公开(公告)号：US09291901B2

公开(公告)日：2016-03-22

申请号：US14477946

申请日：2014-09-05

Applicant: PROMERUS, LLC

Inventor： Pramod Kandanarachchi ,  Larry F. Rhodes

IPC: G03F7/075 ,  G03F7/038 ,  G03F7/039 ,  G03F7/40 ,  C08F232/02 ,  C08F232/08 ,  C08F230/08 ,  C08F220/08 ,  C08F8/12 ,  C08F8/32 ,  C08F8/44 ,  C08F8/48 ,  G03F7/004 ,  G03F7/022 ,  G03F7/30 ,  G03F7/32 ,  C08F222/08 ,  C08F232/04 ,  C08F222/06 ,  C09D135/00 ,  C09D135/06 ,  C09D145/00

CPC classification number: G03F7/0758 ,  C08F8/12 ,  C08F8/32 ,  C08F8/44 ,  C08F8/48 ,  C08F220/08 ,  C08F222/06 ,  C08F222/08 ,  C08F230/08 ,  C08F232/04 ,  C08F232/08 ,  C08F2800/10 ,  C09D135/00 ,  C09D135/06 ,  C09D145/00 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0757 ,  G03F7/30 ,  G03F7/322 ,  G03F7/40

Abstract: Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers encompass norbornene-type repeating units containing pendent silyl groups and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units are either ring-opened or have been transformed into maleimide repeat units. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

Abstract translation: 本文公开了各种胺处理的含马来酸酐的聚合物及其组合物，其可用于形成可自我形成的膜。 在一些实施方案中，这种聚合物包括含有侧链甲硅烷基和马来酸酐型重复单元的降冰片烯型重复单元，其中至少一些这样的马来酸酐型重复单元是开环的或已经转化成马来酰亚胺重复单元。 由这种共聚物组合物形成的膜提供用于微电子和光电子器件的自成像，低k热稳定层。

公开(公告)号：US08932398B2

公开(公告)日：2015-01-13

申请号：US13390285

申请日：2010-06-11

Applicant: My T Nguyen ,  A Kha Phan ,  Quoc Khoi Nguyen ,  Marc-André Locas

Inventor： My T Nguyen ,  A Kha Phan ,  Quoc Khoi Nguyen ,  Marc-André Locas

IPC: D21H21/16 ,  C09B67/00 ,  C04B28/36 ,  B01F17/00 ,  C01B25/00 ,  G03F7/038 ,  G03F7/022 ,  G03F7/027 ,  C07H13/08 ,  B41C1/10 ,  C07D309/10

CPC classification number: C07D309/10 ,  B41C1/1008 ,  B41C2210/02 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/22 ,  B41C2210/24 ,  C07H13/08 ,  G03F7/022 ,  G03F7/027 ,  G03F7/038

Abstract: There is provided a gallotannic compound, a method of producing a gallotannic compound, a lithographic printing plate coating composition, a lithographic printing plate, a method of producing a lithographic printing plate and a method of printing.

Abstract translation: 本发明提供镓锡化合物，制备镓锡化合物的方法，平版印刷版涂料组合物，平版印刷版，平版印刷版的制造方法和印刷方法。

公开(公告)号：US08836089B2

公开(公告)日：2014-09-16

申请号：US13823260

申请日：2011-09-02

Applicant: Akitoshi Tanimoto ,  Shigeru Nobe ,  Kei Kasuya ,  Hiroshi Matsutani ,  Takumi Ueno ,  Yu Aoki ,  Shingo Tahara

Inventor： Akitoshi Tanimoto ,  Shigeru Nobe ,  Kei Kasuya ,  Hiroshi Matsutani ,  Takumi Ueno ,  Yu Aoki ,  Shingo Tahara

IPC: H01L23/29 ,  H01L21/47 ,  G03F7/075 ,  G03F7/039 ,  G03F7/40 ,  G03F7/022

CPC classification number: G03F7/039 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/40 ,  H01L2224/11

Abstract: The positive-type photosensitive resin composition according to the present invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound that produces an acid by light, a thermal crosslinking agent, and a silane compound having at least one functional group selected from an epoxy group and a sulfide group.

Abstract translation: 根据本发明的正型感光性树脂组合物包含具有酚羟基的碱溶性树脂，通过光产生酸的化合物，热交联剂和具有至少一个选自以下的官能团的硅烷化合物： 环氧基和硫醚基。

公开(公告)号：US08790859B2

公开(公告)日：2014-07-29

申请号：US12620988

申请日：2009-11-18

Applicant: Sang-Hyun Yun ,  Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Dong-Min Kim ,  Seung-Ki Kim ,  Ja-Hun Byeon

Inventor： Sang-Hyun Yun ,  Woo-Seok Jeon ,  Jung-In Park ,  Hi-Kuk Lee ,  Byung-Uk Kim ,  Dong-Min Kim ,  Seung-Ki Kim ,  Ja-Hun Byeon

IPC: G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L29/66 ,  H01L21/336

CPC classification number: G03F7/0236 ,  G03F7/022 ,  H01L27/1288 ,  H01L29/66765

Abstract: The present invention relates to a photoresist composition for digital exposure and a method of fabricating a thin film transistor substrate. The photoresist composition for digital exposure includes a binder resin including a novolak resin and a compound represented by the chemical formula (1), a photosensitizer including a diazide-based compound, and a solvent: wherein R1-R9 each include a hydrogen atom, an alkyl group, or a benzyl group, a is an integer from 0 to 10, b is an integer from 0 to 100, and c is an integer from 0 to 10.

