公开(公告)号：US08710455B2

公开(公告)日：2014-04-29

申请号：US13838785

申请日：2013-03-15

Applicant: Canon Kabushiki Kaisha

Inventor： Takashi Shiozawa

IPC: H01J37/10 ,  H01J49/42 ,  H01J43/20

CPC classification number: H01J37/10 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/038 ,  H01J2237/31774

Abstract: A charged-particle beam lens includes a plate-like anode, a plate-like cathode, and an insulator disposed between the anode and the cathode. The insulator, the anode, and the cathode have a passage portion through which a charged beam is passed. A high-resistance film is formed on an inner side of the insulator, the inner side forming the passage portion, or an outermost side of insulator, and the anode and the cathode are electrically connected together via the high-resistance film. The anode and the high-resistance film, and the cathode and the high-resistance film each contain the same metal or semiconductor element and have different resistant values. This suppresses electric field concentration due to an increase in resistance and poor connection at the interface between the anode and the cathode and the high-resistance film or at the interface between the electroconductive film and the high-resistance film, thus suppressing generation of discharge.

Abstract translation: 带电粒子束透镜包括板状阳极，板状阴极和布置在阳极和阴极之间的绝缘体。 绝缘体，阳极和阴极具有带电束通过的通道部分。 在绝缘体的内侧形成高电阻膜，形成绝缘体的通路部分或最外侧的内侧，并且阳极和阴极通过高电阻膜电连接在一起。 阳极和高电阻膜以及阴极和高电阻膜各自含有相同的金属或半导体元件，并具有不同的电阻值。 由于电阻增加和阳极与阴极与高电阻膜之间的界面或导电膜与高电阻膜之间的界面处的接合不良而抑制电场集中，因此抑制了放电的产生。

公开(公告)号：US20120091358A1

公开(公告)日：2012-04-19

申请号：US12905126

申请日：2010-10-15

Applicant: Marco Jan Jaco WIELAND ,  Alexander Hendrik Vincent VAN VEEN

Inventor： Marco Jan Jaco WIELAND ,  Alexander Hendrik Vincent VAN VEEN

IPC: G21K1/08

CPC classification number: H01J37/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/1471 ,  H01J37/1478 ,  H01J37/30 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/0492

Abstract: The invention relates to a charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system has a charged particle source, an aperture array, a beamlet manipulator, a beamlet blanker, and an array of projection lens systems. The charged particle source is configured to generate a charged particle beam. The aperture array is configured to define separate beamlets from the generated beam. The beamlet manipulator is configured to converge groups of the beamlets towards a common point of convergence for each group. The beamlet blanker is configured to controllably blank beamlets in the groups of beamlets. Finally, the array of projection lens systems is configured to project unblanked beamlets of the groups of beamlets on to the surface of the target. The beamlet manipulator is further adapted to converge each of the groups of beamlets towards a point corresponding to one of the projection lens systems.

Abstract translation: 本发明涉及一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统具有带电粒子源，孔径阵列，子束操纵器，子束消除器和投影透镜系统阵列。 带电粒子源被配置为产生带电粒子束。 孔径阵列被配置为从所产生的光束定义单独的子束。 子束操纵器被配置为将每个子束的组合朝向每个组的公共收敛点收敛。 子束消除器被配置为可控地遮挡子束组中的子束。 最后，投影透镜系统的阵列被配置成将子束组的未平坦的子束投影到目标的表面上。 子束操纵器还适于将每个子束组朝向对应于投影透镜系统中的一个的点聚焦。

公开(公告)号：US20110174985A1

公开(公告)日：2011-07-21

申请号：US13010658

申请日：2011-01-20

Applicant: Jerry Peijster

Inventor： Jerry Peijster

IPC: H01J3/14 ,  H01J3/22 ,  H01J3/18

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/023 ,  H01J37/10 ,  H01J2237/1502

Abstract: The invention relates to a charged particle based lithography system for projecting an image on a target using a plurality of charged particle beamlets for transferring said image to said target, said system comprising a charged particle column comprising:an electron optical subassembly comprising a charged particle source, a collimator lens, an aperture array, a blanking means and a beamstop for generating a plurality of charged particle beamlets; anda projector for projecting said plurality of charged particle beamlets on said target;said projector being moveably included in the system by means of at least one projector actuator for moving said projector relative to said electron optical subassembly;said projector actuator being included for mechanically actuating said projector and providing said projector with at least one degree of freedom of movement;wherein said degree of freedom relates to a movement around an optical axis of the system.

Abstract translation: 本发明涉及一种基于带电粒子的光刻系统，用于使用多个带电粒子子束将图像投影到目标上，用于将所述图像转印到所述靶上，所述系统包括带电粒子柱，包括：包含带电粒子源的电子光学子组件 准直透镜，孔径阵列，消隐装置和用于产生多个带电粒子子束的波束抑制器; 以及投影仪，用于将所述多个带电粒子子束投影在所述目标上; 所述投影仪通过至少一个用于相对于所述电子光学子组件移动所述投影仪的投影仪致动器可移动地包括在所述系统中; 所述投影机致动器被包括用于机械地致动所述投影仪并且为所述投影仪提供至少一个移动自由度; 其中所述自由度涉及围绕所述系统的光轴的运动。

公开(公告)号：US07244949B2

公开(公告)日：2007-07-17

申请号：US11366533

申请日：2006-03-03

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle

IPC: G21K5/10 ,  G21K7/00 ,  H01J37/28

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The first magnetic field region is traversed by the primary beam path and the secondary beam path. The second magnetic field region is arranged in the primary beam path upstream of the first magnetic field region and is not traversed by the secondary beam path. The first and second magnetic field regions deflect the primary beam path in substantially opposite directions. The third magnetic field region is arranged in the secondary beam path downstream of the first magnetic field region and is not traversed by the first beam path. The first and third magnetic field regions deflect the secondary beam path in a substantially same direction.

