公开(公告)号：US08994917B2

公开(公告)日：2015-03-31

申请号：US12999512

申请日：2009-07-22

申请人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs

发明人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20 ,  H01L21/67

CPC分类号： G03F7/70875 ,  H01L21/67109 ,  H01L21/67248

摘要： An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.

摘要翻译： 文章支持被构造来支持文章。 物品支撑件包括构造成向物品支撑件提供热提取流体并从其提取热缓冲流体的后填充结构。 背部填充结构连接到提取管道，其被构造和布置成从后部填充结构提取至少一个热缓冲流体的气相。 后填充结构连接到供应管道，构造和布置成将热缓冲流体的液相供应到后填充结构。 背部填充结构被布置成使热缓冲流体进入组合的液体和气相以与制品热连接。

公开(公告)号：US08953142B2

公开(公告)日：2015-02-10

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US08913228B2

公开(公告)日：2014-12-16

申请号：US11730749

申请日：2007-04-03

申请人： Maurice Wijckmans ,  Martinus Agnes Willem Cuijpers ,  Martinus Hendrikus Antonius Leenders ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Theodorus Petrus Maria Cadee ,  Frederik Eduard De Jong ,  Wilhelmus Franciscus Johannes Simons ,  Edwin Augustinus Matheus Van Gompel ,  Martin Frans Pierre Smeets ,  Rob Jansen ,  Gerardus Adrianus Antonius Maria Kusters ,  Martijn Van Baren

发明人： Maurice Wijckmans ,  Martinus Agnes Willem Cuijpers ,  Martinus Hendrikus Antonius Leenders ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Theodorus Petrus Maria Cadee ,  Frederik Eduard De Jong ,  Wilhelmus Franciscus Johannes Simons ,  Edwin Augustinus Matheus Van Gompel ,  Martin Frans Pierre Smeets ,  Rob Jansen ,  Gerardus Adrianus Antonius Maria Kusters ,  Martijn Van Baren

IPC分类号： G03B27/58 ,  G03F7/20 ,  F16L55/053

CPC分类号： G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

摘要： A lithographic apparatus is disclosed that is arranged to project a pattern from a patterning device onto a substrate, the lithographic apparatus has a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and is arranged to dampen a pressure variation in the conditioning system.

摘要翻译： 公开了一种光刻设备，其被布置成将图案从图案形成装置投影到基板上，光刻设备具有被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括压力调节器，其与调节系统流体连通并且被布置成抑制调节系统中的压力变化。

公开(公告)号：US08564763B2

公开(公告)日：2013-10-22

申请号：US12436635

申请日：2009-05-06

申请人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

发明人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

摘要翻译： 公开了一种衬底台，其中提供加热器以考虑可施加于衬底的热负荷。 加热器分段分段以改善控制。 可以提供每个段的温度传感器。 温度传感器可以嵌入在基板台中。

公开(公告)号：US07864292B2

公开(公告)日：2011-01-04

申请号：US11404091

申请日：2006-04-14

申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

公开(公告)号：US07804582B2

公开(公告)日：2010-09-28

申请号：US11494794

申请日：2006-07-28

申请人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Judocus Marie Dominicus Stoeldraijer ,  Antonius Johannes De Kort ,  Franciscus Van De Mast ,  Marteijn De Jong

发明人： Koen Jacobus Johannes Maria Zaal ,  Joost Jeroen Ottens ,  Judocus Marie Dominicus Stoeldraijer ,  Antonius Johannes De Kort ,  Franciscus Van De Mast ,  Marteijn De Jong

IPC分类号： G03B27/58

CPC分类号： G03F7/70858 ,  G03F7/70516 ,  G03F7/70775

摘要： A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.

摘要翻译： 光刻设备包括一个系统，用于补偿衬底台的热变形对衬底台的位置测量的影响，使用衬底台中的侧视镜。 提出了使用各种衬底台扫描轨迹校准光刻设备的方法以及衬底台中横向镜的局部位置和旋转的测量。 具有对准标记的双级光刻设备，其限定仅在曝光站处使用的侧视镜的几何形状，以便当衬底台位于测量站时测量侧视镜的几何形状。

公开(公告)号：US20080297744A1

公开(公告)日：2008-12-04

申请号：US11806662

申请日：2007-06-01

申请人： Frederik Eduard De Jong ,  Marcel Hendrikus Maria Beems ,  Marinus Aart Van Den Brink ,  Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Leon Martin Levasier ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Koen Jacobus Johannes Maria Zaal ,  Richard Bernardus Johannes Droste ,  Johannes Wilhelmus De Klerk ,  Peter Franciscus Wanten ,  Jan Cornelis Van Der Hoeven ,  Edwin Cornelis Kadijk ,  Marteijn De Jong ,  David Lucien Anstotz

发明人： Frederik Eduard De Jong ,  Marcel Hendrikus Maria Beems ,  Marinus Aart Van Den Brink ,  Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Leon Martin Levasier ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Koen Jacobus Johannes Maria Zaal ,  Richard Bernardus Johannes Droste ,  Johannes Wilhelmus De Klerk ,  Peter Franciscus Wanten ,  Jan Cornelis Van Der Hoeven ,  Edwin Cornelis Kadijk ,  Marteijn De Jong ,  David Lucien Anstotz

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

摘要： An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.

摘要翻译： 浸没式光刻设备被描述为具有排出构造以从衬底的边缘和其上支撑衬底的衬底台之间的间隙去除液体的漏液。 排水管设置有向衬底提供液体的装置，而与衬底台的位置无关，和/或在排水管内使气体饱和的装置。 这些措施减少了由于排水管中的液体蒸发导致的热负荷变化。

公开(公告)号：US20080278697A1

公开(公告)日：2008-11-13

申请号：US12216441

申请日：2008-07-03

申请人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

发明人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

IPC分类号： G03B27/52

CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

公开(公告)号：US20080158526A1

公开(公告)日：2008-07-03

申请号：US12000100

申请日：2007-12-07

申请人： Pieter Renaat Maria Hennus ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Peter Paul Steijaert ,  Hubert Matthieu Richard Steijns ,  Peter Smits

发明人： Pieter Renaat Maria Hennus ,  Frits Van Der Meulen ,  Joost Jeroen Ottens ,  Peter Paul Steijaert ,  Hubert Matthieu Richard Steijns ,  Peter Smits

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

摘要： A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.

摘要翻译： 公开了一种用于支撑用于浸没式光刻处理的衬底的衬底支撑件。 基板支撑件具有围绕中心部分定位的中心部分和周边部分。 衬底支撑件还包括布置成减小中心部分和周边部分之间的热传递的热分离器。

公开(公告)号：US07250237B2

公开(公告)日：2007-07-31

申请号：US10743272

申请日：2003-12-23

申请人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

发明人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

IPC分类号： G03C5/00 ,  G03F9/00

CPC分类号： G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations.Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。