Abstract translation: 本发明涉及用于数字曝光的光致抗蚀剂组合物和制造薄膜晶体管衬底的方法。 用于数字曝光的光致抗蚀剂组合物包括包含酚醛清漆树脂和由化学式（1）表示的化合物的粘合剂树脂，包含二叠氮基化合物的光敏剂和溶剂：其中R1-R9各自包含氢原子， 烷基或苄基，a为0〜10的整数，b为0〜100的整数，c为0〜10的整数。

公开(公告)号：US08735029B2

公开(公告)日：2014-05-27

申请号：US13603491

申请日：2012-09-05

Applicant: Eun-Kyung Yoon ,  Eun-Ha Hwang ,  Jong-Hwa Lee ,  Ji-Yun Kwon ,  Dae-Yun Kim ,  Sang-Kyeon Kim ,  Sang-Kyun Kim ,  Sang-Soo Kim ,  Kun-Bae Noh ,  Jun-Ho Lee ,  Jin-Young Lee ,  Hyun-Yong Cho ,  Chung-Beom Hong

Inventor： Eun-Kyung Yoon ,  Eun-Ha Hwang ,  Jong-Hwa Lee ,  Ji-Yun Kwon ,  Dae-Yun Kim ,  Sang-Kyeon Kim ,  Sang-Kyun Kim ,  Sang-Soo Kim ,  Kun-Bae Noh ,  Jun-Ho Lee ,  Jin-Young Lee ,  Hyun-Yong Cho ,  Chung-Beom Hong

IPC: G03F7/023 ,  G03F7/022

CPC classification number: G03F7/0226 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/0755 ,  G03F7/085 ,  Y10S430/107

Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.

Abstract translation: 公开了包含（A）包含聚苯并恶唑前体，聚酰亚胺前体或其组合的碱溶性树脂的正性感光性树脂组合物，（B）感光性重氮醌化合物，（C）由以下化学式1表示的化合物， 和（D）溶剂，以及显示装置和使用其的有机发光装置。 化学式1与详细描述中所定义的相同。

公开(公告)号：US08703367B2

公开(公告)日：2014-04-22

申请号：US13073005

申请日：2011-03-28

Applicant: Hyun-Yong Cho ,  Doo-Young Jung ,  Yong-Sik Yoo ,  Ji-Young Jeong ,  Jong-Hwa Lee ,  Min-Kook Chung ,  Kil-Sung Lee ,  Myoung-Hwan Cha

Inventor： Hyun-Yong Cho ,  Doo-Young Jung ,  Yong-Sik Yoo ,  Ji-Young Jeong ,  Jong-Hwa Lee ,  Min-Kook Chung ,  Kil-Sung Lee ,  Myoung-Hwan Cha

IPC: G03F7/023 ,  G03F7/022

CPC classification number: G03F7/0226 ,  G03F7/0233 ,  G03F7/0751 ,  Y10S430/107

Abstract: A positive photosensitive resin composition includes: (A) a polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a polyamic acid ester compound; and (E) a solvent. The positive photosensitive resin composition can reduce film shrinkage, can have high sensitivity, high resolution, and excellent residue removal properties, and can provide good pattern shapes.

Abstract translation: 正型感光性树脂组合物包括：（A）聚苯并恶唑前体; （B）光敏重氮醌化合物; （C）硅烷化合物 （D）聚酰胺酸酯化合物; 和（E）溶剂。 正型感光性树脂组合物可以降低膜收缩，可以具有高灵敏度，高分辨率和优异的残留物去除性能，并且可以提供良好的图案形状。

公开(公告)号：US08546061B2

公开(公告)日：2013-10-01

申请号：US13291305

申请日：2011-11-08

Applicant: Ming-Ju Wu ,  Chun-An Shih

Inventor： Ming-Ju Wu ,  Chun-An Shih

IPC: G03F7/022 ,  G03F7/038 ,  G03F7/075 ,  G03F7/11

CPC classification number: G03F7/0233 ,  G03F7/0007 ,  G03F7/0757 ,  G03F7/40

Abstract: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains 25 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 10,000 to 80,000 based on a total weight of the polysiloxane when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 400 and 100,000 measured by gel permeation chromatography. The amount of oligomers in the polysiloxane having a molecular weight less than 800 is from 0 wt % to 10 wt % based on a total weight of the photo-curing polysiloxane composition. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.

