公开(公告)号：US07767102B2

公开(公告)日：2010-08-03

申请号：US11839778

申请日：2007-08-16

申请人： Francesco Lemmi ,  David P. Stumbo

发明人： Francesco Lemmi ,  David P. Stumbo

IPC分类号： H01B13/00

CPC分类号： C30B29/605 ,  B82Y10/00 ,  C30B11/12 ,  H01L21/02439 ,  H01L21/02513 ,  H01L21/02521 ,  H01L21/02532 ,  H01L21/02603 ,  H01L21/02606 ,  H01L21/02639 ,  H01L21/02645 ,  H01L21/02653 ,  H01L29/0673 ,  H01L29/0676 ,  H01L29/068 ,  H01L29/125 ,  H01L29/66469 ,  H01L29/775 ,  H01L29/78684 ,  H01L29/7869 ,  H01L29/78696 ,  H01L51/0048 ,  Y10S977/762 ,  Y10S977/938 ,  Y10T428/139 ,  Y10T428/2902 ,  Y10T428/2949

摘要： The present invention is directed to methods to harvest, integrate and exploit nanomaterials, and particularly elongated nanowire materials. The invention provides methods for harvesting nanowires that include selectively etching a sacrificial layer placed on a nanowire growth substrate to remove nanowires. The invention also provides methods for integrating nanowires into electronic devices that include placing an outer surface of a cylinder in contact with a fluid suspension of nanowires and rolling the nanowire coated cylinder to deposit nanowires onto a surface. Methods are also provided to deposit nanowires using an ink-jet printer or an aperture to align nanowires. Additional aspects of the invention provide methods for preventing gate shorts in nanowire based transistors. Additional methods for harvesting and integrating nanowires are provided.

摘要翻译： 本发明涉及收获，整合和利用纳米材料，特别是细长的纳米线材料的方法。 本发明提供了收获纳米线的方法，其包括选择性地蚀刻放置在纳米线生长衬底上以去除纳米线的牺牲层。 本发明还提供了将纳米线整合到电子器件中的方法，其包括将圆筒的外表面与纳米线的流体悬浮液接触并滚动纳米线涂覆的圆筒以将纳米线沉积到表面上。 还提供了使用喷墨打印机或孔径以纳米线排列纳米线的方法。 本发明的另外的方面提供了用于防止基于纳米线的晶体管中的栅极短路的方法。 提供了收获和集成纳米线的其他方法。

公开(公告)号：US07265829B2

公开(公告)日：2007-09-04

申请号：US10738438

申请日：2003-12-17

申请人： Wu Jiang ,  Todd E. French ,  David P. Stumbo

发明人： Wu Jiang ,  Todd E. French ,  David P. Stumbo

IPC分类号： G01J3/28

CPC分类号： G01N21/6452 ,  G01N21/6428 ,  G02B17/061 ,  G02B27/0025

摘要： A reflective light imaging system for use in high-throughput screening of samples disposed in multiple-well plates. The system can include a set of mirrors and lenses. The first mirror has a central aperture through which light from the object passes. The first mirror has a concave reflective surface that faces the image plane. The next element is a second mirror with a convex reflective surface. The system can include an aberration corrective system positioned between the second mirror and the image plane, and an optical sensor near the image plane. Light from an object passes through the central aperture of the first mirror and is reflected off the convex surface of the second mirror. The light then strikes the reflective surface of the first mirror. The light from the first mirror is then collected by the aberration correction system and transmitted toward the image plane.

摘要翻译： 一种用于高通量筛选多孔板样品的反射光成像系统。 该系统可以包括一组镜子和镜头。 第一个镜子有一个中心光阑，通过这个中心孔光从物体通过。 第一反射镜具有面向图像平面的凹面反射面。 下一个元件是具有凸反射表面的第二镜。 该系统可以包括位于第二反射镜和图像平面之间的像差校正系统，以及靠近图像平面的光学传感器。 来自物体的光穿过第一反射镜的中心孔并从第二反射镜的凸表面反射。 光然后撞击第一反射镜的反射表面。 来自第一反射镜的光然后被像差校正系统收集并且朝向图像平面传送。

公开(公告)号：US06498335B2

公开(公告)日：2002-12-24

申请号：US10004647

申请日：2001-12-03

申请人： Douglas N. Modlin ,  David P. Stumbo ,  Rick V. Stellmacher

发明人： Douglas N. Modlin ,  David P. Stumbo ,  Rick V. Stellmacher

IPC分类号： H01J4014

CPC分类号： G01N21/6408 ,  G01N21/6445 ,  G01N21/6452

摘要： A broad-range light-detection system. In some embodiments, the system includes apparatus and methods for detecting light with high accuracy over a broad range of intensities. In other embodiments, the system includes apparatus and methods for automatically scaling the detection range to improve detection based on the intensity of the detected light. In yet other embodiments, the system includes apparatus and methods for detecting light with increased speed, particularly in applications involving analysis of successive samples.

