Roll-to-Roll Chemical Vapor Deposition System
    41.
    发明申请
    Roll-to-Roll Chemical Vapor Deposition System 审中-公开
    卷对卷化学气相沉积系统

    公开(公告)号:US20100310766A1

    公开(公告)日:2010-12-09

    申请号:US12479824

    申请日:2009-06-07

    IPC分类号: C23C16/458 C23C16/44

    摘要: A roll-to-roll CVD system includes at least two rollers that transport a web through a deposition chamber during CVD processing. The deposition chamber defines a passage for the web to pass through while being transported by the at least two rollers. The deposition chamber includes a plurality of process chambers that are isolated by barriers which maintain separate process chemistry in each of the plurality of process chambers. Each of the plurality of process chambers includes a gas input port and a gas exhaust port, and a plurality of CVD gas sources. At least two of the plurality of CVD gas sources is coupled to the gas input port of each of the plurality of process chambers.

    摘要翻译: 卷对卷CVD系统包括在CVD处理期间将幅材输送通过沉积室的至少两个辊。 沉积室限定了通过所述纤维网通过的通道,同时被所述至少两个辊输送。 沉积室包括由在多个处理室中的每一个中保持分离的工艺化学物质的隔离物隔离的多个处理室。 多个处理室中的每一个包括气体输入端口和排气口,以及多个CVD气体源。 多个CVD气体源中的至少两个耦合到多个处理室中的每一个的气体输入端口。

    Method of sputter depositing an alloy on a substrate
    43.
    发明申请
    Method of sputter depositing an alloy on a substrate 审中-公开
    将合金溅射沉积在基底上的方法

    公开(公告)号:US20070045102A1

    公开(公告)日:2007-03-01

    申请号:US11209907

    申请日:2005-08-23

    IPC分类号: C23C14/00

    CPC分类号: C23C14/352 C23C14/165

    摘要: An improved planetary sputter deposition method for sputter depositing an alloy on a substrate wherein the sputter deposited amount, or thickness, of a specific material of the alloy can be controlled so that different substrates can be provided with an alloy having a different composition, i.e. having different percentages of the same materials, thus, reducing the costs of stockpiling multiple alloy targets. The method generally includes providing a substrate and a plurality of targets with each of the plurality of targets being composed of one or more magnetic materials. The targets are sputtered, in sequence, to deposit each of the materials of the plurality of targets on the substrate to provide at least one laminate defining an alloy.

    摘要翻译: 一种用于在基板上溅射沉积合金的改进的行星溅射沉积方法,其中可以控制合金的特定材料的溅射沉积量或厚度,使得可以提供具有不同组成的合金,即具有 不同百分比的相同材料,从而降低储存多种合金靶材的成本。 该方法通常包括提供基底和多个靶,其中多个靶中的每一个由一个或多个磁性材料构成。 按顺序溅射靶,以将多个靶材的每种材料沉积在基底上,以提供限定合金的至少一个层压板。

    Continuous flow deposition system
    44.
    发明授权
    Continuous flow deposition system 失效
    连续流沉积系统

    公开(公告)号:US06972055B2

    公开(公告)日:2005-12-06

    申请号:US10604502

    申请日:2003-07-25

    申请人: Piero Sferlazzo

    发明人: Piero Sferlazzo

    摘要: An atomic layer deposition system is described that includes a deposition chamber. A first and second reaction chamber are positioned in the deposition chamber and contain a first and a second reactant species, respectively. A monolayer of the first reactant species is deposited on a substrate passing through the first reaction chamber. A monolayer of the second reactant species is deposited on a substrate passing through the second reaction chamber. A transport mechanism transports a substrate in a path through the first reaction chamber and through the second reaction chamber, thereby depositing a film on the substrate by atomic layer deposition. The shape of the first and the second reaction chambers are chosen to achieve a constant exposure of the substrate to reactant species when the transport mechanism transports the substrate in the path through the respective reaction chambers at the constant transport rate.

    摘要翻译: 描述了包括沉积室的原子层沉积系统。 第一和第二反应室分别位于沉积室中并含有第一和第二反应物种类。 第一反应物种的单层沉积在穿过第一反应室的基板上。 第二反应物种类的单层沉积在穿过第二反应室的基板上。 输送机构在通过第一反应室并通过第二反应室的路径中输送基板,由此通过原子层沉积在基板上沉积膜。 选择第一和第二反应室的形状,以便当输送机构以恒定的输送速率将基板输送通过相应的反应室的路径时,使基板恒定地暴露于反应物种。

    Acousto-optic tunable filter with segmented acousto-optic interaction region
    45.
    发明授权
    Acousto-optic tunable filter with segmented acousto-optic interaction region 失效
    声光可调滤波器,具有分段声光相互作用区域

