Abstract:
An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.
Abstract:
The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.
Abstract:
A charged-particle beam lens includes a plate-like anode, a plate-like cathode, and an insulator disposed between the anode and the cathode. The insulator, the anode, and the cathode have a passage portion through which a charged beam is passed. A high-resistance film is formed on an inner side of the insulator, the inner side forming the passage portion, or an outermost side of insulator, and the anode and the cathode are electrically connected together via the high-resistance film. The anode and the high-resistance film, and the cathode and the high-resistance film each contain the same metal or semiconductor element and have different resistant values. This suppresses electric field concentration due to an increase in resistance and poor connection at the interface between the anode and the cathode and the high-resistance film or at the interface between the electroconductive film and the high-resistance film, thus suppressing generation of discharge.
Abstract:
A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.
Abstract:
Provided is a charged particle beam lens, including: a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of a charged particle beam; a distance defining member provided between the first electrode and the second electrode such that the first electrode and the second electrode are placed away from each other; and a gap surrounded by the first electrode, the second electrode, and the distance defining member, in which: each of the first electrode and the second electrode has a first through hole formed therein, through which the charged particle beam passes; the second electrode further has a second through hole formed therein, through which the charged particle beam does not pass; and both the first through hole and the second through hole communicate to the gap.
Abstract:
System that focuses electron beams in an electro-static area to a laminar flow of electrons with uniform distribution of current density and extraordinary demagnification includes a housing having a first interior portion and a second interior portion electrically insulated from the first interior portion. The second interior portion has an electric field-free space. An electrode system is disposed in the first interior portion and includes a cathode assembly and at least one anode assembly. The cathode assembly generates an electron beam that passes through each anode assembly and then into the electric field-free space in the second interior portion. A position of a crossover point on a longitudinal axis maybe regulated by varying dimensions of a substantially cylindrical portion of the anode assembly and a substantially cylindrical portion of a near-cathode electrode assembly.
Abstract:
An apparatus and method for generating femtosecond electron beam are disclosed. The apparatus for generating electron beam by discharging an electron generated via a cathode to an anode includes a transmission window provided at one side of the cathode to allow incident laser to pass therethrough, a pinhole formed on the anode such that the pinhole corresponds to the position of the electron generated from the transmission window, and a focusing unit provided at one side of the cathode and generating an electric field to accelerate and at the same time concentrate the electron to the pinhole. Electrons are simultaneously concentrated and accelerated to the pinhole by an electric field generated by the focusing unit positioned at the cathode to generate femtosecond electron beam.
Abstract:
The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.
Abstract:
Electric fields for electrostatic optics for focusing or otherwise controlling beams of ions, electrons and charged particles in general produced by surface current distributions which flow on appropriately shaped and located resistive elements from electrical power sources of appropriate voltage connected to two or more points or regions of the resistive surfaces; the resulting electric fields in the proximity of the current carrying surfaces are parallel to these surfaces. Useful electric field configurations may be produced which are inconvenient or impossible to produce by the prior art using surface charge distributions. New and improved analyzers of "concentric hemisphere" and "parallel plate" types are specifically utilized for ion kinetic energy selection prior to measurement of the mass-to-charge ratio of secondary ions produced by primary ion bombardment of surfaces.
Abstract:
A field terminator includes a plurality of electrode plates positioned around a guide axis at a radial distance therefrom. The plates generate a quadrupole DC field such that a polarity on each plate is opposite to a polarity on the plates adjacent thereto. The plates may be positioned at an axial end of a quadrupole ion guide such as a mass filter. In addition to an RF field, the ion guide may generate a quadrupole DC field. The DC field of the plates may be opposite in polarity to that of the ion guide.