公开(公告)号：US12195279B2

公开(公告)日：2025-01-14

申请号：US17978966

申请日：2022-11-02

Applicant: SEMES CO., LTD.

Inventor： Dong Won Yun ,  Doo Bong Kim ,  Su Ung Lee

IPC: B65G17/12

Abstract: Provided is a transport system to facilitate interlayer movement of a transported object. The transport system comprises: a rail device; and a transport vehicle moving in the rail device, wherein the rail device comprises: a first rail with a first inclination angle; a second rail with a second inclination angle larger than the first inclination angle; a first connection rail configured to connect the first rail to the second rail; and a rack rail installed along the first connection rail and the second rail, wherein the transport vehicle comprises: a frame; a driving wheel connected to the frame and moving the first rail, the first connection rail and the second rail; and a pinion gear connected to the frame and moving along the rack rail.

公开(公告)号：US12187055B2

公开(公告)日：2025-01-07

申请号：US17470303

申请日：2021-09-09

Applicant: SEMES CO., LTD.

Inventor： Yae Jin Byeon ,  Dong Yun Lee

IPC: B41J29/393 ,  B05B15/522 ,  G02F1/13 ,  G06K15/02 ,  H10K71/13

Abstract: Disclosed is a substrate treating apparatus. The inventive concept includes a support unit having a plate that supports a calibration board, on which a plurality of alignment marks are displayed, a first vision unit configured such that a relative location with respect to the plate is changeable, and that photographs the calibration board, and a second vision unit that photographs the calibration board in a scheme that is different from that of the first vision unit.

公开(公告)号：US20250006517A1

公开(公告)日：2025-01-02

申请号：US18672290

申请日：2024-05-23

Applicant: Semes Co., Ltd

Inventor： Sang Min LEE ,  Jong Doo LEE ,  Ju Yeon SONG

IPC: H01L21/67 ,  H01L21/02 ,  H01L21/687

Abstract: Disclosed is a manufacturing method of a semiconductor device. The manufacturing method may include: a closing operation of seating a substrate on a support member provided in a chamber, and closing the chamber to seal a treating space provided by the chamber; a clamping operation of clamping the chamber by moving a clamping body in a direction facing the chamber after the closing operation; a close-contact operation of making the chamber be in contact with the clamping body after the clamping operation; and a substrate processing operation of drying the substrate by supplying supercritical fluid into the treating space.

公开(公告)号：US12176229B2

公开(公告)日：2024-12-24

申请号：US17466270

申请日：2021-09-03

Applicant: SEMES CO., LTD.

Inventor： Yong Bae Choi ,  Ji Hyun Park ,  Shin Young Cheong

IPC: H01L21/673

Abstract: An apparatus of storing container includes a stocker including shelves being configured to support containers, respectively, a purging unit being configured to provide a purge gas for each of the shelves to purge the containers when the stocker is in a purge mode, and to provide the purge gas only for each of the shelves when the stocker is in a normal mode, an inspection unit being configured to inspect a purge quality of the purge gas provided to each of the shelves while the stocker is in the normal mode, and a control unit being configured to change the stocker between in the purge mode and in the normal mode, and being configured to control the purging unit according to a switch between the purge mode and the normal mode. Thus, the apparatus has improved operation efficiency.

公开(公告)号：US20240416394A1

公开(公告)日：2024-12-19

申请号：US18799283

申请日：2024-08-09

Applicant: SEMES CO., LTD.

Inventor： Tae-Keun KIM ,  Kyeong Min LEE ,  Min Hee CHO ,  Won Young KANG

IPC: B08B7/00 ,  H01L21/02

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes discharging a treating liquid including a polymer and a solvent onto a substrate; and solidifying a liquid film of the treating liquid by volatilizing the solvent from the treating liquid on the substrate, and wherein the solidifying a liquid film comprises a first period of stopping the rotation of the substrate or rotating the substrate at a first speed for a first time period.

