Memory device
    41.
    发明授权

    公开(公告)号:US10134752B2

    公开(公告)日:2018-11-20

    申请号:US15393775

    申请日:2016-12-29

    Abstract: A memory device includes a plurality of gate electrode layers stacked on a substrate, a plurality of channel layers penetrating the plurality of gate electrode layers, a gate insulating layer between the plurality of gate electrode layers and the plurality of channel layers, and a common source line on the substrate adjacent to the gate electrode layers. The common source line includes a first part and a second part that are alternately arranged in a first direction and have different heights in a direction vertical to a top surface of the substrate. The gate insulating layer includes a plurality of vertical parts and a horizontal part. The plurality of vertical parts surrounds corresponding ones of the plurality of channel layers. The horizontal part extends parallel to a top surface of the substrate.

    MEMORY DEVICE
    43.
    发明申请
    MEMORY DEVICE 审中-公开

    公开(公告)号:US20170373089A1

    公开(公告)日:2017-12-28

    申请号:US15393775

    申请日:2016-12-29

    CPC classification number: H01L27/11582 G11C16/0483 H01L27/11556

    Abstract: A memory device includes a plurality of gate electrode layers stacked on a substrate, a plurality of channel layers penetrating the plurality of gate electrode layers, a gate insulating layer between the plurality of gate electrode layers and the plurality of channel layers, and a common source line on the substrate adjacent to the gate electrode layers. The common source line includes a first part and a second part that are alternately arranged in a first direction and have different heights in a direction vertical to a top surface of the substrate. The gate insulating layer includes a plurality of vertical parts and a horizontal part. The plurality of vertical parts surrounds corresponding ones of the plurality of channel layers. The horizontal part extends parallel to a top surface of the substrate.

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