Method of purifying nanoparticles in a colloid
    43.
    发明授权
    Method of purifying nanoparticles in a colloid 有权
    纯化胶体中纳米颗粒的方法

    公开(公告)号:US08491768B2

    公开(公告)日:2013-07-23

    申请号:US12821953

    申请日:2010-06-23

    IPC分类号: B01D57/02

    CPC分类号: B03C5/026

    摘要: Nanoparticles in a colloid are purified, with the colloid including a fluid, unwanted matter, and the nanoparticles to be purified. An electric field is applied that is substantially spatially uniform over a distance that is at least equal to a characteristic dimension of the nanoparticles, so that at least some of the nanoparticles move towards at least one collection surface as a result of the force arising between their electrical charge and the electric field, whereupon nanoparticles are collected on said at least one collection surface. The collection surface(s) may be one or more electrodes to which a voltage potential is applied. The collected nanoparticles are then removed from the collection surface, e.g., by dispersing them into another fluid.

    摘要翻译: 胶体中的纳米颗粒被纯化,胶体包括流体,不想要的物质和待纯化的纳米颗粒。 施加的电场在至少等于纳米颗粒的特征尺寸的距离上基本上在空间上均匀,使得至少一些纳米颗粒由于在它们之间产生的力而朝向至少一个收集表面移动 电荷和电场,由此将纳米颗粒收集在所述至少一个收集表面上。 收集表面可以是施加电压电位的一个或多个电极。 然后将收集的纳米颗粒从收集表面中除去,例如通过将其分散到另一种流体中。

    TWO-DIMENSIONAL PATTERNING EMPLOYING SELF-ASSEMBLED MATERIAL
    44.
    发明申请
    TWO-DIMENSIONAL PATTERNING EMPLOYING SELF-ASSEMBLED MATERIAL 有权
    使用自组装材料的二维图案

    公开(公告)号:US20120129357A1

    公开(公告)日:2012-05-24

    申请号:US12017598

    申请日:2008-01-22

    IPC分类号: H01L21/31 B82Y40/00

    摘要: A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled with a filler material and a second layer is deposited above the first layer containing the first nanoscale nested line structure. A second nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running in a second direction is formed from second self-assembling block copolymers within the second layer. The composite pattern of the first nanoscale nested line structure and the second nanoscale nested line structure is transferred into an underlayer beneath the first layer to form an array of structures containing periodicity in two directions.

    摘要翻译: 具有亚光刻宽度和亚光刻距离并沿着第一方向延伸的第一纳米级自对准自组装嵌套线结构由第一层内的第一自组装嵌段共聚物形成。 第一层填充有填充材料,并且第二层沉积在包含第一纳米级嵌套线结构的第一层之上。 具有亚光刻宽度和亚光刻距离并沿第二方向运行的第二纳米级自对准自组装嵌套线结构由第二层内的第二自组装嵌段共聚物形成。 第一纳米级嵌套线结构和第二纳米级嵌套线结构的复合图案被转移到第一层下面的底层中以形成在两个方向上包含周期性的结构阵列。

    Method of positioning patterns from block copolymer self-assembly
    48.
    发明授权
    Method of positioning patterns from block copolymer self-assembly 有权
    从嵌段共聚物自组装定位图案的方法

    公开(公告)号:US07560141B1

    公开(公告)日:2009-07-14

    申请号:US12268562

    申请日:2008-11-11

    IPC分类号: B05D3/02

    摘要: A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.

    摘要翻译: 一种控制由嵌段共聚物的自组装形成的薄片的对准和配准(横向位置)的方法,所述方法包括以下步骤:获得具有能量中性的表面层的基材,该基材包含第一形貌“相位钉扎”图案和第二 地形“导向”模式; 得到自组装二嵌段共聚物; 在能量中性表面上涂布自组装二嵌段共聚物以获得涂布的基材; 并对涂覆的基材进行退火以获得二嵌段共聚物的微畴。