 ,  H01J2237/3132

Abstract: An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the shape and intensity of the electron beam pattern on the coating material and on a crucible containing the molten coating material.

Abstract translation: 电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。 电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。 在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 通过涂层材料上的电子束图案和含有熔融涂层材料的坩埚的形状和强度，增强了EBPVD装置的操作。

公开(公告)号：US20050067934A1

公开(公告)日：2005-03-31

申请号：US10670476

申请日：2003-09-26

Applicant: Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito ,  Yoshimi Watabe

Inventor： Masashi Ueda ,  Tomoko Takagi ,  Norikazu Ito ,  Yoshimi Watabe

IPC: H01J17/26 ,  H01J37/32 ,  H01J61/28 ,  H01L31/20 ,  H05H1/24

CPC classification number: H01L31/202 ,  H01J37/32091 ,  H01J2237/3132 ,  H01J2237/3137 ,  H01J2237/3142 ,  H05H1/46 ,  H05H2001/463 ,  Y02E10/50 ,  Y02P70/521

Abstract: The object of this invention is to realize the new configuration of antenna and the electric power feeding method which substantially suppress the generation of standing wave and consequently to provide a discharge apparatus to generate plasma having an excellent uniformity, a plasma processing method for large-area substrate, and a solar cell manufactured with a high productivity. The present invention is composed of a plurality of U-shaped antenna elements having a power feeding end and a grounded end which are arranged to form an array antenna in such a way that the grounded end and the power feeding end are alternately placed in parallel at regular intervals on a plane, wherein the alternating current electric powers with the same excitation frequency are simultaneously fed to the power feeding ends with the phase shift of 180 degrees between adjacent power feeding ends, the excitation frequency of the alternating current power is 10 MHz-2 GHz, and the length of the conductor is set so that the measured ratio of reflected wave to incident wave is 0.1 or less at the power feeding end. It is also possible to determine the length La of straight conductor to hold the inequality: 0.5(1/α)

Abstract translation: 本发明的目的是实现基本上抑制驻波产生的天线的新配置和馈电方法，从而提供具有均匀性优异的等离子体的放电装置，大面积等离子体处理方法 基板和以高生产率制造的太阳能电池。 本发明由具有供电端和接地端的多个U形天线元件组成，这些U形天线元件被布置成形成阵列天线，使得接地端和馈电端交替地平行放置在 其中具有相同激励频率的交流电功率在相邻供电端之间以180度的相移同时馈送到馈电端，交流功率的激励频率为10MHz- 2GHz，并且设定导体的长度，使得测得的反射波与入射波的比例在馈电端为0.1或更小。 也可以确定直线导体的长度La以保持不等式：0.5（1 /α）