摘要:
Radiation-absorbing semiconductor devices and associated methods of making and using are provided. In one aspect, for example, a method for making a radiation-absorbing semiconductor device having enhanced photoresponse can include forming an active region on a surface of a low oxygen content semiconductor, and annealing the low oxygen content semiconductor to a temperature of from about 300° C. to about 1100° C., wherein the forming of the active region and the annealing of the low oxygen content semiconductor are performed in a substantially oxygen-depleted environment.
摘要:
A magnetic tunnel junction (MTJ) device and fabrication method is disclosed. In a particular embodiment, a method of forming a magnetic tunnel junction (MTJ) device includes forming a top electrode layer over an MTJ structure. The top electrode layer includes a first nitrified metal.
摘要:
A method is disclosed that includes controlling current flow direction for current sent over a source line or a bit line of a magnetic memory device. A current generated magnetic field assists switching of a direction of a magnetic field of a free layer of a magnetic element within a spin transfer torque magnetic tunnel junction (STT-MTJ) device.
摘要:
According to an embodiment of the invention, a magnetic tunnel junction (MTJ) element includes a reference ferromagnetic layer, a storage ferromagnetic layer, and an insulating layer. The storage ferromagnetic layer includes a CoFeB sub-layer coupled to a CoFe sub-layer and/or a NiFe sub-layer through a non-magnetic sub-layer. The insulating layer is disposed between the reference and storage ferromagnetic layers.
摘要:
The present invention relates to the discovery of several genes of the domestic dog (Canine familiaris) associated with taste perception. The invention provides, inter alia, the nucleotide sequence of the canine Tas1r1, Tas1r2, and Tas1r3 receptor genes, the amino acid sequences of the polypeptides encoded thereby, and antibodies to the polypeptides. The present invention also relates to methods for screening for compounds that modify the genes' function or activity, the compounds identified by such screens, and mimetics of the identified compounds. The invention further provides methods for modifying the taste preferences, ingestive responses, or general behavior of a mammal such as a dog by administering compounds that affect the function or activity of the gene or the polypeptide encoded thereby.
摘要:
A method, and system for reducing switching noise on a device, and an improved capacitor-integrated device is disclosed. At least one conductive line is deposited within a device. Additionally, at least one capacitor is attached to the at least one conductive line. Once the capacitor is attached to the conductive line, an improved capacitor-integrated circuit device results. The method and system of the present invention provides for the addition of at least one capacitor to be added between the power supply pins on at least one IC device. By doing so, switching signal noise is reduced. As a result of the method and system of the present invention, the resulting improved device can be efficiently used to check various qualities such as the level of ground bouncing noise, or switching signal noise reduction, without changing the circuit design of the device.
摘要:
An expansion joint device (10) used for metal conduits comprises an inlet short tube (1), an outlet short tube (2), and a sleeve (3). Both the opposed inside ends of the two short tubes (1, 2) are in the inside of the sleeve (3) and form a compensating gap (6) between them. A bellows member (7), axially expansible with an external force applying on, is provided in the compensating gap (6) formed between the opposed inside ends of the two short tubes (1, 2). The two ends of the bellows member (7) are respectively connected with the inside ends of the two short tubes (1, 2) in sealed manner. At least one of the two ends of said sleeve (3) is free end with respect to the two short tubes (1, 2).
摘要:
A buffer layer and a gate dielectric layer overlying a substrate having at least one active area is provided. A sacrificial oxide layer is formed over the gate dielectric layer. A nitride layer is formed over the sacrificial oxide layer. The nitride layer is patterned to form an opening therein within the active area exposing a portion of the sacrificial oxide layer within the opening. The portion of the sacrificial oxide layer within the opening is stripped, exposing a portion of the underlying gate dielectric layer within the opening. A gate electrode is formed within opening over the portion of the gate dielectric layer. The remaining nitride layer is selectively removed. The remaining sacrificial oxide layer is then stripped and removed.
摘要:
A method for bringing up lower level metal nodes of multi-layered IC devices (200) includes a step of boring a passage (210) down through the obstructing or non-target metal layers (220) exposing these layers, through the Inter Layer Dielectric layers (230), stopping at the target metal layer (240), and a step of depositing Gallium implanted insulator (250, 260) forming a node structure (280) with a conductive core (250) and an insulative sheath (260). The conductive core (250) brings up the target metal node or layer (240) and the insulative sheath (260) isolates the exposed non-target metal nodes or layers (220) from the target metal node (240) and the conductive core (250).
摘要:
Aspects for exposing local areas for desired nodes in a multi-layer integrated circuit from the backside are described. In an exemplary method aspect, the method includes removing a predetermined portion of a first backside layer, opening chosen local areas with focused ion beam etching through at least the first backside layer, and exposing a desired node in a metal layer lower than the first backside layer with reactive ion etching. The method further includes removing the predetermined portion by performing reactive ion etching to a predetermined stop point. Alternatively, the first backside layer is mechanically polished to a predetermined thickness. Additionally, the method includes utilizing a high current ion beam during the focused ion beam etching.