公开(公告)号：US10401300B2

公开(公告)日：2019-09-03

申请号：US15317065

申请日：2015-05-27

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Yuko Otani ,  Yuta Urano ,  Toshifumi Honda

IPC分类号： G01B21/00 ,  G01N21/88 ,  G01B11/30 ,  G01N21/956 ,  G01B11/06 ,  G01N21/95 ,  G01N23/2251 ,  G02B21/00 ,  G02B21/10 ,  G02B21/26 ,  G02B27/09 ,  G02B27/58 ,  G01B15/08 ,  G01B11/25 ,  G03F7/20

摘要： A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.

公开(公告)号：US20190219390A1

公开(公告)日：2019-07-18

申请号：US15870622

申请日：2018-01-12

申请人： Applied Materials Israel, Ltd.

发明人： Shimon LEVI ,  Ishai SCHWARZBAND ,  Roman KRIS

IPC分类号： G01B15/08 ,  B82Y35/00

摘要： A method for monitoring a first nanometric structure formed by a multiple patterning process, the method may include performing a first plurality of measurements to provide a first plurality of measurement results; wherein the performing of the first plurality of measurements comprises illuminating first plurality of locations of a first sidewall of the first nanometric structure by oblique charged particle beams of different tilt angles; and processing, by a hardware processor, the first plurality of measurement results to determine a first attribute of the first nanometric structure.

公开(公告)号：US09291452B2

公开(公告)日：2016-03-22

申请号：US13772437

申请日：2013-02-21

申请人： FUJITSU LIMITED

发明人： Kouichirou Kasama

IPC分类号： G01B21/20 ,  G01B15/08

CPC分类号： G01B21/20 ,  G01B15/08

摘要： An undulation detection device includes a two-dimensional sensor configured to emit a sensing wave for distance measurement in a plurality of directions forming different lateral and vertical angles and to measure respective distances to objects from which the sensing wave is reflected, and a processor performs detecting an undulation of the measurement surface or an obstacle placed on the measurement surface from which the sensing wave is reflected, on the basis of a difference among the distances in the different directions, the difference being measured by the two-dimensional sensor, and outputting an undulation detection report, when an in-plane size of the undulation of the measurement surface or the obstacle placed on the measurement surface is equal to or more than a threshold.

摘要翻译： 波动检测装置包括：二维传感器，被配置为在形成不同的横向和垂直角度的多个方向上发射用于距离测量的感测波，并且测量与感测波反射的物体的距离，并且处理器执行检测 基于不同方向上的距离之间的差异，测量表面的波动或放置在测量表面上的障碍物，其中感测波反射的距离是由二维传感器测量的差异，并输出 当测量表面的波动的平面尺寸或放置在测量表面上的障碍物的面内尺寸等于或大于阈值时，起伏检测报告。

公开(公告)号：US08831172B2

公开(公告)日：2014-09-09

申请号：US13204444

申请日：2011-08-05

申请人： Karl Schreiber ,  Josef Geitner

发明人： Karl Schreiber ,  Josef Geitner

IPC分类号： G01B15/08 ,  G06K9/20 ,  G06K9/60 ,  G01N23/083 ,  G01N23/18 ,  G01N23/06

CPC分类号： G01N23/06 ,  G01N23/18 ,  G01N2223/41

摘要： With filmless radiographic inspection of components by means of digital X-ray technology, an uneven surface geometry of the component is smoothened by defining a digital virtual smoothening layer for better, preferably automated, recognition of defects, where the digital radiation signals generated by an X-ray detector are overlaid with digitized surface measurement signals, so that a change in absorption and intensity of radiation due to the surface topography of the component, i.e. due to an uneven surface, is compensated for and only a density caused by internal material defects is represented in the X-ray image.