摘要翻译： 广泛的光检测系统。 在一些实施例中，该系统包括用于在宽范围的强度下以高精度检测光的装置和方法。 在其他实施例中，系统包括用于自动缩放检测范围的装置和方法，以根据检测到的光的强度改进检测。 在其他实施例中，该系统包括用于以增加的速度检测光的装置和方法，特别是在涉及连续采样分析的应用中。

公开(公告)号：US06455821B1

公开(公告)日：2002-09-24

申请号：US09639951

申请日：2000-08-17

申请人： David P. Stumbo

发明人： David P. Stumbo

IPC分类号： H05B102

CPC分类号： H01L21/67248 ,  G03F1/20 ,  G03F7/70875 ,  H01J2237/2001 ,  H01J2237/3175 ,  H01J2237/31794 ,  H01L21/67103 ,  H01L21/67109

摘要： The present invention comprises a system and method for the control of the temperature of an article, particularly in a vacuum. The system is applicable to control of reticle temperature in a electron beam or ion beam lithography system. The system includes non-contacting radiation heat sources to selectively apply localized radiant heat to achieve and maintain temperature uniformity across the reticle. The method generally includes applying initial heat once after the reticle is initially loaded into the lithography system from an external environment, applying exposure heat when other reticles are being exposed and applying heat during the wafer load cycle when a new wafer is loaded and the electron or ion beam is blanked. The operating temperature of the reticle is uniformly maintained at a temperature slightly above the ambient temperature. The temperature uniformly of the reticle is important for fabricating defect-free wafers, resulting in high yields.

摘要翻译： 本发明包括用于控制制品温度的系统和方法，特别是在真空中。 该系统适用于电子束或离子束光刻系统中掩模版温度的控制。 该系统包括非接触式辐射热源，以选择性地施加局部辐射热以实现并保持跨越掩模版的温度均匀性。 该方法通常包括：在将掩模版从外部环境初始加载到光刻系统中之后施加初始热量，当其他掩模版被暴露时施加曝光热，并且在晶片加载循环期间加载新的晶片加载时，电子或 离子束被消隐。 掩模版的工作温度均匀地保持在略高于环境温度的温度。 掩模版的均匀温度对于制造无缺陷晶片是重要的，导致高产率。

公开(公告)号：US5160845A

公开(公告)日：1992-11-03

申请号：US665616

申请日：1991-03-06

申请人： David P. Stumbo ,  John C. Wolfe ,  John N. Randall

发明人： David P. Stumbo ,  John C. Wolfe ,  John N. Randall

IPC分类号： H01J37/304

CPC分类号： H01J37/3045

摘要： The ion beam which performs the printing on the resist through the mask is also used to perform the alignment function. Alignment marks are initially provided on the wafer of a material which emits light when an ion beam impinges thereon, such as silicon dioxide. An ion mask, preferably of silicon, is then positioned over the wafer and alignment marks and ions are directed to the alignment marks through the mask. The degree of alignment is determined by the amount of light emitted by the alignment marks since more ions will strike the alignment marks with increased alignment. The emitted light is detected and +X, -X, +Y, -Y and +theta and -theta error signals are provided on a continuous basis for closed loop control of the mask relative to the wafer under proper alignment is achieved. The control is provided by scanning the emitted light from six appropriately positioned alignment marks on the wafer, comparing the intensity of the emitted light in terms of +X amd -X signals to provide an X error signal, doing the same with the Y and theta signals to provide Y and theta error signals and then digitizing each of the error signals in a digital to analog converter. The digitized signals are then applied to a central processing unit wherein they are analyzed in accordance with a predetermined program and provide signals to a motor controller. The motor controller proceeds to provide output signals to properly position the wafer in the X and Y directions as well as to rotate the mask to provide the desired alignment between the mask and wafer.