Abstract translation: 光固化聚硅氧烷组合物包括聚硅氧烷，邻萘醌二叠氮化物磺酸盐化合物和溶剂。 聚硅氧烷含有25重量％至60重量％的聚硅氧烷部分，其分子量范围为10,000至80,000，基于聚硅氧烷的总重量，当通过绘制累积重量百分比与分子量的下降而得到的整体分子量分布曲线 在通过凝胶渗透色谱法测量的范围在400和100,000之间。 基于光固化聚硅氧烷组合物的总重量，分子量小于800的聚硅氧烷中的低聚物的量为0重量％至10重量％。 还公开了由光固化聚硅氧烷组合物形成的保护膜和含有保护膜的元件。

公开(公告)号：US20130171564A1

公开(公告)日：2013-07-04

申请号：US13603491

申请日：2012-09-05

Applicant: Eun-Kyung YOON ,  Eun-Ha HWANG ,  Jong-Hwa LEE ,  Ji-Yun KWON ,  Dae-Yun KIM ,  Sang-Kyeon KIM ,  Sang-Kyun KIM ,  Sang-Soo KIM ,  Kun-Bae NOH ,  Jun-Ho LEE ,  Jin-Young LEE ,  Hyun-Yong CHO ,  Chung-Beom HONG

Inventor： Eun-Kyung YOON ,  Eun-Ha HWANG ,  Jong-Hwa LEE ,  Ji-Yun KWON ,  Dae-Yun KIM ,  Sang-Kyeon KIM ,  Sang-Kyun KIM ,  Sang-Soo KIM ,  Kun-Bae NOH ,  Jun-Ho LEE ,  Jin-Young LEE ,  Hyun-Yong CHO ,  Chung-Beom HONG

IPC: G03F7/022 ,  G03F7/075

CPC classification number: G03F7/0226 ,  G03F7/0233 ,  G03F7/0236 ,  G03F7/0755 ,  G03F7/085 ,  Y10S430/107

Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.

Abstract translation: 公开了包含（A）包含聚苯并恶唑前体，聚酰亚胺前体或其组合的碱溶性树脂的正性感光性树脂组合物，（B）感光性重氮醌化合物，（C）由以下化学式1表示的化合物， 和（D）溶剂，以及显示装置和使用其的有机发光装置。 化学式1与详细描述中所定义的相同。

公开(公告)号：US20130048604A1

公开(公告)日：2013-02-28

申请号：US13568233

申请日：2012-08-07

Applicant: Min Kang ,  Jin-Ho Ju ,  Jong-Kwang Lee ,  Bong-Yeon Kim ,  Jeong-Won Kim ,  Deok-Man Kang ,  Jung-Hwan Cho ,  Kyung-Mi Choi

Inventor： Min Kang ,  Jin-Ho Ju ,  Jong-Kwang Lee ,  Bong-Yeon Kim ,  Jeong-Won Kim ,  Deok-Man Kang ,  Jung-Hwan Cho ,  Kyung-Mi Choi

IPC: G03F7/004 ,  B44C1/22 ,  G03F7/022 ,  G03F7/027 ,  G03F7/016

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11

Abstract: A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern.

Abstract translation: 光致抗蚀剂组合物包括约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％的光吸收剂， 剩余部分包括有机溶剂。 还提供了形成包括在基板上形成薄膜的精细图案的方法; 通过使用光致抗蚀剂组合物形成光致抗蚀剂图案，所述光致抗蚀剂组合物包含约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％ 的光吸收剂，余量包含有机溶剂; 并通过使用光致抗蚀剂图案作为蚀刻停止层来图案化薄膜以形成精细图案。

公开(公告)号：US20130040410A1

公开(公告)日：2013-02-14

申请号：US13565589

申请日：2012-08-02

Applicant: Cha-Dong KIM ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

Inventor： Cha-Dong KIM ,  Sang Hyun Yun ,  Jung-In Park ,  Su-Yeon Sim ,  Hi-Kuk Lee ,  Sang-Tae Kim ,  Yong-Il Kim ,  Shi-Jin Sung ,  Eun-Sang Lee ,  Sung-Yeol Jin

IPC: G03F7/022 ,  H01L33/08 ,  B44C1/22

CPC classification number: G03F7/0226 ,  G03F7/023 ,  G03F7/40 ,  Y10T428/1005

Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

Abstract translation: 公开了一种光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图案的方法，以及制造显示基板的方法。 光致抗蚀剂组合物包括碱溶性树脂，醌二叠氮化合物，多价酚类化合物和溶剂。 因此，可以改善波长在约392nm至约417nm范围内的光的光敏性，并且可以提高使用光致抗蚀剂组合物形成光图案和薄膜图案的可靠性。