公开(公告)号：US20080192219A1

公开(公告)日：2008-08-14

申请号：US12081291

申请日：2008-04-14

申请人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42

CPC分类号： G03F9/7034 ,  G03F7/70341

摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.

摘要翻译： 在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。

公开(公告)号：US07248334B2

公开(公告)日：2007-07-24

申请号：US11005500

申请日：2004-12-07

申请人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

摘要： The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.

摘要翻译： 光刻设备包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 所述光刻设备还包括被配置为保持基板的基板台，配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量（a）所述基板台的参数的测量系统，或（b ）基板，或（c）由投影系统投影的图像，或（d）（a） - （c）的任何组合，以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统 系统。 光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。

公开(公告)号：US07184122B2

公开(公告)日：2007-02-27

申请号：US10888514

申请日：2004-07-12

申请人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

发明人： Timotheus Franciscus Sengers ,  Sjoerd Nicolaas Lambertus Donders ,  Hans Jansen ,  Arjen Boogaard

IPC分类号： G03B27/42

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

摘要： In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20160274473A1

公开(公告)日：2016-09-22

申请号：US15167357

申请日：2016-05-27

申请人： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

发明人： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Joeri Lof ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Hans Jansen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Alexander Straaijer ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70916 ,  G03F9/7088

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US09141003B2

公开(公告)日：2015-09-22

申请号：US12902847

申请日：2010-10-12

申请人： Ruud Antonius Catharina Maria Beerens ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen

发明人： Ruud Antonius Catharina Maria Beerens ,  Sjoerd Nicolaas Lambertus Donders ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Bastiaan Lambertus Wilhelmus Marinus Van De Ven ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC分类号： G01B11/14 ,  G03F7/20 ,  G01B9/02

CPC分类号： G03F7/7085 ,  G01B9/02 ,  G01B9/02049 ,  G01B11/14 ,  G01B2290/70 ,  G03F7/70766 ,  G03F7/70775

摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.

摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。

公开(公告)号：US09099501B2

公开(公告)日：2015-08-04

申请号：US12901939

申请日：2010-10-11

申请人： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Sergei Shulepov

发明人： Nicolaas Rudolf Kemper ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Sergei Shulepov

IPC分类号： G03B27/52 ,  H01L21/67 ,  G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

摘要： A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

摘要翻译： 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。

公开(公告)号：US08681311B2

公开(公告)日：2014-03-25

申请号：US13154008

申请日：2011-06-06

申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Ten Kate ,  Michel Riepen ,  Sergei Shulepov ,  Sjoerd Nicolaas Lambertus Donders

发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Ten Kate ,  Michel Riepen ,  Sergei Shulepov ,  Sjoerd Nicolaas Lambertus Donders

IPC分类号： G03B27/52

CPC分类号： H01L21/0274 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.

摘要翻译： 公开了一种浸入式光刻设备，其中气刀成形，并且液体移除装置被定位成改善从基板的表面去除液体。

公开(公告)号：US20130038854A1

公开(公告)日：2013-02-14

申请号：US13569926

申请日：2012-08-08

申请人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/60

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/683

摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.

摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（mK）的热导率， 298 K.

公开(公告)号：US20120140192A1

公开(公告)日：2012-06-07

申请号：US13369982

申请日：2012-02-09

申请人： Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk ,  Martinus Hendrikus Antonius Leenders

发明人： Sjoerd Nicolaas Lambertus Donders ,  Bob Streefkerk ,  Martinus Hendrikus Antonius Leenders

IPC分类号： G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

摘要翻译： 公开了一种浸没式光刻设备，其中液体被供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔，其中具有通孔以减小板的存在的阻尼效果，并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响。

公开(公告)号：US20120013873A1

公开(公告)日：2012-01-19

申请号：US13242004

申请日：2011-09-23

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.