摘要翻译： 通过掩模在抗蚀剂上进行印刷的离子束也用于进行取向功能。 对准标记最初设置在当离子束照射在其上时发光的材料的晶片上，例如二氧化硅。 然后将优选硅的离子掩模定位在晶片上方，并且将对准标记和离子通过掩模引导到对准标记。 对准程度由对准标记发出的光量确定，因为更多的离子将以更高的对准进行对准标记。 检测到发射的光，并且在连续的基础上提供+ X，-X，+ Y，-Y和+θ以及-θ误差信号，以在适当对准下实现掩模相对于晶片的闭环控制。 通过扫描来自晶片上六个适当定位的对准标记的发射光来提供控制，根据+ X amd -X信号比较发射光的强度以提供X误差信号，与Y和θ 信号以提供Y和θ误差信号，然后数字化数模转换器中的每个误差信号。 然后将数字化信号施加到中央处理单元，其中根据预定程序对其进行分析，并向马达控制器提供信号。 马达控制器继续提供输出信号以在X和Y方向上适当地定位晶片，并且旋转掩模以在掩模和晶片之间提供期望的对准。

公开(公告)号：US06992761B2

公开(公告)日：2006-01-31

申请号：US10445292

申请日：2003-05-22

申请人： Douglas N. Modlin ,  David P. Stumbo ,  Rick V. Stellmacher ,  Jonathan F. Petersen ,  Todd E. French

发明人： Douglas N. Modlin ,  David P. Stumbo ,  Rick V. Stellmacher ,  Jonathan F. Petersen ,  Todd E. French

IPC分类号： G01J3/30 ,  G01N21/54

CPC分类号： G01N21/6452 ,  G01N21/6428 ,  G01N21/76

摘要： Broad-range light-detection systems, including components and methods of use thereof. These systems may include apparatus and methods for detecting light with increased speed and/or detection efficiency, particularly in applications involving repeated analysis of the same sample and/or successive analysis of different samples, and particularly when the sample or samples have a wide range of light intensities. These systems also may include apparatus and methods for detecting light with increased accuracy over a broad range of intensities. These systems also may include vapparatus and methods for automatically scaling detection range to improve detection based on the intensity of the detected light.

摘要翻译： 宽范围光检测系统，包括组件及其使用方法。 这些系统可以包括用于以增加的速度和/或检测效率检测光的装置和方法，特别是在涉及重复分析不同样品的相同样品和/或连续分析的应用中，特别是当样品或样品具有宽范围 光强度。 这些系统还可以包括用于在宽范围的强度下以更高精度检测光的装置和方法。 这些系统还可以包括用于自动缩放检测范围的装置和方法，以根据检测到的光的强度改进检测。

公开(公告)号：US06838051B2

公开(公告)日：2005-01-04

申请号：US09778224

申请日：2001-02-06

申请人： Samuel A. Marquiss ,  Christopher G. Cesar ,  Jon F. Petersen ,  David P. Stumbo ,  Amer El-Hage ,  Glenn R. Edwards ,  Douglas N. Modlin ,  Ley J. Leytes ,  Samuel Burd

发明人： Samuel A. Marquiss ,  Christopher G. Cesar ,  Jon F. Petersen ,  David P. Stumbo ,  Amer El-Hage ,  Glenn R. Edwards ,  Douglas N. Modlin ,  Ley J. Leytes ,  Samuel Burd

IPC分类号： B01L3/00 ,  G01N35/00 ,  G01N35/02 ,  G01N35/04 ,  G01N35/10 ,  G01N21/00

CPC分类号： B01L3/50853 ,  G01N35/028 ,  G01N35/1011 ,  G01N35/1074 ,  G01N2035/00237 ,  G01N2035/0405 ,  G01N2035/0425 ,  G01N2035/0462 ,  Y10T436/112499 ,  Y10T436/114165

摘要： The invention provides an integrated sample-processing system and components thereof for preparing and/or analyzing samples. The components may include a transport module, a fluidics module, and an analysis module, among others.