摘要翻译： 通过数字X射线技术对部件进行无电影射线检查，通过定义数字虚拟平滑层来优化组件的不平坦表面几何，以更好地，优选地自动识别缺陷，其中由X产生的数字辐射信号 射线检测器被覆盖有数字化的表面测量信号，使得由于部件的表面形貌（即由于不平坦的表面）导致的辐射的吸收和强度的变化被补偿，并且仅由内部材料缺陷引起的密度是 在X射线图像中表示。

公开(公告)号：US20080205596A1

公开(公告)日：2008-08-28

申请号：US10592442

申请日：2005-03-31

申请人： Shigeki Kato

发明人： Shigeki Kato

IPC分类号： G01B15/08

CPC分类号： G01N23/046 ,  G01N2223/419

摘要： There is provided a nondestructive method for inspecting ceramic structures, the method which not only easily detects the position and size of an internal defect in a ceramic structure in a short time, but also accurately identifies the position, shape, and size of the internal defect. In the method, the distribution of X-ray absorption coefficients (CT numbers) at fault planes of the ceramic structure is measured by irradiating the periphery of the ceramic structure with X rays along the periphery of the ceramic structure so that the X rays scan the entire periphery. The X rays are emitted from an X-ray tube at a tube voltage in the range of 80 to 400 kV and a tube current in the range of 2 to 400 mA.

摘要翻译： 提供了一种用于检查陶瓷结构的非破坏性方法，该方法不仅可以在短时间内容易地检测陶瓷结构中的内部缺陷的位置和尺寸，而且可以精确地识别内部缺陷的位置，形状和尺寸 。 在该方法中，陶瓷结构的断层面的X射线吸收系数（CT数）的分布通过沿着陶瓷结构的周边用X射线照射陶瓷结构体的周边来测量，使得X射线扫描 整个周边。 X射线从X射线管以80〜400kV的管电压和2〜400mA范围内的管电流发射。

公开(公告)号：US20050109938A1

公开(公告)日：2005-05-26

申请号：US10957748

申请日：2004-10-05

申请人： Hiroshi Miyai ,  Ryuichi Funatsu ,  Taku Ninomiya ,  Yasuhiko Nara

发明人： Hiroshi Miyai ,  Ryuichi Funatsu ,  Taku Ninomiya ,  Yasuhiko Nara

IPC分类号： G01B15/04 ,  G01B15/08 ,  G01N21/956 ,  G01N23/225 ,  H01L21/66 ,  G01N21/00

CPC分类号： G01N23/2251 ,  G01N21/95607 ,  H01J2237/2817

摘要： A circuit pattern inspection method and apparatus capable of readily setting an optimum threshold value while it is confirmed that a defect detected when a defect is checked can be detected at what threshold value and capable of forming a recipe easily. A circuit pattern inspection of irradiating an electron beam to a specimen formed with a circuit pattern on a surface thereof, forming an inspection image and a reference image in accordance with a secondary electron of a reflected electron from the specimen, and acquiring an abnormal portion from a difference between the inspection image and the reference image, wherein a plurality of characteristic quantities of the abnormal portion are obtained from an image of the abnormal portion, and the abnormal portion is selectively displayed by changing an inspection threshold value virtually set for the characteristic quantities.

摘要翻译： 可以在确认在检查缺陷时检测到的缺陷能够容易地设定最佳阈值的电路图案检查方法和装置，并且能够容易地形成配方。 将电子束照射到其表面上形成有电路图案的试样的电路图案检查，根据来自试样的反射电子的二次电子形成检查图像和参考图像，并从 检查图像与参考图像之间的差异，其中从异常部分的图像获得异常部分的多个特征量，并且通过改变为特征量虚拟设置的检查阈值来选择性地显示异常部分 。

公开(公告)号：US06872943B2

公开(公告)日：2005-03-29

申请号：US10192692

申请日：2002-07-11

申请人： Atsushi Takane ,  Satoru Yamaguchi ,  Osamu Komuro ,  Yasuhiko Ozawa ,  Hideo Todokoro

发明人： Atsushi Takane ,  Satoru Yamaguchi ,  Osamu Komuro ,  Yasuhiko Ozawa ,  Hideo Todokoro

IPC分类号： G01B15/04 ,  G01B15/08 ,  H01J37/28 ,  H01L21/66 ,  G01K1/08 ,  G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2815

摘要： A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.

