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    Ion source device
    31.
    发明授权
    Ion source device 失效
    离子源装置

    公开(公告)号：US5296713A

    公开(公告)日：1994-03-22

    申请号：US7786

    申请日：1993-01-22

    Applicant: Hisato Tanaka

    Inventor： Hisato Tanaka

    IPC: H01J37/067 ,  H01J27/04 ,  H01J37/08 ,  H01J37/15 ,  H01J37/317 ,  H01L21/265 ,  H01J3/02

    CPC classification number: H01J27/04 ,  H01J2237/31701

    Abstract: An ion source device includes an electron generating chamber detachably combined with an electron attraction electrode and an ion generating chamber through insulating members. Hooks are projected from both sides of the electron generating chamber. A holder plate is arranged under the ion generating chamber with an insulating member interposed between them. A fixing member is arranged under the holder plate. The fixing member includes a pusher supported by coned disc springs and this pusher of the fixing member is fitted into a recess on the underside of the holder plate and struck against the top of the recess. A pair of holder members are arranged along both sides of the device. The holder members are detachably engaged with the hooks of the electron generating chamber at the upper portion thereof and also detachably engaged with the fixing member at the lower portion thereof. The components ranging from the electron generating chamber to the holder plate are held and fixed between the hooks of the electron generating chamber and the pusher of the fixing member through the holder members.

    Abstract translation: 离子源装置包括通过绝缘构件与电子吸引电极和离子产生室可拆卸地组合的电子发生室。 钩从电子发生室的两侧突出。 在离子产生室下方设置有夹持板，其间插入绝缘构件。 固定构件设置在保持板下方。 固定构件包括由锥形盘弹簧支撑的推动器，并且固定构件的推动器装配到保持器板的下侧上的凹部中并撞击凹部的顶部。 一对保持器构件沿着装置的两侧布置。 保持器构件在其上部与电子发生室的钩可拆卸地接合，并且在其下部可拆卸地与固定构件接合。 从电子发生室到保持板的组件通过保持件保持和固定在电子发生室的钩和固定构件的推动器之间。

    Electron gun for electron irradiation equipment
    34.
    发明授权
    Electron gun for electron irradiation equipment 失效
    电子辐射设备电子枪

    公开(公告)号：US3857055A

    公开(公告)日：1974-12-24

    申请号：US36118073

    申请日：1973-05-17

    Applicant: AKASHI SEISAKUSHO KK

    Inventor： SHIRAI S ,  UCHIDA H

    IPC: H01J37/067 ,  G01N23/225 ,  H01J3/02 ,  H01J37/06 ,  H01J37/065 ,  H01J1/00

    CPC classification number: H01J37/065

    Abstract: An electron gun for use in electron irradiation equipment. The gun comprises a cartridge including a Wehnelt electrode and a filament with two plug electrodes mounted on an insulating plate. The filament is mounted between the Wehnelt electrode and a conductive plate by two fasteners and can be adjustably aligned with respect to the Wehnelt electrode by moving the electrode with respect to the filament before the mounting is made fast. The electrical potential supply terminal has two jacks which receive the plug electrodes thereby mechanically and electrically coupling the cartridge to the potential supply and the Wehnelt electrode receives its potential through a resilient contact on the potential supply terminal.

    Abstract translation: 用于电子照射设备的电子枪。 该枪包括一个包括Wehnelt电极的盒和一个安装在绝缘板上的两个插头电极的灯丝。 灯丝通过两个紧固件安装在Wehnelt电极和导电板之间，并且可以在安装快速之前通过相对于灯丝移动电极而相对于Wehnelt电极可调节地对准。 电位供应端子具有接收插塞电极的两个插孔，从而将盒机械地电耦合到电源，并且Wehnelt电极通过电位供应端子上的弹性接触件接收其电位。

    Electron gun and system and method using electron gun
    36.
    发明授权
    Electron gun and system and method using electron gun 有权