Abstract translation: 电子 - 光学装置提供用于一次电子束的主光束路径和二次电子的次级光束路径。 电子 - 光学装置包括具有第一，第二和第三磁场区域的磁体装置。 第一磁场区域被主光束路径和次光束路径穿过。 第二磁场区域被布置在第一磁场区域的上游的主光束路径中，并且不被辅助光束路径穿过。 第一和第二磁场区域以基本上相反的方向偏转主光束路径。 第三磁场区域布置在第二磁场区域的下游的次级光束路径中，并且不被第一光束路径穿过。 第一和第三磁场区域以基本上相同的方向偏转次级光束路径。

公开(公告)号：US5736742A

公开(公告)日：1998-04-07

申请号：US729670

申请日：1996-10-03

Applicant: Yukinori Ochiai

Inventor： Yukinori Ochiai

IPC: H01J37/141 ,  H01J37/10 ,  H01J37/20

CPC classification number: H01J37/10 ,  H01J2237/1035 ,  H01J2237/20

Abstract: An in-lens type objective lens is separated into two parts along the plane perpendicular to the direction of electron or ion orbit, so that a target sample can placed between the upper part and the lower part of the lens. Coils for the two parts are serially connected so as to work as one coil. Each of the upper and lower parts of the lens is provided with a lens positioning device. If the in-lens type objective lens is of a three-piece electrostatic type, a structure is provided which enables a target sample to be placed between a first and second electrode group and the third electrode.

Abstract translation: 透镜式物镜沿着垂直于电子或离子轨道方向的平面分成两部分，使得目标样品可以放置在透镜的上部和下部之间。 两个部分的线圈串联连接，以作为一个线圈工作。 透镜的上部和下部各设置有透镜定位装置。 如果透镜式物镜是三体式静电型的，则提供能够将目标样品置于第一和第二电极组与第三电极之间的结构。

公开(公告)号：US12057288B2

公开(公告)日：2024-08-06

申请号：US17642165

申请日：2019-10-04

Applicant: Hitachi High-Tech Corporation

Inventor： Momoyo Enyama ,  Makoto Sakakibara ,  Hajime Kawano

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/2448 ,  H01J2237/2806

Abstract: Provided is a charged particle beam device for which deterioration in throughput in the event of abnormality of multiple beams can be prevented. The charged particle beam device includes: a stage 11 on which a sample is mounted; a charged particle optical system configured to irradiate the sample with multiple beams including multiple primary beams; a detector 15 configured to detect secondary beams generated by interactions between the primary beams and the sample and output detection signals; and a control unit 17 configured to control the stage and the charged particle optical system to generate image data based on the detection signals from the detector obtained by scanning the sample with the multiple beams using a first scanning method. The control unit changes, when the abnormality of the multiple beams is detected based on the image data, the multiple beams to scan the sample using a second scanning method, and a scanning width of the multiple beams for scanning the sample is greater in the second scanning method than in the first scanning method.

公开(公告)号：US20240234080A9

公开(公告)日：2024-07-11

申请号：US18488617

申请日：2023-10-17

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Thomas Schmid

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/10 ,  H01J37/1474 ,  H01J37/28

Abstract: A multi-beam particle beam system comprises a particle beam source for creating a beam of charged particles, and a beam splitter for splitting the beam into a bundle of particle beams. The beam splitter comprises a multi-aperture plate having openings. A particle optical unit is provided to focus each of the particle beams in an object plane. A correction optical unit is provided for compensating for at least one aberration of the particle optical unit and comprises three or five hexapod elements and a plurality of round lens elements. The hexapod elements are successively arranged between the particle source and the multi-aperture plate in the beam path. A round lens element is arranged between each pair of hexapod elements arranged directly in succession in the beam path.

公开(公告)号：US12014895B2

公开(公告)日：2024-06-18

申请号：US17540169

申请日：2021-12-01

Applicant: KLA Corporation

Inventor： Tomas Plettner ,  Doug Larson ,  Mark Cawein ,  Jason W. Huang

IPC: H01J37/10 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/10 ,  H01J37/20 ,  H01J37/28

Abstract: A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. The system also includes an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes. Last, a swathing stage is used to move a sample with a constant velocity in a second direction that is parallel to the first direction.

公开(公告)号：US20240014003A1

公开(公告)日：2024-01-11

申请号：US18345956

申请日：2023-06-30

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US11817289B2

公开(公告)日：2023-11-14

申请号：US17725276

申请日：2022-04-20

Applicant: HITACHI HIGH-TECH CORPORATION ,  Japan Fine Ceramics Center

Inventor： Tsunenori Nomaguchi ,  Shunichi Motomura ,  Tadahiro Kawasaki ,  Takeharu Kato ,  Ryuji Yoshida

IPC: H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/244

CPC classification number: H01J37/09 ,  H01J37/10 ,  H01J37/153 ,  H01J37/244 ,  H01J2237/0458 ,  H01J2237/1534

Abstract: As a device for correcting positive spherical aberration of an electromagnetic lens for a charged particle beam, a spherical aberration correction device combining a hole electrode and a ring electrode is known. In this spherical aberration correction device, when a voltage is applied between the hole electrode and the ring electrode, the focus of the charged particle beam device changes due to the convex lens effect generated in the hole electrode. Therefore, in a charged particle beam device including a charged particle beam source which generates a charged particle beam, a charged particle beam aperture having a ring shape, and a charged particle beam aperture power supply which applies a voltage to the charged particle beam aperture, the charged particle beam aperture power supply is configured to apply, to the charged particle beam aperture, a voltage having a polarity opposite to a polarity of charges of the charged particle beam.