公开(公告)号：US08748853B2

公开(公告)日：2014-06-10

申请号：US13494442

申请日：2012-06-12

申请人： Shinji Nagai ,  Osamu Wakabayashi ,  Yutaka Shiraishi ,  Junichi Fujimoto

发明人： Shinji Nagai ,  Osamu Wakabayashi ,  Yutaka Shiraishi ,  Junichi Fujimoto

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/003

摘要： A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.

摘要翻译： 用于利用激光装置操作的腔室装置包括腔室，目标供应单元，收集单元和收集容器。 该腔室包括入口，来自激光装置的激光束通过入口进入腔室。 目标供给单元被配置为将目标材料供应到室内的预定区域。 收集单元包括碎屑进入表面，使得当靶材料被激光束照射时产生的碎屑进入碎片进入表面。 碎屑进入表面相对于碎片进入碎片进入表面的方向倾斜。 收集容器收集从收集单元流出的碎屑。

公开(公告)号：US20120177072A1

公开(公告)日：2012-07-12

申请号：US13425825

申请日：2012-03-21

申请人： Shinji NAGAI ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji NAGAI ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/10 ,  H01S3/22

CPC分类号： H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

摘要翻译： 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US20100078579A1

公开(公告)日：2010-04-01

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US20080285602A1

公开(公告)日：2008-11-20

申请号：US11631463

申请日：2005-07-07

申请人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

发明人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

IPC分类号： H01S3/10 ,  H01S3/13

CPC分类号： H01S3/2366 ,  H01S3/134 ,  H01S3/225

摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

摘要翻译： 通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E 95）。 为了使测量的光谱纯度范围（E 95）在目标光谱纯度范围（E 950）的允许范围E 950±dE 95内，从通过振荡激光装置（100）开始放电的时间到 由放大激光装置（300）开始放电的时间被控制，光谱纯度范围（E 95）被控制为稳定。

公开(公告)号：US20080095209A1

公开(公告)日：2008-04-24

申请号：US11903111

申请日：2007-09-19

申请人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

发明人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/005 ,  H01S3/036 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/073 ,  H01S3/08009 ,  H01S3/08045 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2366

摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.

摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。

公开(公告)号：US09647415B2

公开(公告)日：2017-05-09

申请号：US14602208

申请日：2015-01-21

申请人： Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

发明人： Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

IPC分类号： H01S3/10 ,  H01S3/00 ,  H01S3/097 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/23

CPC分类号： H01S3/09702 ,  H01S3/0014 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/2366

摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

公开(公告)号：US09257809B2

公开(公告)日：2016-02-09

申请号：US13401734

申请日：2012-02-21

申请人： Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

发明人： Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

IPC分类号： H01S3/223 ,  H01S3/03 ,  H01S3/134 ,  H01S3/23 ,  H01S3/036 ,  G03F7/20

CPC分类号： H01S3/03 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/134 ,  H01S3/2316 ,  H01S3/2366

摘要： A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.

摘要翻译： 用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光， 并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度 根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。

公开(公告)号：US09046651B2

公开(公告)日：2015-06-02

申请号：US13696528

申请日：2011-12-29

申请人： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

发明人： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

IPC分类号： G02B7/182 ,  G02B7/18 ,  G03F7/20

CPC分类号： G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

摘要翻译： 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。

公开(公告)号：US08811436B2

公开(公告)日：2014-08-19

申请号：US13696497

申请日：2012-02-08

申请人： Kenichi Miyao ,  Motoki Niwano ,  Osamu Wakabayashi

发明人： Kenichi Miyao ,  Motoki Niwano ,  Osamu Wakabayashi

IPC分类号： H01S3/13

CPC分类号： H01S3/10046 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/0085 ,  H01S3/09702 ,  H01S3/10007 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/4025 ,  H05G2/005 ,  H05G2/008

摘要： A laser apparatus may include a master oscillator configured to output a laser beam, at least one amplifier disposed in a beam path of the laser beam from the master oscillator, at least one power source for applying a high-frequency voltage to the at least one amplifier, and a controller for varying the high-frequency voltage to be applied to the at least one amplifier from the at least one power source.

摘要翻译： 激光装置可以包括主振荡器，其被配置为输出激光束，至少一个放大器，设置在来自主振荡器的激光束的光束路径中，至少一个电源，用于将至少一个高频电压 放大器和控制器，用于改变要从至少一个电源施加到至少一个放大器的高频电压。

公开(公告)号：US08804780B2

公开(公告)日：2014-08-12

申请号：US11822126

申请日：2007-07-02

申请人： Osamu Wakabayashi ,  Takahito Kumazaki ,  Toru Suzuki ,  Masashi Shinbori ,  Masaya Yoshino

发明人： Osamu Wakabayashi ,  Takahito Kumazaki ,  Toru Suzuki ,  Masashi Shinbori ,  Masaya Yoshino

IPC分类号： H01S3/13 ,  H01S3/137

CPC分类号： G03F7/2006 ,  H01S3/08036 ,  H01S3/106 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.

摘要翻译： 对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。 当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。 调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。 本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量 曝光工具可以稳定。