APPARATUS AND METHOD FOR PROCESSING SUBSTRATE USING SUPERCRITICAL FLUID

    公开(公告)号:US20240186135A1

    公开(公告)日:2024-06-06

    申请号:US18497425

    申请日:2023-10-30

    CPC classification number: H01L21/02101 H01L21/67028

    Abstract: A substrate processing method using a supercritical fluid is provided that can deposit a conformal film in a trench with a high aspect ratio and allows complete filling without voids. The substrate processing method comprises performing a supercritical process by repeating a first step, a first vent step, a second step, and a second vent step a plurality of times in order, supplying, in the first step, a first process fluid containing a precursor and a first supercritical fluid to a reactor so that a pressure of the reactor repeats rise and fall within a first pressure range a plurality of times, venting, in the first vent step, the reactor to lower the pressure of the reactor below the first pressure range, supplying, in the second step, a second process fluid containing a reducing fluid to the reactor so that the pressure of the reactor repeats rise and fall within a second pressure range different from the first pressure range a plurality of times, venting, in the second vent step, the reactor to lower the pressure of the reactor below the second pressure range.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    公开(公告)号:US20240184208A1

    公开(公告)日:2024-06-06

    申请号:US18523881

    申请日:2023-11-30

    Inventor: Hyun Min KIM

    CPC classification number: G03F7/16 H01L21/67017

    Abstract: Proposed is a substrate processing apparatus and a substrate processing method. The substrate processing apparatus includes a process chamber configured to have a processing space therein, a support unit configured to support a substrate within the processing space, a gas supply unit configured to supply a processing gas to the processing space, and an exhaust unit configured to exhaust the processing space, wherein the gas supply unit may vaporize a processing fluid in a liquid state by using at least one of a bubbling method and a blowing method and supply the processing fluid to the processing space.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    公开(公告)号:US20240178031A1

    公开(公告)日:2024-05-30

    申请号:US18382239

    申请日:2023-10-20

    Abstract: A substrate processing apparatus includes a plurality of process chambers for processing a substrate, a first transfer robot configured to transfer the substrate and arranged in a first transfer chamber, a second transfer robot configured to transfer the substrate and arranged in a second transfer chamber, and a share module arranged adjacent to the first transfer chamber and the second transfer chamber and configured to receive the substrate from any one of the first transfer robot and the second transfer robot, wherein an inside of each of the first transfer chamber and the second transfer chamber is in a vacuum state, and the first transfer robot and the second transfer robot transfer the substrate in a vacuum state.

    CARRIAGE SYSTEM CONTROL METHOD AND CARRIAGE SYSTEM CONTROL APPARATUS

    公开(公告)号:US20240178028A1

    公开(公告)日:2024-05-30

    申请号:US18516895

    申请日:2023-11-21

    Abstract: Provided is a carriage system control method and carriage system control apparatus capable of preventing a transportation delay, the carriage system control method including (a) performing upper-level communication to receive bidirectional information by using wireless communication in a normal state from a track controller or a carriage moving along rails of a track and supplied with power through the track or power supply cables, (b) determining whether an abnormal state in which the upper-level communication is disabled has occurred, (c) determining whether current is being applied to the track or the power supply cables, when it is determined that the abnormal state has occurred, and (d) maintaining operation of the carriage or the track controller without closing a corresponding lane to prevent a transportation delay, when it is determined that current is being applied to the track or the power supply cables.

    SUBSTRATE TRANSFERRING APPARATUS AND SUBSTRATE TRANSFERRING METHOD

    公开(公告)号:US20240174440A1

    公开(公告)日:2024-05-30

    申请号:US18494055

    申请日:2023-10-25

    CPC classification number: B65G1/0457 B61L3/008 B65G2201/0297

    Abstract: A substrate transfer apparatus includes a traveling rail including a straight section and a curved section, a raceway structure disposed on the traveling rail and configured to fix the traveling rail, a traveling device including a traveling wheel configured to travel on the traveling rail so as to transfer a substrate, a first sensor connected to the raceway structure and configured to recognize the traveling device, at least one second sensor connected to the raceway structure and configured to recognize the traveling device, and a third sensor connected to the traveling rail and configured to recognize the traveling device, wherein the at least one second sensor and the third sensor are configured to move in a traveling direction of the traveling device.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    公开(公告)号:US20240173738A1