公开(公告)号：US06157032A

公开(公告)日：2000-12-05

申请号：US186495

申请日：1998-11-04

申请人： Stephen W. Into

发明人： Stephen W. Into

IPC分类号： G01B11/24 ,  G01B15/04 ,  G01B15/08 ,  H01J37/28

CPC分类号： H01J37/28 ,  G01B15/04 ,  H01J2237/2814

摘要： The shape of a sample is determined with a scanning electron microscope ("SEM") by using electron emission from a surface to measure its slope. A surface of a sample is placed in the SEM's electron beam for several known angles, and respective measurements of the electron emission are obtained. A relationship between surface angle and electron emission is derived for the sample from the measurements. Then, as the electron beam is scanned along the surface to measure electron emission, this derived relationship is used to obtain the slope at each scanning point.

摘要翻译： 通过使用来自表面的电子发射来测量其斜率，用扫描电子显微镜（“SEM”）测定样品的形状。 将样品的表面放置在SEM的电子束中几个已知的角度，并且获得各自的电子发射测量值。 从测量中得出样品的表面角与电子发射之间的关系。 然后，随着沿着表面扫描电子束以测量电子发射，该导出关系用于获得每个扫描点处的斜率。

公开(公告)号：US5612535A

公开(公告)日：1997-03-18

申请号：US659218

申请日：1996-06-07

申请人： Youqi Wang

发明人： Youqi Wang

IPC分类号： G01B11/06 ,  G01B11/30 ,  G01B15/04 ,  G01B15/08 ,  H01J37/28 ,  H01J37/252

CPC分类号： G01B11/0608 ,  G01B11/306 ,  G01B15/04 ,  G01B15/08 ,  H01J37/28 ,  H01J2237/2814

摘要： A spin-split scanning electron microscope (SSSEM) uses a spin-split electron beam interferometer to measure the difference between two electron beam paths. By measuring the difference in path lengths, and/or measuring changes in the relative difference between the two paths as the electron beams are scanned over a surface, the topology of an object's surface may be measured. The measuring changes in the relative difference between the two paths as a material etching or material deposition or growth process is performed, the amount of material added or removed from an object's surface may be metered. The spin-split scanning electron microscope includes an electron beam source that generates a flying stream of electrons, a spin-split electron beam splitter splits the flying stream of electrons into first and second electron beams having different trajectories, an electron beam intensity detector that receives a reflected portion of the first and second electron beams after they have been reflected from distinct positions of a target surface and generates an intensity signal indicative of the received beams combined intensity; and a controller coupled that receives the intensity signal, and analyzes changes in the intensity signal to determine relative changes in path lengths of the first and second electron beams. The beam splitter includes a magnetic field generator that generates a non-uniform magnetic field in region of space intercepted by the flying stream of electrons which causes electrons having opposite magnetic moments to be deflected into two separate electron beams.

摘要翻译： 旋转扫描电子显微镜（SSSEM）使用自旋分裂电子​​束干涉仪来测量两个电子束路径之间的差异。 通过测量路径长度的差异和/或测量电子束在表面上扫描的两条路径之间的相对差异的变化，可以测量物体表面的拓扑。 进行作为材料蚀刻或材料沉积或生长过程的两个路径之间的相对差异的测量变化，可以计量从物体表面添加或移除的材料的量。 旋转扫描电子显微镜包括产生飞行电子的电子束源，自旋分裂电子​​束分离器将飞行的电子流分成具有不同轨迹的第一和第二电子束，接收电子束强度检测器 第一和第二电子束的反射部分在它们已从目标表面的不同位置反射并产生指示接收光束组合强度的强度信号; 以及耦合的控制器，其接收强度信号，并分析强度信号的变化，以确定第一和第二电子束的路径长度的相对变化。 分束器包括磁场发生器，其在由电子的飞行流拦截的空间区域中产生不均匀的磁场，这导致具有相反磁矩的电子被偏转成两个单独的电子束。