公开(公告)号：US06310687B1

公开(公告)日：2001-10-30

申请号：US09768765

申请日：2001-01-23

申请人： David P. Stumbo ,  Douglas N. Modlin

发明人： David P. Stumbo ,  Douglas N. Modlin

IPC分类号： G01N2164

CPC分类号： B01L3/50853 ,  B01J2219/00317 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00659 ,  B01J2219/00707 ,  C40B60/14 ,  G01N21/253 ,  G01N35/028 ,  G01N35/1011 ,  G01N35/1074 ,  G01N2035/00237 ,  G01N2035/0405 ,  G01N2035/0425 ,  G01N2035/0462

摘要： Apparatus and methods for optical detection with improved read speed and/or signal-to-noise ratio. These apparatus and methods may involve among others moving an sample substrate (108) while simulataneously detecting light transmitted from one or more sample sites (110) on the substrate (108) by sequentially tracking the sample sites (110) as they move. A stage (101), movable in a first direction, supports the substrate (108). A detector (118) detects light emanating from an examination region (102) delimited by a detection initiation position (106a) and a detection termination position (106b). An optical relay structure (122) transmit light from the examination region (102) to the detector (118). A scanning mechanism (120) simultaneously moves the optical relay structure (122) and the substrate in the first direction. The optical relay structure (122) tracks the substrate (108) between the detection initiation position (106a) and the detection termination position (106b).

摘要翻译： 用于具有改进的读取速度和/或信噪比的光学检测的装置和方法。 这些装置和方法可以包括移动样品衬底（108），同时通过在样品位点（110）移动时顺序地跟踪样品位点（110）同时检测从衬底（108）上的一个或多个样品位点（110）传输的光。 可沿第一方向移动的平台（101）支撑基板（108）。 检测器（118）检测从由检测开始位置（106a）和检测终止位置（106b）限定的检查区域（102）发出的光。 光学继电器结构（122）将来自检查区域（102）的光透射到检测器（118）。 扫描机构（120）同时沿第一方向移动光学继电器结构（122）和基板。 光继电器结构（122）在检测开始位置（106a）和检测终止位置（106b）之间跟踪基板（108）。

公开(公告)号：US6133987A

公开(公告)日：2000-10-17

申请号：US177675

申请日：1998-10-22

申请人： David P. Stumbo

发明人： David P. Stumbo

IPC分类号： H01L21/027 ,  G03F7/20 ,  H01J37/147 ,  H01J37/317 ,  G03B27/54 ,  G21K5/10

CPC分类号： H01J37/1471 ,  B82Y10/00 ,  H01J2237/1504 ,  H01J2237/153 ,  H01J2237/31764

摘要： Electron-beam lithography systems used for transferring images from subfields in a reticle to a wafer. Deflection systems in the electronic lens system are controlled by control systems that include devices to correct misalignment of the electron beams from each of the subfields with the electronic optical axis. In a first embodiment, switches switch between sources to deflect the electron beams to the electronic optical axis and error DACs correct position errors in the sources that are input to the switches. In a second embodiment, the deflection systems deflect the electronic optical axis to coincide with the electron beams from the subfields. In other embodiments, the deflection systems in the electronic lens systems are made insensitive to position errors in deflection control systems by satisfying the condition: G.sub.1 /G.sub.2 =M, where G.sub.1 is the gain of first amplifier amplifying a signal from a DAC which is input to the deflection system deflecting the electron beams from the subfields, G.sub.2 is the gain of a second amplifier amplifying the signal from the DAC which is input to the deflection system deflecting the electron beams to the wafer and M is the magnification of the electronic lens system. Alternatively, the deflection systems deflect the electronic optical axis to coincide with the electron beams from the sub fields. A grillage error DAC supplies a position correction to account for grillage between the subfields. In still other embodiments, a ramp generator supplies a ramp that is input to the deflection systems that are insensitive to position errors in deflection control systems by satisfying the condition: G.sub.1 /G2=M.

摘要翻译： 用于将图像从掩模版中的子场传送到晶片的电子束光刻系统。 电子透镜系统中的偏转系统由包括用于校正来自每个子场的电子束与电子光轴的未对准的装置的控制系统控制。 在第一实施例中，开关在源之间切换以将电子束偏转到电子光轴，并且误差DAC校正输入到开关的源中的位置误差。 在第二实施例中，偏转系统偏转电子光轴以与来自子场的电子束重合。 在其他实施例中，电子透镜系统中的偏转系统对偏转控制系统中的位置误差不敏感，满足以下条件：G1 / G2 = M，其中G1是从输入的DAC放大信号的第一放大器的增益 偏转系统偏转来自子场的电子束，G2是放大来自DAC的信号的第二放大器的增益，其被输入到将电子束偏转到晶片的偏转系统，M是电子透镜系统的放大率 。 或者，偏转系统偏转电子光轴以与来自子场的电子束重合。 格栅错误DAC提供位置校正以考虑子区域之间的格架。 在其他实施例中，斜坡发生器通过满足条件：G1 / G2 = M，向偏转系统输入对偏转控制系统中的位置误差不敏感的斜坡。