    公开(公告)号：US12237140B1

    公开(公告)日：2025-02-25

    申请号：US18720024

    申请日：2022-12-20

    Applicant: Ralf Edinger

    Inventor： Ralf Edinger

    IPC: H01J37/067 ,  B33Y10/00 ,  H01J37/147

    Abstract: Examples of an electron gun with a moving cathode station and a moving anode station are described. The moving cathode has a driver that moves the station and comprises a plurality of cathodes with a plurality of bias cups to control a thermal electron emission region by applying a bias voltage to the bias cup. The moving anode station comprises a plurality of anodes and has driver to move the anode station such that a position of each anode is synchronized with a positioned of a respective matching pair of cathode and bias cup. A controller that is in communication with the anode and cathode moving stations controls the bias voltage and the drivers to control the amount of thermal electrons and to synchronize and align a predetermined cathode with a predetermined anode thus controlling the size and parameters of the generated electron beam.

    ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN
    37.
    发明申请
    ELECTRON GUN AND SYSTEM AND METHOD USING ELECTRON GUN 有权

    公开(公告)号：US20250054720A1

    公开(公告)日：2025-02-13

    申请号：US18720024

    申请日：2022-12-20

    Applicant: Ralf Edinger

    Inventor： Ralf Edinger

    IPC: H01J37/067 ,  B33Y10/00 ,  H01J37/147

    Abstract: Examples of an electron gun with a moving cathode station and a moving anode station are described. The moving cathode has a driver that moves the station and comprises a plurality of cathodes with a plurality of bias cups to control a thermal electron emission region by applying a bias voltage to the bias cup. The moving anode station comprises a plurality of anodes and has driver to move the anode station such that a position of each anode is synchronized with a positioned of a respective matching pair of cathode and bias cup. A controller that is in communication with the anode and cathode moving stations controls the bias voltage and the drivers to control the amount of thermal electrons and to synchronize and align a predetermined cathode with a predetermined anode thus controlling the size and parameters of the generated electron beam.

    Filament positioning system and filament positioning method
    38.
    发明授权
    Filament positioning system and filament positioning method 有权

    公开(公告)号：US10607805B2

    公开(公告)日：2020-03-31

    申请号：US15834152

    申请日：2017-12-07

    Applicant: NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY, CHINA

    Inventor： Xixue Hu ,  Hongbo Guo ,  Dongliang Wang ,  Yaling Gan ,  Xiaohui Xu

    IPC: H04N9/47 ,  H04N7/18 ,  H01J37/067 ,  G06T7/73 ,  H01J37/244

    Abstract: Disclosed are a filament positioning system and a filament positioning method. The filament positioning system includes a bottom plate, a first positioning regulating mechanism and a second positioning regulating mechanism, wherein the first positioning regulating mechanism is configured to conduct positioning regulation of a position of a filament seat on the bottom plate, so that filament seats of different models can be fixed to the bottom plate, and the second positioning regulating mechanism is configured to conduct positioning regulation on the filament; and a detection module configured to collect and display position information of a filament tip and the filament seat, wherein the first positioning regulating mechanism and the second positioning regulating mechanism correspondingly regulate positions of the filament seat and the filament tip according to the position information.

    Electron source architecture for a scanning electron microscopy system
    39.
    发明授权
    Electron source architecture for a scanning electron microscopy system 有权

    公开(公告)号：US10388489B2

    公开(公告)日：2019-08-20

    申请号：US15887861

    申请日：2018-02-02

    Applicant: KLA-Tencor Corporation

    Inventor： Mohammed Tahmassebpur

    IPC: H01J37/06 ,  H01J37/063 ,  H01J37/065 ,  H01J37/244 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09 ,  H01J37/073 ,  H01J37/317 ,  H01J37/067 ,  H01J37/26 ,  H01J37/30

    Abstract: A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam sources include an emitter including one or more emitter tips configured to generate one or more electron beams of a plurality of electron beams. The electron beam sources include a stack of one or more positioners configured to adjust a position of the emitter based on one or more measurements of the electron beam generated by the emitter. The emitter is configured to scan the one or more electron beams across an area surrounding a bore of an electron-optical column of the plurality of electron-optical columns. The electron beam source array includes a carrier plate and a source tower. The source tower is configured to adjust a position of the plurality of electron beam sources relative to a position of the plurality of electron-optical columns.

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