公开(公告)号：US5502306A

公开(公告)日：1996-03-26

申请号：US214377

申请日：1994-03-17

申请人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

发明人： Dan Meisburger ,  Alan D. Brodie ,  Curt Chadwick ,  Anil Desai ,  Hans Dohse ,  Dennis Emge ,  John Greene ,  Ralph Johnson ,  Ming-Yie Ling ,  John McMurtry ,  Barry Becker ,  Ray Paul ,  Mike Robinson ,  Richard Simmons ,  David E. A. Smith ,  John Taylor ,  Lee Veneklasen ,  Dean Walters ,  Paul Wieczorek ,  Sam Wong ,  April Dutta ,  Surendra Lele ,  Kirkwood Rough ,  Henry Pearce-Percy ,  Jack Y. Jau ,  Chun C. Lin ,  Hoi T. Nguyen ,  Yen-Jen Oyang ,  Timothy L. Hutcheson ,  David J. Clark ,  Chung-Shih Pan ,  Chetana Bhaskar ,  Chris Kirk ,  Eric Munro

IPC分类号： G01B15/00 ,  G01B15/08 ,  G01N23/04 ,  G01N23/203 ,  G01N23/225 ,  G01R31/307 ,  G03F1/08 ,  G03F1/16 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  H01J37/26

CPC分类号： H01J37/28 ,  G01R31/307 ,  H01J2237/063 ,  H01J2237/184 ,  H01J2237/204 ,  H01J2237/24495 ,  H01J2237/30438

摘要： There is disclosed numerous embodiments of a method and apparatus for a particle scanning system and an automatic inspection system. In each of these a particle beam is directed at the surface of a substrate for scanning that substrate. Also included are a selection of detectors to detect at least one of the secondary particles, back-scattered particles and transmitted particles from the substrate. The substrate is mounted on an x-y stage to provide it with at least one degree of freedom while the substrate is being scanned by the/particle beam. The substrate is also subjected to an electric field on it's surface to accelerate the secondary particles. The system also has the capability to accurately measure the position of the substrate with respect to the charged particle beam. Additionally, there is an optical alignment means for initially aligning the substrate beneath the,particle beam means. To function most efficiently there is also a vacuum means for evacuating and repressurizing a chamber containing the substrate. The vacuum means can be used to hold one substrate at vacuum while a second one is being loaded/unloaded, evacuated or repressurized. Alternately, the vacuum means can simultaneously evacuate a plurality of substrates prior to inspection and repressurize of the same plurality of substrates following inspection. In the inspection configuration, there is also a comparison means for comparing the pattern on the substrate with a second pattern.

摘要翻译： 公开了用于粒子扫描系统和自动检查系统的方法和装置的许多实施例。 在其中的每一个中，粒子束被引导到用于扫描该衬底的衬底的表面。 还包括一些检测器，用于检测来自基底的二次粒子，背散射粒子和透射粒子中的至少一个。 衬底被安装在x-y平台上，以在衬底被/粒子束扫描的过程中提供至少一个自由度。 衬底也在其表面上经受电场以加速次级颗粒。 该系统还具有准确地测量衬底相对于带电粒子束的位置的能力。 另外，存在用于最初对准在粒子束装置下面的衬底的光学对准装置。 为了最有效地起作用，还有一种用于对含有基底的腔室进行抽空和再加压的真空装置。 真空装置可用于将一个基板保持在真空状态，而第二个装载/卸载，抽真空或再加压。 或者，真空装置可以在检查之后同时抽空多个基板，同时在检查之后检查并重新加压相同的​​多个基板。 在检查配置中，还存在用于将衬底上的图案与第二图案进行比较的比较装置。