公开(公告)号：US20240412989A1

公开(公告)日：2024-12-12

申请号：US18737916

申请日：2024-06-07

Applicant: SEMES CO., LTD.

Inventor： Young Eun JEON ,  Jong Won PARK ,  Sung Min CHOI ,  Woo Nam CHOI ,  Kun Hee KO ,  Yu Jung PARK ,  Jung Min SIM

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/324 ,  H01L21/687

Abstract: Proposed are thermal processing apparatus, thermal processing method, and substrate treatment equipment, in which particle generation and damage to a substrate in the cooling process of the substrate can be prevented. The thermal processing apparatus includes a chamber having a processing zone therein, a plurality of chuck pins configured to support a substrate and move up or down individually, a heater configured to provide heat energy to the processing zone, a fluid supply port configured to supply a fluid to the processing zone, a fluid discharge port configured to discharge the fluid remaining in the processing zone to the outside, and a controller configured to control a treatment process of the substrate.

公开(公告)号：US20240412951A1

公开(公告)日：2024-12-12

申请号：US18809588

申请日：2024-08-20

Applicant: SEMES CO., LTD.

Inventor： DONG-HUN KIM ,  WAN JAE PARK ,  SEONG GIL LEE ,  JI-HWAN LEE ,  YOUNGJE UM ,  DONG SUB OH ,  MYOUNGSUB NOH

IPC: H01J37/32

Abstract: An apparatus for treating a substrate includes a process chamber having an inner space, a support unit supporting a substrate in the inner space, a processing gas supply unit for supplying a processing gas to the inner space, and a plasma source that excites the processing gas in a plasma state in the inner space. The processing gas supply unit includes a heater that heats the processing gas.

公开(公告)号：US12159793B2

公开(公告)日：2024-12-03

申请号：US17978328

申请日：2022-11-01

Applicant: SEMES CO., LTD.

Inventor： Min Hee Cho ,  Kyeong Min Lee ,  Won Young Kang ,  Kang Sul Kim ,  Tae-Keun Kim

IPC: H01L21/67 ,  H01L21/02

Abstract: A substrate treating method including removing particles formed on a substrate by continuously performing a process of supplying a treatment liquid including a polymer and a solvent onto the substrate, forming a solidified liquid film by volatilizing the solvent in the treatment liquid, removing the solidified liquid film from the substrate by supplying a stripping liquid onto the substrate, and supplying a rinse liquid onto the substrate may be provided.

公开(公告)号：US12151481B2

公开(公告)日：2024-11-26

申请号：US17844838

申请日：2022-06-21

Applicant: SEMES CO., LTD.

Inventor： Won Yong Jin ,  Ho Sang Lee ,  Suk Won Jang

IPC: B41J2/175

Abstract: A printing apparatus and an ink refill method thereof are provided. The printing apparatus may comprise a printing unit performing printing, and an ink filling unit filling ink in the printing unit in an upward manner, wherein the printing unit includes a printing ink receptor accommodating ink, a spray head spraying the ink, and a pressure controller controlling a pressure of a fluid for operation of the ink, and the ink filling unit includes a supply ink receptor filled with ink for supply to the printing unit, and an ink supply unit mounted on the spray head to supply the ink supplied from the supply ink receptor to the spray head.

公开(公告)号：US12142492B2

公开(公告)日：2024-11-12

申请号：US16952071

申请日：2020-11-18

Applicant: SEMES CO., LTD.

Inventor： Ji-Hwan Lee ,  Seong Gil Lee ,  Dong Sub Oh ,  Myoungsub Noh ,  Dong-Hun Kim ,  Wan Jae Park

IPC: H01L21/67 ,  H01J37/32 ,  H01L21/687

Abstract: A method for processing a substrate includes providing the substrate, a film being formed on the substrate, performing pretreatment to surface-treat the film formed on the substrate using a treatment gas in a plasma state, and performing, after the pretreatment, liquid treatment to remove the film from the substrate by supplying a treatment liquid onto the substrate.