    公开(公告)日:2024-05-30

    申请号:US18502487

    申请日:2023-11-06

    CPC classification number: B05C5/001 B05C13/00 H01L21/02057

    Abstract: Provided is a substrate processing apparatus and substrate processing method capable of allowing a liquid chemical to penetrate deeply into patterns of a substrate, the substrate processing apparatus including a housing for forming a treatment space where a substrate is processed, a substrate supporter mounted in the treatment space to rotate about a rotational axis, and provided to support the substrate, a liquid chemical supplier provided above the substrate supporter to eject a liquid chemical toward an upper surface of the substrate supported by the substrate supporter, and an ejector provided at a side of the treatment space to eject a heat transfer medium with a temperature different from the temperature of the liquid chemical onto the substrate.

    BRAKE DEVICE AND TOWER LIFT COMPRISING THE BRAKE DEVICE

    公开(公告)号:US20240166469A1

    公开(公告)日:2024-05-23

    申请号:US18386652

    申请日:2023-11-03

    CPC classification number: B66B5/22

    Abstract: A tower lift includes a rail module extending in a vertical direction, a carriage module configured to be movable along the rail module by a magnetic levitation method, and a brake device configured to move along the rail module integrally with the carriage module, wherein the brake device includes a first brake body and a second brake body, which are configured to selectively come into contact with the rail module to prevent the carriage module from falling, and a link unit configured to connect the first brake body to the second brake body, and the link unit transfers force from one of the first brake body and the second brake body to the other of the first brake body and the second brake body.

    TRANSFER APPARATUS
    438.
    发明公开
    TRANSFER APPARATUS 审中-公开

    公开(公告)号:US20240158170A1

    公开(公告)日:2024-05-16

    申请号:US18456883

    申请日:2023-08-28

    CPC classification number: B65G1/06 B65G2811/09

    Abstract: A transfer apparatus includes a first guide rail, a second guide rail, a driving module including a main rail and a moving block that moves along the main rail, and a carriage module coupled to the moving block and supporting an article, wherein the carriage module includes first guide wheels configured to be in rolling contact with the first guide rail and second side guide wheels configured to be in rolling contact with the second guide rail.

    MOBILE TRANSPORT DEVICE AND MOBILE TRANSPORT SYSTEM INCLUDING THE SAME

    公开(公告)号:US20240158168A1

    公开(公告)日:2024-05-16

    申请号:US18499623

    申请日:2023-11-01

    CPC classification number: B65G1/0471 B66F9/065

    Abstract: A mobile transport device includes: a pedestal having an upper surface on which one load among a plurality of types of loads requiring power for operation is selectively provided, and a lower surface including a docking groove; a docking table having a support upper surface for supporting the pedestal on which the plurality of types of loads are provided; and a mobile transport robot configured to transport the pedestal on which the plurality of types of loads are provided, by connecting the docking groove to a docking block provided on an upper surface thereof. The docking groove in the lower surface of the pedestal is complementarily connected to the docking block provided on an upper surface of the mobile transport robot, so that the load is electrically connected to the mobile transport robot. The mobile transport device increases transport efficiency and task efficiency.

    WAFER TYPE MEASURING APPARATUS AND MAGNETIC FLUX DENSITY MEASURING METHOD USING THE SAME

    公开(公告)号:US20240151767A1

    公开(公告)日:2024-05-09

    申请号:US18387580

    申请日:2023-11-07

    CPC classification number: G01R31/2831

    Abstract: Provided are a wafer-type measuring apparatus capable of accurately measuring the magnetic flux density in a process chamber without opening the process chamber, and a magnetic flux density measuring method using the wafer-type measuring apparatus. The wafer-type measuring apparatus includes a wafer-type substrate, magnetic flux density sensors disposed on the wafer-type substrate and configured to measure a magnetic flux density, a power supply disposed on the substrate and configured to supply power to the magnetic flux density sensors, a microcontroller unit (MCU) disposed on the substrate and configured to signal process the measured magnetic flux density, and a wireless communication module disposed on the substrate and configured to transmit a signal from the MCU to the outside, and measure the magnetic flux density in a process chamber using a magnetic field.

Patent Agency Ranking