    公开(公告)号:US06718076B2

    公开(公告)日:2004-04-06

    申请号:US10104494

    申请日:2002-03-22

    IPC分类号: G02F1335

    摘要: An acousto-optic tunable filter that includes a polarization beamsplitter, a multi-segment interaction region and a polarization beam combiner is described. The polarization beamsplitter generates a first and a second polarized optical signal. The multi-segment optical interaction region includes a first optical interaction region and a first acoustic wave generator that generates acoustic waves in the first optical interaction region. The multi-segment optical interaction region also includes a second optical interaction region that is non-collinear relative to the first optical interaction region and a second acoustic wave generator that generates acoustic waves in the second optical interaction region. Optical signals that are phase-matched to the acoustic waves are mode-converted in response to the acoustic waves. The acousto-optic tunable filter also includes a polarization beam combiner that generates both a mode-converted optical signal and a non-mode-converted optical signal.

    摘要翻译: 描述了包括偏振分束器,多段相互作用区域和偏振束组合器的声光可调滤波器。 偏振分束器产生第一和第二偏振光信号。 多段光学相互作用区域包括在第一光学相互作用区域中产生声波的第一光学相互作用区域和第一声波发生器。 多段光学相互作用区域还包括相对于第一光学相互作用区域非共线的第二光学相互作用区域和在第二光学相互作用区域中产生声波的第二声波发生器。 与声波相位匹配的光信号响应于声波被模式转换。 声光可调谐滤波器还包括产生模式转换的光信号和非模式转换的光信号的偏振光束组合器。

    Multi-layer sputter deposition apparatus
    46.
    发明授权
    Multi-layer sputter deposition apparatus 有权
    多层溅射沉积设备

    公开(公告)号:US06328858B1

    公开(公告)日:2001-12-11

    申请号:US09401754

    申请日:1999-09-23

    IPC分类号: C23C1435

    摘要: A multi-layer sputter deposition chamber or cluster tool module is described. The sputter deposition chamber includes a plurality of magnetrons mounted on a rotatable member that defines an aperture. A predetermined one of the plurality of magnetrons is positionable proximate to a substrate in the sputter deposition chamber. A transport mechanism transports the substrate in a path of the sputtered ions in a first and a second direction that is substantially opposite to the first direction.

    摘要翻译: 描述了多层溅射沉积室或集群工具模块。 溅射沉积室包括安装在限定孔的可旋转构件上的多个磁控管。 多个磁控管中的预定的一个可以靠近溅射沉积室中的衬底定位。 输送机构在基本上与第一方向相反的第一和第二方向上将溅射离子的路径中的衬底传送。

    Ion generating source for use in an ion implanter
    47.
    发明授权
    Ion generating source for use in an ion implanter 失效
    用于离子注入机的离子发生源

    公开(公告)号:US5497006A

    公开(公告)日:1996-03-05

    申请号:US339554

    申请日:1994-11-15

    摘要: An ion source embodying the present invention is for use in an ion implanter. The ion source comprises a gas confinement chamber having conductive chamber walls that bound a gas ionization zone. The gas confinement chamber includes an exit opening to allow ions to exit the chamber. A base positions the gas confinement chamber relative to structure for forming an ion beam from ions exiting the gas confinement chamber. A gas supply is in communication with the gas confinement chamber for conducting an ionizable gas into the gas confinement chamber. A cathode is supported by the base and positioned with respect to said gas confinement chamber to emit ionizing electrons into the gas ionization zone. The cathode comprises a tubular conductive body that partially extends into the gas confinement chamber and includes a conductive cap that faces into the gas confinement chamber for emitting ionizing electrons into the gas confinement chamber. A filament is supported by the base at a position inside the tubular conductive body of the cathode for heating the cap and cause the ionizing electrons to be emitted from the cap into the gas confinement chamber.

    摘要翻译: 体现本发明的离子源用于离子注入机。 离子源包括气体限制室,其具有结合气体电离区的导电室壁。 气体限制室包括允许离子离开室的出口。 基座相对于从离开气体限制室的离子形成离子束的结构定位气体限制室。 气体供应与气体限制室连通,用于将可电离气体导入气体限制室。 阴极由基座支撑并且相对于所述气体限制室定位,以将电离电子发射到气体电离区域中。 阴极包括部分延伸到气体限制室中的管状导电体,并且包括面向气体限制室的导电盖,用于将电离电子发射到气体限制室中。 灯丝在阴极的管状导电体内部的位置由基底支撑,用于加热帽,并使离子化电子从帽子发射到气体限制室中。